InGaN量子点的诱导生长和发光特性研究

降低InGaN的维数是提高GaN基发光器件发光效率的一种非常有效的方法，本文的工作主要集中在高密度InGaN量子点的生长和分析上。在MOCVD设备上，经过钝化和低温两个特殊工艺条件，在高温CaN表面生长了一层低温岛状GaN．形成表面形貌的起伏，进而导致表面应力的不均匀分布。在这一层低温岛状GaN的诱导性作用下生长并形成InGaN量子点。通过原子力显微镜、透射电子显微镜和光致发光谱对其徽观形貌和光学性质进行了观察和研究。从原子力显微镜以及透射电子显微镜观察得到的结果表明：InGaN量子点为平均直径约30nm、高度约25nm、分布较均匀的圆锥，其密度约10^11cm^-2。室温下，InGaN量子点材料的PL谱强度大大超出相同条件生长的InGaN薄膜材料。这些现象表明，用InGaN量子点代替普通InGaN薄膜．有望获得发光效率更高的GaN基发光器件。     

溅射沉积自诱导混晶界面与Ge量子点的生长研究

在不同的沉积温度下采用离子束溅射技术,在Si基底上生长得到分布密度高、尺寸单模分布的圆顶形Ge量子点.研究发现:随沉积温度的升高Ge量子点的分布密度增大,尺寸减小,当沉积温度升高到750 ℃时,溅射沉积15个单原子层厚的Ge原子层,生长得到高度和底宽分别为14.5和52.7 nm的Ge量子点,其分布密度高达1.68×10¹⁰ cm^-2;Ge量子点的形貌、尺寸和分布密度随沉积温度的演变规律与热平衡状态下气相凝聚的量子点不同,具有稳定形状特征和尺寸分布的Ge量子点是 关键词： Ge量子点 离子束溅射沉积 表面原子行为 混晶界面     

不同盖层对InAs/GaAs量子点结构和光学性质的影响

利用金属有机化合物气相沉积设备生长了不同盖层结构的InAs/GaAs量子点,采用原子力显微镜和光致发光光谱仪对量子点的结构和光学性质进行了研究.量子点层之间的盖层由一个低温层和一个高温层组成.对不同材料结构的低温盖层的对比研究表明,In组分渐变的InGaAs低温盖层有利于改善量子点均匀性、减少结合岛数目、提高光致发光强度;当组分渐变InGaAs低温盖层厚度由6.8 nm增加到12 nm,发光波长从1256.0 nm红移到1314.4 nm.另外,还对不同材料结构的高温盖层进行了对比分析,发现高温盖层采用In组分渐变的InGaAs材料有利于光致发光谱强度的提高. 关键词： 半导体量子点 盖层 组分渐变     

PbTe/CdTe量子点的光学增益

PbTe/CdTe量子点是一类新型异系低维结构材料,实验发现具有强的室温中红外光致发光现象.为研究这一材料体系的发光特性,建立了理论模型,计算了PbTe/CdTe量子点的光学跃迁和增益.模型基于k·p包络波函数方法并考虑了PbTe能带结构的各向异性.分析了量子点光学增益与量子点尺寸、注入载流子浓度的关系.结果表明,当注入载流子浓度在(0.3—3)×10¹⁸cm^-3范围时,尺寸为15—20nm的量子点可以产生 关键词： PbTe/CdTe量子点 光学增益 铅盐矿半导体     

核壳结构硒化镉/硫化镉/巯基乙酸量子点载流子输运特性

采用水溶液法合成了巯基乙酸(TGA) 包覆的CdSe 量子点. 通过X 射线粉末衍射和高分辨透射显微镜检测结果证实, 合成得到闪锌矿结构CdSe 量子点. 能谱图和傅里叶变换红外光谱图结果说明, 在核CdSe 纳米粒子表面与配体TGA 之间有CdS 壳层结构形成. 利用样品表面光电压(SPV) 谱, 指认CdSe 量子点精细能带结构以及各自对应的激发态特征: 475 nm (2.61 eV) 和400 nm (3.1 eV) 两个波长处的SPV 响应峰分别与CdSe 核和CdS 壳层带-带隙跃迁相对应; 370 nm (3.35 eV) 附近SPV 响应峰可能与TGA 中羰基与巯基或羧基之间发生的n →π^* 跃迁有关. 场诱导表面光电压谱结果证实, 合成的CdSe 量子点具有明显的N 型表面光伏特性, 而上述n→π^* 跃迁则具有P 型表面光伏特性. 荧光光谱谱线均匀增宽以及SPV 响应峰位蓝移, 说明样品具有明显的量子尺寸效应. 结合不同pH 值下合成的CdSe 量子点的SPV 谱和表面光声谱发现, SPV 响应强度与表面光声光谱信号强度变化趋势恰好相反. 上述样品表面光伏效应表明, CdSe 量子点表面和相界面处的精细电子结构以及光生载流子的输运特性均与量子点的尺寸大小存在某种内在联系. 关键词： 硒化镉量子点 光生载流子 表面光电压谱 表面光声光谱     

GaSb/GaAs复合应力缓冲层上自组装InAs量子点的生长

研究了GaSb/GaAs复合应力缓冲层上自组装生长的InAs量子点.在2ML GaSb/1ML GaAs复合应力缓冲层上获得了高密度的、沿［100］方向择优分布量子点.随着复合应力缓冲层中GaAs层厚度的不同,量子点的密度可以在1.2×10¹⁰cm^-2和8×10¹⁰cm^-2进行调控.适当增加GaAs层的厚度至5ML,量子点的发光波长红移了约25nm,室温下PL光谱波长接近1300nm. 关键词： 自组装量子点 分子束外延 Ⅲ-Ⅴ族化合物半导体     

InGaN合金中LO声子-等离子激元耦合模的研究

分别采用532,488 nm可见光和325 nm紫外光激发,对金属有机化学气相沉积法在蓝宝石衬底上生长的六方相InGaN/GaN薄膜样品在室温和78 K低温下的拉曼散射谱进行了研究。在可见光激发时,E₂模和A₁(LO)模的散射信号主要来自GaN层;采用紫外光激发时,A₁(LO)模向低频方向移动且共振增强,此散射信号来自InGaN层。在可见光激发的情况下,在A₁(LO)模的高频方向观察到一个宽峰,此宽峰为InGaN的LO声子-等离子激元耦合模,根据耦合模频率得到InGaN层中的电子浓度为n_ｅ＝1.61×1018 cm-3。紫外光激发时,没有观察到耦合模,A₁(LO)模散射信号主要来自样品表面耗尽层,由此估算样品中的耗尽层宽度大约在40 nm。此外,还对比分析了在室温和78 K低温下LO声子-等离子激元耦合模的散射强度的变化规律,计算了不同温度下等离子激元的屏蔽波矢。这些结论对于了解InGaN材料的基本性质以及氮化物光电器件的开发利用都有重要参考价值。     

MOVPE生长的InGaN/GaN单量子阱的光致发光和光吸收特性

研究了用金属有机物气相外延(MOVPE)法在蓝宝石衬底上生长的In组分浓度保持不变的InGaN/GaN单量子阱结构在室温下的发光特性和光吸收特性.实验结果表明,在InGaN厚度<3nm时,随着样品InGaN势阱层宽度的增加(1nm),光致发光(PL)谱的发光峰值波长出现明显的红移33nm现象,而且发光强度下降8%,谱线半峰全宽(FWHM)展宽,通过对样品的透射、反射光谱研究发现,量子阱层窄(1.5nm)的样品在波长接近红外区时出现无吸收的现象,即R+T达到了100%,而在阱层较宽的样品中没有发现这一现象,对引起这些现象的原因进行了讨论.这些结果有助于开发和优化三族氮化物半导体光电器件的进一步研究工作.     

V形坑尺寸对硅衬底InGaN/AlGaN近紫外LED光电性能的影响

使用MOCVD在图形化Si衬底上生长了InGaN/AlGaN近紫外LED,通过改变低温GaN插入层的厚度调控V形坑尺寸,系统地研究了V形坑尺寸对InGaN/AlGaN近紫外LED(395 nm)光电性能的影响。结果表明,低温GaN插入层促进了V形坑的形成,并且V形坑尺寸随着插入层厚度的增加而增大。在电学性能方面,随着V形坑尺寸的增大,-5 V下的漏电流从5.2×10~(-4)μA增加至6.5×10~2μA;350 mA下正向电压先从3.55 V降至3.44 V,然后升高至3.60 V。在光学性能方面,随着V形坑尺寸的增大,35 A/cm~2下的归一化外量子效率先从0.07提高至最大值1,然后衰退至0.53。对V形坑尺寸影响InGaN/AlGaN近紫外LED光电性能的物理机理进行了分析,结果表明:InGaN/AlGaN近紫外LED的光电性能与V形坑尺寸密切相关,最佳的V形坑尺寸为120~190 nm,尺寸太大或者太小都会降低器件性能。     

近红外波段InAs量子点结构与光学特性

采用分子束外延技术,分别在480,520℃的生长温度下,制备了淀积厚度2.7ML的InAs/GaAs量子点。用原子力显微镜对样品进行形貌测试和统计分布。结果表明,在相应的生长温度下,量子点密度分别为8.0×10¹⁰,5.0×10⁹cm^-2,提高生长温度有利于获得大尺寸的量子点,并且量子点按高度呈双模分布。结合光致发光谱的分析,在480℃的生长条件下,最近邻量子点之间的合并导致了量子点尺寸的双模分布;而在525℃的生长温度下,In偏析和InAs解析是形成双模分布的主要原因。     

Influences of excitation power and temperature on photoluminescence in phase-separated InGaN quantum wells

The photoluminescence(PL) properties of a green and blue light-emitting InGaN/GaN multiple quantum well structure with a strong phase separated into quasi-quantum dots(QDs) and an InGaN matrix in the InGaN epilayer are investigated.The excitation power dependences of QD-related green emissions(P_D) and matrix-related blue emissions(P_M) in the low excitation power range of the PL peak energy and line-width indicate that at 6 K both P_m and P_D are dominated by the combined action of Coulomb screening and localized state filling effect.However,at 300 K,P_m is dominated by the non-radiative recombination of the carriers in the InGaN matrix,while P_D is influenced by the carriers transferred from the shallower QDs to deeper QDs by tunnelling.This is consistent with the excitation power dependence of the PL efficiency for the emission.     

Photoluminescence of InAs Self-Organized Quantum Dots Formation on InP Substrate by MOCVD

In this letter, we present results of photoluminescence (PL) emission from single-layer and multilayer InAs self-organized quantum dots (QDs), which were grown on (001) InP substrate. The room temperature PL peak of the single-layer QDs locates at 1608 nm, and full width at half-maximum (FWHM) of the PL peak is 71 meV. The PL peak of the multilayer QDs locates at 1478 nm, PL intensity of which is stronger than that of single-layer QDs. The single-layer QD PL spectra also display excited state emission and state filling as the excitation intensity is increased. Low temperature PL spectra show a weak peak between the peaks of QDs and wetting layer (WL), which suggests the recombination between electrons in the WL and holes in the dots.     

Effect of deposition period on structural and optical properties of InGaAs/GaAs quantum dots formed by InAs/GaAs short-period superlattices

Structural and optical properties of In_0.5Ga_0.5As/GaAs quantum dots (QDs) grown at 510 °C by atomic layer molecular beam epitaxy technique are studied as a function of n repeated deposition of 1-ML-thick InAs and 1-ML-thick GaAs. Cross-sectional images reveal that the QDs are formed by single large QDs rather than closely stacked InAs QDs and their shape is trapezoidal. In the image, existence of wetting layers is not clear. In 300 K-photoluminescence (PL) spectra of InGaAs QDs (n=5), 4 peaks are resolved. Origin of each peak transition is discussed. Finally, it was found that the PL linewidths of atomic layer epitaxy (ALE) QDs were weakly sensitive to cryostat temperatures (16–300 K). This is attributed to the nature of ALE QDs; higher uniformity and weaker wetting effect compared to SK QDs.     

温度对CdSe/ZnS量子点吸收光谱和光致发光谱的影响

测量了分散于正己烷溶液和甲苯溶液中的CdSe/ZnS量子点在室温到近溶液沸点温度间的吸收与光致发光光谱,比较了两种不同的CdSe/ZnS量子点的光谱特性,讨论了温度对吸收和光致发光光谱峰值波长以及相对强度的影响。结果表明:在25~100℃范围内,CdSe/ZnS量子点激子吸收峰波长有微小红移,最大约为4nm;光致发光光谱峰值波长略有红移,但最大不超过6nm。根据光致发光光谱测量的结果,确定了Varshni定律中关于CdSe/ZnS量子点禁带宽度的两个经验参数:α=(2.0±0.2)×10^-4eV/K和β=(200±30)K。温度对CdSe/ZnS量子点吸收强度影响不大,荧光发射强度与温度呈线性关系增强。     

Temperature-dependent photoluminescence of dimethylzinc-treated ZnSe/ZnS quantum dots

Temperature-dependent photoluminescence (PL) measurements were carried out ZnSe/ZnS quantum dots (QDs) grown with post-growth interruption under a dimethylzinc (DMZn) flow. The PL spectra showed sigmoidal peak shifts and V-shaped full width at half maximum (FWHM) variations with increasing temperature, which strongly suggest that the QD structure of ZnSe/ZnS is quite similar to that of other material systems grown in the Stranski–Krastanov mode. Apparent differences are revealed as a consequence of DMZn treatment: (i) the PL spectra of ZnSe/ZnS QDs showed peaks at higher energies and persisted up to 300 K, and(ii) the minimum points of the V-shaped FWHM appear at a higher temperature compared to H₂-purged ZnSe/ZnS QDs. Experimental results demonstrate the enhancement of localization energy.     

Growth and optical characterization of single quantum well structure of submonolayer ZnS/ZnTe

Single quantum wells of submonolayer ZnS/ZnTe were grown between ZnTe layers using hot wall epitaxy method with fast-movable substrate configuration. As ZnS well widths decrease from 1 to 0.15 monolayer, the photoluminescence peaks shift to higher energies from 2.049 to 2.306 eV, and the photoluminescence intensities increase. As ZnS well width decrease, the PL spectra show the lower-energy tails and consequently the increased PL FWHMs. This is a result of a convolution of two PL peaks from two-dimensional and zero-dimensional quantum islands, supported by a still lived lower-energy peaks of zero-dimensional quantum islands above 50 K. The energy shift in the power dependence of photoluminescence spectra is proportional to the third root of the excitation density. These behaviors can be described by the formation of submonolayer type-II ZnS/ZnTe quantum well structure, and the coexistence of two-dimensional and one-dimensional islands in ZnS layers.     

Annealing of In0.45Ga0.55As/GaAs quantum dots overgrown with large monolayer (11 ML) coverage for applications in thermally stable optoelectronic devices

The effects of thermal annealing on the large monolayer (11 ML) coverage of In_0.45Ga_0.55As/GaAs quantum dots (QDs) is being investigated in this study. Low temperature (8 K) photoluminescence (PL) spectra exhibits suppressed blueshift of the strongest PL emission peak even at high temperature annealing (800 °C). TEM and DCXRD characterizations showed the existence of the dots with good crystalline quality at annealing temperatures of 800-850 °C. The physics of annealing induced compositional modification of the InGaAs QDs with various monolayer coverage has been studied by a theoretical model and simulation. All our studies establish the thermal stability of large ML coverage InGaAs QDs, which is desirable for optoelectronic devices required for selective wavelength tuning in specific applications.     

Bandgap engineering of self-assembled InAs quantum dots with a thin AlAs barrier

We investigate the effects of a thin AlAs layer with different position and thickness on the optical properties of InAs quantum dots (QDs) by using transmission electron microscopy and photoluminescence (PL). The energy level shift of InAs QD samples is observed by introducing the thin AlAs layer without any significant loss of the QD qualities. The emission peak from InAs QDs directly grown on the 4 monolayer (ML) AlAs layer is blueshifted from that of reference sample by 219 meV with a little increase in FWHM from 42–47 meV for ground state. In contrast, InAs QDs grown under the 4 ML AlAs layer have PL peak a little redshifted to lower energy by 17 meV. This result is related to the interdiffusion of Al atom at the InAs QDs caused by the annealing effect during growing of InAs QDs on AlAs layer.     

Power density and temperature dependent multi-excited states in InAs/GaAs quantum dots

Self-assembled InAs/GaAs (001) quantum dots (QDs) were grown by molecular beam epitaxy using ultra low-growth rate. A typical dot diameter of around 28 ± 2 nm and a typical height of 5 ± 1 nm are observed based on atomic force microscopy image. The photoluminescence (PL) spectra, their power and temperature dependences have been studied for ground (GS) and three excited states (1–3ES) in InAs QDs. By changing the excitation power density, we can significantly influence the distribution of excitons within the QD ensemble. The PL peak energy positions of GS and ES emissions bands depend on an excitation light power. With increasing excitation power, the GS emission energy was red-shifted, while the 1–3ES emission energies were blue-shifted. It is found that the full width at half maximum of the PL spectra has unusual relationship with increasing temperature from 9 to 300 K. The temperature dependence of QD PL spectra shown the existence of two stages of PL thermal quenching and two distinct activation energies corresponding to the temperature ranges I (9–100 K) and II (100–300 K).     

InGaAsN量子阱的光致发光谱研究(英文)

我们测量了低N组分的InGaAsN/InGaAs/GaAs量子阱材料的光致发光(PL)谱,测量温度范围从13K到300K。实验结果显示,InGaAsN的PL谱的主峰值的能量位置随温度的变化呈现出反常的S型温度依赖关系。用Varshni经验公式对实验数据进行拟合之后,发现在低温下InGaAsN量子阱中的载流子是处于局域态的。此外,我们还测量了样品在不同的温度、不同的能量位置的瞬态谱,结果进一步证实了:在低温下,InGaAsN的PL谱谱峰主要是局域态激子的复合发光占据主导地位,而且InGaAsN中的载流子局域态主要是由N等电子缺陷造成的涨落势引起的。