大面积表面波等离子体源微波功率吸收的数值模拟研究

建立了大面积矩形表面波等离子体(SWP)源全尺寸的三维模型,用数值模拟的方法研究了SWP源基于碰撞的功率吸收问题,给出了随等离子体参数变化的微波反射率曲线,分析了不同天线对微波功率沉积的影响,并讨论了微波功率吸收和表面波的定性关系. 结果发现,均匀放电的SWP源功率沉积本质是由表面波等离子体的性质决定的,等离子体密度太大或太小都不利于功率吸收. 在正常工作气压下,SWP源通过碰撞机理即可以实现微波功率的有效沉积,微波吸收率可达80%以上,与已有实验相符. 本研究同时发现,天线阵列激发的表面波模式越紧凑,强度越大,越有利于微波的吸收. 关键词： 时域有限差分法 等离子体表面波 功率吸收 狭缝天线     

气体压强及表面等离激元影响表面波等离子体电离发展过程的粒子模拟

基于表面等离激元 (SPP) 的表面波等离子体 (SWP) 源, 具有高密度、低温度及高产率等优异性能, 其应用在电子器件微纳加工、材料改性等领域. 但由于SPP激励SWP放电的电离过程难于用理论分析和实验测量描述, 因而SWP源均匀稳定产生的电离发展过程一直未研究清晰. 本文以SWP放电的数值模拟为研究手段, 采用等离子体与电磁波相互作用的粒子模拟 (PIC) 方法, 结合蒙特卡罗碰撞 (MCC) 方法处理碰撞效应的优势, 研究气体压强影响电离过程的电磁能量耦合机理. 模拟结果表明SWP的高效产生是SPP的局域增强电场致使, 气体压强能够改变波模共振转换的出现时刻而影响了SWP的电离发展过程. 本文的研究成果展示了SPP维持SWP放电的电离过程, 可为下一代米级SWP源的参数优化提供设计建议. 关键词： 表面波等离子体 表面等离激元 粒子模拟 电离过程     

Modeling of argon discharge characteristics of planar-type surface wave plasmas in an electron fluid model

The planar-type surface wave plasma (SWP) device permits the generation of high-density and uniform processing plasmas via 2.45-GHz microwave power without the application of an external magnetic field. In the present study, the discharge characteristics in the SWP device were analyzed using a two-dimensional numerical simulation code, and the results were compared with experimental observations. The simulation code is based on the finite-difference time-domain (FDTD) method for the microwave field and on the electron fluid model for the argon discharge plasma. Experimental measurements were performed, and they showed that the surface-wave discharge at a filling pressure of 10-100 mtorr has characteristic electron-density distributions that have a peak at approximately 2 cm from the surface. This characteristic of the electron density profiles, as well as the electron temperature profiles in the plasma, is reproduced by the simulation code, albeit with some discrepancies. In order to reduce the effects of these discrepancies, intentional changes in the electron heat conductivity were introduced, and the adiabatic assumption was found to result in a reasonable electron temperature profile. The effects of the alumina window thickness were also investigated in the simulation.     

负偏压离子鞘及气体压强影响表面波放电过程的粒子模拟

由于表面电磁波沿着介质-等离子体分界面传播,而很难通过对传统的表面波等离子体(SWP)源施加负偏压实现金属材料溅射,因此限制了SWP源的使用范围.近期,一种基于负偏压离子鞘导波的SWP源克服了这个问题,且其加热机理是表面等离激元(SPP)的局域增强电场激励气体放电产生.但是该SWP源放电过程的影响因素并未研究清晰,导致其最佳放电条件没有获得.本文采用粒子(PIC)和蒙特卡罗碰撞(MCC)相结合的模拟方法,探讨了负偏压离子鞘及气体压强影响SWP电离发展过程的放电机理.模拟结果表明,负偏压和气体压强的大小影响了离子鞘的厚度、SPP的激励和波模的时空转化,从而表现出不同的放电形貌.进一步分析确定,在负偏压200 V左右和气体压强40 Pa附近,该SWP源的放电效果最佳.     

表面波等离子体源的发展现状

对微波放电产生的平板型表面波等离子体源进行了系统介绍,分析了表面波等离子体的工作原理, 探讨了维持表面波等离子体放电的能量吸收机制,介绍了由单模谐振腔阵列、 亚波长衍射光栅及开槽天线阵列组成的新型波模转换器.表面波等离子体的产生机理、实现途径、 参数特性和数值仿真等方面的研究进展及其所取得的成果,有利于促进新型表面波等离子体源走向产业化应用, 并促使微电子产业的功效取得新的突破.     

闭式电感耦合等离子体特性对比实验研究和光谱分析

ICP反应室或ICP质谱仪不同,ICP在用于衰减微波时,其腔体采用全密封石英结构,同时缺少静电屏蔽、金属衬底和磁场约束等条件,研究其内部电子密度等参数的分布对于等离子体局部隐身技术具有重要意义。利用光谱分析法,对两种典型ICP源(螺旋型和盘香型)在密闭石英立方体腔内H模式下稳定放电的电子密度分布展开了对比试验研究。使用Ar离子谱中476.45 nm谱线相对光谱强度变化研究了不同型ICP源的E—H模式跳变和功率耦合效率,通过非H谱线(Ar)的Stark展宽法,诊断了两种源的天线垂直平面上的二维电子密度分布。实验发现ICP在H模下的电子密度分布受交变磁场产生的趋肤电流影响较大,趋肤深度随着放电功率的增大而减小,同时主等离子体区域体积缩小、电子密度增加,在天线的垂直面上,螺旋型源ICP电子密度呈中心轴对称型分布,盘香型源ICP呈双峰型分布。功率耦合效率受源天线形状及其容性耦合效应影响较大,光谱相对强度显示螺旋型源的功率耦合效率低于盘香型源。通过该实验方法,可以在石英立方腔体内得到最高电子密度范围为1.4×1017～2.5×1017 m-3的螺旋型ICP源和范围1.8×1017～3.0×1017 m-3的盘香型ICP源。     

电子回旋共振等离子体密度均匀性的数值研究

基于漂移扩散近似,在轴对称假设下,对电子回旋共振等离子体源腔室内的等离子体建立了二维流体模型.采用有限差分法对所建立的模型进行了自洽数值模拟,得到了等离子体密度均匀性随时间演化的数值结果.通过对数值结果的分析,研究了背景气体压强、微波功率和磁场线圈电流对等离子体密度均匀性的影响.研究表明,在电离初期,电子密度的均匀性好于离子密度的均匀性.在电离后期,离子密度的均匀性好于电子密度的均匀性.随着背景气体压强的增大,电子密度和离子密度的均匀性都在增加,且离子密度的均匀性增加的更快.随着微波功率的增大,电子密度和 关键词： 等离子体密度均匀性 背景气体压强 微波功率 磁场线圈电流     

大气压双频氦气放电等离子体特性的数值研究

用一维流体模型研究了大气压双频氦气放电等离子体的特性。数值模拟的结果表明,在单、双频放电中,随着应用电压的增加,电子密度和放电电流都增加。相对于单频放电,双频放电中低频源的耦合效应使得放电中的电流以及电子密度降低。随着低频源电压峰值的增加,电子密度降低,离子通量,电子损失能量以及电子吸收能量均降低;但电子温度和电势随着低频源电压峰值的增加而增加。在相同低频源电压下,随着高频源电压的增加离子流非线性增加。     

Modeling of a hemispherical inductively coupled plasma using neural network

In this study, a hemispherical inductively coupled plasma (HICP) was modeled by using a neural network called a radial basis function network (RBFN). The prediction performance of RBFN models were optimized by using a genetic algorithm. Using a Langmuir probe, experimental data were collected from the HICP equipment of 10 turns. For a systematic modeling, plasma discharge was characterized by using a statistical experiment. The process parameters involved include a radio frequency source power, pressure, position of probe tip, and Cl₂ flow rate. The plasma characteristics modeled include plasma density and electron temperature. From the optimized models, 3D plots were generated to explore parameter effects. Plasma density (or electron temperature) was the most strongly dependent on the tip position. The effect of source power on plasma density was almost independent of Cl₂ flow rate. The effect of pressure was inclined to slightly decrease plasma density. Unlike in other plasma sources, electron temperature was little affected by pressure. The effect of Cl₂ flow rate of increasing electron temperature was the most significant under higher plasma density.     

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Based on one dimensional fluid model, the characteristics of helium plasma discharge driven by dual frequency at atmospheric pressure were studied. The results show that the electron density and discharge current increase with power voltage both in single frequency discharge and dual frequency discharge. In comparison with single frequency discharge, the discharge current and electron density in dual frequency discharge are lowered due to the coupling of low frequency source. As the voltage of low frequency source increases, the electron density, ion flux, electron energy dissipation, as well as electron heating decrease, whereas electron temperature and potential increase. As the voltage of high frequency source increases, the ion flux nonlinearly increases at the same voltage of low frequency source.     

Measurement of neutral gas temperature in inductively coupled plasmas

Dependence of the neutral gas temperature on the gas pressure and discharge power in an inductively coupled plasma source has been investigated using optical emission spectroscopy. Both nitrogen and argon plasmas have been studied separately. In the case of argon plasma, about 5% nitrogen was added to the total gas flow as an actinometer. The maximum temperature was found to be as high as 1850 K at 1 Torr working pressure and 600 W radiofrequency power. The temperature increases almost linearly with the logarithm of the gas pressure, but changes only slightly with the discharge power in the range of 100–600 W. In a nitrogen plasma, a sudden increase in the neutral gas temperature occurs when the gas pressure is increased at a given discharge power. This suggests a discharge-mode transition from the H-mode (high plasma density) to the E-mode (low plasma density). In the H-mode, the gas temperature is proportional to the logarithm of the gas pressure, as in the argon plasma. However, the gas temperature increases almost linearly with the discharge power, which is in contrast to the case of argon plasma. The electron density in the nitrogen plasma is about 10% of that in the argon plasma. This may explain the observation that the nitrogen neutral temperature is always lower than the argon neutral temperature under the same discharge power and gas pressure.     

ANALYSIS OF DUAL FREQUENCY CONFINED CAPACITIVELY COUPLED PLASMA AT LOW POWER

Confined dual frequency hydrogen plasma discharge has been investigated with microwave interferometer method and radial profiles are taken by Abel inversion technique. Dual radio-frequency sources, operating at 27.12MHz and 1.94MHz, are coupled to each other through the plasma. 27.12MHz RF power is used to enhance plasma density and 1.94MHz power is used to enhance ion acceleration energy to the electrode. Radial density profiles has been taken for comparing the effects of low frequency source that the secondary RF source causes reduction in plasma density due to the sheath expansion. Instead radial density profile is assumed as flat by most of the models, there is about 2.5eV of potential drop occurs from centre to boundary at 40W of primary source power. It has been observed that increasing sheath width (increasing the secondary source power to primary source power) reduces the bulk plasma volume and makes potential profile flattening in y direction. While the high frequency power is dissipated by electrons in the bulk plasma; low frequency power is mostly dissipated by ions in the sheath region. Using both high and low frequency power, we may control plasma density and ion acceleration energy to the electrode simultaneously.     

容性耦合射频氩等离子体放电诊断研究及仿真模拟

针对中等气压、中等功率下射频容性耦合(CCRF)等离子体的放电特性,采用基于流体模型的COMSOL软件仿真,建立一维等离子体放电模型,以Ar为工作气体,研究同一气压时不同射频输入功率下等离子体电子温度和电子密度的分布规律。同时依据仿真模型设计制作相同尺寸的密闭玻璃腔体和平板电极,实验测量了不同射频输入功率时放电等离子体的有效电流电压及发射光谱,进而计算等离子体的电子温度及电子密度;利用玻耳兹曼双线测温法,得到光谱法下等离子体的电子温度及电子密度。结果表明:当气体压强为250 Pa、输入功率为100~450 W时,等离子体电压电流呈线性关系,电子密度随功率的增大而增大,而电子温度并未随功率的变化而有明显变化,其与功率无关。运用仿真模拟验证了实验的准确性,通过比较,三种方法所得的结果相近。通过结合等效回路法、光谱法和数值模拟仿真法初步诊断出中等气压下等离子体的放电参数,提出了结合三种方法作为实验研究的方法,使实验结果更具说服力,证明其方法的可靠性,也为进一步的等离子体特性研究提供依据。     

Large Volume and High Density Surface Wave Plasmas Sustained by Two Microwave Launchers

Surface wave plasma （SWP） is an electromagnetic excitation along the planar interface between a dielectric and plasma medium when plasma density is so large that its permittivity becomes negative. An experiment SWP system consisting of two microwave launchers （upper and side microwave launcher） has been developed for producing large volume surface wave plasmas in our laboratory. The experimental investigation shows that comparable uniformity plasma with not only large volume but also high density properties has been obtained by the two launchers.     

Impacts of air pressure on the evolution of nanosecond pulse discharge products

Based on the nonequilibrium plasma dynamics of air discharge, a dynamic model of zero-dimensional plasma is established by combining the component density equation, the Boltzmann equation, and the energy transfer equation. The evolution properties of nanosecond pulse discharge (NPD) plasma under different air pressures are calculated. The results show that the air pressure has significant impacts on the NPD products and the peak values of particle number density for particles such as O atoms, O3 molecules, N2(A3) molecules in excited states, and NO molecules. It increases at first and then decreases with the increase of air pressure. On the other hand, the peak values of particle number density for N2(B3) and N2(C3) molecules in excited states are only slightly affected by the air pressure.     

Characteristics of a dual‐radio‐frequency cylindrical inductively coupled plasma

The plasma parameters such as electron density, effective electron temperature, plasma potential, and uniformity are investigated in a new dual‐frequency cylindrical inductively coupled plasma (ICP) source operating at two frequencies (2 and 13.56 MHz) and two antennas (a two‐turn high‐frequency antenna and a six‐turn low‐frequency (LF) antenna). It is found that the electron density increases with 2 MHz power, whereas the electron temperature and plasma potential decrease with 2 MHz power at a fixed 13.56 MHz power. Moreover, the plasma uniformity can be improved by adjusting the LF power. These results indicate that a dual‐frequency synergistic discharge in a cylindrical ICP can produce a high‐density, low‐potential, low‐effective‐electron‐temperature, and uniform plasma.     

气压对于低气压双频容性耦合Ar/O2 等离子体放电特性影响的研究

 研究了气压对双射频氩氧混合等离子体电子温度和电子密度的影响。在13.56MHz低频功率和94.92MHz高频功率固定为60W和氩氧气体比为1:9的情况下,利用发射光谱法分析了气压不同时氩氧混合等离子体的放电光谱中的特征谱线的变化规律。使用一维质点网格法(PIC-MC)静电模型计算了电子温度和电子密度。结果表明：电子温度随着气压的增加先降低后升高,与实验结果趋势相吻合;电子密度随着气压的增加先增大后减小。     

脉冲微放电发射光谱用于合金样品元素分析

利用大气压脉冲微放电剥蚀源对铝合金进行光谱分析。该针板结构微放电装置具有价格低廉、操作便捷、分析快速等特点。脉冲放电能瞬间注入极大的放电能量,不致使样品融化,进而保证放电的稳定性。在几微秒的时间内,对钨针电极施加近-4 000 V的高压,电极间迅速形成放电通道,针尖和样品之间形成高达20 A的电流,造成对样品的剥蚀,并对被剥蚀的粒子进行激发。单次放电脉冲注入能量约为8.5 mJ,能量以电流的形式传递于放电电极。剥蚀形貌图表明放电微等离子体局域在电极间隙,针尖轴向上的能量传递和电流密度远高于离轴区域。为了深入研究剥蚀机制和物理性质,对等离子体源的电学特性进行了讨论。通过精确的时序拍摄技术观测了等离子体的演化过程,从ICCD相机的快速成像结果可以看到等离子体源寿命与脉冲高压放电源的脉宽相当,发光强度与放电电流变化趋势相吻合。与光谱分析装置相连接,脉冲微放电剥蚀源可有效激发合金样品中的铝、镁、锰、铜等元素原子谱线。对放电过程等离子体光谱特性进行考察,利用玻尔兹曼斜线法和Stark展宽法计算等离子体电子温度和电子数密度,分别得到过程中等离子体电子激发温度约6 700 K,等离子体电子数密度约1017 cm-3量级,并验证了放电处于局域热平衡状态。探究其定量分析性能,结果表明该脉冲微放电等离子体直接作为一种光谱分析源可实现对铝合金样品快速定量分析。     

高气压强电场电离过程中的离子浓度分布规律

研究了高气压强电场电离区域的离子浓度分布的连续性方程, 对电离区域的电离物的产生、消失和输运进行了研究。通过采用电离放电增加了输入能量密度、G 值、电离占空比等, 从而提高了离子产生率。通过外加电场和离子“雪崩”头部的本征电场的叠加作用, 离子被束缚在放电通道中。对离子施加垂直电场方向的作用力, 就能把电场中的等离子体成束输送出去。已经能够做到有效体积仅为1cm³的等离子体源, 输运等离子体率达到 10¹² cm^{- 3}•s^{- 1}。     

The effects of normal current density and the plasma spatial structuring in argon DBDs

This paper presents the results of theoretical studies of high-pressure dielectric barrier discharges (DBD) in argon. Two different DBDs at the megahertz and the kilohertz power frequency range were simulated. The effect of normal current density was obtained in the numerical model for both types of the discharge. The discharge of megahertz range was uniform over the radius. The increase in the discharge current is accompanied by increase in the discharge area. The discharge of kilohertz range is not uniform over the radius. The concentric ring formation was observed during calculations. The increase in the discharge current occurs due to increase in the number of rings and as a result in the discharge area. The developed 2D model is able to describe only the first stage of the filament formation – the formation of concentric plasma rings. The filament formation starts at the edge of the current channel and spreads to its centre. Both the effect of normal current density and the filaments formation are caused by the nonstationarity at the current channel boundary.