Electronic characteristics of InAs self-assembled quantum dots

Deep-level transient spectroscopy and photoluminescence studies have been carried out on structures containing self-assembled InAs quantum dots formed in GaAs matrices. The use of n- and p-type GaAs matrices allows us to study separately electron and hole levels in the quantum dots by the deep-level transient spectroscopy technique. From analysis of deep-level transient spectroscopy measurements it follows that the quantum dots have electron levels 130 meV below the bottom of the GaAs conduction band and heavy-hole levels at 90 meV above the top of the GaAs valence band. Combining with the photoluminescence results, the band structures of InAs and GaAs have been determined.     

Anomalous photoluminescence of InAs quantum dots implanted by Mn ions

The photoluminescence (PL) of Mn-implanted quantum dot (QD) samples after rapid annealing is studied. It is found that the blue shift of the PL peak of the QDs, introduced by the rapid annealing, decreases abnormally as the implantation dose increases. This anomaly is probably related to the migration of Mn atoms to the InAs QDs during annealing, which leads to strain relaxation when Mn atoms enter InAs QDs or to the suppression of the inter-diffusion of In and Ga atoms when Mn atoms surround QDs. Both effects will suppress the blue shift of the QD PL peaks. The temperature dependence of the PL intensity of the heavily implanted QDs confirms the existence of defect traps around the QDs.     

Resonant photoluminescence from modulation-doped InAs –GaAs quantum dots

Resonant luminescence studies of InAs quantum dots (QDs) embedded in a GaAs matrix grown by molecular beam epitaxy are presented, showing marked differences for modulation-doped and undoped QDs and indicating that the doping leads to different exciton formation and carrier relaxation mechanisms. The LO-phonon assisted relaxatioin of excitons between sub-levels is identified for the modulation-doped QDs.     

Molecular beam epitaxy growth and characterization of self-assembled InAs quantum dots on (1 0 0) InAlAs/InP substrates

Self-assembled InAs quantum dots (QDs) on In_0.52Al_0.48As layer lattice matched to (1 0 0) InP substrates have been grown by molecular beam epitaxy (MBE) and evaluated by transmission electron microscopy (TEM) and photoluminescence (PL). TEM observations indicate that defect-free InAs QDs can be grown to obtain emissions over the technologically important 1.3–1.55 μm region. The PL peak positions for the QDs shift to low energy as the InAs coverage increases, corresponding to increase in QD size. The room temperature PL peak at 1.58 μm was observed from defect-free InAs QDs with average dot height of 3.6 nm.     

Exchange interaction in InAs nanocrystal quantum dots

The near band-gap level structure in high-quality colloidal InAs nanocrystal quantum dots within the very strong confinement regime is investigated. Size-selective photoluminescence excitation and fluorescence line narrowing measurements reveal a size-dependent splitting between the absorbing and the emitting states. The splitting is assigned to the confinement-enhanced electron–hole exchange interaction. The size dependence of the splitting significantly deviates from the idealized 1/r³scaling law for the exchange splitting. A model incorporating a finite barrier which allows for wavefunction leakage is introduced. The model reproduces the observed 1/r²dependence of the splitting and good agreement with the experimental data is obtained. The smaller barriers for embedded InAs dots grown by molecular-beam epitaxy, are predicted to result in smaller exchange splitting as compared with colloidal dots with a similar number of atoms.     

等离子体增强InAs单量子点荧光辐射的研究

通过测量光致发光(PL)谱、PL时间分辨光谱及不同激发功率下PL发光强度,研究了低温(5 K)下等离子体对InAs单量子点PL光谱的增强效应.采用电子束蒸发镀膜技术在InAs量子点样品表面淀积了5 nm厚度的金膜,形成纳米金岛膜结构.实验发现,金岛膜有利于量子点样品发光强度的增加,最大PL强度增加了约5倍,其主要物理机理是金岛膜纳米结构提高了量子点PL光谱的收集效率.     

Self-assembly of InAs quantum dots on GaAs(001)by molecular beam epitaxy

Currently, the nature of self-assembly of three-dimensional epitaxial islands or quantum dots (QDs) in a lattice-mismatched heteroepitaxial growth system, such as InAs/GaAs(001) and Ge/Si(001) as fabricated by molecular beam epitaxy (MBE), is still puzzling. The purpose of this article is to discuss how the self-assembly of InAs QDs in MBE InAs/GaAs(001) should be properly understood in atomic scale. First, the conventional kinetic theories that have traditionally been used to interpret QD self-assembly in heteroepitaxial growth with a significant lattice mismatch are reviewed briefly by examining the literature of the past two decades. Second, based on their own experimental data, the authors point out that InAs QD self-assembly can proceed in distinctly different kinetic ways depending on the growth conditions and so cannot be framed within a universal kinetic theory, and, furthermore, that the process may be transient, or the time required for a QD to grow to maturity may be significantly short, which is obviously inconsistent with conventional kinetic theories. Third, the authors point out that, in all of these conventional theories, two well-established experimental observations have been overlooked: i) A large number of “floating” indium atoms are present on the growing surface in MBE InAs/GaAs(001); ii) an elastically strained InAs film on the GaAs(001) substrate should be mechanically unstable. These two well-established experimental facts may be highly relevant and should be taken into account in interpreting InAs QD formation. Finally, the authors speculate that the formation of an InAs QD is more likely to be a collective event involving a large number of both indium and arsenic atoms simultaneously or, alternatively, a morphological/structural transformation in which a single atomic InAs sheet is transformed into a three-dimensional InAs island, accompanied by the rehybridization from the sp²-bonded to sp³- bonded atomic configuration of both indium and arsenic elements in the heteroepitaxial growth system.     

Mn离子注入InAs/GaAs量子点结构材料的光电性质研究

用高能离子注入(160keV)的方法对InAs/GaAs量子点结构进行掺杂，研究了不同退火工艺处理后量子点的光致发光和电学性能.相对于长时间退火，快速退火处理后的量子点发光通常较强.在相同的退火条件下，量子点发光峰位随着Mn注入剂量的增加，先是往高能量端快速移动，而后发光峰又往低能方向移动.后者可能是由于Mn原子进入InAs量子点，释放了InAs量子点中的应变所致.对于高注入剂量样品和长时间退火样品，变温电阻曲线在40 K附近会出现反常行为. 关键词： 离子注入 InAs/GaAs量子点 光致发光 团簇     

Magnetic field dependence of hole levels in InAs quantum dots

We have studied the charging of InAs quantum dots with holes in perpendicular fields up to 16 T by capacitance—voltage spectroscopy. The first two charging peaks show almost no shift with magnetic field which is consistent with the filling of a twofold degenerate s-like state with no orbital angular momentum. The next four charging peaks shift towards lower and higher energy in an alternating fashion. Peaks 5 and 6 shift approximately twice as strong as peaks 3 and 4. This behavior cannot be explained by the charging of a fourfold degenerate p-shell according to Hund′s first rule. We speculate that the p-shell is not completely filled before the filling of the d-shell starts.     

Tunnelling current in Schottky diodes containing InAs quantum dots

Current transport mechanism in Schottky diode containing InAs quantum dots (QDs) is investigated using temperature-varying current-voltage characteristics. We found that the tunnelling emission has obvious effects on the I-V characteristics. The I-V-T measurements revealed clear effects of QDs on the overall current flow. Field emission (FE, pure tunnelling effect) was observed at low temperature and low voltages bias region. The zero-bias barrier height decreases and the ideality factor increases with decreasing temperature, and the ideality factor was found to follow the T₀-effect. When the reverse bias is varied, the ideality factors of Schottky barriers exhibit oscillations due to the tunnelling of electrons through discrete levels in quantum dots. The traps distributed within InAlAs layer can also act as a transition step for reverse bias defect-assisted tunnelling current which can phenomenologically explain the decrease of the effective barrier height with measurement temperature.     

Molecular states observed in a single pair of strongly coupled self-assembled InAs quantum dots

Molecular states in a single pair of strongly coupled self-assembled InAs quantum dots are investigated using a sub-micron sized single-electron transistor containing just a few pairs of coupled InAs dots embedded in a GaAs matrix. We observe a series of well-formed Coulomb diamonds with charging energy of less than 5 meV, which are much smaller than those reported previously. This is because electrons are occupied in molecular states, which are spread over both dots and occupy a large volume. In the measurement of ground and excited state single-electron transport spectra with a magnetic field, we find that the electrons are sequentially trapped in symmetric and anti-symmetric states. This result is well explained by numerical calculation using an exact diagonalization method.     

Temperature dependence of the electron distribution in a GaAs matrix with embedded InAs quantum dots

We report on the effect of the Debye averaging process on the CV characteristics of a sample containing four coupled planes of InAs self-assembled quantum dots. The observed electron distribution presented a dynamical dependence of the temperature during the C–V measurements which was explained in terms of the screening length dependence on the temperature. In addition, using the C–V data, we calculated the electron density at the planes containing the InAs dots and we have observed a high-temperature stability: the electron density at the quantum dots remained constant over a large range of temperature.     

Photoluminescence and lasing properties of InAs/GaAs quantum dots grown by metal-organic chemical vapour deposition

Photoluminescence （PL） and lasing properties of InAs/GaAs quantum dots （QDs） with different growth procedures prepared by metalorganic chemical vapour deposition are studied. PL measurements show that the low growth rate QD sample has a larger PL intensity and a narrower PL line width than the high growth rate sample. During rapid thermal annealing, however, the low growth rate sample shows a greater blueshift of PL peak wavelength. This is caused by the larger InAs layer thickness which results from the larger 2-3 dimensional transition critical layer thickness for the QDs in the low-growth-rate sample. A growth technique including growth interruption and in-situ annealing, named indium flush method, is used during the growth of GaAs cap layer, which can flatten the GaAs surface effectively. Though the method results in a blueshift of PL peak wavelength and a broadening of PL line width, it is essential for the fabrication of room temperature working QD lasers.     

The preferential formation site of dislocations in InAs/GaAs quantum dots

In this paper, taking elastic anisotropy into consideration, we use a dislocation position dependent model to calculate the preferential formation site of the pure edge and 60° mixed dislocation segment in different shaped InAs/GaAs quantum dots (QDs). From the result, it is clear that for the pure edge dislocations the most energy favorable position is always the base center of the quantum dots. While as to the 60° mixed dislocations, the positions near to the edge of the quantum dot base are the energy favorable area and the exact position is changed with different aspect ratio of the quantum dot.     

Raman study of InAs quantum dots on GaAs/InP grown by low pressure metal-organic chemical vapor deposition

Raman spectra of InAs quantum dots (QDs) on InP substrate were investigated. Both longitudinal-optic (LO) and transverse-optic (TO) frequency of InAs QDs showed a large blue-shift comparing to its bulk due to the compressive strain in InAs QDs. Raman scattering of InAs QDs with a thin GaAs interlayer was studied. We obtained that the peak position of LO and TO mode of InAs QDs became larger blue-shifted when we inserted the GaAs layer. At the same time, we found a red-shift of the frequency of GaAs LO mode because of tensile strain. Theoretical calculation was performed and its prediction coincided with our experiment results well. They both showed that strain played an important role in formation of InAs QDs.     

离子注入对InAs/GaAs量子点光学效质的影响

研究了低能质子注入诱导的界面混合和快速热退火对量子点发光效率的影响，对其光致发光 峰强进行了拟合计算.研究发现量子点的发光峰强度主要由载流子俘获时间和非辐射复合寿 命决定.由于后退火处理能够部分的消除因质子注入造成的缺陷，量子点中非辐射复合中心 浓度与注入剂量成亚线性关系；退火温度越高，非辐射复合中心被消除越多，亚线性程度越 高.界面混合导致的俘获效率的增加和注入损伤引起的非辐射复合是相互竞争过程，存在一 个临界的注入剂量N_C，当注入剂量N小于N_C，界面混合作 用较为明显，量子点 发光峰强随注入剂量增加而增强；当N大于N_C时，质子注入引起了大量的非 辐射复合 中心，主要表现为注入损伤，量子点的发光峰强随注入剂量增加而迅速减弱.退火温度越高 ，N_C越大. 关键词： 量子点 离子注入 峰强     

InAs/AlAs quantum dots with InGaAs insertion layer: dependence of the indium composition and the thickness

We have systematically studied the effect of an In_xGa_1−xAs insertion layer (IL) on the optical and structural properties of InAs quantum dot (QD) structures. A high density of 9.6×10¹⁰ cm⁻² of InAs QDs with an In_0.3Ga_0.7As IL has been achieved on a GaAs (1 0 0) substrate by metal organic chemical vapor deposition. A photoluminescence line width of 25 meV from these QDs has been obtained. We attribute the high density and high uniformity of these QDs to the use of the IL. Our results show that the InGaAs IL is useful for obtaining high-quality InAs QD structures for devices with a 1.3 μm operation.     

Photochromism and magneto-optic response of ZnO:Mn semiconductor quantum dots fabricated by microemulsion route

ZnO:Mn semiconductor quantum dots were prepared by solution casting led microemulsion route. Quantum dots of average size ∼2 nm were noticed in transmission electron micrographs. The present work highlights colour change phenomena (photochromic effect) of quantum dots while subjected to photon illumination. The magneto-optic measurements e.g. magnetic field (H) vs angle of rotation (θ) show step like behavior and is ascribed to the quantum confinement effect of diluted magnetic ZnO:Mn nanostructures. Further, underlying mechanism responsible for exhibiting photochromism and magneto-optic effects are also discussed.      

InAs/GaAs量子点1.3 μm单光子发射特性

采用双层耦合量子点的分子束外延生长技术生长了InAs/GaAs量子点样品,把量子点的发光波长成功地拓展到1.3 μm.采用光刻的工艺制备了直径为3 μm的柱状微腔,提高了量子点荧光的提取效率.在低温5 K下,测量得到量子点激子的荧光寿命约为1 ns;单量子点荧光二阶关联函数为0.015,显示单量子点荧光具有非常好的单光子特性;利用迈克耳孙干涉装置测量得到单光子的相干时间为22 ps,对应的谱线半高全宽度为30 μeV,且荧光谱线的线型为非均匀展宽的高斯线型.     

The refractive nonlinearities of InAs/GaAs quantum dots above-bandgap energy

The third-order optical nonlinear refractive properties of InAs/GaAs quantum dots grown by molecular beam epitaxy have been measured using the reflection Z-scan technique at above-bandgap energy. The nonlinear refractive index and nonlinear absorption index of the InAs/GaAs quantum dots were determined for wavelengths from 740 to 777 nm. The measured results are compared with the nonlinear refractive response of several typical III-V group semiconductor materials. The corresponding mechanisms responsible for the large nonlinear response are discussed.