Electrical characterization of p-ZnO/p-Si heterojunction

Nitrogen doped p-ZnO film, with urea as nitrogen source, is fabricated by pulsed laser deposition on well-cleaned p-type (1 0 0) Si substrates. The structural and electrical properties of the p-p heterojunction are investigated by current-voltage (I-V) and capacitance-voltage (C-V) measurements. It shows a diode-like behavior with turn-on voltage of 0.5 V. The ideality factor η determined by applying positive potential in p-ZnO and negative potential along p-Si is found to be 6. Such a high value of η is attributed to lattice mismatch between ZnO and Si. and other factors responsible are thermoionic emission, minority carrier injection and recombination. C-V results indicate an abrupt interface and a band bending of 0.9 V in the silicon. Heterojunction band diagram for p-ZnO/p-Si is proposed.     

Preparation and characterization of CdS/Si coaxial nanowires

CdS/Si coaxial nanowires were fabricated via a simple one-step thermal evaporation of CdS powder in mass scale. Their crystallinities, general morphologies and detailed microstructures were characterized by using X-ray diffraction, scanning electron microscope, transmission electron microscope and Raman spectra. The CdS core crystallizes in a hexagonal wurtzite structure with lattice constants of a=0.4140 nm and c=0.6719 nm, and the Si shell is amorphous. Five Raman peaks from the CdS core were observed. They are 1LO at 305 cm⁻¹, 2LO at 601 cm⁻¹, A₁-TO at 212 cm⁻¹, E₁-TO at 234 cm⁻¹, and E₂ at 252 cm⁻¹. Photoluminescence measurements show that the nanowires have two emission bands around 510 and 590 nm, which originate from the intrinsic transitions of CdS cores and the amorphous Si shells, respectively.     

Nonlinear optics and plasma-induced bistability in CdS

The investigation of highly excited semiconductors and of nonlinear optical properties recently tends to merge into one field of semiconductor physics. This is demonstrated here for the case of CdS. Two experimental methods are presented, which allow us both to detect optical nonlinearities and to understand their physical origins. These are the creation of laser-induced gratings and the excite- and- probe technique. The reasons for the nonlinearities are a broadening of the exciton resonances, transitions to the biexciton and the formation of an electron-hole plasma. The latter point is discussed in some detail and it is demonstrated, how the nonlinearities connected with this phase transition may be exploited to produce a dispersive and an intrinsic, absorptive bistability.     

Electrical and magnetic properties of Ni-Cu-Si heterojunction prepared by the liquid phase epitaxy technique

Ni-Cu-Si heterojunction was prepared by the liquid phase epitaxy (LPE) technique. Two growth solutions containing Indium (In) with Cu pieces and In with Ni pieces were employed during the fabrication process. The as-formed junction was directly characterized by different techniques including scanning electron microscopy (SEM), energy dispersive X-ray spectroscopy (EDS) and thin film X-ray diffraction (XRD) measurements. The current-voltage (I-V) characteristics of the Au/Ni/Cu/Si diode were found to be nonlinear, asymmetric, having a good rectification behavior with a very small leakage current of 0.003 μA at a reverse bias voltage of 2.0 V. The value of turn on voltage was located at 0.2 V. The magnetic properties were also evaluated at room temperature with a vibrating sample magnetometer. Systematic study of junction fabrication and characterization of such a heterosystem, comparison of the behavior of flat silicon and nanoporous silicon as substrates are presented and thoroughly discussed.     

Structural and optical characterization of CdS nanoparticles prepared by chemical precipitation method

In the present study we have synthesized CdS semiconducting quantum dots by the chemical precipitation method using Thioglycerol as the capping agent. X-ray powder diffraction (XRD) and transmission electron microscopy (TEM) are employed to characterize the size, morphology and crystalline structure of the as-prepared material. The synthesized QPs have a mixture of cubical and hexagonal crystal symmetry with 12 nm average diameter. Ultraviolet-visible (UV-vis) absorption spectroscopy is used to calculate the band gap of the material and blue shift in absorption edge. Confinement of the optical phonon modes in the QPs is studied by Raman spectroscopy, while FTIR for identification of chemical bonds in the nanomaterial. Multiple cadmium and sulphur defects were observed by employing the photoluminescence (PL) method.     

磁控溅射法制备ZnO/YBCO异质结及电学特性

利用磁控溅射技术在YBCO上沉积ZnO薄膜,获得ZnO/YBCO异质结.测量其不同温度下的电学性质,样品显示良好的整流特性,并且随着温度的升高,ZnO/YBCO异质结电流逐渐增大.     

电泳法制备ZnO/YBCO异质结及电学性质研究

采用电泳方法及高温煅烧工艺制备ZnO/YBCO异质结,XRD图谱显示ZnO具有c轴方向的择优取向。在SEM的截面图中可观察到ZnO与YBCO结合致密,放大500倍的表面形貌图呈现织构(textured)的微结构特征,放大5000倍的表面形貌图中可观察微米量级的六方晶粒。通过对ZnO/YBCO异质结的电学性质进行测试,结果显示整流特性。     

Photoluminescence and optical characterization of CdS nanoparticles prepared by solid-state method at low temperature

The photoluminescence (PL) and optical properties of CdS nanoparticles prepared by the solid-state method at low temperature have been discussed. The effects of NaCl and anionic surfactant SDBS (sodium dodecylbenzene sulfonate) on the luminescent properties of CdS nanophosphors prepared using this method, without the inert gas or the H₂S environment, were studied separately. The synthesized products were characterized by X-ray diffraction (XRD), transmission electron microscopy (TEM), field emission scanning electron microscope (FESEM), and energy dispersive X-ray spectroscopy (EDAX). UV–VIS absorption and PL spectra were also studied. XRD studies confirmed the single-phase formation of CdS nanoparticles. TEM micrograph revealed the formation of nearly spherical nanoparticles with a diameter of 2.5 nm. The PL emission for the CdS shows the main peak at 560 nm with a shoulder at 624 nm, with an increase in the PL intensity after the addition of SDBS. The effect of Mn doping on PL intensity has also been investigated. The PL spectra show that the emission intensity decreases as the dopant concentration increases.     

Laser type of spectral narrowing in electroluminescent Si/SiO2superlattices prepared by low-pressure chemical vapour deposition

Si/ SiO₂superlattices were fabricated by low-pressure chemical vapour deposition. Superlattices of 75–150 nm layer pair thicknesses and having 1–8 layer pairs were investigated in order to evaluate their surface structure and electroluminescent properties. Atomic force microscopy (AFM) studies were performed in order to investigate the surface morphology of a thin SiO₂layer and to evaluate the sizes of polysilicon nanocrystals grown onto the top of it. The current–voltage characteristics and the electroluminescence spectra are also shown. We have observed a blueshift of over 200 nm in the electroluminescence peak wavelength by increasing the driving current. The change in the direction of the driving current through a sample changes the peak wavelength from the yellow to red region. In some samples, we could detect an exponential increase in light intensity in current densities near 100 mA per square millimeter. The increase in intensity is combined with a very prominent spectral narrowing of the electroluminescence spectra. The half width of this spectral peak was less than 5 nm. It is possible that we have observed for the first time a laser type of mechanism in semiconductor structures made solely of silicon and silicon dioxide.     

A field-effect WSe2/Si heterojunction diode

It is significant to develop a heterogeneous integration technology to promote the application of two-dimensional (2D) materials in silicon roadmap. In this paper, we reported a field-effect WSe₂/Si heterojunction diode based on ambipolar 2D WSe₂ and silicon on insulator (SOI). Our results indicate that the device exhibits a p-n diode behavior with a rectifying ratio of ～ 300 and an ideality factor of 1.37. As a photodetector, it has optoelectronic properties with a response time of 0.13 ms, responsivity of 0.045 A/W, detectivity of 4.5×10¹⁰ Jones and external quantum efficiency (EQE) of 8.9 %. Due to the ambipolar behavior of the WSe₂, the rectifying and optoelectronic properties of the heterojunction diode can be modulated by the gate electrical field, enabling various potential applications such as logic optoelectronic devices and neuromorphic optoelectronic devices for in-sensor computing circuits. Thanks to the process based on the mature SOI technique, our field-effect heterojunction diode should have obvious advantages in device isolation and integration.     

On ultra-thin oxide/Si and very-thin oxide/Si structures prepared by wet chemical process

The properties of ultra-thin oxide/Si and very-thin oxide/Si structures prepared by wet chemical oxidation in nitric acid aqueous solutions (NAOS) and passivated in HCN aqueous solutions were investigated by electrical, optical and structural methods. n- and p-doped (1 0 0) crystalline Si substrates were used. There were identified more types of interface defect states in dependence on both post-oxidation treatment and passivation procedure. On samples prepared on n-type Si, continuous spectrum of defect states of 0.05-0.2 eV range and discrete defect traps, ∼E_CB − 0.26 eV and ∼E_CB − 0.39 eV, were found. All mentioned defects are related with various types of Si dangling bonds and/or with SiO_x precipitates. Post-metallization annealing of investigated MOS structures reduced the interface defect density and suppressed the leakage currents. It did not change spectral profile of interface defect states in the Si band gap. In addition, there are presented following two optical phenomena: relation between amplitude of photoluminescence signal of NAOS samples and parameters of chemical oxidation process and quantum confinement effect observed on samples containing Si grains of size less as ∼2 nm.     

SiC based Si/SiC heterojunction and its rectifying characteristics

The Si on SiC heterojunction is still poorly understood, although it has a number of potential applications in electronic and optoelectronic devices, for example, light-activated SiC power switches where Si may play the role of an light absorbing layer. This paper reports on Si films heteroepitaxially grown on the Si face of (0001) n-type 6H-SiC substrates and the use of B₂H_6 as a dopant for p-Si grown at temperatures in a range of 700--950~\du. X-ray diffraction (XRD) analysis and transmission electron microscopy (TEM) tests have demonstrated that the samples prepared at the temperatures ranged from 850~℃ to 900~℃ are characterized as monocrystalline silicon. The rocking XRD curves show a well symmetry with FWHM of 0.4339° Omega. Twin crystals and stacking faults observed in the epitaxial layers might be responsible for widening of the rocking curves. Dependence of the crystal structure and surface topography on growth temperature is discussed based on the experimental results. The energy band structure and rectifying characteristics of the Si/SiC heterojunctions are also preliminarily tested.     

Fabrication of GaAs/SiO_2/Si and GaAs/Si heterointerfaces by surface-activated chemical bonding at room temperature

The room-temperature(RT) bonding mechanisms of Ga As/Si O_2/Si and Ga As/Si heterointerfaces fabricated by surface-activated bonding(SAB) are investigated using a focused ion beam(FIB) system, cross-sectional scanning transmission electron microscopy(TEM), energy dispersive x-ray spectroscopy(EDX) and scanning acoustic microscopy(SAM).According to the element distribution detected by TEM and EDX, it is found that an intermixing process occurs among different atoms at the heterointerface during the RT bonding process following the surface-activation treatment. The diffusion of atoms at the interface is enhanced by the point defects introduced by the process of surface activation. We can confirm that through the point defects, a strong heterointerface can be created at RT. The measured bonding energies of Ga As/Si O_2/Si and Ga As/Si wafers are 0.7 J/m~2 and 0.6 J/m~2. The surface-activation process can not only remove surface oxides and generate dangling bonds, but also enhance the atomic diffusivity at the interface.     

Nanostructuring Si surface and Si/SiO2 interface using porous-alumina-on-Si template technology. Electrical characterization of Si/SiO2 interface

In this work, anodic porous alumina thin films with pores in the nanometer range are grown on silicon by electrochemistry and are used as masking material for the nanopatterning of the silicon substrate. The pore diameter and density are controlled by the electrochemical process. Through the pores of the alumina film chemical oxidation of the silicon substrate is performed, leading to the formation of regular arrays of well-separated stoichiometric silicon dioxide nanodots on silicon, with a density following the alumina pores density and a diameter adjustable by adjusting the chemical oxidation time. The alumina film is dissolved chemically after the SiO₂ nanodots growth, revealing the arrays of silicon dioxide dots on silicon. In a next step, the nanodots are also removed, leaving a nanopatterned bare silicon surface with regular arrays of nanopits at the footprint of each nanodot. This silicon surface structuring finds interesting applications in nanoelectronics. One such application is in silicon nanocrystals memories, where the structuring of the oxidized silicon surface leads to the growth of discrete silicon nanocrystals of uniform size. In this work, we examine the electrical quality of the Si/SiO₂ interface of a nanostructured oxidized silicon surface fabricated as above and we find that it is appropriate for electronic applications (an interface trap density below 1–3×10¹⁰ eV⁻¹ cm⁻² is obtained, indicative of the high quality of the thermal silicon oxide).     

Electrical and interface characteristics of nanocrystalline n-Zn0.5Cd0.5S/p-Cu2S heterojunction structure prepared by dip coating

Nanocrystalline of n-Zn_0.5Cd_0.5S/p-Cu₂S heterojunctions were successfully prepared by the dip coating method. The surface morphology and the composition analysis were made by scanning electron microscopy (SEM) and energy dispersive x-ray (EDX) technique, respectively. Temperature dependent current–voltage characteristics of the heterojunctions were measured in the temperature range 300–400 K with a step of 25 K. The current–voltage (I–V) characteristics exhibit electrical rectification behavior. The zero bias barrier height (Φ_B0) and the ideality factor (n) are affected by temperature. Interface states at the n-Zn_0.5Cd_0.5S/p-Cu₂S heterojunction play a crucial role in determining the electrical characteristics of the heterojunction. The high value of n can be ascribed to the presence of an interfacial layer. The energy distribution profile of the density of interface states (N_ss) was extracted from the forward bias I–V measurements using the width of the depletion region deduced from the capacitance -voltage characteristics at high frequency (1MHz).     

Preparation and characterization of graphene/CdS nanocomposites

Graphene-based nanocomposites are emerging as a new class of materials that hold promise for many applications. In this paper, we present a facile approach for the preparation of graphene/CdS nanocomposites through simple reflux processes, in which thiourea (CS(NH₂)₂) and thioacetamide (C₂H₅NS) act as a sulphide source, respectively. The samples were characterized by the X-ray diffraction (XRD), transmission electron microscopy (TEM), Fourier transform infrared spectrum (FT-IR), ultraviolet-visible (UV-vis) spectroscopy and thermogravimetry analysis. It was shown that in the nanocomposites, the CdS nanoparticles were densely and uniformly deposited on the graphene sheets, and the sulphide source used has a great influence on the morphology, structure and property of the graphene/CdS nanocomposites. The good distribution of CdS nanoparticles on graphene sheets guarantees the efficient optoelectronic properties of graphene/CdS and would be promising for practical applications in future nanotechnology.     

Structure and transport mechanisms of Si/porous Si n-p junctions prepared by liquid phase epitaxy

Heterojunction devices of n-Si/p-PSi were fabricated by growing n-Si films onto p-type porous Si substrates by liquid phase epitaxy. The structure of the grown films was checked using scanning electron microscopy and X-ray diffraction spectroscopy. X-ray diffraction measurements showed that the grown films have monocrystalline structure oriented along (1 1 1) direction with mainly cubic phase. Current-voltage (I-V) and capacitance-voltage (C-V) characteristics were measured over the temperature range from 298 to 398 K. The analysis of the dark I-V characteristics of n-Si/p-PSi at several temperatures is done to elucidate the conduction mechanisms and the evaluation of the heterojunction parameters is presented. Two carrier transport mechanisms are believed to be at the origin of the forward current. At low bias voltage (V ≤ 0.4 V) the forward current is dominated by the recombination at the porous silicon side of the space charge region. In the 0.5 V ≤ V ≤ 1.4 V region, the current transport is due to the space charge—limited current mechanism dominated by a single trapping level of energy 0.41 eV. The reverse current is considered to be mainly generated in the depletion region of the porous silicon. The capacitance-voltage results confirm an abrupt junction with a homogenous distribution of the impurities inside the space charge region. Information on the depletion region, built-in voltage and net carrier concentration were obtained from the dark C-V characteristics.     

ZnO/Si异质结的光电转换特性研究

利用直流反应溅射方法在p型Si衬底上生长掺Al的n型ZnO薄膜,测量了由n型ZnO薄膜和p型Si衬底组成的异质结在黑暗和光照条件下的I-V特性,结果表明该异质结具有优良的整流特性,而且在光照条件下的反向电流迅速增大并很快趋于饱和.通过测量ZnO薄膜的光电流和异质结的光电压的光谱响应,初步分析了异质结的光电转换机理.测量结果显示,在入射光波长为380nm时光电流强度明显下降,反映出光电流与ZnO薄膜禁带宽度的密切关系;同时还发现,在与ZnO禁带宽度相对应的波长前后所产生的光生电压方向相反.推测这一现象与异质结的能带结构密切相关. 关键词： ZnO薄膜 异质结 光电转换 光谱响应     

一种新型Si/SiGe/Si双异质结PIN电学调制结构的异质结能带分析

PIN结构是电光调制器中常见的一种电学调制结构, 该结构中载流子注入效率直接影响着电光调制器的性能. 在前期的研究中, 我们在SOI材料的基础上提出了一种新型Si/SiGe/Si双异质结PIN电学调制结构, 可以有效提高载流子注入效率, 降低调制功耗. 为了进一步研究这种新型调制器结构的调制机理, 本文从单异质结能带理论出发, 定量分析了该新型结构中双异质结的势垒高度变化, 给出了双异质结势垒高度的定量公式, 将新型结构与SiGe-OI和SOI两种PIN电学调制结构进行能带对比, 分析了该新型结构载流子注入增强的原因, 最后模拟了新型结构的能带分布, 以及能带和调制电压与注入载流子密度的关系, 并与SiGe-OI和SOI两种PIN电学调制结构进行对比发现, 1 V调制电压下, 新型结构的载流子密度达到了8× 10¹⁸cm^-3, 比SOI 结构的载流子密度高了800%, 比SiGe-OI结构的载流子密度高了340%, 进一步说明了该新型结构的优越性, 并且验证了理论分析的正确性.