超薄全局应变硅薄膜的应变弛豫研究

采用Ge浓缩法制备了高质量超薄绝缘体上锗硅(SiGe-on-insulator,SGOI)材料,然后在SGOI上通过超高真空化学气象沉积(UHVCVD)法外延了厚度为15 nm的超薄全局应变硅单晶薄膜,使用电子束光刻和反应离子刻蚀在样品上制备了一组纳米级尺寸不等的应变硅线条和应变硅岛,并利用TEM、SEM、Raman等分析手段表征样品.实验结果表明,本文制备的应变硅由于其直接衬底超薄SiGe层的低缺陷密度和应力牵制作用,纳米图形化的应变Si弛豫度远小于文献报道的无Ge应变硅或者具有Ge组分渐变层SiGe衬底的应变Si材料.     

绝缘体上全局应变硅晶圆的制备和表征

首先使用改良型Ge浓缩法制备了绝缘体上锗硅圆片,然后在超薄弛豫SiGe层上,利用超高真空化学气相沉积法外延了单晶硅薄膜,获得一系列不同厚度的6寸绝缘体上应变硅晶圆.结果表明应变硅薄膜完整、均匀、表面平整且晶体质量良好,获得样品中顶层硅最大应力值达2.22 GPa.应用临界厚度理论对样品厚度和应变值之间的关系进行了分析,发现本实验所得样品在超过临界厚度3倍之后会发生应变弛豫.     

硅锗合金Seebeck系数影响因素的研究

作为一种洁净能源,硅锗合金的热电转换性能的研究越来越受到人们的重视.本文重点研究了不同Ge浓度的硅锗合金以及Si、Ge单晶在300～1100K温度范围内,Seebeck系数随温度的变化.并对组分相同导电类型不同、晶向不同以及结晶状态不同的样品的Seebeck系数进行了比较.在研究温度区间,Seebeck系数的绝对值大小一般在200～600μV/K之间,随温度不同连续变化.通过对比发现SiGe合金的Seebeck系数大小不仅与Ge的浓度和温度有关,其他因素对其绝对值也有影响,其中晶向最为明显,表现出了明显的各向异性.此外,材料本身的电阻率除了作为一个热电参数影响最优值外,其大小还对Seebeck系数的绝对值有影响,即掺杂济浓度对Seebeck系数的影响.     

氢氦共同稀释对微晶硅锗薄膜结构特性的影响

采用射频等离子体增强化学气相沉积(RF-PECVD)技术,在200℃的衬底温度下,以SiH4和GeH4为反应气体,H2和He为稀释气体,制备微晶硅锗(μc-Si Gex∶H)薄膜.结合Raman,XRF,FTIR,AFM等测试,我们分析了不同流量He的掺入对高锗含量(Ge含量～40;)μc-Si1-x Gex∶H薄膜结构性能和光电特性的影响.结果表明,随着He稀释/H2稀释(CHe/H2=He/H2)的增加,薄膜的Ge含量基本保持不变,H含量减少,致密度提高,Ge悬挂键和微结构因子先减少后增大.CHe/H2=36;时,薄膜光电特性最好.     

非晶锗的低温晶化和光学特性研究

本文采用直流磁控溅射在(100)硅衬底上沉积了单层锗薄膜,分别用拉曼光谱和X射线衍射研究了薄膜的结晶性,通过对结晶性的研究发现,在衬底温度为200℃时溅射功率为150W时结晶性开始变好,功率增至250W的过程,锗薄膜的择优取向发生(220)向(331)的变化.这样在无金属掺杂的情况下得到了结晶性较好的样品.光致发光结果表明,非晶锗在可见光区有较强的发光现象,发光峰位中心分别在648.1nm和713.0nm.发光峰位不随晶粒尺寸变化而变化,但峰强对晶粒大小的依赖性很强,平均晶粒较大的锗薄膜在可见光区发光现象不显著.     

硅基上Si1-xGex合金的外延生长及性能研究

硅基上高质量的异质外延生长是实现高性能微电子器件的基础,本文通过低温分子束外延技术在Si衬底上实现了全组分的Si1-x Gex(0相似文献   

用于薄膜太阳能电池的非晶硅锗制备与性能研究

利用射频等离子体增强化学气相沉积工艺(RF-PECVD)制备非晶硅锗薄膜,研究氢稀释率和衬底温度对薄膜光电性能的影响.通过二者的优化制备出光学带隙1.5 eV、光敏性6×104的高质量非晶硅锗薄膜.在此基础上制备出效率为6.65;的非晶硅锗(a-SiGe∶H)单结太阳能电池.     

单晶硅衬底上Ge填埋层低温应力诱导重结晶制备多晶硅薄膜

本文采用电子束蒸发法,室温下在Si(400)的基片上生长含锗(Ge)填埋层的非晶硅薄膜,其结构为a-Si/Ge/Sisubstrate,并在真空中进行后续退火.采用Raman散射(Raman Scattering)、X射线衍射(X-ray Diffraction)、高分辨电子扫描显微镜(HRSEM)、光学显微镜和热重差热分析(DSC)等手段,研究退火后样品晶化特性和晶化机理.结果表明,室温下生长的含有250 nm Ge填埋层的生长态样品在400℃退火5h,薄膜基本全部实现晶化,并表现出明显的Si (111)择优取向.样品分别在400℃、500℃、600℃和700℃退火后薄膜的横向光学波的波峰均在519cm-1附近,半高宽大约为6.1 cm-1,且均在Si(111)方向高度择优生长.退火温度为600℃的样品对应的晶粒尺寸约为20 μm.然而,在相同的薄膜结构(a-Si/Ge/Si substrate)的前提下,当把生长温度提高到300℃时,温度高达到700℃退火时间5h后,薄膜依然是非晶硅状态.差热分析表明,室温生长的样品,在后续退火过程中伴随界面应力的释放,从而诱导非晶硅薄膜重结晶成多晶硅薄膜.     

离子束溅射制备Si/Ge多层膜及红外吸收性能研究

采用离子束溅射方法在Si衬底上制备Si/Ge多层膜.通过改变生长温度、溅射速率等因素得到一系列Si/Ge多层膜样品.通过X射线衍射、拉曼散射、原子力显微分析(AFM)等表征方法研究薄膜结构与生长条件的关系.在小束流(10mA)、室温条件下制备出界面清晰、周期完整的Si/Ge多层膜.通过红外吸收谱的测量发现薄膜样品具有较好的红外吸收性能.     

无机化合物Na2Ge2Se5多晶合成研究

硒锗钠(Na2Ge2Se5)是一种极具潜质新型红外非线性材料.但该化合物具有明显的制备难点.根据其制备特点,自行设计并搭建反应装置,高效、安全制备其前驱体Na2Se;然后将制备的Na2Se与Ge、Se按化学计量比称取,在单温区合成炉中合成Na2Ge2Se5多晶料.对制备的Na2Se、Na2Ge2Se5多晶进行XRD,SEM、EDS等分析测试表明产物为高纯单相Na2Se、Na2Ge2Se5多晶.     

Influence of Ge doping level on the EPR signal of Ge(1), Ge(2) and E'Ge defects in Ge-doped silica

We present an experimental investigation on the Ge doping level dependence of the Electron Paramagnetic Resonance (EPR) signal spectral features of the Ge(1), Ge(2) and E'Ge defects induced in Ge doped silica. We have studied samples produced by sol–gel or PCVD techniques and doped with different amounts of Ge up to 20% by weight. The samples were gamma or beta ray irradiated and successively they were thermally treated to isolate the EPR signals of the different point defects. The data show that the EPR line shapes of the Ge(1) and the Ge(2) centers are progressively modified for doping level higher than 1%, whereas the line shape of the E'Ge defect appears independent from the doping. Together with the EPR investigation, we have also recorded Raman spectra of the investigated samples. The Ge doping induces detectable modifications of Raman lines when the doping level is higher than 1% by weight. Basing on these observations, the structural modifications detected by Raman spectroscopy are tentatively considered the origin of the changes in the EPR features.     

石墨烯上远程外延Ge纳米柱

远程外延能够突破传统外延中晶格匹配、热匹配等限制,近年来得到了广泛的关注。Ⅲ-Ⅴ族和Ⅲ-氮化合物半导体已经成功在石墨烯上远程外延生长,但Ⅳ族半导体的远程外延很少被报道。本文首次借助于分子束外延技术在石墨烯上远程外延制备了半导体Ge纳米柱,研究了其生长特性及剥离转移。结果表明:远程外延生长的Ge纳米柱为[111]c晶向,集中分布在石墨烯的褶皱以及衬底Cu-Ni原子台阶处;随着生长温度的提高,Ge纳米柱的高度和密度逐渐下降,但直径差别不大,约为55~65 nm;此外,自组织生长的Ge纳米棒显示无应变的生长状态;引入少量Sn形成GeSn纳米柱,能够显著提升Ge纳米柱的面密度。同时,生长的Ge纳米柱可实现剥离,有望实现异质集成,应用于先进光电子器件等领域。     

Density of vapor deposited amorphous Ge films

The density of vapor-deposited amorphous Ge films (a-Ge) was determined by spectrophotometry combined with Rutherford backscattering spectroscopy. It was found to be 0.99±3% of the bulk value for crystalline Ge (c-Ge). This density is in agreement with the Lorentz-Lorenz law which, based upon the existing infrared data on the index of refraction of a-Ge, suggests that the density of a-Ge should be close (within 4%) to that of c-Ge.     

Electrical properties of glasses in the GeBiSbSe and GeBiS systems

Measurements of optical absorption, dc conductivity and thermopower were carried out on glasses of the types (GeSe_3.5)₈₈sbPin12?xBi_x. The main results are: 1) observation of n-type conduction in the Ge₂₀Bi_xS_80?x glasses containing high concentrations of Bi; 2) in the mixed doped glasses, transition from p-type for a Sb-doped glass (x = 0) to n-type on addition of Bi at nearly equal concentrations of Sb and Bi. The possible types of bonding of the Bi atoms in the structure and their influence on the electrical behaviour are examined.     

Structural relaxation and crystallization of amorphous Ge films

The irreversible changes in conductivity occurring in evaporated amorphous Ge films just after deposition and during annealing are investigated in detail. Their analysis leads to a model for the structural relaxation of real amorphous networks. Electron diffraction and electron microscope experiments provide additional information on annealing effects and crystallization processes.     

纳米Ge薄膜的制备及光致发光特性研究

采用直流磁控溅射技术在不同生长温度制备了一系列的Ge薄膜.应用拉曼散射、X射线衍射、光致发光等技术表征薄膜的结构.结果表明:Ge薄膜的结晶温度约为380℃,并且随着生长温度的升高,Ge的结晶性变好,晶粒长大;对不同尺寸Ge薄膜的光致发光研究表明:随着纳米Ge晶粒尺寸的减小,光致发光峰的相对强度逐渐增强,且发光峰位发生蓝移.用有效质量近似模型讨论了量子尺寸效应和介电限域效应对纳米Ge颗粒发光特性的影响.     

Influence of rare-earth impurities on the Ge and Ga local structure in the Ca3Ga2Ge3O12 glass

The present contribution presents X-ray absorption fine structure (XAFS) measurements and analysis of the Ge and Ga local structure in glass of Ca₃Ga₂Ge₃O₁₂ composition, doped with rare-earth metals (Ce, Eu, Ho, Er in the amount of 0.7 wt% and Nd in the amount of 1.0 wt%). The Ge and Ga ion neighborhoods in the considered glass samples have been compared with data obtained for undoped glass. The results have shown that introduction of rare-earth ions modifies the local structure around the Ga ions in the glass network, leaving the same occurrence ratio of the GaO₄ and GaO₆ structural units as in undoped Ca₃Ga₂Ge₃O₁₂ glass. At the same time, the GeO₂ subsystem remains completely unaffected by the presence of rare-earth dopants.