膜催化研究 Ⅱ.多孔无机膜的制备与表征及其反应器对甲醇脱氢反应的促进作用

采用溶胶-凝胶法制备了多孔氧化铝膜,并通过DSC、TGA、SEM、N_2吸附和气体透过率测定等手段,对膜的性能进行了表征.结果表明,用这种方法制备的多孔氧化铝膜是一种均匀无裂痕和具有较窄孔径分布(约4nm)的膜材料.将此多孔氧化铝膜制成膜反应器后,用于甲醇催化脱氢制甲醛的反应,发现甲醇转化率比常规反应器有较大幅度的提高.同时首次尝试采用溶胶-凝胶法将催化活性组分直接负载到多孔氧化铝膜上,从而得到了一种具有催化活性的多孔膜,并考察了它的反应活性.文中对由这两种多孔膜及钯/陶瓷复合膜制成的反应器的特点进行了比较.     

金属螯合亲和膜吸附分离与纯化溶菌酶的研究（Ⅱ）——不同金 …

采用低温氧或氨等离子体法改性聚丙烯微孔膜，基于等离子体改性膜的活化，偶联及螯合过程的机理，制备了Ｆｅ＾３＋、Ｎｉ＾２＋、Ｃｕ＾２＋等金属离子螯合亲和膜，并用于溶菌酶的吸－脱附实验。两种膜的重复吸－脱附性能相近，而Ｆｅ＾３＋螯合亲和膜基本上不能用于重复吸－脱附实验，采用补充金属螯合离子，能部分恢复亲和膜对溶菌酶的吸附量，是实现亲和膜重复使用的有效方法。     

等离子体辅助合成分子筛膜及其催化性能的研究

首次将等离子体技术应用于分子筛膜的制备，研究了以微波等离子体处理基材表面分子筛膜前驱体辅助水热反应合成支撑β型分子筛膜．利用XRD、SEM、XPS、BET、TPD表征了分子筛膜的物相、形貌、孔结构、表面元素组成和表面酸性，并通过甲醇与异丁烯液相反应体系实验考察了分子筛膜的催化性能．结果表明，等离子体处理能有效改善分子筛膜前驱体在基材表面的分散状况，减小了分子筛膜晶体的尺度，使晶体大小均匀，形成的膜致密、牢固．与采用常规方法合成的分子筛膜相比，等离子体辅助合成的分子筛膜对甲醇与异丁烯的反应有更好的催化活件．     

膜催化研究II. 多孔无要膜的制备与表征及其反应器对甲醇脱氢反应的促进作用

采用溶胶-凝胶法制备了多孔氧化铝膜, 并通过DSC、TGA、SEM、N~2吸附和气体透过率测定等手段, 对膜的性能进行了表征。结果表明, 用这种方法制备的多孔氧化铝膜是一种均匀无裂痕和具有较窄孔径分布(约4nm)的膜材料。将此多孔氧化铝膜制成膜反应器后, 用于甲醇催化脱氢制甲醛的反应, 发现甲醇转化率比常规反应器有较大幅度的提高。同时首次尝试采用溶胶-凝胶法将催化活性组分直接负载到多孔氧化铝膜上, 从而得到了一种具有催化活性的多孔膜, 并考察了它的反应活性。文中对由这两种多孔膜及钯/陶瓷复合膜制成的反应器的特点进行了比较。     

膜催化研究II. 多孔无要膜的制备与表征及其反应器对甲醇脱氢反应的促进作用

采用溶胶-凝胶法制备了多孔氧化铝膜, 并通过DSC、TGA、SEM、N~2吸附和气体透过率测定等手段, 对膜的性能进行了表征。结果表明, 用这种方法制备的多孔氧化铝膜是一种均匀无裂痕和具有较窄孔径分布(约4nm)的膜材料。将此多孔氧化铝膜制成膜反应器后, 用于甲醇催化脱氢制甲醛的反应, 发现甲醇转化率比常规反应器有较大幅度的提高。同时首次尝试采用溶胶-凝胶法将催化活性组分直接负载到多孔氧化铝膜上, 从而得到了一种具有催化活性的多孔膜, 并考察了它的反应活性。文中对由这两种多孔膜及钯/陶瓷复合膜制成的反应器的特点进行了比较。     

等离子体聚合制备气体分离膜研究概况

本文叙述了近年来等离子体聚合技术制备气体分离膜,主要是富氧膜的研究进展。着重介绍等离子体聚合制备复合膜的类型及结构、气体透过特性、等离子体反应参数对复合膜气体透过性的影响。     

γ—氧化铝膜的表面酸碱性

研究了氧化铝膜的表面酸碱性,发现采用溶胶－凝胶法制备的氧化铝膜的表面酸碱性受膜的择优取向性的影响;焙烧温度越高,形成的氧化铝膜的（110）面择优取向性越强,氧化铝膜表面呈碱性OH基团密度越大,碱量越大;而γ-氧化铝膜表面酸性OH基团密度越小,酸量越少。经700℃焙烧形成的氧化铝膜表面,双碱性OH基团为主,对酸性气体有良好的选择吸附性。含25％（体积分数）CO2／N2混合气体经700℃焙烧一 γ－氧化铝膜分离后,混合气中的CO2浓度降为0.7％。     

亲水膜的表面改性及在膜蒸馏中的应用

膜的微孔性和疏水性是水溶液膜蒸馏的两个基本条件,迄今人们均采用疏水性高分子材料制成疏水微孔膜用于膜蒸馏研究。本文采用辐照接枝聚合和等离子体表面聚合的方法,将亲水的醋酸纤维素微孔膜和硝酸纤维素微孔膜表面疏水化改性,成功地用于膜蒸馏研究,大大扩展了疏水微孔膜的材料来源。实验结果表明,亲水膜表面改性得到的疏水膜,其膜蒸馏性能不低于疏水材料制成的膜,尤其是等离子体聚合法可以实现多种特殊单体在多孔的材料表面聚合,成为制备高性能疏水微孔膜的有效手段,为膜蒸馏的深入发展和实用化创造了有利条件。     

聚乙烯－葡萄糖氧化酶膜的制备和性能研究

聚乙烯－葡萄糖氧化酶膜的制备和性能研究朱如瑾，殷弘浩，刘永盛，黄家湛（成都高分子材料国家重点实验室成都科技大学高分子研究所成都６１００６５）关键词聚乙烯，等离子体，固定化酶，葡萄糖氧化酶固定化酶是６０年代发展起来的生物工程技术Ｉ‘］．酶的固定化方法主...     

聚乙烯－葡萄糖氧化酶膜的制备和性能研究

聚乙烯－葡萄糖氧化酶膜的制备和性能研究朱如瑾，殷弘浩，刘永盛，黄家湛（成都高分子材料国家重点实验室成都科技大学高分子研究所成都６１００６５）关键词聚乙烯，等离子体，固定化酶，葡萄糖氧化酶固定化酶是６０年代发展起来的生物工程技术Ｉ‘］．酶的固定化方法主...     

纳米ZnO薄膜的制备及其可见光催化降解甲基橙

采用溶胶-凝胶方法制备ZnO透明溶胶, 在铝箔上涂膜后经500 ℃处理制得具有可见光响应的纳米ZnO薄膜光催化剂. 以甲基橙模拟有机污染物, 在可见光下研究了薄膜的降解性能, 结果表明, 用一片有效面积为200 cm2的ZnO/Al薄膜作为催化剂, 甲基橙的降解率达到96.3％, 比ZnO负载在玻璃上制得的ZnO/glass薄膜催化剂活性高得多. 采用扫描电镜与原子力显微镜对ZnO/Al薄膜制备条件进行了表征, 结果发现多孔ZnO/Al薄膜比致密ZnO/Al薄膜具有更高的活性, 实验制备的具有高活性的ZnO/Al薄膜颗粒平均直径为52.2 nm. 采用本方法制备的ZnO/Al薄膜是一种具有应用前景的, 能在可见光下降解有机物的有效光催化剂.     

铈、锂盐对铝阳极氧化膜的协同封闭作用

研究了铈、锂盐在铝阳极氧化膜封闭处理中的协同作用.场发射扫描电镜和X射线衍射谱对铈、锂盐协同封闭前后铝阳极氧化膜形貌和结构的研究结果表明，封闭后膜表面的孔洞消失，封闭产物分布均匀，封闭后膜仍然以非晶态形式存在.根据X射线光电子能谱的结果，封闭后的膜主要由含结晶水的Al2O3及铈、锂的混合氢氧化物组成，同时膜中还含有及封闭溶液组分中的一些阴离子.电化学阻抗谱的研究结果表明铈、锂盐协同封闭能够显著提高膜的耐蚀性能.在实验结果基础上，初步认为铈、锂盐封闭是通过生成结构紧密的封闭产物填充、覆盖膜孔，从而显著提高铝阳极氧化膜的耐蚀性能.     

Toward a quantitative description of the anodic oxide films on aluminum

A method to quantify the composition of anodic oxide films on aluminum using Infrared Spectroscopic Ellipsometry (IRSE) is proposed. It consists of obtaining the absorption coefficient of the film as a function of wavelength. Using values of the absorption coefficients for the pure components of the film, the percentages (mole or wt%) of each component in the sample can be calculated.The method is demonstrated in a study of the structure of the oxide film on electropolished aluminum and the anodically formed barrier layer film. Both surface oxides were found to be initially a form of amorphous Al₂O₃. While the barrier film is essentially free of water as prepared, the film on electropolished aluminum contained about 25 wt% water. Hydration of both types of films by immersion in boiling water results in the formation of pseudoboehmite (AlOOH). The technique may have more general applicability to the quantitative determination of the composition of corrosion films and other surface layers on metals.     

流化床CVD淀积过程中铝膜微结构及表面形貌的研究

考察了在常压流化床CVD反应器中利用三异丁基铝的热分解反应在高折射率玻璃微珠表面淀积铝膜时,淀积温度和时间对铝膜微结构和表面形貌的影响.SEM谱的表面形貌分析表明,提高淀积温度时,铝膜经过三维岛状→孔洞结构→连续致密膜的变化;延长淀积时间,铝膜的晶粒会变粗变大.AES谱的表面化学组成分析表明,在较高的淀积温度下铝膜中碳的残留并不明显,但发生了玻璃微珠基材中Ti,Ba等元素向铝膜中的扩散.Ti的扩散有利于形成连续致密的铝膜.     

金属铝诱导法低温制备多晶硅薄膜

以氢气稀释的硅烷(SiH₄)和硼烷(B₂H₆)为气源,利用等离子体增强化学气相沉积法(PECVD)制备出p型a-Si薄膜.采用铝诱导晶化技术对不同厚度的铝膜对a-Si薄膜晶化的影响进行了研究.实验中发现,铝膜溅射为10 s的非晶硅薄膜样品在450℃下退火10 min后,p型a-Si结构仍为非晶态,铝膜溅射为20 s的非晶硅薄膜在450℃下退火20 min后,p型a-Si薄膜开始晶化为poly-Si薄膜,并且铝膜厚度越厚,则a-Si薄膜晶化程度越强.     

Dielectric properties of Al–Si composite oxide films formed on electropolished and DC-etched aluminum by electrophoretic sol-gel coating and anodizing

Highly pure aluminum specimens (99.99%) after electropolishing and DC-etching were covered with SiO₂ films by electrophoretic sol-gel coating and were anodized in neutral boric acid/borate solutions. Time-variations in cell voltage during electrophoretic sol-gel coating and in anode potential during anodizing were monitored. Structure and dielectric properties of the anodic oxide films were examined by scanning electron microscopy (SEM), transmission electron microscopy (TEM), energy-dispersive X-ray (EDX), and electrochemical impedance spectroscopy (EIS). It was found that electrophoretic sol-gel coating forms uniform SiO₂ films on the surface of both electropolished and DC-etched specimens. Anodizing of specimens after electrophoretic coating lead to the formation of anodic oxide films consisting of two layers: an inner alumina layer and an outer Al–Si composite oxide layer. The anodic oxide films formed, thus, had slightly higher capacitances than those formed on aluminum without any coating. Higher heating temperatures after electrophoretic deposition caused the increase in capacitance of anodic oxide films more effectively. Anodizing in a boric acid solution after SiO₂ coating on DC-etched foil allowed the anode potential to reach a value higher than 1,000 V, resulting in 39% higher capacitances than those on specimens without SiO₂ film. Dedicated to Professor Su-Il Pyun on the occasion of his 65th birthday.     

XPS法测量铝箔表面氧化铝的厚度

介绍了一种无需溅射、无需变角，只需一次简单的ＸＰＳ（Ｘ射线光电子能谱）窄扫描，即可根据谱图中氧化态和金属态的相对强度算出铝金属表面氧化铝的厚度。用该法测量了一系列不同方法处理的铝表面氧比铝厚度，并与椭偏法及ＮＲＡ法（核反应分析法）测定结果进行了对比，结果表明，该法是一种简便准确的膜厚测量法。     

铝阳极氧化着色封闭膜的电子显微分析

本文对铝合金阳极氧化电解着色及封闭膜的分区结构、氧化膜定向生长和封闭结构进行了扫描电镜显微分析和透射电子显微分析。其分析结果对铝合金精饰工艺研究具有较好的指导作用。     

Plasma Polymerization on Metals

An ellipsometric technique is described for accurately measuring the film thickness of plasma-polymerized polymers on metallic substrates. The index of refraction n and absorption index Kof the plasma polymer film can also be studied by ellipsometry. Films of plasma polystyrene and polyepichlorohydrin were deposited on evaporated aluminum substrates and their thickness and optical constants determined. Plasma polystyrene films from 20 to 1600 Å thick have optical constants n = 1.63 and K =0 independent of film thickness. Plasma polyepichlorohydrin films over the same range of thickness give n ? 1.70 and K? 0.01. By utilizing the ellipsometric method the effect of plasma polymer film thickness on surface energy properties was determined. Advancing contact angle measurements and surface energy analysis detail the polar γSV^P dispersion γSV^Pcontributions to the solid-vapor surface tension γSV = γSV^d + γSV^P Polystyrene and polyepichlorohydrin films on etched aluminum. For thin plasma polystyrene films (600 Å), anomalies in the calculated surface energy are discussed and related to possible surface nonuniformity caused by film growth. Thicker films of plasma polystyrene are shown to have normal surface energy properties as does plasma poly-epichlorohydrin over the entire range of film thickness measured. The adhesive and cohesive properties of plasma polystyrene and polyepichlorohydrin films are discussed as estimated from a lap-shear bond strength study. Etched aluminum coated with various thicknesses of these two polymers and bonded with an epoxy-phenolic adhesive shows a decreasing shear strength with increasing plasma film thickness but begins to level off at ～1600 psi for films >1600 Å thick.