Thiol-ene/hyperbranched polymer hybrid thin films: Cure behavior and gas barrier properties

In this work, novel thiol-ene (TE)/hyperbranched polymer(HBP) hybrid thin films have been prepared by a simple photopolymerization method and the TE/HBP system was also investigated in terms of thermocuring behavior and gas barrier properties. The effect of added HBP on thermal curing (cross-linking) of TE polymer was examined with dynamic and isothermal differential scanning calorimeter (DSC) and compared with photocuring reaction of identical system. The structure of prepared TE/HBP hybrid thin film was analyzed by X-ray diffraction (XRD). Themomechanical analysis (TMA) provided extensive data on the coefficient of linear thermal expansion (CTE), dimensional change upon heating, and isothermal profile of TE/HBP hybrid thin films. Light transmittance as well as water/oxygen permeability of the resulting TE/HBP hybrid thin film was also measured depending on the HBP content.     

制备参数对钙钛氧化物薄膜的微结构和性能影响

利用钛酸丁酯-氯化钙-无水乙醇体系通过溶胶-浸渍提拉法制备了钙钛氧化物薄膜.采用X射线衍射仪(XRD)、扫描电子显微镜(SEM)及能谱分析仪(EDS),荧光光谱仪和紫外-可见分光光度计等技术对薄膜的结构,形貌及元素成分和光学性能进行了分析.结果表明:当n(钛酸丁酯)/n(乙醇)为1∶15时,制备得到了光学性质良好(价带较宽)的钙钛氧化物薄膜.随着焙烧温度升高到550℃,薄膜的结晶强度不断增加,薄膜主晶相由CaTiO3相转化为层状结构CaTi2O4(OH)2主晶相,该薄膜呈现多孔结构,从而使光学特性进一步增强.     

Oriented Thin Films of the Low-Band-Gap Polymer PTB7 by Friction Transfer Method

Low-band-gap polymers are promising materials for organic photovoltaic application. We prepared an oriented thin film of a low-band-gap polymer, PTB7, by friction transfer method. The oriented film showed a strong dichroic absorption in the whole visible range. The orientation of molecular chain was characterized by two-dimensional grazing incident X-ray diffraction (2D-GIXD) with synchrotron radiation. 2D-GIXD results showed PTB7 molecular plane parallel to the substrate plane, i.e., “face on orientation.”     

雾化辅助化学气相沉积法氧化镓薄膜生长研究

采用自主设计搭建的雾化辅助化学气相沉积系统设备,开展了Ga₂O₃薄膜制备及其特性研究工作。通过X射线衍射研究了沉积温度、系统沉积压差对Ga₂O₃薄膜结晶质量的影响。结果表明,Ga₂O₃在425~650 ℃温度区间存在物相转换关系。随着沉积温度从425 ℃升高至650 ℃,薄膜结晶分别由非晶态、纯α-Ga₂O₃结晶状态向α-Ga₂O₃、β-Ga₂O₃两相混合结晶状态改变。通过原子力显微镜表征探究了生长温度对Ga₂O₃薄膜表面形貌的影响,从475 ℃升高至650 ℃时,薄膜表面粗糙度由26.8 nm下降至24.8 nm。同时,高分辨X射线衍射仪测试表明475 ℃、5 Pa压差条件下的α-Ga₂O₃薄膜样品半峰全宽仅为190.8″,为高度结晶态的单晶α-Ga₂O₃薄膜材料。     

Photoconduction and transport mechanisms in polycrystalline zincphthalocyanine thin films

Zincphthalocyanine (ZnPc) thin films were prepared by the vacuum evaporation method under a pressure of 10^‐6 mbar. The X‐ray diffraction analysis of vacuum evaporated ZnPc films reveals that the structure of the films is polycrystalline in nature. The photoconduction properties have been studied in the wavelength range 400 –800nm using suitable masks. The Photoconductivity of the films as a function of light intensity and applied voltage were studied and results were discussed in detail. The photoconduction was found to increase with higher light illumination and maximum at the band edge of the ZnPc thin film. (© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

基于Si衬底的CdSe薄膜蒸镀工艺研究

采用真空蒸发技术在Si(100)基底上制备了CdSe纳米晶薄膜,利用X射线衍射仪(XRD)、膜厚测试仪、原子力显微镜(AFM)方法对不同蒸发电流下制备的薄膜的结晶情况、表面形貌进行分析表征.结果表明:蒸发电流对CdSe薄膜的结晶性能和表面形貌有显著影响.当蒸发电流为75 A时,CdSe薄膜沿(002)方向的衍射峰相对较强,沿c轴取向择优生长优势明显,薄膜厚度约为160 nm,晶粒尺寸约为40 nm,颗粒均匀;薄膜表面平整光滑,表面粗糙表面粗糙度(5.63 nm)相对较低,薄膜结晶质量较好.     

Micron scale and nanoscale structure of mesoporous silica thin films

Ordered mesoporous silica thin films have been prepared on silicon substrates by spin-coating technique using poly(alkaline oxide) triblock copolymers EO₂₀PO₇₀EO₂₀ (P123) as structure-directing agent. The X-ray diffraction and transmission electron microscopy investigations show that the obtained mesoporous silica thin films have an ordered pore array structure in nanoscale. The atomic force microscopy analysis reveals that the obtained mesoporous silica thin films exhibit a tile arrangement structure in micron scale.     

离子束溅射制备Si/Ge多层膜及红外吸收性能研究

采用离子束溅射方法在Si衬底上制备Si/Ge多层膜.通过改变生长温度、溅射速率等因素得到一系列Si/Ge多层膜样品.通过X射线衍射、拉曼散射、原子力显微分析(AFM)等表征方法研究薄膜结构与生长条件的关系.在小束流(10mA)、室温条件下制备出界面清晰、周期完整的Si/Ge多层膜.通过红外吸收谱的测量发现薄膜样品具有较好的红外吸收性能.     

多周期溅射单质靶制备铜锌锡硫薄膜电池

采用多周期磁控溅射单质靶Cu-Sn-Zn制备CZTS薄膜太阳电池.多周期包含两周期和四周期,同时与单周期制备的CZTS薄膜电池作对比.通过X射线衍射仪(XRD)、扫描电子显微镜(SEM)、能谱仪(EDS)和拉曼光谱仪(Raman)对不同周期得到的CZTS薄膜的晶体性质、表面样貌、化学成分等性质进行分析研究.分析结果显示,多周期制备的CZTS薄膜晶体质量要比单周期的好,表面均匀致密.重要的是四周期溅射制备的CZTS薄膜是研究的最佳实验组.最终把不同周期得到的CZTS薄膜制备成完整的器件结构,得到的太阳电池效率分别是:单周期2.64;,两周期3.01;,四周期3.36;.     

Crosslinked Cholesteric Network from the Acrylic Acid Ester of (Hydroxypropyl)Cellulose

The acrylic acid ester of (hydroxypropyl)cellulose was prepared from (hydroxypropyl)cellulose and acryloyl chloride. The resultant polymer, with 2.2 ester groups per anhydroglucose unit, formed a thermotropic cholesteric mesophase with visible reflection hands at temperatures between ambient and 60°C. By exposing a thin layer of the mesophase to UV light, the mesophase structure was stabilized to give a crosslinked cholesteric film.     

Study of polyelectrolyte complexes of chitosan and sulfoethyl cellulose

The complexing of polycation chitosan and polyanion sulphoethyl cellulose during the formation of polyelectrolyte simplex membranes using the layer-by-layer deposition of a solution of one polyion on a gel-like film of another one has been studied. The structural characteristics of the multilayer composites and their components have been analyzed by X-ray diffraction, scanning electron microscopy, and energy-dispersive X-ray microanalysis. A technique is proposed for studying the structure of surface layers of thin polymer films (15–20 μm) using a portable DIFREI-401 diffractometer. It is shown that the sequence of layer deposition during the formation of membrane films does not affect their structural characteristics. The interaction between positively charged chitosan groups (-NH ₃ ⁺ ) and negatively charged sulfoethyl cellulose groups (-SO ₃ ^? ) during the growth of polyelectrolyte complexes results in a packing of chitosan chains in the multilayer film.     

Electrical properties of Bi3.15Nd0.85Ti2.8-xZr0.2MnxO12 thin films with different Mn content synthesized by chemical solution deposition (CSD)

Bi_3.15Nd_0.85Ti_2.8-xZr_0.2Mn_xO₁₂ (BNTZM) thin films with various Mn content (x = 0, 0.005, 0.01, 0.03, and 0.05) have been prepared on Pt/Ti/SiO₂/Si (100) substrates by a chemical solution deposition (CSD) technique. The crystal structures of BNTZM thin film have been analyzed by X-ray diffraction (XRD). The dependence of Mn contents on the ferroelectric, dielectric properties, and leakage current of these BNTZM films have been thoroughly investigated. The XRD analysis demonstrated that all the BNTZM thin films were of typical bismuth-layer-structured ferroelectrics (BLSF) polycrystalline structure and exhibited a highly preferred (117) orientation. Among these BNTZM films, the BNTZM thin film with Mn content equal to 0.01 exhibits the maximum remnant polarization (2P_r) of 48μC/cm² and a low coercive field (2E_c) of 177 kV/cm. In addition, the BNTZM thin film with x = 0.01 (Mn) showed a fatigue-free behavior up to 1 × 10¹⁰ read/write cycles.     

Cu掺杂ZnO薄膜的制备及其光谱特性

采用溶胶-凝胶法在铟锡氧化物(ITO)导电玻璃基底上制备了不同掺杂浓度的Cu∶ ZnO薄膜.采用X射线衍射仪和扫描电子显微镜分析了薄膜样品的晶相结构和形貌,用荧光光谱仪测量了薄膜样品的光致发光谱.结果表明:Cu∶ ZnO薄膜均为六角纤锌矿结构,呈c轴择优取向,且因压应力的存在使其晶格常数略小于未掺杂薄膜样品的晶格常数;低温和高温退火处理的薄膜样品的光致发光谱(PL)中分别观察到414 nm、438 nm的蓝光双发射峰和510 nm左右的绿光发射峰.蓝光发射峰与样品中的Vzn和Zni有关,而绿光发射峰与样品中的Vo -Zni有关.     

p-ZnO薄膜及其异质结的光电性质

采用射频磁控溅射法,在不同的Ar∶O2条件下,以高掺磷n型Si衬底为磷掺杂源制备了p型ZnO薄膜和p-ZnO/n-Si异质结.对ZnO∶P薄膜进行了光致发光谱(PL)、霍尔参数、Ⅰ-Ⅴ特性、扫描电镜(SEM)和X射线衍射谱(XRD)等测试.结果表明,获得的ZnO∶P薄膜沿(0002)晶面高取向生长,以3.33 eV近带边紫外发光为主,伴有2.69 eV附近的深能级绿色发光峰,空穴浓度为8.982 × 1017/cm3,空穴迁移率为9.595 cm2/V·s,p-ZnO/n-Si异质结I-V整流特性明显,表明ZnO∶P薄膜具有p型导电特性.     

射频溅射功率对Mn-Co-Ni-O薄膜结构与性能的影响

采用射频磁控溅射技术在硅衬底上制备了锰钴镍氧(Mn-Co-Ni-O, MCNO)薄膜并进行了后退火处理。利用X射线衍射、扫描电子显微镜、光学测试仪器等测试手段对晶体结构、表面形貌及光学性能进行表征。分析了不同射频溅射功率(60~100 W)对MCNO薄膜表面微观形貌、晶体结构和光学性能的影响。结果表明,在60~90 W下获得的薄膜表面致密且均匀,但在100 W下获得的MCNO薄膜表面晶粒尺寸显著增大。物相分析表明,采用射频磁控溅射沉积的MCNO薄膜主要为尖晶石结构,溅射功率对薄膜结晶质量和择优取向具有显著影响,在80 W下获得的MCNO薄膜结晶质量最佳。同时,拉曼光谱测试也表明该MCNO薄膜表现出最强的Mn⁴⁺—O对称弯曲振动和最小的压应力。紫外-可见-近红外光谱分析表明,MCNO薄膜的吸光范围主要在可见光-近红外波段,在80~90 W溅射功率下获得的MCNO薄膜在近红外波段表现出更强的吸收峰。射频溅射功率的改变会影响薄膜的厚度和结晶质量,从而对薄膜的光学带隙起到调控作用。光致发光光谱测试不同溅射功率下薄膜的缺陷峰发光强度,且在功率为80 W时沉积的薄膜具有最强紫外发射峰,表明改变溅射功率能够有效改善薄膜缺陷及提高晶体质量。     

钨酸盐薄膜的原电池电化学制备技术及其发光性能

采用室温原电池电化学技术在钨衬底上制备出了具有发光性能的BaWO4、SrWO4、CaWO4薄膜,利用X射线衍射仪、扫描电镜、荧光光谱仪对样品进行了分析,对薄膜的发光性能进行了研究。XRD分析表明,所制备的钨酸盐薄膜是高度结晶的,呈四方结构;SEM观察表明,在原电池条件下,这些晶体以四方锥形的习性生长。室温下的荧光性能测试表明,所制备的BaWO4、SrWO4、CaWO4薄膜在220nm至240nm的光激发下,均在450nm附近出现一个蓝光发射带,而BaWO4薄膜还在310nm的光激发下,在400nm及590nm附近出现额外的发射带,形成从400~590nm的准连续发射光谱。研究表明,原电池电化学技术为某些功能陶瓷薄膜的制备提供了一条环境协调的、廉价便利的工艺新路线。     

Dependence of the reflection high-energy electron diffraction oscillation shape on the molecular migration time and the oscillation period

Binominal expressions for the reflection high-energy electron diffraction (RHEED) oscillations during the growth of thin films by molecular beam epitaxy (MBE) were investigated. The dependence of the RHEED oscillation shape on the molecular migration time and the oscillation period was analyzed quantitatively. The peaks and valleys in the calculated oscillation intensities as a function of the oscillation period were in qualitatively reasonable agreement with those obtained from the experimental data. These results can help in controlling the epitaxial film thickness in the growth of films by using the MBE technique.     

Polycrystalline Lead Tin Chalcogenide Thin Film Grown by Spray Pyrolysis

PbSnS₂ thin film has been prepared for the first time by spray pyrolysis technique on FTO substrate at 570K. The preliminary optical and structural characteristics of the film have been reported. The optical studies showed that the value of the fundamental absorption edge lies at 1.47eV and a low energy absorption band tail has been observed. The prepared film is p‐ type electrical conductivity, polycrystalline in nature and has an orthorhombic crystal structure. The value of an average grain size of the film is 350Å.     

Bi1.65Zn1.0Nb1.5O7.225陶瓷和薄膜的结构和介电性能对比

以立方焦绿石Bi1.5Zn1.0Nb1.5O7(BZN)为配方基础,通过掺入过量10％的Bi2O3,形成Bi1.65Zn1.0Nb1.5O7.225非化学计量比分子式.采用固相反应法合成具有焦绿石立方结构的Bi1.65Zn1.0Nb1.5O7.225陶瓷,并采用脉冲激光沉积法在Pt/SiO2/Si(100)基片上制备其薄膜.对比研究了非化学计量比Bi1.5Zn1.0Nb1.5O7.225陶瓷和薄膜的结晶性能,微观形貌以及介电性能的差异.结果表明烧结的Bi1.65Zn1.0Nb1.5O7.225陶瓷和沉积的BZN薄膜都保持立方焦绿石单相结构,但是薄膜展现出较强的(222)晶面择优取向.陶瓷和薄膜的晶格常数,微观形貌都体现出差异.对比二者的介电特性后发现,Bi1.65Zn1.0Nb1.5O7.225薄膜的介电常数明显高于陶瓷的介电常数,这归因于薄膜和块体材料之间的差异,例如厚度,致密度,择优取向等.     

Aluminum induced formation of SiGe alloy in Ge/Si/Al thin film structure

In this work, a study of aluminum induced crystallization (AIC) of thin film germanium/silicon/aluminum (Ge/Si/Al) structure on oxidized silicon is presented. The Ge/Si/Al trilayer structure was prepared in three consecutive thin film deposition processes. The AIC was performed in nitrogen at 500 °C within time duration between 1 and 9 h. The progress of crystallization was monitored by optical microscopy, Raman spectroscopy, X-ray diffraction (XRD) and scanning electron microscopy (SEM) combined with energy dispersive X-ray spectroscopy (EDS). It was found that in Ge/Si/Al structure the AIC can lead to formation of SiGe alloy at temperature of 500 °C. This presents an alternative low-temperature formation method of SiGe which is suitable for integration with the conventional Si technology in electronic device fabrication.