Design and optimisation of AlxGa1−xAs/AlyGa1−yAs multilayer structures for visible wavelength applications

Quantum wells with excitonic features in the visible wavelength range were designed using the Al_xGa_1−xAs/Al_yGa_1−yAs material system, and grown using low pressure metal organic vapour phase epitaxy. Characterisation of these quantum well samples was carried out by using photovoltaic spectroscopy, photoluminescence, differential reflectance or photoreflectance techniques. These measurements showed that excitonic absorption in the 520–630 nm range could be achieved using these AlGaAs quantum wells.     

Compositional control of CdxZn1−xSe grown by photoassisted organometallic vapor phase epitaxy

The photoassisted OMVPE growth technique is important for the fabrication of blue/green laser diodes based on Cd_xZn_1−xSe quantum wells. Low temperature growth with photoassistance is key to the fabrication of these devices, however, the compositional control of Cd_xZn_1−xSe becomes increasingly difficult as the growth temperature is reduced. We have studied the compositional control of Cd_xZn_1−xSe using the sources DMCd, DMZn, and DMSe, with irradiation from a Hg arc lamp. We studied the dependence of the composition on the growth temperature, irradiation intensity, and source mass flows. The composition x increases with increasing temperature and decreases with increasing irradiation intensity. The solid-phase composition is a non-linear function of the gas-phase composition X. The slope of this characteristic, dx/dX, should be minimized for good compositional control. At 475°C without photoassistance, dx/dX is 1.75 near a composition of 20%, as determined from the data of Parbrook et al. Decreasing the temperature increases dx/dX. At 370°C with 12 mW/cm², dx/dX ≈ 13 and at 350°C with 58 mW/cm² dx/dX ≈ 60. We have investigated this behavior at 370°C with 12 mW/cm² irradiation by studying both the composition and the growth rate as a function of the gas-phase composition. The growth rate is non-monotonic, and is minimum for a gas-phase composition of 0.20. The behavior is quite complex, and is not fully understood at the present time. Nonetheless, our results indicate that the Cd-bearing precursor is adsorbed much more strongly than the Zn-bearing precursor. In addition to this, the introduction of the DMCd strongly inhibits the growth of ZnSe. We have achieved sufficiently good compositional control at 370°C and 12 mW/cm² to grow ZnSe/Cd_xZn_1−xSe/ZnSe multiple quantum well structures. More work is necessary in order to clarify the roles of irradiation intensity and VI/II ratio so that good compositional control can be achieved at lower growth temperatures.     

Molecular beam epitaxy of GaSb/AlxGa1 − xSb quantum well structures

Molecular beam epitaxy (MBE) is used to grow GaSb/Al_xGa_{1 − x}Sb quantum well (QW) structures on GaSb(001) substrates using both Sb₂ and Sb₄ molecules. While the optoelectronic properties of thick GaSb epitaxial layers are significantly affected by the type of molecule used, no influence is noted on the QW photoluminescence properties. It is shown that MBE allows a very precise and reproducible control of the QW structure parameters such as QW widths for which monolayer precision is obtained. Through the variation of the QW associated PL energy as a function of the growth temperature, the occurrence of a surface segregation-like phenomenon is evidenced. However, this effect is rather weak so that a good estimation of the valence band offset through the PL energy variation with the QW width can be made. Moreover, the QW width for which the Γ-L crossover occurs is very precisely determined.     

The effect of inserting strain-compensated GaNAs layers on the luminescence properties of GaInNAs/GaAs quantum well

Photoluminescence (PL) properties of GaInNAs/GaAs quantum wells (QWs) with strain-compensated GaNAs layers grown by molecular beam epitaxy are investigated. The temperature-dependent PL spectra of GaInNAs/GaAs QW with and without GaNAs layers are compared and carefully studied. It is shown that the introduction of GaNAs layers between well and barrier can effectively extend the emission wavelength, mainly due to the reduction of the barrier potential. The PL peak position up to 1.41 μm is observed at the room temperature. After adding the GaNAs layers into QW structures, there is no essential deterioration of luminescence efficiency. N-induced localization states are also not remarkably influenced. It implies that with optimized growth condition, high-quality GaInNAs/GaAs QWs with strain-compensated GaNAs layers can be achieved.     

InxGa1−xAs/GaAs quantum wire structures grown on GaAs (100) patterned substrates with [001] ridges

In_xGa_1−xAs/GaAs (x = 0.12-0.23) quantum well (QW) structures were grown by molecular beam epitaxy (MBE) on [001] ridges with various widths (1.1-12 μm) of patterned GaAs (100) substrate. The smallest lateral width of the InGaAs/GaAs quantum wire (QWR) structures was estimated to be about 0.1 μm by high-resolution scanning electron microscope (SEM). The In contents of the grown InGaAs/GaAs QWs on the ridges were studied as a function of ridge top width (ridge width of the MBE grown layer) by cathodoluminescence (CL) measurements at 78 K. Compared to the InGaAs QW grown on a flat substrate, the In content of the InGaAs/GaAs QW on the ridge increases from 0.22 to 0.23 when the ridge top width decreases to about 2.9 μm, but it decreases steeply from 0.23 down to 0.12 with a further decrease of the ridge width from 2.9 to 0.05 μm. A simulation of MBE growth of InGaAs on the [001] ridges shows that this reduced In content for narrow ridges is due to a large migration of Ga atoms to the (100) ridge top region from {110} side facets.     

Growth of strain-compensated GaInNAs/GaAsP quantum wells for 1.3 μm lasers

Strain-compensated GaInNAs/GaAsP quantum well structures and lasers were grown by gas source molecular beam epitaxy using a RF-plasma nitrogen radical beam source. The optimal growth condition for the quantum well structure was determined based on room-temperature photoluminescence measurements. Effects of rapid thermal annealing (RTA) on the optical properties of GaInNAs/GaAsP quantum well structures as well as laser diodes are examined. It was found to significantly increase the photoluminescence from the quantum wells and reduce the threshold current density of the lasers, due to a removal of N induced nonradiative centers from GaInNAs wells.     

Photoluminescence characterization of GaxIn1−xAs (0 ≤ x ≤ 0.32) strained quantum wells grown on InP by chemical beam epitaxy

We have investigated some characteristics of Ga_xIn_1−xAs/InP (x = 0, 0.2, 0.32) strained materials by growing multi-quantum wells with various well widths from 3 to 60 Å by chemical beam epitaxy. Growth conditions such as valve sequences and growth interruptions were optimised to have single-peaked photoluminescence spectra for all strained samples. Measured room temperature emission wavelengths were compared with theoretically estimated values. Photoluminescence linewidths were around 16 meV for most samples at 77 K, but broadened for well widths of less than 20 Å. Photoluminescence intensity also peaked at well width of 20 Å for all compositions. Performances of optical devices may be closely related to this “critical thickness” determined probably by the growth system limitation.     

Molecular beam epitaxy of GaN/AlxGa1−xN superlattices for 1.52 – 4.2 μm intersubband transitions

High-quality superlattice structures of GaN/AlGaN were grown on (0 0 0 1) sapphire substrates by molecular beam epitaxy. The threading dislocation density was reduced by growing low-temperature AlN layers in between the high-temperature GaN. In addition, in situ monitoring of the growth rate was achieved using pyrometric interferometry. Cross-sectional transmission electron microscopy of the superlattice structures revealed abrupt interfaces between GaN/AlGaN and excellent layer uniformity. We observed intersubband absorption at wavelengths as short as 1.52 μm in the GaN/AlGaN material system. A range of intersubband absorption peaks was observed between 1.52 and 4.2 μm by varying the well thickness and barrier Al content. In addition, the distribution of the built-in electric field between the well and barrier layers was also found to affect the intersubband transition wavelength.     

Molecular beam epitaxy of strained Si1−xGex layers on patterned substrates

Epitaxial Si_1-xGe_x layers have been grown on patterned Si(001) substrates. Mesa-like structures of 1.4 μm height on the surface limited by inclined {111} planes were used. Structure dimensions between 10 and 0.2 μm were chosen to allow the mesas to relieve elastically under the strained layer. The film growth, the crystallographic perfection and the relaxation of strained Si_1-xGe_x layers were investigated by transmission electron microscopy (TEM) including in situ annealing. The relaxation mechanism and the control of dislocation generation on top of the mesas are discussed.     

X-ray scattering studies of the short and medium range ordering in AsxTe1−x glasses

The structures of As_xTe_1−x(x = 0.2, 0.4, and 0.5) glasses are studied using the differential X-ray anomalous scattering technique. The partial distribution functions have also been obtained for the stoichiometric As₂Te₃ glass, giving information on the medium range ordering. All the glasses show chemical disorder to differing extents, the As₂Te₃ glass being the most disordered. The Te coordination number undergoes a change at x=0.4 where it is 2.5 compared with 2 for AsTe. This change indicates the existence of about 50% of threefold Te sites in the stoichiometric glass, as well as in the Te-rich glasses. Some of the physical properties of the glasses may be explained based on these results.     

Non-linear As(P) incorporation in GaAs1−yPy on GaAs and InAs1−yPy on InP

We find anion incorporation into both GaAs_1−yP_y on GaAs and InAs_1−yP_y on InP during gas source molecular beam epitaxy (GSMBE) is not linearly related to the hydride gas fluxes within our reactor. The deviation from an ideal model, i.e., y = ƒ_P/(ƒ_P+ƒ_As), where As(P) is the flux of AsH₃ (PH₃), can be as large as a factor of two. GaAsP exhibits the largest degree of nonlinearity and incorporation is found to depend quadratically on the fluxes over a wide range of flux ratio. Significant deviations are also found for InAsP; however, anion incorporation can be modeled with y = ƒ_P/(ƒ_P+βƒ_As).     

Directional solidification of InxGa1−xAs

We have investigated a constitutional supercooling and segregation phenomena in In_xGa_1−xAs crystals unidirectionally solidified in a vertical system. The constitutional supercooling generates characteristic fluctuations of composition along the growth direction and this can be explained by a free nucleation ahead from the growth interface. The macroscopic compositional profiles of the grown crystals suggest that a transport of solute is mainly dominated by the diffusion. Such a growth mode is partly attributed to the difference in density between InAs and GaAs.     

Growth of GaInAs(P) and GaInAsP/GaInAs MQW structures by CBE

We discuss the growth of lattice matched GaInAs, GaInAsP and GaInAsP/GaInAs multiple quantum well structures for high speed laser applications. Optical cavities, including five 90 Å GaInAs quantum wells with GaInAsP barriers and waveguides showed a 4 K photoluminescence line width of 8.7 meV. Transmission electron microscopy and X-ray diffraction confirm the good control over the growth of these structures.     

XPS and electroluminescence studies on SrS1−xSex and ZnS1−xSex thin films deposited by atomic layer deposition technique

SrS_1−xSe_x and ZnS_1−xSe_x thin films were deposited by the atomic layer deposition (ALD) technique using elemental selenium as the Se source, thus avoiding use of H₂Se or organometallic selenium compounds. X-ray diffraction (XRD) analysis showed that the films were solid solutions and X-ray photoelectron spectroscopy (XPS) data showed that the surface of both ZnS_1−xSe_x and SrS_1−xSe_x were covered with an oxide and carbon-containing contaminants from exposure to air. The oxidation of SrS_1−xSe_x extended into the film and peak shifts from sulfate were found on the surface. Luminance measurements showed that emission intensity of the ZnS_1−xSe_x:Mn alternating current thin film electroluminescent (ACTFEL) devices at fixed voltage was almost the same as that of the ZnS:Mn device, while emission intensity of the SrS_1−xSe_x:Ce devices decreased markedly as compared to the SrS:Ce device. Emission colors of the devices were altered only slightly due to selenium addition.     

Growth of heavily C-doped GaAs/AlGaAs MQW structures by MOVPE for 2–3 μm normal incidence photodetectors

The growth and intersubband optical properties of high quality heavily doped p-type GaAs/AlGaAs multiple quantum well (MQW) structures are reported. The MQWs were fabricated by the atmospheric pressure metalorganic vapor phase epitaxy process using liquid CCl₄ to dope the wells with C acceptors (N_a ≈ 2 × 10¹⁹ cm⁻³). A constant growth temperature was maintained for the entire structure while different V/III ratios were used for the well and barrier regions. By this process it is possible to achieve both high C doping densities in the wells and to simultaneously obtain good quality AlGaAs barriers. Fourier transform infrared spectroscopy measurements on heavily doped 10-period MQW structures reveal a new absorption peak at 2 μm with an effective normal incidence absorption coefficient of 4000 cm⁻¹. Photocurrent measurements on mesa-shaped diodes show a corresponding peak at 2.1 μm. The photodiodes exhibit a symmetrical current-voltage characteristic and a low dark current, which are indicative of a high quality MQW structure and a well-controlled C doping profile. The 2 μm absorption represents the shortest wavelength ever reported for any GaAs/AlGaAs or InGaAs/AlGaAs MQW structure and should be very useful for implementing multicolor infrared photodetectors.     

Thermodynamic analysis of the MOVPE growth of InxGa1−xN

A chemical equilibrium model is applied to the growth of the In_xGa_1−xN alloy grown by metalorganic vapor-phase epitaxy (MOVPE). The equilibrium partial pressures and the phase diagram of deposition are calculated for the In_xGa_1−xN alloy. The vapor-solid distribution relationship is discussed in comparison with the experimental data reported in the literature. It is shown that the solid composition of the In_xGa_1−xN alloy grown by MOVPE is thermodynamically controlled and that the incorporation of group III elements into the solid phase deviates from a linear function of the input mole ratio of the group III metalorganic sources under the conditions of high mole fraction of decomposed NH₃ (high value of ), high temperature and low input V/III ratio. The origin of the deviation of the solid composition from the linear relation is also discussed.     

Electronic traps in mixed Si1−xGexO2 films

Thermally stimulated luminescence (TSL) and infrared (IR) spectroscopy were measured in plasma grown Si_1−xGe_xO₂ (x=0, 0.08, 0.15, 0.25, 0.5) with different thicknesses (12–40 nm). A comparison with the TSL properties of thermally grown SiO₂ and GeO₂ was also performed. A main IR absorption structure was detected, due to the superposition of the peaks related to the asymmetric O stretching modes of (i) Si–O–Si (at ≈1060 cm⁻¹) and (ii) Si–O–Ge (at 1001 cm⁻¹). Another peak at ≈860 cm⁻¹ was observed only for Ge concentrations, x>0.15, corresponding to the asymmetric O stretching mode in Ge–O–Ge bonds. A TSL peak was observed at 70°C, and a smaller structure at around 200°C. The 70°C peak was more intense in all Ge rich layers than in plasma grown SiO₂. Based on the thickness dependence of the signal intensity we propose that at Ge concentrations 0.25x0.5 TSL active defects are localised at interfacial regions (oxide/semiconductor, Ge poor/Ge rich internal interface, oxide external surface/atmosphere). Based on similarities between TSL glow curves in plasma grown Si_1−xGe_xO₂, thermally grown GeO₂ and SiO₂ we propose that oxygen vacancy related defects are trapping states in Si_1−xGe_xO₂ and GeO₂.     

Elastic properties of GexAsySe100−x−y glasses

The elastic properties of Ge_xAs_ySe_100−x−y (0x30; 10y40) glasses have been studied. The results were analyzed in terms of the dependence on the theoretical mean coordination number (mean number of covalent bonds per atom) m (m=2+(2x+y)×0.01). Three ranges of m (2.1m2.51, 2.51<m2.78, 2.78<m3) were revealed, where different dependencies of elastic moduli (Young’s modulus, shear modulus) and Poisson’s ratio of glasses on m were observed.     

Photocurrent measurements on GaAs1−xNx epilayers grown by metalorganic chemical vapor deposition

GaAs_1−xN_x epilayers were grown on a GaAs(0 0 1) substrate by metalorganic chemical vapor deposition. Composition was determined by high resolution X-ray diffraction. Band gap was measured from 77 to 400 K by using photocurrent measurements. The photocurrent spectra show clear near-band-edge peak and their peak energies drastically decrease with increasing nitrogen composition due to band gap bowing in the GaAs_1−xN_x epilayers. Those red shifts were particularly notable for low nitrogen compositions. However, the shifts tended to saturate when the nitrogen composition become higher than 0.98%. When the nitrogen composition is in the range 1.68–3.11%, the measured temperature dependence of the energy band gap was nicely fitted. However, the properties for the nitrogen composition range 0.31–0.98% could not be fitted with a single fitting model. This result indicates that the bowing parameter reaches 25.39 eV for low nitrogen incorporation (x=0.31%), and decreases with increasing nitrogen composition.     

Liquid phase epitaxial growth and characterization of thin In1−xGaxAsyP1–y layers lattice-matched to InP

Growth studies enabled the deposition of In_0.71Ga_0.29As_0.68P_0.32 single quantum well structures with InP or In_0.88Ga_0.12As_0.26P_0.74 confinement layers lattice-matched to (001) InP by liquid phase epitaxy (LPE). Well widths in the order of 50–100 Å have been achieved using a conventional step cooling technique. The physical characterization has demonstrated the capability of the employed method to produce multilayered heterostructures which display confined particle states; quantum mechanically induced blue-shifts of the low temperature PL-emission up to 125 meV were measured. A remarkable reduction of the FWHM values of the shifted PL peaks was attained by optimization of the growth conditions.