磁性随机存储器的研究进展

通过分析磁性随机存储器(MRAM)的基本原理,及其与现有的静态存储器(SRAM)、动态存储器(DRAM)和快闪存储器(Flash)的性能比较,探讨了MRAM作为下一代新型存储器的应用前景.     

CoFeB/AlOx/Ta及AlOx/CoFeB/Ta结构中垂直易磁化效应的研究

本文详细研究了在不同氧化层和铁磁层厚度情况下, 底层CoFeB/AlO_x/Ta结构和 顶层AlO_x/CoFeB/Ta结构中的垂直磁各向异性. 在底层CoFeB/AlO_x/Ta结构中观察到了垂直磁化的磁滞回线, 证明了其垂直易磁化效应的存在; 而在顶层AlO_x/CoFeB/Ta结构中却没有观察到类似的磁滞回线. 对这种对称结构中的非对称现象进行了分析. 研究还发现不同的氧化层和铁磁层厚度均会影响层间界面相互作用的强度, 从而导致结构的垂直磁化曲线矫顽力大小发生改变. 这项研究将对基于AlO_x氧化层垂直磁隧道结的研制具有重要的意义. 关键词： 垂直磁各向异性 磁隧道结 随机存储器     

利用金属掩模法制备钉扎型磁性隧道结

利用金属掩模法和Ir22Mn78合金反铁磁钉扎层，制备了四种钉扎型的Py/Al2O3/Py，Py/Al2O3/Co，Co/Al2O3/Py和Co/Al2O3/Co磁性隧道结，坡莫合金的成分为Py＝Ni79Fe21.例如：利用狭缝宽度为100?μm的金属掩模，直接制备出室温隧穿磁电阻比值为17.2%的磁性隧道结Co/Al2O3/Co，其结电阻为76Ω,结电阻和结面积的积矢为76×10_{4Ωμm2，自由层的偏转场为1114?A/m，并且在外加磁场0.1114A·m-1之间时室温磁电阻比值 关键词： 磁性隧道结 隧穿磁电阻 磁随机存储器 金属掩模}     

4英寸热氧化硅衬底上磁性隧道结的微制备

就如何在4英寸热氧化硅衬底上沉积高质量的磁性隧道结纳米多层薄膜材料和如何利用光刻方法微加工制备均匀性较好的磁性隧道结方面做了初步研究，并对磁性隧 道结的磁电性质及其工作特性进行了初步测量和讨论.利用现有的光刻设备和工艺条 件在4英寸热氧化硅衬底上直接制备出的磁性隧道结，其结电阻与面积的积 矢的绝对误差在10% 以内，隧穿磁电阻的绝对误差在7% 以内，样品的磁性隧道结性质具有较好的均匀性和一致性，可以满足研制磁随机存储器存储单元演示器件的基本要求. 关键词： 磁性隧道结 隧穿磁电阻 磁随机存储器 4英寸热氧化硅衬底     

具有纳米氧化层的磁性隧道结的热稳定性研究

研究发现在磁隧道结的反铁磁层和被钉扎铁磁层之间插入一层纳米氧化层，可以使磁隧道结的退火温度增加了40℃，即明显地提高了磁隧道结的温度稳定性.通过卢瑟福背散射实验直接观察到产生这一效应的原因是该纳米氧化层有效地抑制了Mn元素在退火过程中的扩散，从而使TMR值在较高的退火温度下得以保持. 关键词： 磁性隧道结 隧穿磁电阻 热稳定性 纳米氧化层     

Co基磁性隧道结势垒结构的电子全息研究

利用高分辨电子显微术和电子全息方法研究了Co基磁性隧道结退火热处理前后的微观结构及相应势垒层结构的变化. 研究结果表明，退火处理可以明显地改善势垒层和顶电极、底电极之间的界面质量，改进势垒层本身的结构. 这与该磁性隧道结经过280℃退火处理后，隧道磁电阻值大大增加是一致的. 关键词： 磁性隧道结 隧道磁电阻 高分辨电子显微学 电子全息     

磁性隧道结Ni80Fe20/Al2O3/Co的制备和物性

用等离子体氧化形成绝缘层的方法,重复性地制备出了Ｎｉ８０Ｆｅ２０／Ａｌ２Ｏ３／Ｃｏ磁性隧道结。样品的隧道磁电阻（ＴＭＲ）比值在室温下最高可达６．０％,翻转场（ｓｗｉｔｃｈ ｆｉｅｌｄ）可低于８００Ａ／ｍ,平台宽度约２４００Ａ／ｍ。结电阻的变化范围从几百欧姆到几百千欧。     

电子全息对磁隧道结势垒层的研究

利用电子全息显微学方法，从理论和实验两方面，系统研究了磁隧道结势垒层的内势分布，指出了一些在实验过程中应予以注意的实验现象，提出了可能的解决方法. 关键词： 电子全息 磁隧道结 平均内势     

超导隧道结中的电流相位关系

计算了等自旋配对超导隧道结中的直流Josephson电流.结果表明,当两侧超导体中配对势的轨道对称性分别属于磁点群D₄的A不可约表示和 ²E不可约表示的情况下,电流相位关系是I∝sin4φ. 关键词： 超导隧道结 Josephson电流     

重离子辐照引起磁性隧道结功能失效类型及机理研究

重点研究了磁性隧道结(MTJ)的电学性能受离子注量影响的物理规律。实验首次发现了高能Ta离子辐射损伤导致MTJ电学功能失效的现象,主要失效模式为:高、低电阻态失效,其中79.9%的功能失效为高电阻态失效。计算表明,单个10.9 MeV/u的Ta离子辐照引入的损伤无法导致MTJ宏观电学功能失效。结合理论计算与Monte Carlo模拟分析,MTJ中的绝缘势垒层与铁磁薄膜的损伤是出现高、低电阻态失效的内因。     

Strain-mediated magnetoelectric control of tunneling magnetoresistance in magnetic tunneling junction/ferroelectric hybrid structures

Because of the wide selectivity of ferromagnetic and ferroelectric (FE) components, electric-field (E-field) control of magnetism via strain mediation can be easily realized through composite multiferroic heterostructures. Here, an MgO-based magnetic tunnel junction (MTJ) is chosen rationally as the ferromagnetic constitution and a high-activity (001)-Pb(Mg$_{1/3}$Nb$_{2/3}$)$_{0.7}$Ti$_{0.3}$O$_{3}$ (PMN-0.3PT) single crystal is selected as the FE component to create a multiferroic MTJ/FE hybrid structure. The shape of tunneling magnetoresistance (TMR) versus in situ E-fields imprints the butterfly loop of the piezo-strain of the FE without magnetic-field bias. The E-field-controlled change in the TMR ratio is up to $-$0.27% without magnetic-field bias. Moreover, when a typical magnetic field ($\sim \pm 10$ Oe) is applied along the minor axis of the MTJ, the butterfly loop is changed significantly by the E-fields relative to that without magnetic-field bias. This suggests that the E-field-controlled junction resistance is spin-dependent and correlated with magnetization switching in the free layer of the MTJ. In addition, based on such a multiferroic heterostructure, a strain-gauge factor up to approximately 40 is achieved, which decreases further with a sign change from positive to negative with increasing magnetic fields. This multiferroic hybrid structure is a promising avenue to control TMR through E-fields in low-power-consumption spintronic and straintronic devices at room temperature.     

Electrical conductance properties for magnetic tunnel junctions with MgO barriers

We measured inelastic electron tunneling (IET) spectra and conductance for MgO tunneling magnetoresistance (TMR) films to obtain information on the ferromagnetic/barrier layer interface. The IET spectra showed the difference between amorphous and crystalline structures in the barrier. In the magnetic tunnel junction (MTJ) with a crystalline barrier the IET spectra indicated an Mg-O phonon peak at a low bias voltage by measurement with a parallel magnetization configuration. On the other hand, no peak was observed in the MTJ with an amorphous barrier.     

Magnetization switching driven by spin-transfer-torque in high-TMR magnetic tunnel junctions

This paper presents a numerical study of magnetization switching driven by spin-polarized current in high-TMR magnetic tunnel junctions (TMR>100%). The current density distribution throughout the free-layer is computed dynamically, by modeling the ferromagnet/insulator/ferromagnet trilayer as a series of parallel resistances. The validity of the main hypothesis, which states that the current flows perpendicular to the sample plane, has been verified by numerically solving the Poisson equation. Our results show that the nonuniform current density distribution is a source of asymmetry to the switching process. Furthermore, we observe that the reversal mechanisms are characterized by well-defined localized pre-switching oscillation modes.     

高磁电阻磁性隧道结的几种微制备方法研究

利用金属掩模法优化了制备磁性隧道结的实验和工艺条件，金属掩模的狭缝宽度为100 μm. 采用4 nm厚的Co₇₅Fe₂₅为铁磁电极和10或08 nm厚的铝氧化物 为势垒膜， 直接制备出了室温隧穿磁电阻（TMR）为30%—48％的磁性隧道结，其结构为Ta(5 nm)/Cu(25 nm)/Ni₇₉Fe₂₁(5 nm)/Ir₂₂Mn₇₈(10 nm)/ Co₇₅Fe₂₅ (4 nm)/Al(08 nm)-O/Co₇₅Fe₂₅(4 nm)/Ni₇₉Fe ₂₁(20 nm)/Ta(5 nm).同时，利用刻槽打孔法和去胶掀离法两种光刻技术并结合Ar离子束刻蚀及化学反应刻 蚀，制备出面积在4 μm×8 μm—20 μm×40 μm、具有室温高TMR和低电阻的高质量磁性 隧道结.300 ℃ 退火前后其室温TMR可分别达到22% 和50%.研究结果表明，采用光刻中的刻 槽打孔或去胶掀离工艺方法制备的小尺寸磁性隧道结，可用于研制磁动态随机存储器和磁读 出头及其他传感器件的磁敏单元. 关键词： 磁性隧道结 隧穿磁电阻 金属掩模法 光刻法     

Output voltage calculations in double barrier magnetic tunnel junctions with asymmetric voltage behavior

In this paper we study the asymmetric voltage behavior (AVB) of the tunnel magnetoresistance (TMR) for single and double barrier magnetic tunnel junctions (MTJs) in range of a quasi-classical free electron model. Numerical calculations of the TMR–V curves, output voltages and I–V characteristics for negative and positive values of applied voltages were carried out using MTJs with CoFeB/MgO interfaces as an example. Asymmetry of the experimental TMR–V curves is explained by different values of the minority and majority Fermi wave vectors for the left and right sides of the tunnel barrier, which arises due to different annealing regimes. Electron tunneling in DMTJs was simulated in two ways: (i) Coherent tunneling, where the DMTJ is modeled as one tunnel system and (ii) consecutive tunneling, where the DMTJ is modeled by two single barrier junctions connected in series.     

Perpendicular magnetic tunnel junction and its application in magnetic random access memory

Recent progresses in magnetic tunnel junctions with perpendicular magnetic anisotropy(PMA) are reviewed and summarized. At first, the concept and source of perpendicular magnetic anisotropy(PMA) are introduced. Next, a historical overview of PMA materials as magnetic electrodes, such as the RE–TM alloys TbFeCo and GdFeCo, novel tetragonal manganese alloys Mn–Ga, L10-ordered(Co, Fe)/Pt alloy, multilayer film [Co, Fe, CoFe/Pt, Pd, Ni, Au]N, and ultra-thin magnetic metal/oxidized barrier is offered. The other part of the article focuses on the optimization and fabrication of CoFeB/MgO/CoFeB p-MTJs, which is thought to have high potential to meet the main demands for non-volatile magnetic random access memory.     

第一性原理研究Hg2CuTi型Heusler合金Ti2FeB的磁性和半金属性

基于密度泛函理论的GGA计算,我们具体研究了Hg2 CuTi型Heusler合金Ti2 FeB的电子结构和磁性质,结果发现Ti2FeB合金在其费米面处存在100％的自旋极化,并在5.1～6.2(A)晶格范围内被保留.Ti2FeB具有大约0.5 eV的半金属带隙和1μB的原胞总磁矩,是一个稳定的半金属铁磁体.此外,我们的研究也表明RKKY型间接交换和d电子杂化在决定合金磁性质中起决定性作用.     

对称抛物势阱磁性隧道结中的自旋输运及磁电阻效应

研究了两端具有铁磁接触的对称抛物势阱磁性隧道结(F/SPW/F)中自旋相关的隧穿概率和隧穿磁电阻,讨论了量子尺寸效应和Rashba 自旋轨道耦合作用对自旋极化输运特性的影响.研究结果表明:隧穿概率和隧穿磁电阻随抛物势阱宽度的增加发生周期性的振荡.抛物势阱深度的增加减小了隧穿概率和隧穿磁电阻的振荡频率.Rashba 自旋轨道耦合强度的增加加大了隧穿概率和隧穿磁电阻的振荡频率.隧穿概率和隧穿磁电阻的振幅和峰谷比强烈依赖于两铁磁电极中磁化方向的夹角. 关键词： 磁性隧道结 Rashba 自旋轨道耦合 隧穿概率 隧穿磁电阻     

Structural and magnetic changes in MgO-based magnetic tunneling junctions during the early stages of annealing

We have studied the effects of the initial stages of the annealing on magnetic tunnel junctions with MgO barriers and CoFeB electrodes. We report changes in the resistance-voltage characteristics and tunneling magnetoresistance for patterned transport junctions, and correlate these with the observed changes in the structural and magnetic interface morphologies determined by soft X-ray resonant magnetic scattering from sheet films from the same wafer. An important feature of our experiment was that all measurements were carried out within the soft X-ray diffractometer on samples from the same wafer subjected to simultaneous annealing cycles, so that our magnetotransport and scattering data are directly comparable. The as-grown junction showed a tunneling magnetoresistance ratio of 5.5%, and a specific barrier resistance of . A anneal for 1 h resulted in a small rise in barrier resistance and magnetoresistance coupled with a smoothing of the magnetic interfaces, consistent with the healing of barrier defects and removal of tunneling hot-spots. A subsequent anneal for a further hour resulted in further smoothing, and a rise in the magnetoresistance ratio to 72%, and a much weaker dependence of the parallel state resistance upon voltage bias, indicating the development of crystallographic texture in the electrodes. Annealing to yielded a further decrease in magnetic interface width (the quadrature sum of roughness and intermixing length scales). The reduction in interface width for Co species occurred at higher temperatures than for Fe throughout the experiments.     

Perpendicular magnetization and exchange bias in epitaxial NiO/[Ni/Pt]2 multilayers

The realization of perpendicular magnetization and perpendicular exchange bias(PEB)in magnetic multilayers is important for the spintronic applications.NiO(t)/[Ni(4 nm)/Pt(1 nm)]₂multilayers with varying the NiO layer thickness t have been epitaxially deposited on SrTiO;(001)substrates.Perpendicular magnetization can be achieved when t<25 nm.Perpendicular magnetization originates from strong perpendicular magnetic anisotropy(PMA),mainly resulting from interfacial strain induced by the lattice mismatch between the Ni and Pt layers.The PMA energy constant decreases monotonically with increasing t,due to the weakening of Ni(001)orientation and a little degradation of the Ni–Pt interface.Furthermore,significant PEB can be observed though NiO layer has spin compensated(001)crystalline plane.The PEB field increases monotonically with increasing t,which is considered to result from the thickness dependent anisotropy of the NiO layer.