Optical and electrical properties of thermally oxidized bismuth thin films

Bismuth trioxide (Bi₂O₃) thin films were prepared by dry thermal oxidation of metallic bismuth films deposited by vacuum evaporation. The oxidation process of Bi films consists of a heating from the room temperature to an oxidation temperature (T_o = 673 K), with a temperature rate of 8 K/min; an annealing for 1 h at oxidation temperature and, finally, a cooling to room temperature. The optical transmission and reflection spectra of the films were studied in spectral domains ranged between 300 nm and 1700 nm, for the transmission coefficient, and between 380 nm and 1050 nm for the reflection coefficient, respectively. The thin-film surface structures of the metal/oxide/metal type were used for the study of the static current-voltage (I-U) characteristics. The temperature of the substrate during bismuth deposition strongly influences both the optical and the electrical properties of the oxidized films. For lower values of intensity of electric field (ξ < 5 × 10⁴V/cm), I-U characteristics are ohmic.     

Influence of interdiffusion on the electrical conductivity of multilayered metal films

The annealing-time dependence of the electrical conductivity of multilayered single-crystal and polycrystalline metal films has been analyzed theoretically within the frame of the semi-classical approach. It is demonstrated that changes in the electrical conductivity which are caused by the diffusion annealing allow for investigating the processes of the bulk and grain-boundary diffusion, and for estimating the coefficients of the diffusion. The electrical conductivity was calculated and the numerical analysis of the diffusion-annealing time dependence was performed at various parameters.     

Effects of Ag addition on phase transformation and resistivity of TiSi2 thin films

In this study, the effects of adding Ag to TiSi₂ thin films are examined. It is demonstrated that both the C49 → C54 transformation temperature and the electric resistivity are appreciably lowered with Ag addition. Due to the presence of Ag nanocrystals precipitated at the C49 grain boundaries, the overall grain boundary density would increase to result in the higher nucleation rate of C54 and the lower transformation temperature. The precipitation of pure Ag network can provide another electric current conductive path except for the TiSi₂ grains. Due to the lower vacuum condition and the higher oxygen content in the current sputtered and annealed films, the C49 → C54 transformation temperature and the resistivity of the TiSi₂-20 at%Ag films can only be reduced by ∼100 °C and 10 μΩ cm, as compared with the non-Ag additive films. With better fabrication vacuum, the transformation temperature and resistivity might be lowered to a level below 700 °C and 15 μΩ cm, which are highly applausive for engineering applications.     

Effects of metal doping on the physical properties of ZnTe thin films

Zinc telluride (ZnTe) thin films were sublimated on a glass substrate using closed space sublimation (CSS) technique. ZnTe thin films of same thickness were tailored with copper (Cu) & silver (Ag) doping, considered for comparative study. X-ray diffraction (XRD) patterns of as-deposited ZnTe thin film and doped ZnTe samples exhibited polycrystalline behavior. The preferred orientation of (111) having cubic phase was observed. XRD patterns indicated that the crystallite size had increased after silver and copper immersion in as-deposited ZnTe thin films. Scanning electron microscopy (SEM) was used to observe the change of as-deposited and doped sample's grains sizes. EDX confirmed the presence of Cu and Ag in the ZnTe thin films after doping respectively. The optical studies showed the decreasing trend in energy band gap after Cu and Ag-doping. Transmission also decreased after doping. Resistivity of as-deposited ZnTe thin film was about 10⁶ Ω cm. The resistivity was reduced to 68.97 Ω cm after Cu immersion, and 10⁴ Ω cm after Ag immersion. Raman spectra were used to check the crystallinity of as-deposited, Cu and Ag-doped ZnTe thin film samples.     

Structural and electrical characterization of strontium bismuth tantalate (SBT) thin films

Ferroelectric strontium bismuth tantalate (SBT) thin films were deposited by thermal metalorganic chemical vapour deposition (MOCVD) onto a complex layered Pt/IrO₂/Ir/Ti(Al)N substrate. A study of ultra-violet (UV)-assisted rapid thermal processing (RTP) annealing strategies of the SBT thin films was performed. The influence of UV irradiation temperature and annealing atmosphere on the crystallinity of the deposited films was evaluated using both microstructural and electrical analysis techniques. A UV-RTP strategy in an oxygen atmosphere above 400 °C, followed by a furnace treatment at 700 °C, provided an optimum remnant polarization figure of merit.     

The effect of CO adsorption on the resistivity of thin Pd films

Thin Pd films of 5–50nm thickness are deposited on glass substrates under UHV conditions and are subsequently covered step by step with CO at 77 or 293 K. The resistivity increases linearly with the number of adsorbed CO molecules in the initial stages of adsorption while a saturation value develops at higher coverages. The thickness dependence of the linear increase can be quantitatively interpreted with the help of the scattering hypothesis. The scattering cross section is calculated to beA=1.6Ų in good agreement with the experimental evidence.Paper in part presented at the 9th Int'l Conf. on Thin Films, Vienna (1993)     

Analytical model of transient compressive stress evolution during growth of high diffusivity thin films on substrates

We present an analytical model of transient compressive stress evolution during growth of thin films with high surface and grain boundary diffusivities on substrates. The model provides a closed-form analytical solution which compares well with numerical analysis as well as recent experimental data on transient stress evolution during electrodeposition of Sn films on substrates.     

The effect of gas adsorption on the electrical resistivity of thin silver films

Silver films in the thickness range 20–60 nm deposited on glass substrates in UHV conditions were covered stepwise with oxygen, carbon monoxide and ethylene at 77 K. Resistivity was measured in situ. The evaluation of the thickness dependence of resistivity on the basis of a scattering hypothesis leads to scattering cross sections decreasing from O₂ to CO and C₂H₄. The results are explained by considering the energetic structure of the broadened molecular orbitals of the adsorbates near the Fermi level.     

Temperature dependence of dc photoconductivity in CdTe thin films

The temperature dependence of dc photoconductivity in the measuring range 303–417 K has been studied in CdTe thin films having thicknesst < 4000 Å. The photoactivation energy decreases in dark which is explained on the basis of grain boundary (GB) effect. The current lost to recombination at GB space charge region causes a negative effect on the photosensitivity of the films. A decrease in photosensitivity with increase in temperature is attributed to the reduction of photoexcitation process. It is observed that the minority carrier lifetime varies inversely with light intensity which supports the sublinear relationship of photoconductivity with the intensity of light and thereby confirms the defect-controlled photoconductivity in CdTe thin films     

Enhancement of photosensitivity in bismuth doped Cu2ZnSnS4 thin films

In this paper, the effect of bismuth doping on the structural, morphological, optical and electrical properties of Cu₂ZnSnS₄ (CZTS) films has been investigated. The undoped and bismuth doped CZTS films (0, 0.5, 1, 1.5 and 2 mol%) were deposited on glass substrates by solution based method. The XRD result shows a significant improvement in the crystallinity of the films with increase in bismuth concentration. The Raman spectra of the films show the dominant peak at 334 cm^–1 corresponding to A₁ vibrational mode of CZTS kesterite phase. The FESEM micrographs of the films show an enhancement in the grain size and densification with the addition of bismuth ion concentration. The optical bandgap of the films was found to vary (1.59–1.40 eV) with the doping of bismuth ions. The I –V characteristics indicate twofold increment in the photoconductivity for the bismuth doped CZTS films under 100 mW/cm² illumination suggesting their potential application in photovoltaic devices. (© 2016 WILEY‐VCH Verlag GmbH &Co. KGaA, Weinheim)     

微晶硅薄膜带隙态及微结构的研究

研究了氢化微晶硅薄膜费米能级以上的带隙态密度分布与薄膜微结构关系.采用拉曼谱和红外谱表征不同H稀释比制备的微晶硅薄膜的微结构.薄膜带隙态密度分布由调制光电流的相移分析技术测得.采用三相模型（非晶相、晶相和界面相）分析了薄膜带隙态密度与薄膜微结构的关系.结果表明,材料的带隙态密度随着界面相的增加而增加,当界面体积分数达到最大时,薄膜的带隙态密度也最大,即材料的带隙态密度与界面体积分数正相关. 关键词： 带隙态 界面相 微晶硅 调制光电流     

Optical properties and adhesion of air oxidized vacuum evaporated bismuth thin films

Highly adhesive bismuth oxide thin films on glass have been prepared by air oxidation of vacuum evaporated bismuth thin films at various temperatures. The transmittance, optical band gap, refractive index and adhesion show temperature and oxidation time effects. The films show a direct band gap between 2 and 2.5 eV. The refractive indices are in the range 1.854-1.991. The transmittances of the bismuth oxide films are quite high in a large wavelength range. These bismuth oxide films can have potential use in optical waveguides.     

Fabrication of cuprous and cupric oxide thin films by heat treatment

Cuprous oxide (Cu₂O) and cupric oxide (CuO) thin films were prepared by thermal oxidation of copper films coated on indium tin oxide (ITO) glass and non-alkaline glass substrates. The formation of Cu₂O and CuO was controlled by varying oxidation conditions such as, oxygen partial pressure, heat treatment temperature, and oxidation time. The microstructure, crystal direction, and optical properties of copper oxide films were measured with X-ray diffraction, atomic force microscopy, and optical spectroscopy. The results indicated that the phase-pure Cu₂O and CuO films were produced in the oxidation process. Optical transmittance and reflectance spectra of Cu₂O and CuO clearly exhibited distinct characteristics related to their phases. The electrical properties indicated that these films formed ohmic contacts with Cu and ITO electrode materials. Multilayers of Cu₂O/CuO were fabricated by choosing the oxidation sequence. The experimental results in this paper suggest that the thermal oxidation method can be employed to fabricate device quality Cu₂O and CuO films that are up to 200–300 nm thick.     

The resistivity of thin gold films

Results are obtained on the D.C. electrical resistivity of evaporated gold films on KBr substrates as a function of thickness and temperature. These show that the conduction electrons are not specularly reflected at the sample surface but nevertheless the temperature dependent part of the resistivity is independent of sample thickness. Comparison of the results with Fuchs-Sondheimer theory for the effects of sample thickness upon the resistivity yield a maximum specularity of approximately 0.64 for <100> films on KBr.     

薄膜中异常晶粒生长理论及能量各向异性分析

针对柱状晶薄膜，建立了异常晶粒生长理论模型.指出薄膜中的晶粒生长，除像传统的整体材料中的晶粒生长一样考虑晶界能外，还应当考虑表面能、界面能和应变能.对能量的各向异性进行了回顾性分析.从表面能的最小化考虑，面心立方和体心立方薄膜的择优取向或织构应分别为（111）和（110）；而从应变能的最小化考虑，面心立方和体心立方薄膜的择优取向或织构应分别为（110）和（100）. 关键词： 薄膜 异常晶粒生长 模型 织构     

Luminescence centers in thin films of yttrium oxide and yttrium-aluminum garnet activated with bismuth

Luminescence spectra and photoluminescence excitation spectra of Y₂O₃:Bi and Y₃Al₅O₁₂:Bi thin films were investigated. Luminescence was stimulated by the emission from two types of centers that were associated with the substitution of Bi³⁺ for Y³⁺ in sites of the crystal lattice of Y₂O₃ (Y₃Al₅O₁₂) with point symmetries C₂ and C_3i (D₂ and C_3i). The emission of Bi³⁺ in the site with point symmetry C_3i causes blue luminescence in both Y₂O₃:Bi and Y₃Al₅O₁₂:Bi films with maxima at 3.03 eV and 3.15 eV, respectively, that is related to the ³P₁-¹S₀ transition. The emission of Bi³⁺ in the site with point symmetry C₂ gives green luminescence in Y₂O₃:Bi with the maximum at 2.40 eV that is also related to the ³P₁-¹S₀ transition. The emission of Bi³⁺ in the site with point symmetry D₂ leads to ultraviolet luminescence in Y₃Al₅O₁₂:Bi with the maximum at 3.75 eV that corresponds to the ³P₁-¹S₀ transition. The red luminescence band with the maximum at 1.85 eV in Y₂O₃:Bi is due to the presence of structural defects. __________ Translated from Zhurnal Prikladnoi Spektroskopii, Vol. 75, No. 2, pp. 202–207, March–April, 2008.     

Photoinduced effect in Ga-Ge-S based thin films

Glassy films of Ga₁₀Ge₂₅S₆₅ with 4 μm thickness were deposited on quartz substrates by electron beam evaporation. Photoexpansion (PE) (photoinduced increase in volume) and photobleaching (PB) (blue shift of the bandgap) effects have been examined. The exposed areas have been analyzed using perfilometer and an expansion of 1.7 μm (ΔV/V ≈ 30%) is observed for composition Ga₁₀Ge₂₅S₆₅ exposed during 180 min and 3 mW/cm² power density. The optical absorption edge measured for the film Ge₂₅Ga₁₀S₆₅ above and below the bandgap show that the blue shift of the gap by below bandgap photon illumination is considerable higher (ΔE_g = 440 meV) than ΔE_g induced by above bandgap illumination (ΔE_g = 190 meV). The distribution of the refraction index profile showed a negative change of the refraction index in the irradiated samples (Δn = −0.6). The morphology was examined using a scanning electron microscopy (SEM). The chemical compositions measured using an energy dispersive analyzer (EDX) indicate an increase of the oxygen atoms into the irradiated area. Using a Lloyd's mirror setup for continuous wave holography it was possible to record holographic gratings using the photoinduced effects that occur in them. Diffraction efficiency up to 25% was achieved for the recorded gratings and atomic force microscopy images are presented.     

The effect of codeposited nitrogen on the amorphous-polycrystalline resistivity transformation temperature of thin iron films

Results are presented for the dependence of the amorphous-polycrystalline transformation temperature, T_t, on the concentration of codeposited gaseous nitrogen in thin iron films. These are compared with the effect of other impurities on T_t for the case of amorphous iron films. It is found that there is an approximate logarithmic dependence of T_t on impurity concentration.