Coexistence of negatively and positively buckled isomers on n+-doped Si(111) − 2 × 1

A long-standing puzzle regarding the Si(111) ? 2 × 1 surface has been solved. The surface energy gap previously determined by photoemission on heavily n-doped crystals was not compatible with a strongly bound exciton known from other considerations to exist. New low-temperature angle-resolved photoemission and scanning tunneling microscopy data, together with theory, unambiguously reveal that isomers with opposite bucklings and different energy gaps coexist on such surfaces. The subtle energetics between the isomers, dependent on doping, leads to a reconciliation of all previous results.     

Electronic stabilization of the Si(111)5 × 2-Au surface: Pb and Si adatoms

Using scanning tunneling microscopy/spectroscopy (STM/STS), angle resolved photoemission spectroscopy (ARPES) and first-principles density functional theory (DFT), we study the structural and the electronic properties of the Si(111)5 × 2-Au surface decorated with Pb adatoms. The STM topography data reveal that Pb adatoms form a similar superstructure to that observed in the case of Si adatoms on a bare Si(111)5 × 2-Au surface. The DFT calculations show that preferential adsorption sites of Pb atoms are located near the double Au chain. Bias dependent STM topography and spectroscopy together with the DFT calculations allow us to distinguish Pb from Si adatoms. Both the Si and Pb adatoms modify the electronic properties in the same way, which confirms the electronic origin of the stabilization of the surface.     

Thiophene on Si(111)2×1: Synchrotron radiation study of a desulfurization process

The adsorption and desulfurization of thiophene on cleaved silicon was studied at different temperatures. For substrate temperatures of 60–85 K, we found the co-existence of two different adsorption states at low exposures, which yield to a condensed thiophene multilayer at high exposures. For room-temperature substrates, we observed a desulfurization process. The process is probably followed by further fragmentation, and the fragmentation path depends on the substrate preparation process.     

Order-disorder transition on Si(001): c(4 × 2) to (2 × 1)

A phase transition between c(4 × 2) and (2 × 1) structures on the clean Si(001) surface has been observed at about 200 K by low energy electron diffraction. From the temperature dependence of the width and intensity of the diffraction spots this transition is concluded to be a second order order-disorder transition. The transition proceeds by a single stage, which is in strong contrast with the case of Ge(001) for which a two-stage transition has been reported.     

Si(111)2×1表面重构及1×1畴影响的LEED计算

长期以来Si(111)2×1重构表面的原子结构是个没有完全解决的问题。通过低能电子衍射(LEED)的全动力学的仔细计算,我们分析了以前提出的各种模型,肯定了皱曲的π-建链模型。进一步调整了表面六层原子的位置,使理论计算与实验结果符合得更好。我们最佳的2×1结构的最主要特点是表面链的倾斜达0.44?。最后,我们的计算指出在Si(111)2×1表面中1×1畴的存在对结果产生重大的影响。 关键词：     

Adsorption of Perylene on Si(111)(7×7)

We investigate the adsorption of organic molecular semiconductor perylene on(7 × 7) reconstructed Si(111)surface by ultraviolet photoemission spectroscopy.It is observed that seven features that derive from the organic material are located at 0.71,2.24,4.0,5.9,7.46,8.65 and 9.95 eV in binding energy.The theoretical calculation results reveal the most stable adsorption geometry of organic molecule perylene on Si(111)(7 × 7) substrates is at the beginning of deposition.     

Dangling-bond logic gates on a Si(100)-(2 × 1)-H surface

Atomic-scale Boolean logic gates (LGs) with two inputs and one output (i.e. OR, NOR, AND, NAND) were designed on a Si(100)-(2 × 1)-H surface and connected to the macroscopic scale by metallic nano-pads physisorbed on the Si(100)-(2 × 1)-H surface. The logic inputs are provided by saturating and unsaturating two surface Si dangling bonds, which can, for example, be achieved by adding and extracting two hydrogen atoms per input. Quantum circuit design rules together with semi-empirical elastic-scattering quantum chemistry transport calculations were used to determine the output current intensity of the proposed switches and LGs when they are interconnected to the metallic nano-pads by surface atomic-scale wires. Our calculations demonstrate that the proposed devices can reach ON/OFF ratios of up to 2000 for a running current in the 10 μA range.     

Low energy laser photoelectron study of defect states on cleaved Si(111)2 × 1 surfaces

Step-associated surface defect states on good cleaved surfaces of Si(111)2 × 1 have been sensitively observed without a background of valence-band or intrinsic surface-state photoelectrons, by exciting with tunable laser photons below the valence photoemission threshold.     

Silver schottky contacts on Si(111)∶ H-(1×1) surfaces prepared by wet-chemical etching

Schottky contacts were prepared by evaporation of silver on H-terminated Si(111) surfaces at room temperature. The Si(111)H-(1×1) surfaces were obtained by wet-chemical etching in buffered hydrofluoric acid. The zero-bias barrier heights and the ideality factors, which were determined fromI/V characteristics measured with these contacts, were found to be linearly correlated. This plot gives a zero-bias barrier height of 0.74 eV for an ideality factor of 1.01 which is obtained for image-force lowering of the barrier only. The barrier heights observed here equal the one found with Ag/Si(111)-(1×1) contacts. They were prepared by Ag evaporation onto clean Si(111)-(7×7) surfaces at room temperature and subsequent heat treatments. The present result is explained by the desorption of the hydrogen adatoms during the deposition of Ag and the existence of a (1×1)-structure at the Ag/Si(111) interface.     

Fluorine etching on the Si(111)-7×7 surfaces using fluorinated fullerene

Fluorine etching on the Si(1 1 1)-7×7 surfaces using fluorinated fullerene molecules as a fluorine source has been investigated. At room temperature, adsorbed fluorinated fullerene molecules reacted with the Si(1 1 1)-7×7 surface to create a localized distribution of fluorine on the surface. Nanoscale etch pits were created by annealing at 300 °C, due to the adsorption of the fluorine localized around the C₆₀F_x molecules. Annealing at 400 °C resulted in the delocalized fluorine distribution on the surface and healing of the etch pits, due to the enhancement of the diffusion of both the fluorine and silicon atoms. Subsequent annealing at 500 °C led to desorption of SiF₂ reactants formed on the surface. The fluorine diffusion process was found to be an elemental process in the etching because the diffusion of adsorbed fluorines is a key for the formation of the SiF₂ species and their subsequent desorption.     

Diffusion of Au atoms and (5×2) phase formation on the Si(111) (7×7) surface

In this article we investigate the complex 1D mesoscopic model of adatom diffusion and the evolution of an ordered phase on the substrate surface. The analysis of the theoretical model is compared with the experimental results of the spreading of Au adatoms on Si(111)-(7×7) surface. The steady state solutions and their stability conditions are determined within the concept of the traveling-wave solution. It is shown that the formation of the ordered phase (5×2) and the difference in the diffusion of Au on (7×7) and on (5×2) structure results in a sharp edge of diffusion front which corresponds to the coverage of a saturated (5×2) phase. This edge moves linearly in time and α can be determined by experiment. The system of model equations enables the damped waves solution or temporary evolution of two steps.     

Atomic and electronic properties of tert-butanol on the Si(001)-(2×1) surface

The atomic and electronic properties of the adsorption of tert-butanol [(CH₃)₃OH] molecule on the Si(001)-(2×1) surface have been studied by using the ab-initio density functional theory (DFT) based on pseudopotential approach. We have found that tert-butanol bonded the Si(001) surface by oxygen atom, cleaving a O–H bond and producing a Si-H bond and tert-butoxy surface species. We have also investigated the influence of chemisorption of tert-butanol on the electronic structure of the clean Si(001)-(2×1) surface. Two occupied surface states situated entirely below the bulk valence band maximum have been identified, which means that the clean Si(001)-(2×1)surface was passivated by the chemisorption of tert-butanol. In order to explain the nature of the surface components we have also plotted the total and partial charge densities at the [`(K)]\bar{K} point of the surface Brillouin zone (SBZ).     

Core-level photoemission spectra from Cs monolayers on Si(1 1 1)2 × 1

Band shape in the Cs 4d core level of cesium atom monolayers adsorbed on Si(1 1 1)2 × 1 has been studied by photoemission spectroscopy using synchrotron radiation. Asymmetry appeared on the low kinetic energy side at high coverages of cesium atoms. This is caused by the energy loss due to the overlayer plasmon in the cesium atom monolayer of photoemitted Cs 4d electrons.     

Effect of NH3 adsorption on the atomic structure of Si(111) √3 × √3 - Al and Si(111) √3 × √3 - Ag surfaces

The room temperature (RT) adsorption of ammonia (NH₃) on Si(111)√3 × √3-Al and Si(111)√3 × √3-Ag surfaces has been studied using LEED and AES. The transformation from Si(111)√3 × √3-Al surface structure to Si(111)1 × 1-(Al, H) upon NH₃ exposure has been found to be similar to the previously observed structural transformation induced by exposure in the atomic hydrogen. It has been demonstrated that the transformation is caused by hydrogen atoms which are generated by NH₃ dissociation on the Si(111)√3 × √3-Al surface. It has been estimated that about 0.1 ML of ammonia molecules is needed to complete the structural transformation. No interaction of NH₃ with the Si(111)√3 × √3-Ag surface has been found. The dissociation of NH₃ molecules is believed to be impossible on this surface     

Na/Si(111)3×1表面的NEXAFS研究

利用同步辐射光源测量Na2s二次电子部分产额谱得到Na诱导Si（111）3×1结构的近边Ｘ射线吸收精细结构（NEXAFS）谱，并用原子集团多重散射方法对几种可能的模型进行计算，与实验结果比较，认为Na/Si（111）3×1吸附结构与Mnch模型相一致．Na原子吸附在Si的顶位，Na—Si键长为0.3nm． 关键词：