MOCVD-Ga0.4In0.6As0.85P0.15/InP分布布喇格反射镜的反射率

采用MOCVD方法在InP衬底上制备了高质量的四元合金Ga0.4In0.6As0．85P0.15和InP外延层,用椭圆偏光仪测得Ga0.4In0.6As0.85P0.15和InP外延层的折射率。由这两种具有不同折射率的半导体材料交替生长构成不同周期的分布布喇格反射镜(DBR)。研究了不同周期的DBR结构的反射率与波长及反射率与DBR结构周期数的关系。根据多层膜增反原理,当中心波长为1．55um时,反射率随周期数增加迅速增加,周期数为23时,反射率可达99．97％。利用MOCVD技术,通过Ga0.4In0.6As0.85P0.15/InP的交替生长,成功地获得周期数分别为3,4,7,11,15,19,23的分布布喇格反射镜(DBR)。实验结果表明,已获得表面如镜面状的二元InP外延层,而组分x,y分别为0．4,0．85的四元合金,因其处于混溶隙,外延层表面较粗糙,未获得镜面状表面。反射率的测量结果表明,反射镜的反射率随周期数的增加而升高,当DBR的周期数为23时,反射率为54．44％,与理论结果尚存在一定差距。     

A comparative study of AlGaAsSb/AlAsSb distributed Bragg mirrors on InP

AlGaAsSb/AlAsSb Bragg mirrors lattice matched on InP with six pairs of layers were grown by molecular beam epitaxy. The effect of Te doping on the electrical and optical properties of the Bragg mirrors, and the presence of digital alloy gradient layers between the ternary and quaternary layers are analysed. The presence of digital alloy layers at the interfaces reduces the electrical resistance through the perpendicular direction of the Bragg mirror, without significantly affecting the reflectivity.     

1.55-μm InGaAs/InGaAlAs MQW vertical-cavity surface-emitting lasers with InGaAlAs/InP distributed Bragg reflectors

High-performance InGaAs/InGaAlAs multiple-quantum-well vertical-cavity surface-emitting lasers (VCSELs) with InGaAlAs/InP distributed Bragg reflectors are proposed for operation at the wavelength of 1.55 μm. The lasers have good heat diffusion characteristic, large index contrast in DBRs, and weak temperature sensitivity. They could be fabricated either by metal-organic chemical vapor deposition (MOCVD) or by molecular beam epitaxy (MBE) growth. The laser light-current characteristics indicate that a suitable reflectivity of the DBR on the light output side in a laser makes its output power increase greatly and its lasing threshold current reduce significantly, and that a small VCSEL could output the power around its maximum for the output mirror at the reflectivity varying in a broader range than a large VCSEL does.     

Surfactant effects of indium on cracking in AlN/GaN distributed Bragg reflectors grown via metal organic vapor phase epitaxy

Aluminum Nitride (AlN) and Gallium Nitride (GaN) superlattice structures are often characterized by a network of cracks resulting from the large lattice mismatch and difference in thermal expansion coefficients, especially as the thickness of the layers increases. This work investigates the influence of indium as a surfactant on strain and cracking in AlN/GaN DBRs grown via Metal Organic Vapor Phase Epitaxy (MOVPE). DBRs with peak reflectivities ranging from 465 nm to 540 nm were grown and indium was introduced during the growth of the AlN layer. Image processing techniques were used to quantify the crack length per square millimeter and it was observed that indium has a significant effect on the crack formation and reduced the total crack length in these structures by a factor of two.     

MOCVD生长InP/GaInAsP DBR结构及相关材料特性

采用金属有机化学气相沉积(MOCVD)法InP衬底上成功地制备了GaxIn1-xAsyP1-y/InP交替生长的分布布喇格反射镜(DBR)结构以及与之相关的四元合金GaxIn1-xAsyP1-y和InP外延层。利用X射线衍射、扫描电子显微镜(SEM)、低温光致发光(PL)光谱等测量手段对材料的物理特性进行了表征。结果表明,在InP衬底上生长的InP外延层和四元合金GaxIn1-xAsyP1-y外延层77K光致发光(PL)谱线半峰全宽(FWHM)分别为9.3meV和32meV,说明形成DBRs结构的交替层均具有良好的光学质量。X射线衍射测量结果表明,四元合金GaxIn1-xAsyP1-y外延层与InP衬底之间的相对晶格失配仅为1×10-3。GaxIn1-xAsyP1-y/InP交替生长的DBR结构每层膜的光学厚度约为λ/4n(λ=1.55/μm)。根据多层膜增反原理计算得出当膜的周期数为23时,反射率可达90％。     

Temperature tuning of the Bragg resonance of InAsP/InP Bragg-spaced quantum wells grown by MOCVD

In this article, we presented a study of InAs_0.04P_0.96/InP Bragg-spaced quantum wells (BSQWs), which were grown by metal organic chemical vapor deposition (MOCVD). The quantum wells were characterized by photoluminescence (PL), double-crystal x-ray diffraction (DC-XRD), and reflection spectra. We found that the BSQWs structure grown at 580 °C appears to be extremely abrupt, uniform, free of misfit dislocations, and of narrow PL line width. From the reflection spectra at different temperatures, we presented a theoretical analysis of the changes in band structure for resonant and near-resonant wells, and proposed a new scheme of using the temperature to tune the Bragg resonance of Bragg spaced quantum wells.     

中心波长1080 nm的高功率光纤光栅研制与测试

介绍了基于紫外光侧写和相位掩模法制作双包层光纤光栅的工艺,制作了一对中心波长1080 nm的光纤光栅,测试光谱得到其反射谱带宽分别为2 nm和1 nm。采用自制的光纤光栅搭建了一个高功率光纤振荡器,得到最高502 W的激光输出,并测试了输出激光的光谱和光束质量。     

三角形大带宽反射光谱光纤光栅的设计和制备

反射谱具有三角形形状的光纤光栅在光纤传感等领域中具有重要的应用前景。利用遗传算法设计出了产生三角形光谱分布的光纤光栅的耦合系数沿光纤的分布。计算表明,三角形光谱光纤光栅是可以实现的,其反射带宽可以通过光栅的啁啾量进行调节,常周期的三角光栅反射带宽小,变周期的三角光栅反射带宽大,其带宽同其啁啾量大致相等。实验中,采用光束扫描法制备了反射底宽为0．77nm三角形光谱的光纤光栅。     

All-optical synchronization of a 40 GHz self-pulsating distributed Bragg reflector laser to return-to-zero 10, 20 and 40 Gbit/s data streams

This paper presents experimental investigations of the all-optical synchronization of a distributed Bragg reflector (DBR) laser self-pulsating at 40 GHz on various injected bit-rate signals. Even though there is no modulation applied to this laser, it exhibits a modulation of its output emission, measured at 39.7 GHz with a linewidth of 30 MHz. Such performance is exploited in all-optical clock recovery for a return-to-zero data stream at 40 Gbit/s. The SP-DBR laser wavelength and the injected signal wavelength are 10 nm apart. All-optical synchronization is demonstrated at 40 Gbit/s with a linewidth of less than 20 MHz for injected signals at 10 and 20 Gbit/s, respectively. Thus the SP-DBR laser proves to be very versatile and can be synchronized on various bit-rate data signals.     

紫外波段SiO2/Si3N4介质膜分布式布拉格反射镜的制备与研究

采用光学传递矩阵方法设计了紫外波段SiO₂/Si₃N₄介质膜分布式布拉格反射镜, 并利用等离子体增强化学气相沉积技术在蓝宝石(0001)衬底上制备了SiO₂/Si₃N₄介质膜分布式布拉格反射镜. 光反射测试表明, 样品反射谱的峰值波长仅与理论模拟谱线相差10 nm, 并随着反射镜周期数的增加而蓝移. 由于SiO₂与Si₃N₄具有相对较大的折射率比, 因而制备的周期数为13的样品反射谱的峰值反射率就已大于99%. 样品反射谱的中心波长为333 nm, 谱峰的半高宽为58 nm. 样品截面的扫描电子显微镜和表面的原子力显微镜测量结果表明, 样品反射谱的中心波长蓝移是由子层的层厚和界面粗糙度的变化引起的. X射线反射谱表明,子层界面过渡层对于反射率的影响较小, 并且SiO₂膜的质量比Si₃N₄差, 也是造成反射率低于理论值的原因之一.     

基于InP/ZnS核壳结构量子点的色转换层设计及制作

提出了采用环境友好型InP/ZnS核壳结构量子点材料制备匹配蓝光Micro-LED阵列的量子点色转换层以实现Micro-LED阵列器件全彩化的技术方案。通过采用倒置式量子点色转换层方案,实现了InP/ZnS量子点材料和Micro-LED阵列的非直接接触,从而可以缓解LED中热量聚集导致的量子点材料发光主波长偏移、半峰宽展宽以及发光效率衰减等问题。量子点色转换层中内嵌PDMS聚合物柔性膜层,可以消除咖啡环效应,同时,色转换层中内嵌飞秒激光图案化处理的500 nm长波通滤光膜层,可以抑制蓝光从非蓝色像素单元出射。最后,实验制备了像素单元中心间距90μm的16×16 InP/ZnS量子点色转换层。该设计可以实现基于蓝光Micro-LED阵列的全彩色Micro-LED显示器件的制备,并且该制备方法可以降低全彩色Micro-LED阵列显示器件的制备成本。     

+1/-1相位掩模板和532nm激光下低损耗As_2S_3硫系光纤布喇格光栅的制备

采用改进型Sagnac干涉光栅写入系统,利用532nm准带隙光曝光源和带+1/-1衍射级的相位掩模板,在两种不同直径的低损耗As_2S_3硫系玻璃光纤上刻写布喇格光栅,并研究曝光期间光栅的动态特性.实验表明,As_2S_3光纤布喇格光栅透射峰值随光纤直径的减小而增强;在曝光过程中,布喇格波长先是较快地向短波长方向移动,随着曝光时间的延长,布喇格波长缓慢地向长波长方向回复.曝光时间为800~1 000s时,在包层直径为140μm的As_2S_3光纤上获得质量良好的布喇格光栅光谱,其透射峰值可达-2.6dB,带宽为0.37nm.对As_2S_3硫系光纤纤芯的光敏性分析结果表明,折射率调制幅度和平均折射率变化随曝光时间分别可达到10-4和10-3数量级.     

Improvement in electrical and photovoltaic properties of a-Si/c-Si heterojunction with slanted nano-columnar amorphous silicon thin films for photovoltaic applications

The flat a-Si and slanted nanocolumnar (S-nC) a-Si thin films were prepared on c-Si and corning glass substrates by e-beam physical vapor deposition (EB-PVD) technique. The structural properties of all the grown thin films were determined by X-Ray Diffraction (XRD) analysis and Raman spectroscopy. Surface and cross-sectional morphology of a-Si/c-Si and S-nC a-Si/c-Si heterojunctions were investigated by Field Emission Scanning Electron Microscopy (FE-SEM). Sculptured thin films demonstrate potential for significant nanoscale applications in the area of thin film technology. The electrical and photovoltaic properties of these heterojunctions have been investigated by means of dc current–voltage (I–V) measurements at room temperature in dark and light conditions. The S-nC STFs' performance has been found to be improvable on changing the morphology of the thin film. We have found that, the porous morphology of this structure improves the photosensitivity features in photovoltaic devices and solar cell technology. We gained a high open voltage value, such as 900 mV in S-nC a-Si/c-Si thin film, without any doping process.     

近红外宽截止窄带滤光膜的研制

在空间光通信系统中,为满足光学系统对滤光膜的特殊要求,研制出了一种近红外宽截止窄带滤光膜,实现了降低深背景范围内杂散光干扰的要求.通过对薄膜材料特性的研究、膜系设计曲线的不断优化,得到了相对易于制备的窄带滤光膜结构;采用电子束加热蒸发及离子辅助沉积技术制备薄膜,采用光控加晶控同时监控的方法监控膜层厚度,通过不断优化工艺参量,提高中心波长处的透过率,最终成功得到了光谱性能较好的滤光膜.经光谱测试表明:所镀膜层在800~1 530nm、1 600~1 800nm波段平均透过率低于0.3%,1 565nm单点透过率高于92%,通带半带宽为18nm,满足光学系统的使用要求.     

Fabrication of YBCO／YSZ and YBCO／MgO thick films using electrophoretic deposition with top-seeded melt growth process

Superconducting thick films were grown on single crystals MgO and YSZ by electrophoretic deposition with Y_2BaCuO_5(Y211) addition. YBCO thick films were then accomplished by sintering the precursor films above the peritectic temperature. Single crystals of MgO (3×3×0.5 mm^3) were used as top-seed to control crystal structure of the thick films. As shown by scanning electron microscopy, the morphologies of YBCO/YSZ and YBCO/MgO thick films are spherulitic texture and platelet type. The critical temperature is ～89 K for the YBCO/YSZ thick film; the onset transition temperature is 86.4 K and the transition width is ～3 K for YBCO/MgO thick film. The critical current densities (as determined by Bean model) are, in A/cm^2, 3870 (77 K) for YBCO/YSZ thick films and 2399 (77 K) for YBCO/MgO thick films, which are comparable to the best J_c reported of the thick films prepared by the same method.     

具有电色散补偿的10 Gb/s脉冲转换器的研制

设计并研制了带电色散补偿功能的10 Gb/s脉冲转换器。电色散补偿通过时域均衡的方法,消除光纤色散带来的码间串扰;将电色散补偿芯片纳入脉冲转换器设计中,从而提高了其传输距离。所研制的样品光发射部分采用分布反馈激光器加电吸收调制器集成光源,接收部分采用带互阻放大器的雪崩光电二极管光电探测器模块,电色散补偿芯片对光电探测器输出的码流执行色散补偿算法。对样品进行的测试结果表明该脉冲转换器背对背接收灵敏度为-24.6 dBm,经过100 km G.652光纤传输后接收灵敏度为-20.8 dBm。未加电色散补偿功能时,采用相同的光源传输距离仅为50 km。