AC-hopping conductance of self-organized Ge/Si quantum dot arrays

Dense (n=4×10¹¹ cm^-2) arrays of Ge quantum dots in a Si host were studied using attenuation of surface acoustic waves (SAWs) propagating along the surface of a piezoelectric crystal located near the sample. The SAW magneto-attenuation coefficient, ΔΓ=Γ(ω,H)-Γ(ω,0), and change of velocity of SAW, ΔV/V=(V(H)-V(0))/V(0), were measured in the temperature interval T=1.5–4.2 K as a function of magnetic field H up to 6 T for the waves in the frequency range f=30–300 MHz. Based on the dependences of ΔΓ on H, T and ω, as well as on its sign, we believe that the AC conduction mechanism is a combination of diffusion at the mobility edge with hopping between localized states at the Fermi level. The measured magnetic field dependence of the SAW attenuation is discussed based on existing theoretical concepts.     

Raman study of Si–Ge intermixing in Ge quantum rings and dots

The Ge/Si (1 0 0) nanostructures have been studied by atomic force microscopy (AFM) and Micro Raman optical spectroscopy. Two layers of Ge of total thickness 0.75 nm and Si cap with thickness 2.5 nm were deposited by the method of molecular beam epitaxy at the temperature range 640–700 °C. AFM shows both quantum dots and ring-shape Ge nanostructures. From the analysis of the intensity and energy shift of the Raman signal we have found that the average concentration of Ge decreases considerably from 44% to 27%, when the growth temperature increases, whereas the degree of strain relaxation remains roughly the same. This allows us to conclude that intermixing is a dominating mechanism for strain relaxation in processes of transformation of Ge quantum dots to quantum rings.     

Phonons in Ge/Si quantum dot structures: influence of growth temperature

In this paper we present the results of a Raman study of Ge/Si quantum dot (QD) superlattices grown with different thicknesses of a Si interlayer and at different substrate temperatures. The built-in strain and atomic intermixing in the QDs are deduced from an analysis of optical phonon frequencies of the QDs obtained from Raman spectra of the structures.     

Luminescence study of Si/Ge quantum dots

We present a photoluminescence (PL) study of Ge quantum dots embedded in Si. Two different types of recombination processes related to the Ge quantum dots are observed in temperature-dependent PL measurements. The Ge dot-related luminescence peak near 0.80 eV is ascribed to the spatially indirect recombination in the type-II band lineup, while a high-energy peak near 0.85 eV has its origin in the spatially direct recombination. A transition from the spatially indirect to the spatially direct recombination is observed as the temperature is increased. The PL dependence of the excitation power shows an upshift of the Ge quantum dot emission energy with increasing excitation power density. The blueshift is ascribed to band bending at the type-II Si/Ge interface at high carrier densities. Comparison is made with results derived from measurements on uncapped samples. For these uncapped samples, no energy shifts due to excitation power or temperatures are observed in contrast to the capped samples.     

Photocurrent spectroscopy of indirect transitions in Ge/Si multilayer quantum dots at room temperature

Lateral photoconductivity spectra of multilayer Ge/Si heterostructures with Ge quantum dots were studied in the work proposed at room temperature. The photocurrent with minimal energy 0.48-0.56 eV that is smaller than Ge band gap was observed from such structures at the geometry of waveguide excitation. Generation of the photocurrent with the limit energy 0.48-0.56 eV was explained by spatially indirect electron transitions from heavy hole states of SiGe valence band into Δ₂-valley of the conduction band of Si surrounding. It was found out that the limit energy of such transitions decreased, as the number of SiGe quantum dot layers increased.     

The effects of thermal annealing in self-assembled Ge/Si quantum dots

The effects of thermal annealing in Si base self-assembled Ge dots have been investigated by Raman spectra and PL spectra. An obvious Raman frequency shift under different annealing temperature can be observed. There are two main effects during the annealing procession: one is the inter-diffusion of the Si and Ge quantum dots; the other is the relaxation of the elastic strain. With the calculated results, PL blue shift can be related to strain relaxation effects, and/or a general decrease of Ge content due to the Ge-Si intermixing.     

离子束溅射自组装Ge/Si量子点生长的演变

采用离子束溅射技术,通过改变Ge的沉积量,在n型Si(100)衬底上自组装生长了一系列Ge量子点样品. 利用AFM和Raman光谱对样品表面形貌和结构进行表征,系统地研究了Ge量子点形貌、密度、尺寸大小以及Ge的结晶性和量子点中组分等随Ge沉积量的演变规律. 结果表明:Ge层从二维薄层向三维岛过渡过程中,没有观察到传统的由金字塔形向圆顶形量子点过渡,而是直接呈圆顶形生长;且随着Ge沉积量的增加,量子点密度先增大后减小,Ge的结晶性增强同时Ge/Si互混加剧,量子点中Si的组分增加. 关键词： 离子束溅射 量子点 表面形貌 Raman光谱     

Band gap narrowing and doping level of heavily doped Germanium nanocrystals deduced from photoconductivity studies

We investigate the photoconductivity of a n⁺-ZnO/n-Ge NCs/p⁺-GaAs junction where the active layer consists of heavily n-doped Ge NCs synthesized in the gas phase. Measurement of a significant current at energies smaller than the band gap of GaAs demonstrates the photogeneration of charge carriers by the Ge NCs. From the correlation of the NC size with the absorption threshold, a narrowing of the direct band gap in the Ge NC thin film is obtained and attributed to the heavy doping of the Ge NCs. A remarkably high electrical activation of ~15% is found for the incorporated P impurities in the NCs.     

Impurity effects in the optical absorption of quantum rings

We study the interplay between impurity scattering and Coulomb interaction effects in the absorption spectrum of neutral bound magnetoexcitons confined in quantum-ring structures. Impurity scattering breaks the rotational symmetry of the ring system, introducing characteristic features in the optical emission. Signatures of the optical Aharonov–Bohm effect are still present for weak scattering and strong Coulomb screening. Furthermore, an impurity-induced modulation of the absorption strength is present even for a strong impurity potential and low screening. This behavior is likely responsible of recent experimental observations in quantum-ring structures.     

Electronic states of self-organized InGaAs quantum dots on GaAs (3 1 1)B studied by conductive scanning probe microscope

We have used conductive scanning probe microscope (SPM) in high vacuum and operated at 173 K in order to investigate the electronic properties of self-organized InGaAs quantum dots (QDs) grown on GaAs (3 1 1)B and (0 0 1) substrates. Ordered InGaAs quantum dot arrays on GaAs (3 1 1)B surface were fabricated by atomic-H assisted molecular beam epitaxy (H-MBE), and Si SPM tips coated with Au which warrants electrical conductivity were used to measure simultaneously both the topographic and current images of QDs surface. From the current–voltage (I–V) curves, unique and different plateau features were observed for QDs formed on GaAs (3 1 1)B and (0 0 1) substrates. The results suggested that a high degree of symmetry of InGaAs QDs on (3 1 1)B was responsible for the observed degeneracy of electronic states and artificial atom-like states. We demonstrate that this conductive SPM technique becomes a powerful tool in studies of single electron charging of individual dots.     

Temperature dependence of photoluminescence from self-organized Ge quantum dots with large size and low density

Photoluminescence(PL) from self-organized Ge quantum dots(QDs) with large size and low density has been investigated over a temperature range from 10 to 300 K using continuous-wave(CW) optical excitation.The integrated PL intensity of QDs observed is negligible at about 10 K and rapidly increases with raising temperature up to 100 K.Through analyzing the PL experimental data of the QDs and wetting layer(WL),we provide direct evidence that there exists a potential barrier,arising from the greater compressive...     

在Si衬底上自组装生长Ge量子点研究进展

在Si衬底上自组装生长纳米尺度的Ge量子点，由于三维量子限制效应的贡献，能够在能带结构上对Si、Ge天然材料的间接带特性实施准直接带结构的改性，使激子行为和带间复合跃迁得到大幅度增强，同时Ge量子点的可控有序相关排列还有助于发展新一代的Si基电子波量子器件．文章回顾了自20世纪80年代末至今Ge／Si量子点生长研究的重要进展，对其潜在的重要应用作出了评述．结合作者自己的研究结果，着重介绍了Ge量子点的生长动力学及其形态的演变过程，指出自组装生长的Ge／Si量子点属Ⅱ型能带结构，其发光效率比一维量子阱有很大增强．探讨了用模板衬底实现对Ge量子点尺寸和分布的有序可控生长方法与途径．     

Magnetic properties of quantum dots and rings

Exact many-body methods as well as current-spin-density functional theory are used to study the magnetism and electron localization in two-dimensional quantum dots and quasi-one-dimensional quantum rings. Predictions of broken-symmetry solutions within the density functional model are confirmed by exact configuration interaction (CI) calculations: In a quantum ring the electrons localize to form an antiferromagnetic chain which can be described with a simple model Hamiltonian. In a quantum dot the magnetic field localizes the electrons as predicted with the density functional approach. Received 5 December 2000     

Confined states in two-dimensional flat elliptic quantum dots and elliptic quantum wires

The energy spectrum and corresponding wave functions of a flat quantum dot with elliptic symmetry are obtained exactly. A detailed study is made of the effect of ellipticity on the energy levels and the corresponding wave functions. The analytical behavior of the energy levels in certain limiting cases is obtained.     

Densely packed Ge quantum dots grown on SiO2/Si substrate

We studied the growing process of Ge dots on silicon substrates covered with an ultrathin silicon dioxide buffer layer which was formed with simple chemical procedure. Uniform and densely packed (10¹¹ cm⁻²) quantum dots (QDs) were obtained by optimizing the growth parameter with the MBE method. The influence of temperature, coverage, as well as the post-annealing process, on the epitaxial and non-epitaxial nanodots formation was evaluated. Nano-sized high density quantum dots were also realized with different growing conditions, whose structural and growing mechanism were discussed under the help of SEM and RHEED results.     

Ge quantum dot molecules and crystals: Preparation and properties

Templated self-organization has been used to prepare two-dimensional arrays as well as three-dimensional quantum dot crystals (QDC) containing Ge dots in a Si host crystal. Si(1 0 0) substrates have been patterned with two-dimensional hole gratings using extreme ultra-violet interference lithography (EUV-IL) and reactive ion etching. The EUV-IL was realized by multiple beam diffraction using Cr gratings on SiN_x membranes fabricated by e-beam lithography. Si/Ge overgrowth was performed by molecular beam epitaxy. The impact of the microscopic shape and size of the prepattern using the mask design and the EUV-IL exposure dose as parameters on the Ge dot nucleation has been studied with atomic force microscopy, transmission electron microscopy and photoluminescence measurements. Adjusting the growth parameters in multiple layer deposition the initial two-dimensional configuration was transferred into three-dimensional QDC.     

Stepwise dependence of the photoconductivity of Si/Ge structures with quantum dots on the interband illumination intensity

It was found that a stepwise increase in the interband light intensity causes an increase in the low-temperature lateral photoconductivity of a Si/Ge structure containing six layers of germanium quantum dots in a silicon host. As was previously observed in structures with a single layer of quantum dots, strengthening of the driving field results in the step positions shifting to lower light intensities. This effect was also found to take place under a dark driving field. The results are discussed in terms of the percolation theory of nonequilibrium electrons localized in the states between quantum dots.     

Resonant Raman scattering of discrete hole states in self-assembled Si/Ge quantum dots

We report the first resonant electronic Raman spectroscopy study of discrete electronic transitions within small p-doped self-assembled Si/Ge quantum dots (QDs). A heavy hole (hh) to light hole (lh) Raman transition with a dispersionless energy of 105 meV and a resonance energy of the hh states to virtually localised electrons at the direct band gap of 2.5 eV are observed. The hh–lh transition energy shifts to lower values with increasing annealing temperature due to significant intermixing of Si and Ge in the QDs. Structural parameters of the small Si/Ge dots have been determined and introduced into 6-band k·p valence band structure calculations. Both the value of the electronic Raman transition of localised holes as well as the resonance energy at the E₀ gap are in excellent agreement with the calculations.     

Growth and optical properties of Ge/Si quantum dots formed on patterned SiO2/Si(0 0 1) substrates

Single and stacked layers of Ge/Si quantum dots were grown in SiO₂ windows patterned by electron-beam lithography on oxidized Si (0 0 1) substrates. The growth of a silicon buffer layer prior to Ge deposition is found to be an additional parameter for adjusting the Ge-dot nucleation process. We show that the silicon buffer layer evolves towards [1 1 3]-faceted pyramids, which reduces the area of the topmost (0 0 1) surface available for Ge nucleation. By controlling the top facet area of the Si buffer layers, only one dot per circular window and a high cooperative arrangement of dots on a striped window can be achieved. In stacked layers, the dot homogeneity can be improved through the adjustment of the Ge deposited amount in the upper layers. The optical properties of these structures measured by photoluminescence spectroscopy are also reported. In comparison with self-assembled quantum dots, we observed, both in single and stacked layers, the absence of the wetting-layer component and an energy blue shift, confirming therefore the dot formation by selective growth.     

Recombination processes in structures with GaN/ALN quantum dots

Mechanisms of the generation and the radiative and nonradiative recombination of carriers in structures with GaN quantum dots in the AlN matrix are studied experimentally and theoretically. Absorption, stationary and nonstationary photoluminescence of quantum dots at different temperatures are investigated. It is found that the photoluminescence intensity considerably decreases with the temperature while the photoluminescence kinetics weakly depends on the temperature. The photoluminescence kinetics is shown to be determined by radiative recombination inside quantum dots. A mechanism of nonradiative recombination is proposed, according to which the main reason for the thermal quenching of photoluminescence is nonradiative recombination of charge carriers, generated by optical transitions between quantum dots and wetting layer states.