深能级对AlGaInP/GaAs异质结双极晶体管性能的影响

用深能级瞬态光谱和光致发光(PL)方法研究了AlGaInP/GaAs异质结双极晶体管(HBT)发射区AlGaInP中的深能级.得到了两个深能级,分别为E_c-E_t1＝0.42eV和E_c-E_t2＝0.59eV,其复合截面为σ_n1＝6.27×10^-17cm²和σ_n2＝6.49×10^-20cm². 关键词：     

CdS/CdTe薄膜太阳电池的深能级瞬态谱和光致发光研究

用深能级瞬态谱和光致发光研究了无背接触层的CdS/CdTe薄膜太阳电池的杂质分布和深能级中心.得到了净掺杂浓度在器件中的分布.确定了两个能级位置分别在E_V+0365 eV和E_V+0282 eV的深中心,它们的浓度分别为167×10¹² cm^-3和386×10¹¹ cm^-2,俘获截面分别为143×10^-14cm²和153×10^-16cm².它们来源于以化学杂质形式存在的Au和（或）Te_Cd^-复合体,或与氩氧气氛下沉积CdTe时的氧原子相关. 关键词： 深能级瞬态谱 光致发光 CdS/CdTe太阳电池     

质子辐照对纯铝薄膜微观结构的影响

利用透射电子显微镜(TEM)详细分析了不同剂量的质子辐照纯铝薄膜样品的微观结构, 质子的能量E=160 keV.实验表明,质子辐照能够在Al薄膜中诱发空位位错圈,在实验范围内,位错密度随辐照剂量的增加而增加;质子辐照在1×10¹¹—4×10¹¹/mm²范围内随辐照剂量的增加,位错圈数量密度以及位错圈尺寸都随之增加.在较高剂量6×10¹¹/mm²辐照下,位错圈数量密度减小,但其尺寸显著 关键词： 质子辐照 空位簇缺陷 位错圈 微观结构     

立方体AgCl微晶中［Fe(CN)6］4-引入的浅电子陷阱阱深与俘获截面的动力学模拟

为了描述在晶体生长阶段掺入［Fe(CN)₆］^4-的立方体AgCl微晶中 光电子的产生与 衰减过程，建立了一种由三个固有中心和一个浅电子陷阱(SETs)组成的动力学模型，并引出一组微分方程.通过求解微分方程得到与实验结果相符合的光电子衰减曲线及其寿命.调整相 关模拟参数，于常温下得到由［Fe(CN)₆］^4-引入的SETs阱深为0.1 15eV，电子俘获截面为2.136×10^-17cm². 关键词： 光电子 浅电子陷阱 俘获截面 AgCl微晶     

Rb(62D)原子与基态Rb原子,H2分子碰撞转移截面

本文用荧光法测量Rb(6²D)原子与基态Rb原子,H₂分子碰撞转移截面。结果表明:Rb(6²D)-Rb(5²s)转移截面为σ_fs=67×10^-14cm²,σ_tr=4.3×10^-14cm²,Rb(6²D)—H₂转移截面为σ_fs 关键词：     

位移损伤诱发CMOS图像传感器电荷转移损失退化的理论模拟研究

以4T PPD（4个晶体管的钳位光电二极管）型CMOS图像传感器为研究对象，开展注量为1×10¹¹,3×10¹¹,5×10¹¹,7×10¹¹,1×10¹² neutron/cm²的中子辐照下损伤模拟的研究，建立CMOS图像传感器的器件模型和不同注量中子辐照后位移损伤的缺陷模型；采用相关双采样技术测量由亮到暗连续两帧时序脉冲下浮置节点（FD）的输出值，建立测量电荷转移损失（CTI）的模拟方法；获得CTI随中子辐照注量的变化关系，分析CTI随中子累积注量的变化规律，结合中子辐照效应实验验证中子辐照诱发CTI退化的理论模拟计算结果的有效性。研究结果表明，CMOS图像传感器的位移损伤敏感区域为空间电荷区域，中子辐照后会在空间电荷区中引入位移损伤缺陷，这些缺陷通过不断俘获和发射载流子，使信号电荷不能快速转移到FD中，造成电荷转移损失；电荷转移损失随着中子辐照注量的增加而增大，二者在一定范围内呈线性关系。     

一种新型掺铒碲酸盐玻璃的光谱性质研究

研究了一种新型掺Er³⁺碲酸盐玻璃的光谱性质；应用Judd-Ofelt理论计算了碲 酸盐玻璃中Er³⁺离子的强度参数Ω(Ω₂=479×10^-20 cm²,Ω₄= 152×10^-20cm²,Ω₆=066×10^-20cm2)，计算了离子的自发跃迁概 率，荧光分支比；应用McCumber理论计算了Er³⁺的受激发射截面(σ_{e=1040×1 0^-21cm²)，Er³⁺离子⁴I13/ 2→⁴I15/2发射谱的 荧光半高宽(FWHM=655nm)及各能级的荧光寿命(⁴I13/2 能级为τrad =399ms)；比较了不同基质玻璃以及不同类型碲酸盐玻璃中Er³⁺离子的光谱 特性， 结果表明该掺铒碲酸盐玻璃具有更好的光谱性能，更适合于掺Er³⁺光纤放大 器实现宽带和高增益放大. 关键词： 碲酸盐玻璃 光谱性质 Judd-Ofelt理论}     

等离子体氧轰击硅生成缺陷的研究

本文对等离子体氧轰击硅产生的缺陷进行了研究。发现等离子体氧轰击在硅中引入两个缺陷E₁(E_c—0.46eV)及E₂(E_c—0.04eV)。测量了缺陷的光电离截面谱,分析表明,缺陷E₂的电子声子相互作用很强,其Frank-Condon移动达0.76eV,缺陷E₁的电子声子相互作用较小,其Frank-Condon移动为0.04eV。由实验结果得到与缺陷E₁、E₂相耦合的声子模分别为hω_p⁽¹⁾=28meV,hω_p⁽²⁾=20meV。 关键词：     

Ti/4H-SiC肖特基势垒二极管抗辐射特性的研究

本文采用γ射线、高能电子和中子对Ti/4H-SiC肖特基势垒二极管(SBD)的抗辐射特性进行了研究.研究发现对于γ射线和1 MeV电子辐照,-30 V辐照偏压对器件的辐照效应没有明显的影响.经过1 Mrad(Si)的γ射线或者1×l0¹³ n/cm²的中子辐照后,Ti/4H-SiC肖特基接触都没有明显退化;经过3.43×10¹⁴ e/cm²的1 MeV电子辐照后Ti/4H-SiC的势垒高度比辐照前轻微下降,这是由于高能 关键词： 碳化硅 肖特基 辐照 偏压     

MgⅪ 1s3p-1s4p能级间平均高温及高密度条件下的粒子数反转

采用最新设计带侧向喷口的微管靶,当微管内壁平均激光辐照强度约为3.5×10¹³W·cm^-2时,观察到沿整个喷口1s3p ¹P₀⁰和1s4p ¹P₀⁰能级间强烈的粒子数反转。测得相应环境等离子体平均电子温度470—520eV,密度约为2×10²⁰cm^-3。分析了可能导致高温条件下粒子数反转的机制。 关键词：     

Photoelectronic investigations of semi-insulating p-type GaAs:Cr containing neutral chromium acceptors

A photoelectronic analysis of p-type GaAs:Cr, i.e. measurements of thermally stimulated currents and the dependences of photoconductivity and photo-Hall effect on photon energy, temperature and light intensity, have enabled trap locations and densities as well as properties of neutral chromium acceptors to be determined. Hole traps proved to be located at 0.15 and 0.23 eV above the valence band, and their densities have been estimated to be 10¹⁵ cm^?3 and 5 × 10¹⁶ cm^?3 respectively. Their occurrence is related to the presence of copper in the samples investigated. Neutral chromium acceptors are located at 0.77 eV above the valence band and are at a constant distance from the conduction band. Their photoionization cross-section is 3 × 10^?17 cm² while the photoexcited electron escape cross-section is about 10^?20 cm². The potential of a neutral Cr acceptor is of the delta function type with weak coulombic tails. The maximum radius of the Bohr orbit of an electron in the ground state is 4 atomic units.     

On the 0.34 eV hole trap in irradiated boron-doped silicon

Abstract

A detailed deep level transient spectroscopy (DLTS) study has been carried out on a prominant hole trap at 0.34 eV above the valence band in irradiated p-type silicon. The boron concentration in the float zone and Czochralski-grown samples varied between 10¹² and 10¹⁶ cm^?3, and irradiations with 2.0 MeV electrons have been performed at nominal room temperature to total fluences of 1.0 × 10¹⁶ and 1.0 × 10¹⁷ e^?/cm². The introduction rate of the trap is strongly boron-dependent, while the oxygen content in the samples does not influence neither the trap production rate nor its observed annealing behaviour. In the light of these observations and other available data on this trap, a boron-carbon pair is here tentatively proposed as the defect identity. A previously unreported hole trap at 0.45 eV above the valence band has also been observed in this work in highly boron-doped material. The isothermal and isochronal annealing characteristics of both traps have been investigated up to 400°C.     

Gap states in hydrogenated amorphous silicon: A comparison of photoemission and photoconductivity results

We report photoemission results from which we directly determined the density of states g(E) in the gap of a-Si:H between the top of the valence band E_v and the Fermi level. At 0.4 eV above E_v, g(E) was found to be ≈1×10²⁰ cm^-3 eV^-1 in the undoped film; P-doping increased g(E) in this region whereas annealing reduced it. The photoconductivity-derived optical absorption spectrum matched the shape of the photoemission spectrum, and thus supports the explanation that the photoconductivity shoulder at photon energies in the region of 1.3 eV is due to transitions from localized states above the valence band to the conduction band.     

Trapping levels in PbI2

A first investigation on trapping levels in PbI₂, performed by the Thermally Stimulated Current (TSC) technique, is presented. Three hole trapping centers are evidenced at 0.12, 0.29 and 0.59 eV above the valence band, with densities ranging between 8 × 10¹⁴ and 5 × 10¹⁶ cm^?3 and capture cross-sections between 8 × 10^?21 and 3 × 10^?17 cm². The center at 0.59 eV is likely responsible for the relatively short trapping time in PbI₂, as determined with nuclear techniques. By using a particular method, the behaviour of hole drift mobility along the layers as a function of temperature is determined for the first time. Finally, the presence of a spurious peak, not sensitive to irradiation, is reported and discussed.     

Electrical conduction mechanism and carrier trapping in β-metal free phthalocyanine single crystals

The dark electrical conductivity of β-metal free phthalocyanine single crystals has been investigated over the temperature range 273–600°K, at a reduced pressure of 10^?7 torr. The results obtained are in accordance with the model proposed by Barbe and Westgate[5] for this material, in which the energy gap between the top of the valence band and the bottom of the conduction band is determined to be 2·00 eV. At temperatures below about 410°K, the conduction process is consistent with the presence of an electron trapping level located 0·32 eV below the conduction band edge, with a density of 7×10¹⁶ cm^?3, and a donor level of density 2×10⁷ cm^?3 at the same energy. Above about 410°K, there is evidence to suggest that the conduction process is intrinsic.     

Deep levels in gallium arsenide by capacitance methods

The three capacitance methods, i.e., TSCAP, PHCAP, and transient capacitance measurements, are applied to determine electronic properties of deep levels inn-GaAs. In the boat-grown wafer detected are the 0.30 eV electron trap withN _T =3.6×10¹⁶ cm^?3 andS _n =2.4×10^?15 cm², and the 0.75 eV electron trap withN _T =2.0×10¹⁶ cm^?3 andS _n =1.2×10^?14 cm². In the epitaxial wafer, the 0.45 eV hole trap is detected withN _T >1.5×10¹³ cm^?3 andS _p =1.4×10^?14 cm² as well as the 0.75 eV electron trap withN _T =2.4×10¹³ cm^?3.     

Hole contribution to the elastic constants of SnTe

Ultrasonic wave velocities have been measured in SnTe single crystals with hole concentrations of 1.0 and 4.5 × 10²⁰/cm³. The shear elastic stiffness constant C₄₄ is sensitive to the hole concentration but $\text{1}\text{2}\text{(C}{}_{11}\text{? C}{}_{12}\text{)}$ is not, a result which is consistent with the valence band pockets being sited at the L points. The non-ellipsoidal, non-parabolic multivalley band model has been used to calculate the hole contribution to the elastic constants. The calculated difference between the shear constant C₄₄ (2.78 × 10¹⁰ dyne cm^-2) for the two crystals is in agreement with that measured experimentally (2.67 × 10¹⁰ dyne cm^-2). The shear deformation potential constant E_u for the SnTe valence band is 7.8 eV at 293°K.     

Electron capture cross-section in copper doped CdS

The electron capture cross-section of the dominant copper-related center in CdS, 1.1 eV above the valence band, has been measured directly using space charge junction techniques. The cross-section is independent of temperature between 150 and 720 K and has a value of 1.2 × 10^?20 cm².     

Electrical characterisation of ruthenium Schottky contacts on n-Ge (1 0 0)

Ruthenium (Ru) Schottky contacts were fabricated on n-Ge (1 0 0) by electron beam deposition. Current–voltage (I–V), deep level transient spectroscopy (DLTS), and Laplace-DLTS techniques were used to characterise the as-deposited and annealed Ru/n-Ge (1 0 0) Schottky contacts. The variation of the electrical properties of the Ru samples annealed between 25 °C and 575 °C indicates the formation of two phases of ruthenium germanide. After Ru Schottky contacts fabrication, an electron trap at 0.38 eV below the conduction band with capture cross section of 1.0×10⁻¹⁴ cm⁻² is the only detectable electron trap. The hole traps at 0.09, 0.15, 0.27 and 0.30 eV above the valence band with capture cross sections of 7.8×10⁻¹³ cm⁻², 7.1×10⁻¹³ cm⁻², 2.4×10⁻¹³ cm⁻² and 6.2×10⁻¹³ cm⁻², respectively, were observed in the as-deposited Ru Schottky contacts. The hole trap H(0.30) is the prominent single acceptor level of the E-centre, and H(0.09) is the third charge state of the E-centre. H(0.27) shows some reverse annealing and reaches a maximum concentration at 225 °C and anneals out after 350 °C. This trap is strongly believed to be V–Sb₂ complex formed from the annealing of V–Sb defect centre.     

Electron traps in GaS

Measurements performed on n-GaS by means of the space-charge limited current method indicate the presence of a deep trap for electrons, at 0.57 eV from the conduction band and with a density of about 2.3 × 10¹³cm^?3. Another deeper trap at 0.63 eV and with a density of 6 × 10¹²cm^?3 is probably also present. The results seem to confirm the validity of a new direct method of analysis. Traps are tentatively attributed to compensated sulphur vacancies.