Surface photovoltage for real n- and p-type in the visible and near spectroscopy (110) CdTe surfaces infra-red spectral range

Surface photovoltage spectroscopy has been carried out on real n- and p-type (110) CdTe surfaces in the wavelength range 0.36-1 μm at room temperature (300 K), and at atmospheric pressure. The measurements show the existence of surface states at 1.3; 1.48, and 1.2; 1.46 eV within the energy gap of n- and p-type CdTe, respectively. Surface states greater than the energy gap at 2.24, 2.38, 2.68, and 3.1 eV have also been detected in n-type samples and at 1.66, 2.12, 2.69 eV in p-type samples.     

Intrinsic electron accumulation at clean InN surfaces

The electronic structure of clean InN(0001) surfaces has been investigated by high-resolution electron-energy-loss spectroscopy of the conduction band electron plasmon excitations. An intrinsic surface electron accumulation layer is found to exist and is explained in terms of a particularly low Gamma-point conduction band minimum in wurtzite InN. As a result, surface Fermi level pinning high in the conduction band in the vicinity of the Gamma point, but near the average midgap energy, produces charged donor-type surface states with associated downward band bending. Semiclassical dielectric theory simulations of the energy-loss spectra and charge-profile calculations indicate a surface state density of 2.5 (+/-0.2)x10(13) cm(-2) and a surface Fermi level of 1.64+/-0.10 eV above the valence band maximum.     

Surface and interface electronic properties of AlGaN(0001) epitaxial layers

AlGaN layers with Al content varying over the whole range of compositions were grown by molecular beam epitaxy (MBE) on n-6H-SiC substrates. The band gap energy is obtained from the vanishing of Fabry–Pérot oscillations in a fit to optical reflection spectra near the band gap absorption edge. The surface potential was determined by in-situ X-ray photoemission spectroscopy (XPS) and is found to increase as a function of the Al content from (0.5±0.1) eV to (1.3±0.1) eV, from GaN to AlN. A Si₃N₄ thin passivation layer was formed in-situ onto a 2DEG AlGaN/GaN structure. The mechanism underlying the passivation of high electron mobility transistor (HEMT) structures is suggested to be based on the formation of interface states, which keep the Fermi level fixed at a position close to that of the free AlGaN surface. PACS 73.20.-r; 73.40.-c; 73.40.Kp     

Surface photovoltage investigations of Cd1−xMnxTe for x = 0.01 and 0.10

Surface photovoltage investigations of Cd_1−xMn_xTe monocrystals for x = 0.01 and 0.10 were performed in the temperature range between 100 and 300 K with a modified Kelvin method at a pressure of 10⁻⁵ Pa. The surfaces with orientation (110) were ground, polished with “Gamal”, and rinsed in acetone and alcohol. Three types of effects were observed on the surface spectroscopy curves: A sharp increase in photovoltage, connected with the electron band-to-band transitions for a photon energy equal to the energy gap. Photovoltage quenching attributed to the existence of surface states with energy just above the edge of the valence band. Increase in photovoltage in the range between 0.9 and 1.0 eV resulting from electron transitions between the valence band and energy states connected with manganese ions.     

Energy gap revealed by low-temperature scanning-tunnelling spectroscopy of the Si(111)-7×7 surface in illuminated slightly doped crystals

Physical properties of the Si(111)-7×7 surface of low-doped n- and p-type Si samples are studied in the liquid helium temperature region by scanning-tunnelling microscopy and spectroscopy. Conduction required for the study is provided by illumination of the surface. Application of illumination completely removes the band bending near the surface and restores the initial population of the surface states. Our results indicate the existence of the energy gap 2Δ?=?40?±?10?meV in the intrinsically populated Si(111)-7×7 surface.     

Some comments on the electronic properties of the surface space charge layer of copper phthalocyanine thin films

A simple analysis, using a theory of the surface space charge layer of semiconductors, of the published values of the work function φ and surface ionization energy Φ_s of copper phthalocyanine (CuPc) thin films was performed. Using a well known position of the Fermi level E_F within the band gap E_g the values of its absolute band bending eV_s and surface electron affinity X_s were determined. A small negative value of the absolute band bending eV_s = −0.17 ∓ 0.15 eV has been interpreted by the existence of the filled electronic surface states localized in the band gap below the Fermi level E_F. Such states were predicted theoretically for thin films and the crystalline surface of CuPc, and attributed to surface lattice defects of a high concentration.     

On the electronic structure of cleaved GaAs(110) surfaces exposed to formic acid

GaAs(110) surfaces cleaved in UHV and exposed to HCOOH have been studied by work function measurements (Kelvin method), electron energy loss spectroscopy (ELS) and by low energy electron diffraction (LEED). From the different changes of the work function on n- and p-type material information about intrinsic and extrinsic surface states is derived. In the loss spectra the adsorbed formate species causes a loss near 9 eV. The intensity of the loss near 20 eV generally ascribed to an excitonic transition from the Ga 3d core level into surface states is reduced only by a factor of two after saturation with HCOOH. This might be related to the c(2 × 2) superstructure observed in LEED, which suggests a saturation coverage of half a monolayer.     

Surface photovoltage due to photo-thermo-ionization of surface states: GaAs

Surface photovoltage spectroscopy was employed for studying the mechanism of subuand gap photoionization transitions from surface states in GaAs surfaces. It was found that the photoionization cross-section exhibits a maximum for a photon energy of about 0.9 eV. This finding indicates a photo-thermal mechanism of photovoltage, i.e., photo-induced transitions between surface state levels and the subsequent thermal ejection of electrons from the upper level into the conduction band.     

Low energy electron diffraction and electron spectroscopy studies of the clean (110) and (100) titanium dioxide (rutile) crystal surfaces

Low-energy electron diffraction (LEED), Auger electron spectroscopy (AES), electron energy loss (ELS) and ultraviolet photoemission spectroscopies (UPS) were used to study the structures, compositions and electron state distributions of clean single crystal faces of titanium dioxide (rutile). LEED showed that both the (110) and (100) surfaces are stable, the latter giving rise to three distinct surface structures, viz. (1 × 3), (1 × 5) and (1 × 7) that were obtained by annealing an argon ion-bombarded (100) surface at ~600,800 and 1200° C respectively. AES showed the decrease of the $\text{O(510 eV)}\text{Ti(380 eV)}$ peak ratio from ~1.7 to ~1.3 in going from the (1 × 3) to the (1 × 7) surface structure. Electron energy loss spectra obtained from the (110) and (100)?(1 × 3) surfaces are similar, with surface-sensitive transitions at 8.2, 5.2 and 2.4 eV. The energy loss spectrum from an argon or oxygen ion bombarded surface is dominated by the transition at 1.6 eV. UPS indicated that the initial state for this ELS transition is peaked at ?0.6 eV (referred to the Fermi level E_F in the photoemission spectrum, and that the 2.4 eV surface-sensitive ELS transition probably arises from the band of occupied states between the bulk valence band maximum to the Fermi level. High energy electron beams (1.6 keV 20 μA) used in AES were found to disorder clean and initially well-ordered TiO₂ surfaces. Argon ion bombardment of clean ordered TiO₂ (110) and (100)?(1 × 3) surfaces caused the work function and surface band bending to decrease by almost 1 eV and such decrease is explained as due to the loss of oxygen from the surface.     

Probing the electronic structure of ZnO nanowires by valence electron energy loss spectroscopy

Valence electron energy loss spectroscopy in a transmission electron microscope is employed to investigate the electronic structure of ZnO nanowires with diameter ranging from 20 to 100 nm. Its excellent spatial resolution enables this technique to explore the electronic states of a single nanowire. We found that all of the basic electronic structure characteristics of the ZnO nanowires, including the 3.3 eV band gap, the single electron interband transitions at approximately = 9.5, approximately = 13.5,and approximately = 21.8 eV, and the bulk plasmon oscillation at approximately 18.8 eV, resemble those of the bulk ZnO. Momentum transfer resolved energy loss spectra suggest that the 13.5 eV excitation is actually consisted of two weak excitations at approximately = 12.8 and approximately = 14.8 eV, which originate from transitions of two groups of the Zn 3d electrons to the empty density of states in the conduction band, with a dipole-forbidden nature. The energy loss spectra taken from single nanowires of different diameters show several size-dependent features, including an increase in the oscillator strength of the surface plasmon resonance at approximately = 11.5 eV, a broadening of the bulk plasmon peak, and splitting of the O 2s transition at approximately = 21.8 eV into two peaks, which coincides with a redshift of the bulk plasmon peak, when the nanowire diameter decreases. All these observations can be well explained by the increased surface/volume ratio in nanowires of small diameter.     

Photoemission measurements of bulk,surface and hydrogen induced states on cleaved Ge(111)

Ultraviolet photoemission spectroscopy using HeI (21.2 eV) resonance photons has been used to study cleaved Ge(111) surfaces which were also characterized by Auger electron spectroscopy and low energy electron diffraction. Higher effective resolution for both bulk and surface states was found than for recent measurements employing synchrotron radiation.     

Electronic properties of cleaved Si(111) upon room-temperature deposition of Au

Low energy electron diffraction (LEED), Auger electron spectroscopy (AES), and photoemission yield spectroscopy (PYS) measurements are performed on a set of 2 × 1 reconstructed silicon (111) surfaces with different bulk dopings as a function of gold coverage θ, from zero to a few hundred monolayers, obtained by UHV evaporation on a sample kept at room temperature. Our measurements show the formation of an Au-Si alloy with the first two monolayers of gold deposit which induces a decrease of the ionization energy Φ by about 0.15 eV while no variation of the work function is observed. In the effective density of states, the double structure related to the 2 × 1 reconstruction is then replaced by a single peak at ? 0.4 eV below the valence band edge. At larger coverages, the Au-Si alloy remains on top of a gold layer which forms an abrupt interface with the Si substrate.     

Reflectometric study of surface states and oxygen adsorption on clean Si(100) and (110) surfaces

External differential reflection measurements were carried out on clean Si(100) and (110) surfaces in the photon energy range of 1.0 to 3.0 eV at 300 and 80 K. The results for Si(100) at 300 K showed two peaks in the joint density of states curve, which sharpened at 80 K. One peak at 3.0 ± 0.2 eV can be attributed to optical transitions from a filled surface states band near the top of the valence band to empty bulk conduction band levels. The other peak at 1.60 ± 0.05 eV may be attributed to transitions to an empty surface states band in the energy gap. This result favours the asymmetric dimer model for the Si(100) surface. For the (110) surface at 300 K only one peak was found at 3.0 ± 0.2 eV. At 80 K the peak height diminished by a factor of two. Oxygen adsorption in the submonolayer region on the clean Si(100) surface appeared to proceed in a similar way as on the Si(111) 7 × 7 surface. For the Si(110) surface the kinetics of the adsorption process at 80 K deviated clearly. The binding state of oxygen on this surface at 80 K appeared to be different from that on the same surface at 300 K.     

Surface photovoltage spectroscopy and surface piezoelectric effect in GaAs

“Real” (111) surfaces of n-type GaAs were investigated employing surface photovoltage spectroscopy and the surface piezoelectric effect. Surface states at the energy position E_c ? E_t ? 0.72 eV were found on both the Ga and the As surfaces. Both types of surfaces exhibited a barrier of about 0.55 V. No variations in the surface barrier or the energy position of the surface states were observed in various ambients at atmospheric pressure (dry air, wet air, ammonia and ozone). However, the capture cross-section of the surface states for electrons, as determined from the surface piezoelectric effect transients (of the order of 10^?13 cm²), was found to be sensitive to the ambient. It decreased in wet air and increased in ozone. This effect was more pronounced on the As than on the Ga surfaces. Additional surface states were found to be present in the energy region of 0.9 to 1.0 eV, below the bottom of the conduction band. However, their exact energy positions could not be determined due to interference caused by the carrier trapping of the surface states at E_c ? E_t ? 0.72 eV.     

Oxygen-related band gap state in single crystal rubrene

A molecular exciton signature is established and investigated under different ambient conditions in rubrene single crystals. An oxygen-related band gap state is found to form in the ambient atmosphere. This state acts as an acceptor center and assists in the fast dissociation of excitons, resulting in a higher dark and photoconductivity of oxidized rubrene. The band gap state produces a well-defined photoluminescence band at an energy 0.25 eV below the energy of the 0-0 molecular exciton transition. Two-photon excitation spectroscopy shows that the states are concentrated near the surface of naturally oxidized rubrene.     

Photoelectron spectroscopy of nickel on zinc oxide in the monolayer and submonolayer range

Nickel films of thicknesses between 0.05 and 5 monolayers were deposited by evaporation onto the polar ZnO(0001)Zn and ZnO(000$\text{1}$)O surfaces. The character and thickness of the Ni films were determined by Auger electron spectroscopy. The work function, the bending of the substrate bands and the emission from the Ni 3d states were studied by UV photoelectron spectroscopy. After deposition of about 2 monolayers of Ni the O face showed an upward band bending whereas the Zn face showed hardly any at all. After reaching a film thickness of about one monolayer the emission from the Ni 3d states becomes similar to that from the 3d band of bulk Ni. For a film thickness below 0.2 of a monolayer the emission features at ?4.3 eV and ?6.0 eV were attributed to Ni atoms interacting with oxygen from the substrate and the features at ?2.1 and ?1.3 to Ni atoms and two-dimensional Ni clusters.     

Nanostructure growth-induced defect formation and band bending at ZnO surfaces

Morphological, electrostatic, and optical techniques reveal spontaneous growth of nano-“mounds” on ZnO polar surfaces in air creating native point defects at and under the surface that increase work function locally by hundreds of meV. Nanoscale surface photovoltage spectroscopy reveals Zn vacancies with gap states whose density grows with nano-mound proximity over hundreds of nanometers. The low activation energy for ZnO nano-mound growth with oxygen indicates interstitial Zn diffusion that feeds nanostructure growth, generating deep level acceptors that increase n-type band bending and impact Schottky barrier formation.     

Observation of extrinsic surface states on (112̄0) CdS

Surface states have been detected by surface photovoltage spectroscopy on (112̄0) CdS surfaces subjected to various treatments in UHV and studied by Auger electron spectroscopy and LEED. All surface electronic features can be related to chemical contamination or lattice nonstoichiometry. Energy level spectra of air-exposed CdS exhibit a set of discrete states due to adsorption of C, O, and Cl. Ion bombardment generates a pair of states 2.35 eV and ~0.8 eV above the valence band edge due to S interstitials and vacancies, respectively. Oxygen adsorption produces a broad continuum of states. Changes in surface atomic order show no direct effect on these electronic features. No intrinsic surface states, filled or empty, are observed by surface photovoltage spectroscopy on clean, stoichiometric (112̄0) faces of CdS.     

Surface characterisation of indium phosphide

LEED, characteristic loss spectroscopy, Auger electron spectroscopy, photoemission and light modulated contact potential methods have been employed to study indium phosphide surfaces. Cleaved (110) faces have a surface unit mesh identical to that of the bulk and surface states lead to band bending in the surface region. Reaction with oxygen leads to loss of phosphorus and the formation of an oxide layer near the surface. Features in the characteristic loss spectrum are discussed in terms of interband transitions and plasmon losses and the Auger spectra of oxidized surfaces are thought to contain components due to cross transitions. The surface composition, band bending and photothresholds of etched (100) surfaces of epitaxial InP layers have been established. Surfaces cannot be cleaned by heat treatment alone since decomposition occurs at elevated temperature. The influence of evaporated silver on the sign of the surface photovoltage has also been investigated.     

Electron emission from surfaces of alkali halides under the impact of metastable helium and neon atoms

Energy distributions of the electrons ejected from the evaporated film surfaces of LiF, LiCl, LiBr, NaF and NaCl by the impact of metastable He and Ne atoms have been measured. The observed distribution curves have two distinct structures: one peak is identified as the valence band structure caused by Penning ionization, while the other peak is ascribed to scattered electrons. The positions of the valence band peaks are shifted to lower ionization energy from the corresponding photoelectron peaks (by 0.1–1.5 eV depending on the substance). In contrast to the photoelectron spectra, the structure attributable to conduction bands appears only very weakly. The relative intensity of the peak caused by scattered electrons is either strong or weak depending on the combination of the metastable atom and the sample. The interpretation of this observation is that the scattered electron peak is enhanced when the energy of the metastable atom exceeds twice the band gap energy, i.e. when the electron—electron scattering of Penning electrons in the solid is feasible.