Antistructure disorder and its relation to dislocations in III–V semiconductors

Intimate relationship between antistructure defects and dislocations occurs in GaAs which manifests itself as: (i) appearing of spatial correlation between grown-in dislocations and the EL2 defects (component of the latter are As_Ga antisites), (ii) similar suppression of the concentration of EL2 and dislocation density due to the doping with donor impurities, (iii) generation of As_Ga antisites during the plastic deformation of a crystal. Al these effects can be understood in terms of the dislocation-mediated generation of As_Ga antisites via absorption of As_i interstitials at dislocation jogs. Large anion (cation) precipitates appearing at dislocations are pointed out to be important for both antisite and dislocation generation under certain conditions.     

Back-Scattered Electron Imaging of Microscopic Segregation in (Si,Ge) Single Crystals

Compositional inhomogeneities of (Si,Ge) single crystals grown by the radio frequency (RF) heated float zone technique have been studied using the back-scattered electron (BSE) mode of a scanning electron microscope. Numerical analysis of the images by Fast Fourier Transformation (FFT) showed that the number of spatial frequencies with substantial amplitudes is increased when investigating longitudinal sections of crystals containing dislocations instead of dislocation-free crystals. This can be attributed to different growth conditions in terms of super-cooling.     

Change of the Normal Rate of Hills Growth on the (001) Face of TGS Single Crystal Under Constant Crystallization Conditions

Considerable change (up to 100% in one of the cases) of the normal growth rate of hills on the (001) face of the TGS crystal at strictly constant supersaturation and temperature is registered experimentally. On the basis of the spatial disposition of the dislocations, which form the source of the steps, a model of a growth centre (called herein non-parallel centre of growth) is proposed. The model is qualitatively concordant with the experimental data. It is shown that the inconstancy of the normal rate of growth at constant supersaturation and temperature is an immanent characteristic of the non-parallel centre of growth.     

Investigations of crystal defects with reflection-section topography

A simple topographic technique is presented that allows an exact determination of the depth of kinematically reflecting regions below the crystal surface. A kinematical reflection full of contrast can be achieved by a spatial separation of the images from perfect and disturbed parts of the crystal. Possible applications of reflection-section topography are e.g. demonstrated by lattice deformations caused by laser irradiation and ion implantation as well as by growth bands and dislocations. In weakly deformed crystals a new kind of interference fringes can be observed.     

Dynamic Aspects of Dislocation Behaviour Near Low-Angle Boundary in Molybdenum Single Crystals

The dislocation behaviour was inventigated in specimens of monocrystals of molybdenium during in — situ stretching in the direction [001] near low — angle twist boundary which was close to be parallel to the direction of the external force. Low-angle boundary is easily penetrable for the fast moving nonscrew dislocations and acts as an effective stopper for screw dislocations which are quite parallel to the forming boundary dislocations. The mixed tipe dislocations emission by the low-angle boundary was noticed. On the stage when plastic deformation is performed mainly by the motion of screw dislocations the “relay-race”-like transmission of the dislocations motion through the boundary was observed.     

Influence of non-stoichiometry on the recombination activity of dislocations in undoped semi-insulating GaAs crystals

The effect of non-stoichiometry of gallium arsenide melt composition on the recombination activity of dislocations in undoped semi-insulating GaAs crystals is studied and analyzed. It is shown that the deviation from the stoichiometric melt composition is one of the major factors affecting the recombination activity of dislocations in undoped semi-insulating GaAs crystals. namely: the recombination activity of dislocations is increased when the arsenic-rich melt is used, and, on the contrary, is decreased when the gallium-rich melt is used. The regularities observed are explained by the complex processes of interaction of dislocations with the non-stoichiometry-induced intrinsic point defects.     

Study of the Nature and Distribution of Elementary Steps on the (100) Cleavage Faces of MgO Single Crystals by Atomic Force Microscopy

Some observations made on the nature and distribution of monolayer (elementary) steps on the (100) cleavage faces of MgO single crystals by atomic force microscopy are presented and discussed. The following types of patterns of monolayer steps are described: (1) trains of steps, (2) steps terminating on the cleaved surface at the emergence points of screw dislocations, and (3) localized pinning of advancing steps at random sites (probably at the emergence points of edge dislocations). It is shown that: (1) the origins of emergence points of monolayer steps are devoid of hollow cores due to a small Burgers vector of dislocations and (2) the minimum distance between two emerging steps due to screw dislocations and between two pinning centres due to edge dislocations depends on their sign, and is determined by the mutual interaction between neighbouring dislocations.     

Dislocation Multiplication in the Flexoelectric Distortion Grid with an Increase in Electric Field Amplitude

It is shown that a plane one-dimensional flexoelectric grid well simulates the processes of the nucleation of defects (dislocations) and an increase in their number in crystals under increasing mechanical stresses in the crystal lattice. The latter rise with an increase in electric field above the instability threshold and the corresponding growth of the modulations of the flexoelectric-grid spatial structure. Parameters of these modulations are obtained for various boundary conditions at the surface of a nematic film oriented in one direction. The previous data on the dislocation patterns in strong fields are explained. The applicability of the dislocation theory to the planar one-dimensional grid is shown.     

Characterization of defects in GaP and GaAsP graded heterojunctions by transmission electron microscopy

Misfit dislocations are observed in graded heterojunctions GaAs_1?xP_x by electron microscopy. Results are in agreement with previous work concerning the nature of the dislocations (Lomer and 60° dislocations) and their density dependence on the phosphorus gradient. The discussion concerns the formation of Lomer dislocations and the possibility of reducing the density of inclined dislocations which reach the surface of the epitaxial layer. GaP substrates, S-doped, are examined by transmission electron microscopy. Numerous defects such as Frank loops, perfect loops, helical dislocations and precipitates are observed. A GaP homoepitaxial layer realized on this substrate is free from these defects but exhibits stacking faults. A zinc diffusion does not produce additional defect but a 1000 Å thick amorphous layer is observed a at the surface.     

The role of dislocations in the formation of mechanical stresses during annealing of gallium arsenide single crystals

The effect of dislocations on the change of mechanical stresses in undoped semi-insulating gallium arsenide single crystals has been studied during their annealing in vacuum and in the arsenic atmosphere. The phenomena observed are explained by the effect of dislocations playing the role of channels for arsenic diffusion on the concentration of intrinsic point defects in the crystal regions surrounding dislocations. The mechanism of arsenic diffusion over dislocations allows one to consider dislocations as sources and sinks of arsenic without the translational and twinning processes and, thus, makes the well-known data on the reactions of dislocation interaction with point defects and the experimental structural data for single crystals more consistent.     

Diffusion of self-point defects in body-centered cubic iron crystal containing dislocations

The energetic, crystallographic, and diffusion characteristics of self-point defects (SPDs) (vacancies and self-interstitial atoms (SIAs)) in body-centered cubic (bcc) iron crystal in the absence of stress fields have been obtained by the molecular statics and molecular dynamics methods. The effect of elastic stress fields of dislocations on the characteristics of SPDs (elastic dipoles) has been calculated by the methods of the anisotropic linear theory of elasticity. The SPD diffusion in the elastic fields of edge and screw dislocations (with Burgers vectors 1/2 〈111〉 and 〈100〉) at 293 K has been studied by the kinetic Monte Carlo method. The values of the SPD sink strength of dislocations of different types are obtained. Dislocations are more effective sinks for SIAs than for vacancies. The difference in the sink strengths for SIAs and vacancies in the case of edge dislocations is larger than the screw dislocations.     

Dislocation mobility in LiF at low temperatures

The mobility of dislocations in LiF has been measured at 4.2 and 10 K by means of an etch pit technique. The average velocity of screw dislocations is 2–5 times as large as edge dislocations. The results of the stress and temperature dependence of the velocities correlate well with the data of the critical shear stress in the same temperature region, and are well described by the theory of Peierls mechanism with thd Peierls stress of about 20 MPa for edge dislocations on {110} slip plane.     

Dislocations in synthetic quartz

The present paper is a review of the data about the dislocations in the as-grown quartz crystal. The work presents some general considerations about dislocations, their origins and causes, methods of their observation and techniques to reduce the dislocations density. It is also shown a method to obtain a new shape crystal used in the positive X-seeds preparation.     

Propagation behavior of threading dislocations during physical vapor transport growth of silicon carbide (SiC) single crystals

The dislocation formation and propagation processes in physical vapor transport (PVT) grown 4H silicon carbide (4H–SiC) single crystals have been investigated using defect selective etching and transmission electron microscopy (TEM). It was found that while the growth initiation process generally increased the density of threading dislocations in the grown crystal, for certain areas of the crystal, threading dislocations were terminated at the growth initiation. Foreign polytype inclusions also introduced a high density of dislocations at the polytype boundary. In the polytype-transformed areas of the crystal, almost no medium size hexagonal etch pits due to threading screw dislocations were observed, indicating that the foreign polytype inclusions had ceased the propagation of threading screw dislocations. Based on these results, we argued the formation and propagation of the threading dislocations in PVT grown SiC crystals, and proposed the dislocation conversion process as a plausible cause of the density reduction of threading dislocations during the PVT growth of SiC single crystals.     

A theoretical interpretation of the electrical behaviour of individual edge dislocations in Si as determined by combined EBIC/TEM studies

The EBIC data obtained from individual edge and Frank partial dislocations ⁱn Si, and described in other publications, are related to defect parameters, such as the capture cross-section for minority carriers, which determine electrical recombination properties of dislocations. A two stage model for the capture of minority carriers by dislocations is developed and shown to correctly account for the temperature-dependence of the EBIC contrast obtained from these dislocations.     

Determination of the types and densities of dislocations in GaN epitaxial layers of different thicknesses by optical and atomic force microscopy

The change in the dislocation density on the surface of GaN epitaxial layers, which were grown by hydride vapor-phase epitaxy on sapphire substrates with c and r orientations, has been investigated by optical and atomic force microscopy (AFM). It is shown that the observed decrease in the density of threading dislocations with an increase in the layer thickness is related to the annihilation of mixed dislocations. The experimental and theoretical data on the change in the density of mixed dislocations with an increase in the epitaxial-layer thickness are in good correspondence.     

Nature,origin and effect of dislocations in epitaxial semiconductor layers

The paper is concerned with the manner in which dislocations in Group 3–5 compound epitaxial layer structures are generated, propagate and interact with one another. The different types of epitaxial layer and dislocation behaviour are initially reviewed. The examination methods used are based on electron microscopy. The TEM is used in conjunction with plan-view, cross-section, and angle-lap specimens to determine the detailed nature and three-dimensional distribution of the dislocations. The SEM EBIC and CL methods are used with bulk specimens to obtain electrical and luminescent information. In particular, the latter methods give micrograph-type images showing dark spots and lines corresponding to individual dislocations, the contrast arising because of electrical carrier recombination taking place at the dislocations. These methods are used to investigate the dislocation behaviours occurring in a wide range of specimens including homo- and hetero-epitaxial layers, and embracing small, medium and large mismatches. An attempt is made to obtain quantitative data concerning the processes occurring. The work has provided a better understanding in many instances, and sometimes allowed the occurrence of the dislocations to be better controlled. An example is given of the application of the results to the improvement in the quality of a GaAs transmission photocathode device-type structure.     

Anomalously Large Burgers Vectors of Screw Dislocations in Gallium Nitride Nanowires

Crystallography Reports - The results of structural studies of GaN nanowires containing screw dislocations are presented. It is found that the length of the Burgers vector of dislocations may reach...     

Zum Nachweis von Versetzungen in β-Kupferphthalocyanin-Einkristallen

An etching technique was developed to investigate dislocations in β-copper phthalocyanine single crystals. Considering the expected content of dislocations and the etch pit symmetry the symmetric etch pits are correlated to [010]-edge dislocations on {201 }- and {001}-lattice planes with (001)- and (201 )-slip planes. Asymmetric etch pits on {001}- and {201 }-planes are connected with [010]-edge dislocations related to (100)- and (101 )-slip planes. The dislocation density on growth planes and cleavage planes is commonly lower than 100 cm⁻². [010]-screw dislocations are not observed, but their existence could not be excluded.     

Influence of a buried misfit dislocation network on the pyramid-to-dome transition size of Ge self-assembled quantum dots on Si(0 0 1)

The critical sizes of the pyramid-to-dome transition of Ge self-assembled quantum dots (SAQDs) grown on relaxed SiGe buffer layers were investigated for the relationship between the misfit strain built in dots and nucleation sites. The strain field of arrays of buried dislocations in a relaxed SiGe buffer layer provided preferential nucleation sites for quantum dots. Burgers vector analysis using plan-view transmission electron microscopy verified that the preferential nucleation sites of Ge SAQDs depended on the Burgers vector direction of corresponding dislocations. The measurement of the lateral distance between SAQDs and dislocations clarified that the location of SAQDs was at the intersection of the dislocation slip plane and the top surface. The samples are fabricated to contain low dislocation densities. The average dislocation spacing is larger than the surface migration length of Ge adatoms, resulting in two groups of SAQDs, those that are located along the dislocations, and those that are not. Atomic force microscopy observations showed a distinctively larger critical size for Ge SAQDs grown over the intersection of the dislocation slip plane and the top surface than those grown in regions between dislocations. These experimental observations indicate that the critical size of the pyramid-to-dome transition is strongly dependent on misfit strain in SAQDs with lower strain being associated with a larger critical size.