氢化非晶硅薄膜晶体管的低频噪声特性

针对氢化非晶硅薄膜晶体管(hydrogenated amorphous silicon thin film transistor,a-Si:H TFT)的低频噪声特性展开实验研究.由测量结果可知,a-Si:H TFT的低频噪声特性遵循1/f~γ(f为频率,γ≈0.92)的变化规律,主要受迁移率随机涨落效应的影响.基于与迁移率涨落相关的载流子数随机涨落模型(?N-?μ模型),在考虑源漏接触电阻、局域态俘获及释放载流子效应等情况时,对器件低频噪声特性随沟道电流的变化进行分析与拟合.基于a-Si:H TFT的亚阈区电流-电压特性提取器件表面能带弯曲量与栅源电压之间的关系,通过沟道电流噪声功率谱密度提取a-Si:H TFT有源层内局域态密度及其分布.实验结果表明:局域态在禁带内随能量呈e指数变化,两种缺陷态在导带底密度分别约为6.31×10~(18)和1.26×10~(18)cm~(-3)·eV~(-1),特征温度分别约为192和290 K,这符合非晶硅层内带尾态密度及其分布特征.最后提取器件的平均Hooge因子,为评价非晶硅材料及其稳定性提供参考.     

部分耗尽结构绝缘体上硅器件的低频噪声特性

针对部分耗尽结构绝缘体上硅(silicon-on-insulator, SOI)器件低频噪声特性展开实验与理论研究. 实验结果表明, 器件低频噪声主要来源于SiO₂-Si界面附近缺陷态对载流子的俘获与释放过程; 基于此理论可提取前栅和背栅氧化层界面附近缺陷态密度分别为8×10¹⁷ eV^-1·cm^-3和2.76×10¹⁷ eV^-1·cm^-3. 基于电荷隧穿机理, 在考虑隧穿削弱因子、隧穿距离与时间常数之间关系的基础上, 提取了前、背栅氧化层内缺陷态密度随空间的分布情况. 此外, SOI器件沟道电流归一化噪声功率谱密度随沟道长度的增加而线性减小, 这表明器件低频噪声主要来源于沟道的闪烁噪声. 最后, 基于电荷耦合效应, 分析了背栅电压对前栅阈值电压、沟道电流以及沟道电流噪声功率谱密度的影响.     

铟锌氧化物薄膜晶体管局域态分布的提取方法

本文针对铟锌氧化物薄膜晶体管(IZO TFT)的低频噪声特性与变频电容-电压特性展开试验研究,基于上述特性对有源层内局域态密度及其在禁带中的分布进行参数提取.首先,基于IZO TFT的亚阈区I-V特性提取器件表面势随栅源电压的变化关系.基于载流子数随机涨落模型,在考虑有源层内缺陷态俘获/释放载流子效应基础上,通过γ因子提取深能态陷阱的特征温度;基于沟道电流噪声功率谱密度及平带电压噪声功率谱密度的测量,提取IZO TFT有源层内局域态密度及其分布.试验结果表明,带尾态缺陷在禁带内随能量呈e指数变化趋势,其导带底密度N1TA约为3.42×10~(20)cm~(-3)·eV-,特征温度TTA约为135 K.随后,将C-V特性与线性区I-V特性相结合,对栅端寄生电阻、漏端寄生电阻、源端寄生电阻进行提取与分离.在考虑有源层内局域态所俘获电荷与自由载流子的情况下,基于变频C-V特性对IZO TFT有源层内局域态分布进行参数提取.试验结果表明,深能态与带尾态在禁带内随能量均呈e指数变化趋势,深能态在导带底密度NDA约为5.4×10~(15)cm~(-3)·eV~(-1),特征温度TDA约为711 K,而带尾态在导带底密度NTA约为1.99×10~(20)cm~(-3)·eV~(-1),特征温度TTA约为183 K.最后,对以上两种局域态提取方法进行对比与分析.     

发光二极管可靠性的噪声表征

通过对发光二极管内部结构的研究，发现N_t(界面态陷阱密度)和扩散电流比率 是影响发光二极管性能的重要因素，并与器件可靠性有密切关系.器件内部存在的多种噪声 中，低频1/f噪声可表征N_t和扩散电流比率.在深入研究发光二极管工作原理及1 /f噪声载流子数涨落理论和迁移率涨落理论的基础上，建立了发光二极管的电性能模型及1/ f噪声模型.在输入电流宽范围变化的条件下测量了器件的电学噪声，实验结果与理论模型符 合良好.通过对其测量结果分析，深入研究了噪声和发光二极管性能与可靠性的关系，证明 了噪声幅值越大，电流指数越接近于2，器件可靠性越差，失效率则显著增大. 关键词： 1/f噪声 发光二极管 陷阱 光功率     

宽范围偏置电流下的GaAlAs红外发光二极管1/f噪声特性

在宽范围偏置条件下,测量了GaAlAs红外发光二极管(IRLED)的低频噪声,发现1/f噪声幅值与偏置电流的γ次方成正比,在小电流区,γ≈1,在大电流区γ≈2.基于载流子数涨落和迁移率涨落机制建立了一个GaAlAs IRLED 1/f噪声模型,该模型的分析表明,低电流区GaAlAs IRLED的1/f噪声源于体陷阱对载流子俘获和发射导致的扩散电流涨落,高电流区的1/f噪声源于结空间电荷区附近氧化层陷阱对该处表面势的调制而引起载流子表面复合速率的涨落.该研究结果为1/f噪声表征GaAlAs IRLED的可靠性提供了实验基础与理论依据.     

短波碲镉汞光伏器件的低频噪声研究

对所研制的短波光伏碲镉汞器件进行了变温电流-电压特性和低频噪声研究，测试温度范围255—293K.实验结果表明随着温度的下降，器件的优值因子R₀A从45×10³Ωcm²增加到7×10⁴Ωcm².器件在低频区的主要噪 声成分是1/f噪声和产生-复合噪声，在高频区主要是散粒噪声.在测试的偏压内，器件的1/f噪声功率谱密度与流过器件的电流的平方成正比，器件的Hooge系数为3×10^-4—7×10^-4.从噪声 功率谱密度曲线分析中得到产生-复合噪声的特征时间常数τ，通过τ的温度特性得到了器件的深能级. 关键词： 碲镉汞 优值因子 低频噪声 深能级     

N/P沟道MOSFET1/f噪声的统一模型

对n／p两种沟道类型、不同沟道尺寸MOSFET的1／f噪声特性进行了实验和理论研究.实验结 果表明，虽然nMOSFET的1／f噪声幅值比pMOSFET大一个数量级，但是其噪声幅值均表现出和 有效栅压的平方成反比、和漏压的平方成正比、和沟道面积成反比的规律.基于该实验结果 ，认为MOSFET的1/f噪声产生机理为位于半导体_氧化物界面附近几个纳米范围内的氧化层陷 阱通过俘获和发射过程与沟道交换载流子，在引起载流子数涨落的同时也通过库仑散射导致 沟道载流子迁移率的涨落.在这两种涨落机理的基础上，引入了氧化层陷阱的分布特征及其 与沟道交换载流子的隧穿和热激活两种方式，建立了MOSFET l／f噪声的统一模型.实验结果 和本文模型符合良好. 关键词： 1/f噪声 MOSFET 氧化层陷阱 涨落     

金属氧化物半导体场效应管热载流子退化的1/fγ噪声相关性研究

研究了金属氧化物半导体(MOS)器件在高、中、低三种栅压应力下的热载流子退化效应及其1/fγ噪声特性.基于Si/SiO2界面缺陷氧化层陷阱和界面陷阱的形成理论,结合MOS器件1/f噪声产生机制,并用双声子发射模型模拟了栅氧化层缺陷波函数与器件沟道自由载流子波函数及其相互作用产生能级跃迁、交换载流子的具体过程.建立了热载流子效应、材料缺陷与电参量、噪声之间的统一物理模型.还提出了用噪声参数Sfγ表征高、中、低三种栅应力下金属氧化物半导体场效应管抗热载流子损伤能力的方法.根据热载流子对噪声影响的物理机制设计了实验并验证这个模型.实验结果与模型符合良好.     

基于辐照前1/f噪声的金属-氧化物-半导体场效应晶体管辐照退化模型

基于金属-氧化物-半导体场效应晶体管(MOSFET)噪声的载流子数涨落和迁移率涨落理论,建立了MOSFET辐照前1/f噪声参量与辐照后分别由氧化层陷阱和界面陷阱诱使阈值电压漂移之间的定量数学模型,并通过实验予以验证.研究结果表明,辐照诱生的氧化层陷阱通过俘获和发射过程与沟道交换载流子,在引起载流子数涨落的同时也通过库仑散射导致沟道迁移率的涨落,因此辐照前的1/f噪声幅值正比于辐照诱生的氧化层陷阱数.利用该模型对MOSFET辐照前1/f噪声与辐照退化的相关性从理论上 关键词： f噪声')" href="#">1/f噪声 辐照 金属-氧化物-半导体场效应晶体管 陷阱     

基于辐照前1/f噪声的金属-氧化物-半导体场效应晶体管辐照退化模型

基于金属-氧化物-半导体场效应晶体管(MOSFET)噪声的载流子数涨落和迁移率涨落理论,建立了MOSFET辐照前1/f噪声参量与辐照后分别由氧化层陷阱和界面陷阱诱使阈值电压漂移之间的定量数学模型,并通过实验予以验证.研究结果表明,辐照诱生的氧化层陷阱通过俘获和发射过程与沟道交换载流子,在引起载流子数涨落的同时也通过库仑散射导致沟道迁移率的涨落,因此辐照前的1/f噪声幅值正比于辐照诱生的氧化层陷阱数.利用该模型对MOSFET辐照前1/f噪声与辐照退化的相关性从理论上进行了解释,同时也为MOSFET抗辐照能力预测提供理论依据.     

Dielectric and piezoelectric properties of(110) oriented Pb(Zr_(1-x)Ti_x)O_3 thin films

A phenomenological Landau–Devonshire theory is developed to investigate the ferroelectric, dielectric, and piezoelectric properties of(110) oriented Pb(Zr_(1-x)Ti_x)O_3(x = 0.4, 0.5, 0.6, and 0.7) thin films. At room temperature, the tetragonal a_1 phase, the orthorhombic a_2c phase, the triclinic γ_1 phase, and the triclinic γ_2 phase are stable. The appearance of the negative polarization component P_2 in the a_2c phase and the γ_1 phase is attributed to the nonlinear coupling terms in the thermodynamic potential. The γ phase of the Pb(Zr_(1-x)Ti_x)O_3 thin films has better dielectric and piezoelectric properties than the a_2c phase and the a_1 phase. The largest dielectric and piezoelectric coefficients are obtained in the Pb(Zr_(0.5)Ti_(0.5))O_3 thin film. The piezoelectric coefficient of 110–150 pm/V is obtained in the(110) oriented Pb(Zr_(0.5)Ti_(0.5))O_3 thin film, and the Pb(Zr_(0.3)Ti_(0.7))O_3 thin film has the remnant polarization and relative dielectric constant of 50 μC/cm~2 and 100, respectively,which are in agreement with the experimental measurements reported in the literature.     

非晶硅太阳电池宽光谱陷光结构的优化设计

陷光是改善薄膜太阳电池光吸收进而提高其效率的关键技术之一. 以非晶硅（α-Si）薄膜太阳电池为例,设计了一种新的复合陷光结构：在Ag背电极与硅薄膜之间制备一维Ag纳米光栅,并通过保形生长在电池前表面沉积织构的减反膜. 采用有限元数值模拟方法,研究了该复合陷光结构对电池光吸收的影响,并对Ag纳米光栅的结构参数进行了优化. 模拟结果表明：该复合陷光结构可在宽光谱范围内较大地提高太阳电池的光吸收;当Ag纳米光栅的周期P为600 nm,高度H为90 nm,宽度W为180 nm时,在AM1.5光谱垂直入射条件下α-Si薄膜电池在300–800 nm波长范围内总的光吸收较无陷光结构的参考电池提高达103%,其中在650–750 nm长波范围内的光子吸收率提高达300%以上. 结合电场强度分布,对电池在各个波段光吸收提高的物理机制进行了分析. 另外,该复合陷光结构的引入,还较大地改善了非晶硅电池对太阳光入射角度的敏感性. 关键词： 非晶硅太阳电池 陷光 银纳米光栅 数值模拟     

Field-induced generation-recombination noise in (100) n-channel Si-MOSFET's at T = 4.2 K: II. Experiments

The spectral noise intensity of the drain current of an n-channel (100) Si-MOSFET in strong inversion was measured as a function of drain current and gate voltage at T = 4.2 K. In addition to flicker noise and white noise it was possible to distinguish a Lorentzian, which was due to generation-recombination noise. Since, at T = 4.2 K, the 2D-electron gas in the MOSFET in strong inversion is degenerate this generation-recombination noise must be caused by traps in the conduction band. The measured noise relaxation time was found to depend on drain current.Our results can be interpreted in terms of a generation-recombination process in which the generation is partly field-induced. Agreement between theory and experiment is within the experimental error, both for the way in which the inverse noise relaxation time depends on drain current and the way in which the ratio of the low frequency plateau of the spectral noise intensity to the noise relaxation time depends on the product of drain current and drain voltage. Measurements of the ratio of the low-frequency plateau of the spectral noise intensity to the relaxation time versus gate voltage at T = 4.2 K we used to construct an energy spectrum of the density of traps in the conduction band. A maximum is observed at about 14meV above the bottom of the conduction band.     

金属Fe与间隙H原子相互作用的密度泛函研究

采用基于密度泛函理论的第一性原理方法, 研究了不同摩尔比下H在α-Fe和γ-Fe晶格中的间隙占位情况, 计算了稳态晶体的总能量、结合能、溶解热、电子态密度、电荷差分密度和电荷布居, 分析了间隙H原子和Fe晶格之间的相互作用, 讨论了H溶解对α-Fe和γ -Fe晶体电子结构的影响. 结果表明: H溶解引起α-Fe和γ-Fe晶体点阵晶格畸变, 体积膨胀率随着溶氢量的增加而增加. 从能量角度分析发现, H优先占据α-Fe的四面体间隙位, 而在γ -Fe中优先 占据八面体间隙位. 态密度、电荷差分密度以及电荷布居分析发现, 间隙H原子与Fe晶格的相互作用仅由H的1s轨道电子和Fe的4s轨道电子所贡献, 二者作用力相对较弱, 这是造成H在Fe晶格中固溶度较低的主要原因之一. 关键词： 金属Fe 间隙H原子 第一性原理 溶解热     

Structural,elastic, electronic,and thermodynamic properties of MgAgSb investigated by density functional theory

The structural, elastic, electronic, and thermodynamic properties of thermoelectric material Mg Ag Sb in γ, β, α phases are studied with first-principles calculations based on density functional theory. The optimized lattice constants accord well with the experimental data. According to the calculated total energy of the three phases, the phase transition order is determined from α to γ phase with cooling, which is in agreement with the experimental result. The physical properties such as elastic constants, bulk modulus, shear modulus, Young's modulus, Poisson's ratio, and anisotropy factor are also discussed and analyzed, which indicates that the three structures are mechanically stable and each has a ductile feature. The Debye temperature is deduced from the elastic properties. The total density of states(TDOS) and partial density of states(PDOS) of the three phases are investigated. The TDOS results show that the γ phase is most stable with a pseudogap near the Fermi level, and the PDOS analysis indicates that the conduction band of the three phases is composed mostly of Mg-3s,Ag-4d, and Sb-5p. In addition, the changes of the free energy, entropy, specific heat, thermal expansion of γ-MgAgSb with temperature are obtained successfully. The obtained results above are important parameters for further experimental and theoretical tuning of doped MgAgSb as a thermoelectric material at high temperature.     

Effects of pressure on structural,electronic, and mechanical properties of α,β,and γ uranium

The first-principles methods have been employed to calculate the structural, electronic, and mechanical properties of the α, β, and γ phases of uranium under pressure up to 100 GPa. The electronic structure has been viewed in forms of density of states and band structure. The mechanical stability of metal U in the α, β, and γ phases have been examined.The independent elastic constants, polycrystalline elastic moduli, as well as Poisson's ratio have been obtained. Upon compression, the elastic constants, elastic moduli, elastic wave velocities, and Debye temperature of α phase are enhanced pronouncedly. The value of B/G illustrates that α and γ phases are brittle in ground state.     

LaBaMnO薄膜的铁磁共振

用电子自旋共振实验研究La_0.65Ba_0.35MnO₃(LBMO)薄膜的磁性,从磁性膜的各向异性铁磁共振谱得到不同角度θ_h时的共振磁场B_r,求出样品的等效磁场B_eff及旅磁比γ,并通过样品的饱和磁化强度M_s,求出各向异性常数K.     

High‐performance In–Zn–O thin‐film transistors with a soluble processed ZrO2 gate insulator

Spin‐coated zirconium oxide films were used as a gate dielectric for low‐voltage, high performance indium zinc oxide (IZO) thin‐film transistors (TFTs). The ZrO₂ films annealed at 400 °C showed a low gate leakage current density of 2 × 10^–8 A/cm² at an electric field of 2 MV/cm. This was attributed to the low impurity content and high crystalline quality. Therefore, the IZO TFTs with a soluble ZrO₂ gate insulator exhibited a high field effect mobility of 23.4 cm²/V s, excellent subthreshold gate swing of 70 mV/decade and a reasonable I_on/off ratio of ～10⁶. These TFTs operated at low voltages (～3.0 V) and showed high drain current drive capability, enabling oxide TFTs with a soluble processed high‐k dielectric for use in backplane electronics for low‐power mobile display applications. (© 2013 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)