Basic ammonothermal growth of Gallium Nitride – State of the art,challenges, perspectives

Recent progress in ammonothermal technology of bulk GaN growth in basic environment is presented and discussed in this paper. This method enables growth of two-inch in diameter crystals of outstanding structural properties, with radius of curvature above tens of meters and low threading dislocation density of the order of 5?×?10⁴ cm^?2. Crystals with different types of conductivity, n-type with free electron concentration up to 10¹⁹ cm^?3, p-type with free hole concentration of 10¹⁶ cm^?3, and semi-insulating with resistivity exceeding 10¹¹ Ω cm, can be obtained. Ammonothermal GaN of various electrical properties is described in terms of point defects present in the material. Potential applications of high-quality GaN substrates are also briefly shown.     

Measurements of localized-state density in chemically vapour deposited amorphous silicon by the field-effect method

New techniques to determined the localized-state density in chemically vapour deposited amorphous silicon over a wide energy range by the field-effect method are presented. The density is measured for the first time as 10¹⁸ ～ 10²⁰ cm^?3 eV^?1 in the range ±0.4～±0.5 eV around the Fermi level. From the results it is suggested that the silicon atom network of CVD a-Si has a similar randomness to that of glow discharge a-Si, providing a density of tail states of about 10¹⁹ ～ 10²⁰ cm^?3 eV^?1 and native defect states of about 10¹⁸ cm^?3 eV^?1.     

The field effect in amorphous chalcogenides: An investigation of localized states and electronic transport

The temperature dependence of the field effect response permits an unambiguous determination of the identity of those states responsible for electrostatic screening in the amorphous chalcogenides. We observe (1) in As₂Te₃, field effect screening by localized states at the Fermi level at low temperatures (～ 10¹⁹ cm^?3 eV^?1) and by mobile charge carriers (～ 10¹⁸ cm^?3 at 300 K) at high temperatures, and a transition from p-type to two-carrier (primarily n-type) conductivity as the temperature is raised above ～320 K; (2) in As₂SeTe₂, screening by mobile charge carriers (～ 10¹⁸ cm^?3 at 300 K) with strongly type conductivity; (3) in As₂Se₂Te, screening by localized states at the Fermi level (～ 10¹⁹ cm^?3 eV^?1) with strongly p-type conductivity; and (4) in Sb₂Te₃, a very high density of localized states at the Fermi level (～ 2 × 10²⁰ cm^?3 eV^?1) with both electron and hole contributions to the conductivity. Correlation with thermoelectric power results suggests that the p-type conductivity in As₂Te₃ is due to near-equal contributions from two processes: hopping in localized states plus extended state conduction. Aging and annealing behavior is described with the aid of a “chaotic potential model” that appears to be able to account for large changes in mobile carrier density that leave the conductivity unaltered.     

Characterization of deep levels in a-plane GaN epi-layers grown using various growth techniques

To study the correlation between defects and deep levels in a-plane GaN films grown on r-plane sapphire substrates, transmission electron microscopy (TEM) and deep level transient spectroscopy (DLTS) have been performed on three types of a-plane GaN samples grown using modified two-step growth (sample I), SiN_x interlayer (sample II), and patterned insulator on sapphire substrate (sample III). From the microstructure evolution in cross-sectional TEM images, it was shown that combination of growth techniques is highly efficient in the reduction of dislocation densities. Average dislocation densities of samples I, II, and III were about 2.2×10⁹ cm^?2, 1.1×10⁹ cm^?2, and 3.4×10⁸ cm^?2, respectively. The trap a_t E_c–E_t～0.13 eV (E1) was observed in only sample I, and three electron traps at 0.28–0.33 eV (E2), 0.52–0.58 eV (E3), and 0.89–0.95 eV (E4) from the conduction band edge were measured common to all the samples. The analysis of trap properties indicated that E2 and E3 trap levels are strongly associated with the partial dislocations in a-plane GaN films.     

Crystal growth and spectral properties of Nd:Ca5(BO3)3F

A neodymium doped Ca₅(BO₃)₃F single crystal with size up to 51×48×8 mm³ has been grown by the top seeded solution growth (TSSG) technique with a Li₂O‐B₂O₃‐LiF flux. The spectra of absorption and fluorescence were measured at room temperature. According to Judd‐Ofelt (J‐O) theory, the spectroscopic parameters were calculated and the J‐O parameters Ω₂, Ω₄, Ω₆ were obtained as follows: Ω₂ = 1.41×10⁻²⁰cm², Ω₄ = 3.18×10⁻²⁰cm², Ω₆ = 2.11×10⁻²⁰cm². The room temperature fluorescence lifetime of NCBF was measured to be 51.8 μs. According to the J‐O paramenters, the emission probabilities of transitions, branching ratios, the radiative lifetime and the quantum efficiency from the Nd^{3+ 4}F_3/2 metastable state to lower lying J manifolds were also obtained. In comparasion with other Nd‐doped borate crystals, the calculated and experimental parameters show that NCBF is a promising SFD crystal.     

Crystal growth and spectral analysis of Dy3+ and Er3+ doped KPb2Cl5 as a mid‐infrared laser crystal

This paper reports crystal growth and optical characteristics of dysprosium (Dy³⁺) and erbium (Er³⁺) doped mid‐infrared laser crystal ternary‐potassium‐lead‐chloride (KPb₂Cl₅). Two transparent crystals with good optical quality have been grown successfully by using the Bridgman technique,the largest crystal size reaches up to ∅︁10×60mm². Measurements of X‐ray diffraction(XRD) and absorption spectra were carried out. Based on Judd‐Ofelt theory, the intensity parameters Ω_t(t=2,4,6), the experimental and theoretical oscillator strengths have been obtained.The intensity parameters Ω_t(t=2,4,6) of Er³⁺:KPb₂Cl₅ were calculated to be Ω₂=5.10×10^‐20 cm², Ω₄=1.25×10^‐20 cm², Ω₆=0.83×10^‐20 cm², and the values for Dy³⁺:KPb₂Cl₅ were calculated to be Ω₂=6.26×10^‐20 cm², Ω₄=2.45×10^‐20 cm², Ω₆=0.04×10^‐20 cm² respectively. (© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Silver sulfide based glasses (I). Glass forming regions,structure and ionic conduction of glasses in GeS2Ag2S and GeS2Ag2SAgI systems

Ag₂S forms with GeS₂ stable glasses over a wide range of compositions (0–55% Ag₂S mol%). In the same system, more complex glasses obtained by dissolving silver iodide have been synthesized with up to 50 mol% AgI.Raman spectra are presented and a vibrational assignment in terms of bridging and non-bridging sulfur has been made. The electrical conductivity of these glasses has been measured over a temperature range (?50°C? + 50°C) and for various compositions by the complex impedance diagram method. At 25°C, the conductivity reached a maximum value of 6 × 10^?3 Ω^?1 cm^?1. Whatever the glass used, the same limit value of conductivity $\text{(σ ? 10 su?2 Ω}{}^{\mathrm{?1}}\text{cm}{}^{\mathrm{?1}}$) and activation energy ($\text{E}{}_{\mathrm{\sigma }}\text{? 0.25}\text{eV}$) are obtained for the highest content of silver iodide. A conduction mechanism is proposed.     

The validity of the double layer model on the amorphous semiconductor surface including the bulk localized state within the gap

Under the two assumptions that the origin of surface states may be different from that of bulk localized states within the gap and the density of surface states is sufficiently high, the validity of the double layer model on the amorphous semiconductor surface is investigated in comparison with the case of a crystal. It is suggested that the criteria concerning the double layer should be determined by the relative value of the surface states to that of bulk localized states. The existence of the double layer can be confirmed when the bulk localized state density n(E_f) is smaller than 10¹⁹ cm^?3 eV^?1. When n(E_f) is high at about 10²⁰ cm^?3 eV^?1, surface states cannot be distinguished from the localized states within the gap. This double layer model is strongly supported by the results of previous experiments by others who have measured the dependence of the Schottky barrier height on the work function of metal and the dependence of the surface potential on the preparation conditions of a-SiH.     

X-ray diffraction study and quantitative measurements of high dislocation densities in superlattices and single crystal layers of heteroepitaxial systems with pronounced lattice mismatch

Plastic deformation in a single-crystal layer of the In_0.12Ga_0.88As/(111)InP solid solution is identified by the methods of X-ray diffractometry (XRD) and the double-crystal pseudorocking curves (DCPRC). X-ray topographs showed the generation of three intersecting systems of straight dislocations in the layer. In a one-layer ZnSe/GaAs structure and multilayer ZnSe/ZnSe_{1 − x} S_x/ZnSe/GaAs structures, the elastic and plastic strains were detected by the combined XRD-DCPRC method. The major components of the thermoelastic and plastic-deformation tensors were determined as ε_xx = ε_yy = 3.5 × 10⁻³ and ε_zz = 2.35 × 10⁻³. Using these data, the dislocation densities were determined as N _d ∼ 2.5 × 10⁸ cm⁻² and N _d ∼ 3 × 10¹⁰ cm⁻² for the 7 μm-thick ZnSe and 1 μm-thick InAs layers, respectively. In a superlattice of the Al_xGa_{1 − x} As/GaAs/⋯/GaAs-type with a large lattice parameter, the plastic deformation was detected. X-ray topography confirmed that the dislocation density in this superlattice equals ∼10⁵ cm⁻². __________ Translated from Kristallografiya, Vol. 45, No. 2, 2000, pp. 326–331. Original Russian Text Copyright ? 2000 by Kuznetsov.     

Study of microdefects in GaAs:Si single crystals grown by the vertical gradient freeze method

Microdefects in Si-doped GaAs single crystals grown by the vertical gradient freeze method have been studied with X-ray diffuse scattering. In the case of doping to majority carrier concentrations n ～ 1 × 10¹⁸ cm^?3, large microdefects with positive dilatation that accompany the initial stage of arsenic precipitation at high temperatures were observed. It is shown that GaAs samples heavily doped with silicon (n ～ 3 × 10¹⁸ cm^?3) contain large (several micrometers) interstitial microdefects, which can play the role of nucleation regions for new SiAs and SiAs₂ phases.     

Growth and spectroscopic investigation of Yb/Nd co‐doped KLu(WO4)2 laser crystals

Single crystals of Yb, Nd: KLu(WO₄)₂ (Yb, Nd: KLW) of dimensions up to 40mm× 40mm×5mm have been grown by top‐seeded solution growth (TSSG) method. X‐ray powder diffraction pattern was measured and compared with that of Nd: KLuW and Yb: KLuW. Absorption and fluorescence spectra were measured at room temperature. The Judd‐Ofelt theory was applied to analyze the spectrum of Nd, Yb: KLuW crystal. The intensity parameters Ω_t (t=2, 4 and 6) were calculated as Ω₂=20.68×10^‐20cm², Ω₄=11.04×10^‐20cm², Ω₆=6.74×10^‐20cm² respectively, with a root mean square deviation of 0.58×10^‐20 cm². (© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Spectroscopic properties of Tm3+ doped TeO2-R2O-La2O3 glasses for 1.47 μm optical amplifiers

Upon excitation at 808 nm laser diode, an intense 1.47 μm infrared fluorescence has been observed with a broad full width at half maximum (FWHM) of about 124 nm for the Tm³⁺-doped TeO₂-K₂O-La₂O₃ glass. The Judd–Ofelt parameters found for this glass are: Ω₂ = 5.26 × 10^?20 cm², Ω₄ = 1.57 × 10^?20 cm² and Ω₆ = 1.44 × 10^?20 cm². The calculated emission cross-sections of the 1.47 μm transition are 3.57 × 10^?21 cm², respectively. It is noted that the gain bandwidth, σ_e × FWHM, of the glass is about 440 × 10^?28 cm³, which is significantly higher than that in ZBLAN and Gallate glasses, a high gain of 35.5 dB at 1470 nm can be obtained in a TKL glass fiber. TeO₂-R₂O (R = Li, Na, K)-La₂O₃ glasses has been considered to be more useful as a host for broadband optical fiber amplifier.     

Some new results on transport and density of state distribution in glow discharge microcrystalline silicon

The electronic properties of the material are discussed on the basis of the grain boundary trapping model proposed for polycrystalline Si. In spite of the difference in crystallite sizes it is shown that the model is applicable, leading to 10¹¹ cm^?2 filled states between crystallites. Gap state densities between 2 × 10¹⁸ and 4 × 10¹⁸cm^?3eV^?1 are deduced from field effect measurements.     

Synthesis of the Copolymer Based on Diketopyrrolopyrrole with Didecyl Chain for OPVs

A new accepter unit, diphenylpyrrolo[3,2-b]pyrrole-2,5-dione with didecyl chain, was prepared and utilized for the synthesis of the conjugated polymer containing electron donor-acceptor pair for OPVs. The iDPP, part of the structure of a natural dye found in lichens, is the regioisomer of the known DPP with switched position of the carbonyl group and nitrogen atom. At the 4-positions of the N-substituted phenyl groups of 1,4-bis(4-butylphenyl)-pyrrolo[3,2-b]-pyrrole-2,5-dione unit in P-butyl, the butyl group was substituted with decyl group to increase solubility. The absorption spectrum of polymer with diphenylpyrrolo[3,2-b]pyrrole-2,5-dione unit exhibit two maximum peaks at about 365 and 542 nm. The spectrum of the P1 as the solid thin film shows absorption band with maximum peaks at 370 and 536 nm, and the absorption onset at 703 nm, corresponding to band gap of 1.76 eV. The oxidation and reduction potential onset of the synthesized polymer were estimated to be 0.84 and ?1.22 V, which correspond to HOMO and LUMO energy levels of ?5.64 and ?3.58 eV, respectively. The devices comprising P1 with PC₆₁BM annealed at 100°C showed a V_OC of 0.79 V, a J_SC of 1.75 mA/cm², and a FF of 0.31, leading to the power conversion efficiency of 0.43% under white light illumination (AM 1.5 G, 100 mW/cm²).     

Defects and stresses in MBE-grown GaN and Al0.3Ga0.7N layers doped by silicon using silane

The electric and structural characteristics of silicon-doped GaN and Al_0.3Ga_0.7N layers grown by molecular beam epitaxy (MBE) using silane have been analyzed by the Hall effect, Raman spectroscopy, and high-resolution X-ray diffractometry. It is established that the electron concentration linearly increases up to n = 4 × 10²⁰ cm^?3 with an increase in the silane flow rate for GaN:Si, whereas the corresponding dependence for Al_0.3Ga_0.7N:Si is sublinear and the maximum electron concentration is found to be n = 4 × 10¹⁹ cm^?3. X-ray measurements of sample macrobending indicate a decrease in biaxial compressive stress with an increase in the electron concentration in both GaN:Si and Al_0.3Ga_0.7N:Si layers. The parameters of the dislocation structure, estimated from the measured broadenings of X-ray reflections, are analyzed.     

Influence of photonic excitations on the electrical parameters of TlInS2 crystals

The photo‐excitation effect on the current transport mechanism in TlInS₂ crystals has been studied by means of dark and illuminated conductivity measurements. The temperature‐dependent electrical conductivity analysis in the temperature region of 110‐340 K revealed the domination of the thermionic emission and the thermally assisted variable range hopping (VRH) of charge carriers above and below 160 K, respectively. Above 160 K, the conductivity activation energies in the dark are found to be 0.28 and 0.15 eV in the temperature regions of 340‐240 K and 230‐160 K, respectively. In the temperature region of 110‐150 K, the dark variable range hopping analysis revealed a density of localized states of 1.99×10²² cm^–3eV^–1, an average hopping distance of 0.53 nm and an average hopping energy of 79.65 meV. When the sample was photo‐excited, the values of the conductivity activation energies, the density of localized states near the Fermi level and the average hopping energy were observed to decrease sharply with increasing illumination intensity. On the other hand, the average hopping distance increased with rising illumination intensity. Such behaviours were attributed to the Fermi level shift and/or trap density reduction by electron‐hole recombination. (© 2010 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Electrical Characterization of Irradiation plus Annealing – induced VAsZnGa Pairs in p-type GaAs (Zn) Crystals

Effect of fast electron irradiation (E =2.2 Mev, ϕ_c = 1 × 10¹⁶ el/cm²) and subsequent annealings (T = 150 to 350 °C, t = 10 to 600 min) of zinc-doped p-type GaAs crystals on the formation and dissociation of V_AsZn_Ga, pairs is studied. An analysis of the formation and dissociation kinetics of V_AsZn_Ga pairs permitted to find the diffusion coefficient of radiation-induced arsenic vacancies D(D = 1.5 × 10⁻¹⁸, 1 × 10⁻¹⁷ and 5 × 10⁻¹⁷ cm²/s at 150, 175 and 200 °C accordingly), their migration energy ϵ_m(ϵ_m = 1.1 eV), the binding energy of V_AsZn_Ga, pairs ϵ_b(ϵ_b = 0.5 eV), and also their dissociation energy ϵ_d(ϵ_d = 1.6 eV).     

Semiconducting Properties of TI2Te3 Single Crystals

Electrical conductivity and Hall effect measurements were performed on single crystals of TI₂Te₃ to have the general semiconducting behaviour of this compound. The measurements were done at the temperature range 160–350 K. All crystals were found to be of p-type conductivity. The values of the Hall coefficient and the electrical conductivity at room temperature were 1.59 × 10³ cm³/coul and 3.2 × 10⁻² ω⁻¹ cm⁻¹, respectively. The hole concentration at the same temperature was driven as 39.31 × 10¹¹ cm⁻³. The energy gap was found to be 0.7 eV where the depth of impurity centers was 0.45 eV. The temperature dependence of the mobility is discussed.     

Effect of Neutron Irradiation and Annealing on the Intensity of the Copper Related 1.01 eV Emission Band in n-type GaAs

Effect of neutron irradiation (E = 2 MeV, ϕ ≤ 10¹⁵ n/cm²) and subsequent annealing (T ≤ 700 °C, t = 30 min) on the intensity of the copper-related peaked at hvm =1.01 eV emission band in n-type GaAs (n₀ = 2 × 10¹⁸ cm⁻³) is studied. A strong irradiation-induced increase of the above emission intensity was observed testifying about the irradiation-stimulated growth in the concentration of copper-related 1.01 eV radiative centres (Cu_GaV_As pairs). A model is presented to explain this effect.     

Influence of density of states on optical properties of GaSe thin film

A systematic investigation on the effect of substrate temperature on the structure, optical absorption and density of states of vacuum evaporated gallium monoselenide (GaSe) thin films is reported. The X‐ray diffraction analysis shows an occurrence of amorphous to polycrystalline transformation in the films deposited at higher‐temperature substrates (573K). The compositional analysis is made with Auger Electron Spectroscopy (AES). The thickness of the film (175nm) is measured by a multiple beam interferometery. Optical characteristics of the GaSe sample have been analyzed using spectrophotometer in the photon energy range of 1.0 ‐ 4 eV. The absorption mechanism has been recognized and the allowed indirect as well as forbidden direct transitions have been found. As‐deposited films show two indirect and allowed transitions due to spin‐orbit splitting of the valence band, as reported here for the first time. Low field conduction have enabled us to determine the density of states in amorphous and poly‐GaSe films. The amorphous and polycrystalline GaSe thin films have localized states density values of N (E_F) = 1.686 × 10¹⁷ cm^‐3 eV^‐1 and 1.257 × 10¹⁵ cm^‐3 eV^‐1 respectively. The experimental results are interpreted in terms of variations in the density of localized states due to progressive decrease of the unsaturated bonds during deposition. (© 2004 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)