Dislocations in CdTe

Two different etchants were developed to get boat- and triangular type etch pits on CdTe crystals. The subboundaries are shown to be symmetrical tilt boundaries. Dislocation density and microhardness measurements were made on three CdTe crystals grown by Bridgman, Travelling heater and vapour phase technique and were correlated.     

Dislocations in synthetic quartz

The present paper is a review of the data about the dislocations in the as-grown quartz crystal. The work presents some general considerations about dislocations, their origins and causes, methods of their observation and techniques to reduce the dislocations density. It is also shown a method to obtain a new shape crystal used in the positive X-seeds preparation.     

Dislocations in magnetic garnet crystals

1. Dislocations in magnetic flux-grown garnet crystals (Y₃Fe₅O₁₂ and others) have been observed. As a rule, {110} growth pyramids have more defects than {211} ones. 2. The highest content of defects (dislocation density 10³–10⁴ cm⁻²) is observed in Y₃Fe₅O₁₂ that grows on crucible walls adjacent to the free surface of the solution where the flow of heat is not uniform to the greatest degree. Bottom grown crystals usually have less dislocations. Far fewer dislocations are in wall grown crystals, least of all dislocations are contained in crystals that grow inside the solution. The solution pouring off at the end of the crystallization period increases dislocation density by some dozens. 3. Heat treatment decreases dislocation density. The less dislocation content and the lower ordering are in the initial crystal, the higher heat treatment effectiveness.     

Dislocations and grain boundaries in semiconducting rubrene single-crystals

Assessing the fundamental limits of the charge carrier mobilities in organic semiconductors is important for the development of organic electronics. Although devices such as organic field effect transistors (OFETs), organic thin film transistors (OTFTs) and organic light emitting diodes (OLEDs) are already used in commercial applications, a complete understanding of the ultimate limitations of performance and stability in these devices is still lacking at this time. Crucial to the determination of electronic properties in organic semiconductors is the ability to grow ultra-pure, fully ordered molecular crystals for measurements of intrinsic charge transport. Likewise, sensitive tools are needed to evaluate crystalline quality. We present a high-resolution X-ray diffraction and X-ray topography analysis of single-crystals of rubrene that are of the quality being reported to show mobilities as high as amorphous silicon. We show that dislocations and grain boundaries, which may limit charge transfer, are prominent in these crystals.     

Dislocations and dislocation reduction in space grown GaSb

The behaviour of dislocations in GaSb crystals grown in space both from a stoichiometric melt (floating zone method, FZ) and a Bi solution (floating solution zone, FSZ) respectively, is studied. Predominantly straight 60° dislocations with Burgers vectors of the type b = a/2 <110> in (111) glide planes are identified. In the 20 mm long FZ single crystal the linear growing out of the dislocations is observed which reduces the dislocation density in the centre of the crystal to values below 300 cm^–2. The Bi incorporation in the FSZ crystal results in a misfit between seed and grown crystal and in a network of misfit dislocations at the interface. Thermocapillary convection during growth as well as the surface tension may be the reasons for the presence of curved dislocations and the higher dislocation density within a 1 – 2 mm border region at the edges of both of the crystals. (© 2009 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Inclined Dislocations in Synthetic Calcite Crystals

A large number of perfect (100) cleavages were obtained by cleaving the laboratory grown synthetic calcite crystals. By etching such cleavages in 20% ammonium chloride solution, it is established that the pits indicate the sites of dislocations in the crystals. This is further confirmed by comparing the etch patterns on matched cleavage surfaces. Eccentricity of the pits has been attributed to the inclined nature of dislocations. Existence of parallel dislocations seems to be due to the purity of the crystal. These observations are verified by comparing etch patterns produced on opposite faces of a thin flake (0.048 mm thick) and also by successive etching and polishing a cleavage surface. It is conjectured that curl-bottomed pits nucleate at the sites of screw dislocations in the crystal. The implications are discussed.     

Dislocations (Solitons) in anharmonic crystals

Static dislocations (solitons) in an anharmonic lattice are studied within the framework of the Frenkel-Kontorova model. The dislocation-induced fields corresponding to the displacement vector and the stress tensor are calculated, and their properties are analyzed. The process of soliton nucleation is discussed in terms of the kinetics of the excited phonon subsystem of a loaded crystal. The expressions describing the nucleation time and the force and the energy conditions of a dislocation (soliton) nucleation are derived.     

CdZnTe晶体位错处的Raman光谱及PL谱研究

利用显微Raman光谱技术,对比研究了CdZnTe晶体无位错区和位锘密集区的Raman光谱.研究发现,CdZnTe晶体无位错区的Raman光谱出现了与Te有关的A1模(119 cm-1)、类CdTe的TO1模(138 cm-1)和类ZnTe 的TO2模(179 cm-1);CdZnTe晶体位错密集区的Raman光谱中仅出现了与Te有关的A1模和类CdTe的TO1模,CdZnTe晶体类ZnTe的TO2模消失.对CdZnTe试样位错密集区进行变温光致发光谱测试,结果表明,束缚在中性施主上的激子的离解为电子空穴对,电子空穴的非辐射复合过程吸收了类ZnTe的TO2模声子能量,造成Raman 光谱中类ZnTe的TO2模缺失.     

Precipitation-induced Dislocations in Crystals of NaCl:Ni

Using the decoration technique, the dislocation structure has been observed in regions localized near precipitates in nickel-doped NaCl crystals. The results are interpreted in terms of the stress-operated mechanism for the generation of prismatic dislocations by the precipitates. Normally only two of twelve possible slip directions operate for 〈110〉 rods. This is accounted for in terms of the climb and disappearance of dislocation loops corresponding to the other directions. {100} plates produce loops spreading along for 〈110〉 directions.     

4H碳化硅单晶中的位错

4H碳化硅(4H-SiC)单晶具有禁带宽度大、载流子迁移率高、热导率高和稳定性良好等优异特性,在高功率电力电子、射频/微波电子和量子信息等领域具有广阔的应用前景。经过多年的发展,6英寸(1英寸=2.54 cm)4H-SiC单晶衬底和同质外延薄膜已得到了产业化应用。然而,4H-SiC单晶中的总位错密度仍高达10³~10⁴ cm^-2,阻碍了4H-SiC单晶潜力的充分发挥。本文介绍了4H-SiC单晶中位错的主要类型,重点讲述4H-SiC单晶生长、衬底晶圆加工以及同质外延过程中位错的产生、转变和湮灭机理,并概述4H-SiC单晶中位错的表征方法,最后讲述了位错对4H-SiC单晶衬底和外延薄膜的性质,以及4H-SiC基功率器件性质的影响。     

碳化硅单晶位错研究进展

SiC作为代表性的第三代半导体材料,具有优异的物理化学性能。随着材料及应用的发展,SiC衬底在航天电源、电动汽车、智能电网、轨道交通、工业电机等领域的应用日益重要。相比第一代半导体材料如Si和第二代半导体材料如GaAs而言,SiC衬底质量还有很大的改善空间,是现阶段研发和产业的热点。其中SiC单晶缺陷,特别是一维位错缺陷的检测和降低,是近10年内重要的研究内容。本文重点对SiC中位错的形成原因、位错检测技术、位错密度降低方法及近年来SiC单晶中位错的优化水平进行总结归纳,并提出了SiC需要继续突破和发展的方向。     

Influence of Dislocations in KDP Crystals on Laser Damage Threshold

The dislocation density in KDP crystals has been determined by X-ray diffraction topography (LANG method). A method for determining the laser damage thresholds in dependence on dislocation density is described. It is found that dislocations with a density about 10³ cm⁻² reduce the laser damage threshold up to a factor of two compared with perfect regions. It is shown that experimentally measured damage results can be explained theoretically.     

Dislocations in silicon observed by high-voltage,high-resolution electron microscopy

Dislocations in deformed silicon crystals have been studied by high-resolution electron microscopy with the axial illumination along the [110] direction using a 1 MV electron microscope. Extended 60 dislocations, Z-shape faulted dipoles and stacking fault tetrahedra were observed in atomic level. The results demonstrated the potentiality of highvoltage, high-resolution electron microscopy for the study of atomic configurations of structural defects.     

低位错ZnSe单晶的生长

采用化学气相输运法(CVT)在适合的温度和I2含量的条件下,生长出了25mm×3mm的ZnSe单晶,位错密度为6.5×103个/cm2.对ZnSe单晶进行光学性能分析,在10.6μm处的透过率超过70;,在10.6μm处的吸收系数为7.72×10-4/cm.     

Nucleation,Glide Velocity and Blocking of Misfit Dislocations in SiGe/Si

Relaxation of strained layer systems is still not well understood. It is time dependent and changes considerably for samples with different growth history. This has to be discussed in terms of nucleation, glide velocity and blocking of misfit dislocations. We have investigated these phenomena at samples with SiGe layer thicknesses ranging from 60 nm up to 120 nm grown by molecular beam epitaxy (MBE) or chemical vapor deposition (CVD) by means of X-ray topography. The samples were annealed at temperatures between 500° and 600° C. Nucleation of misfit dislocations is heterogeneous and the rate is obviously dependent on layer strain and thickness. A quantified nucleation rate was not yet accessible, mainly due to the preferential formation of dislocation bundles. The propagation velocities of misfit dislocation segments were measured during annealing by means of synchrotron radiation plane wave topography (reflection geometry). The values agree well with theory and there is no evidence that they depend on growth regime. It is shown that the interaction of propagating misfit dislocations with crossing ones may lead to blocking or cross slip in different glide systems. These results are corroborated by investigations with atomic force and transmission electron microscopy.     

Burgers Vectors of Dislocations in Creep-deformed Fe3Si Single Crystals

In creep-deformed Fe₃Si single crystals the Burgers vectors of the dislocations were examined by transmission electron microscopy. The Burgers vector in a sample deformed under conditions of 60 MPa and 575–600 °C was of the type 1/2 〈110〉, whereas 〈111〉 superlattice dislocations were not found. 1/2 〈110〉 is the shortest translation distance in the D0₃ superlattice structure of Fe₃Si.     

Anomalously Large Burgers Vectors of Screw Dislocations in Gallium Nitride Nanowires

Crystallography Reports - The results of structural studies of GaN nanowires containing screw dislocations are presented. It is found that the length of the Burgers vector of dislocations may reach...     

Evaporation Model of NaCl Cleavage Faces around Edge Dislocations in Vacuum

It is shown in the present paper that the evaporation of edge dislocations in the form of circular steps takes place in NaCl crystals by the evaporation of these steps in a high vacuum and in a temperature region of 350–500°C. The distances of steps are regular. This regularity is explained by means of a suggested model. This model explains also the change in the evaporation rate depending upon the density of dislocations. This explanation is based on the existence of an effective charge at the emergence point of the edge dislocations a/2 〈110〉. {110} with the surface planes {100}. This charge interacts with another one formed on the faults of steps. As a result of this interaction a modulation is observed of the formation of a new step in the emergence point. This means that the same is observed in the case of step distances too.