Vacuum-UV negative photoion spectroscopy of SF5CF3

Ion pair formation, generically described as AB-->A(+)+B(-), from vacuum-UV photoexcitation of trifluoromethyl sulfur pentafluoride, SF(5)CF(3), has been studied by anion mass spectrometry using synchrotron radiation in the photon energy range of 10-35 eV. The anions F(-), F(2)(-), and SF(x)(-) (x=1-5) are observed. With the exception of SF(5)(-), the anions observed show a linear dependence of signal with pressure, showing that they arise from ion pair formation. SF(5)(-) arises from dissociative electron attachment, following photoionization of SF(5)CF(3) as the source of low-energy electrons. Cross sections for anion production are put on to an absolute scale by calibration of the signal strengths with those of F(-) from both SF(6) and CF(4). Quantum yields for anion production from SF(5)CF(3), spanning the range of 10(-7)-10(-4), are obtained using vacuum-UV absorption cross sections. Unlike SF(6) and CF(4), the quantum yield for F(-) production from SF(5)CF(3) increases above the onset of photoionization.     

Electronegativities from core-ionization energies: electronegativities of SF5 and CF3

Core-ionization energies have been measured for SF(6) (S 2p), SF(5)SF(5) (S 2p), SF(5)Br (S 2p and Br 3d), and SF(5)CF(3) (S 2p and C 1s). These results, together with others that establish correlations between core-ionization energies and Pauling electronegativities, make it possible to assign group electronegativities to SF(5) and CF(3). This method gives electronegativities for these groups comparable to that of bromine, whereas analysis of the effect of these groups on acidity indicates electronegativities comparable to that of fluorine. Other methods of estimating electronegativity fall between these extremes. These disparities can be understood in part as reflecting the effects of polarizibility of the substituent, which tends to lower both the core-ionization energy and the deprotonation energy, making the electronegativity appear to be less in one case and more in the other. In addition, and possibly more important, the core-ionization energies presented here reflect the effect of the group on an adjacent atom, whereas the acidity reflects the effect on a remote atom. It appears that fluorine has a large effect on an adjacent atom but a relatively small effect on a remote atom. By contrast SF(5) and CF(3) have a relatively small effect on an adjacent atom, but this effect falls off only slowly with distance from the substituent. Thus, the effective electronegativities of CF(3) and SF(5) relative to those of the halogens depend on the site at which the molecule is probed as well as on the process that is under consideration.     

When SF5 outplays CF3: effects of pentafluorosulfanyl decorated scorpionates on copper

Polyfluorinated, electron-withdrawing, and sterically demanding supporting ligands are of significant value in chemistry. Here we report the assembly and use of a bis(pyrazolyl)borate, [Ph₂B(3-(SF₅)Pz)₂]⁻ that combines all such features, and involves underutilized pentafluorosulfanyl substituents. The ethylene and carbonyl chemistry of copper(i) supported by [Ph₂B(3-(SF₅)Pz)₂]⁻, a comparison to the trifluoromethylated counterparts involving [Ph₂B(3-(CF₃)Pz)₂]⁻, as well as copper catalyzed cyclopropanation of styrene with ethyl diazoacetate and CF₃CHN₂ are presented. The results from cyclopropanation show that SF₅ groups dramatically improved the yields and stereoselectivity compared to the CF₃.

Copper–ethylene and carbonyl complexes of the newly developed [Ph₂B(3-(SF₅)Pz)₂]⁻ enable the study of ligand steric and electronic effects caused by the –SF₅ group (dubbed “super CF₃”), and a comparison to the –CF₃ bearing analogs.     

Mechanistic studies on the formation of trifluoromethyl sulfur pentafluoride, SF5CF3--a greenhouse gas

The formation of SF5CF3(X1A'), through the radical-radical recombination of SF5(X2A1) and CF3(X2A1), was observed for the first time in low-temperature sulfur hexafluoride-carbon tetrafluoride matrices at 12 K via infrared spectroscopy upon irradiation of the ices with energetic electrons. The nu1 fundamentals of the SF5(X2A1) and CF3(X2A1) radicals were monitored at 857 and 1110 cm-1, respectively; the newly formed trifluoromethyl sulfur pentafluoride molecule, SF5CF3(X1A'), was detected via its absorptions at 846 and 1160 cm-1. This formation mechanism suggests that a source for this potentially dangerous greenhouse gas might be the recombination of SF5(X2A1) and CF3(X2A1) radicals on aerosol particles in the terrestrial atmosphere.     

Kinetic study of the gas‐phase reaction of hydroxyl radical with CF3CH2OCH2CF3 using the laser photolysis–laser induced fluorescence method

The laser photolysis‐laser‐induced fluorescence method was used for measuring the kinetic parameters of the reaction of OH radicals with CF₃CH₂OCH₂CF₃ (2,2,2‐trifluoroethyl ether), in the temperature range of 298–365 K. The bimolecular rate coefficient at 298 K, k_II(298), was measured to be (1.47 ± 0.03) × 10^?13 cm³ molecule^?1 s^?1, and the temperature dependence of k_II was determined to be (4.5 ± 0.8) × 10^?12exp [?(1030 ± 60)/T] cm³ molecule^?1 s^?1. The error quoted is 1σ of the linear regression of the respective plots. The rate coefficient at room temperature is very close to the average of the three previous measurements, whereas the values of E_a/R and the A‐factor are higher than the two previously reported values. © 2010 Wiley Periodicals, Inc. Int J Chem Kinet 42: 519–525, 2010     

SF_5CF_3与还原性自由基C_2H_3脱氟反应机理研究

用密度泛函B3PW91/6-311g(d,p)方法对SF5CF3与还原性自由基C2H3反应机理进行了理论研究,优化了反应通道上反应物、过渡态、中间体和产物的几何构型,用内禀反应坐标计算和频率分析确认了过渡态.用精确模型算法G3(MP2)计算了各物种单点能量.研究结果表明:SF5CF3与C2H3自由基反应为多通道反应,C2H3可脱去SF5CF3分子中不同位上的F原子,分别生成3个中间体IM1,IM2和IM3.然后3个中间体发生自分解反应生成产物P1[CF2SF5+C2H3F],P2[CF3SF4(a)+C2H3F]和P3[CF3SF4(b)+C2H3F],其中Path 2和Path 3能垒高度分别为141.9和147.0kJ·mol-1,为竞争反应通道,P2和P3为反应主产物.     

VUV laser-induced fluorescence of molecular hydrogen

State-selective detection of molecular hydrogen by VUV laser-induced fluorescence has been achieved at excitation wavelengths greater than the lithium fluoride cut-off, using xenon as the non-linear medium. With this approach sensitivities of ≈10⁹ per cm³ per quantum state have been achieved under cell conditions. This method provides a simple approach to monitoring the vibrational state distribution of hydrogen and its isotopes.     

Zur Kenntnis der Sulfensäurefluoride CF3SF und CF2ClSF sowie deren Dimeren

The Sulfenic Fluorides CF₃SF and CF₂CISF and their Dimers The reactions of R_fSCl (R_f = CF₃, CF₂Cl) with HgF₂ and AgF give R_fSF and the dimer product R_fSF₂SR_f in high yield and various ratios, in contrast, activated KF leads only to R_fSF in low yield. A complex of transition metal and sulfenic halide as an intermediate step is discussed for the dimerisation. As liquid CF₃SF₂SCF₃ disproportionates into CF₃SF₃ and CF₃SSCF₃ and the hydrolysis of CF₃SF₂SCF₃ gives the stable compound CF₃S(O)SCF₃ · PF₃ reacts with R_fSF as well as with R_fSF₂SR_f to R_fSPF₄. The products of the spontaneous decomposition of CF₂ClSF were investigated. I.r., n.m.r., and mass spectra are reported and discussed. It was possible to carry out vapour pressure measurements of CF₂ClSF.     

Darstellung und spektroskopische Charakterisierung der Persulfoniumsalze (CH3)(CF3)SF3+SbF6− und (CH3)(CF3)2SF2+SbF6− und Kristallstruktur von CF3SF2+SbF6−

Preparation and Spectroscopic Characterization of the Persulfonium Salts (CH₃)(CF₃)SF₃⁺SbF₆^? and (CH₃)(CF₃)₂SF₂⁺SbF₆^? and Crystal Structure of CF₃SF₂⁺SbF₆^? [1] . The preparation of the persulfonium salts (CH₃)(CF₃)SF₃⁺SbF₆^? and (CH₃)(CF₃)₂SF₂⁺SbF₆^? by methylation of the sulfuranes CF₃SF₃ and (CF₃)₂SF₂ with CH₃OSO⁺SbF₆^? in liquid SO₂ is reported. The thermolabile compounds are characterized by IR, Raman, ¹H, ¹³C, and ¹⁹F NMR spectroscopy. CF₃SF₂⁺SbF₆^? crystallizes in the space group C2/c with a=16.889(8) Å, b=7.261(4) Å, c=13.416(7) Å, β=91.08° with 8 formula units per unit cell at 167 K. Cations and anions are connected via short SF contacts forming a Ψ-octahedral surrounding of the central S atom which is in close analogy to the already known CF₃SF₂⁺AsF₆^?.     

Spectrokinetic study of SF5 and SF5O2 radicals and the reaction of SF5O2 with NO

UV spectra of SF₅ and SF₅O₂ radicals in the gas phase at 295 K have been quantified using a pulse radiolysis UV absorption technique. The absorption spectrum of SF₅ was quantified from 220 to 240 nm. The absorption cross section at 220 nm was (5.5 ± 1.7) × 10⁻¹⁹ cm². When SF₅ was produced in the presence of O₂ an equilibrium between SF₅, O₂, and SF₅O₂ was established. The rate constant for the reaction of SF₅ radicals with O₂ was (8 ± 2) × 10⁻¹³ cm³ molecule⁻¹ s⁻¹. The decomposition rate constant for SF₅O₂ was (1.0 ± 0.5) × 10⁵ s⁻¹, giving an equilibrium constant of K_eq = [SF₅O₂]/[SF₅][O₂] = (8.0 ± 4.5) × 10⁻¹⁸ cm³ molecule⁻¹. The SF₅ O₂ bond strength is (13.7 ± 2.0) kcal mol⁻¹. The SF₅O₂ spectrum was broad with no fine structure and similar to the UV spectra of alkyl peroxy radicals. The absorption cross section at 230 nm was found to (3.7 ± 0.9) × 10⁻¹⁸ cm². The rate constant of the reaction of SF₅O₂ with NO was measured to (1.1 ± 0.3) × 10⁻¹¹ cm³ molecule⁻¹ s⁻¹ by monitoring the kinetics of NO₂ formation at 400 nm. The rate constant for the reaction of F atoms with SF₄ was measured by two relative methods to be (1.3 ± 0.3) × 10⁻¹¹ cm³ molecule⁻¹ s⁻¹. © 1994 John Wiley & Sons, Inc.     

Chalkogenfluoride in niedrigen Oxydationsstufen. V. Die ungewöhnlichen chemischen Gleichgewichte F3S?SF ⇌ 2SF2 und CF3SF2?SCF3 ⇌ 2 CF3SF

Lower Chalcogen Fluorides V. Unusual Chemical Equilibria F₃S? SF ? 2 SF₂ and CF₃SF₂? SCF₃ ? 2 CF₃SF SF₂ and CF₃SF form unusual chemical equilibria with their dimers F₃SSF and CF₃SF₂ SCF₃ involving two different bonds (SF and SS). The equilibrium between F₃SSF and SF₂ is disturbed by a decomposition reaction of these compounds yielding SF₄ and SSF₂ · K_p (298) = 2.5 · 10^?3atm, ΔH°₂₉₈ = 68.5 kJ/mol for the system F₃SSF ? 2SF₂ and K_p(298) = 1.3 × 10³ atm, δH₂₉₈ = 42.5 kJ/mol for the system CF₃SF₂SCF₃ ? 2CF₃SF have been determined as the equilibrium constants and the dissociation enthalpies. In both systems kinetic hindrance delays the achievement of the equilibrium. The rates for dissociation and decomposition are strongly surface dependent. Under favourable conditions the half-lives at 298 K for the dissociation of F₃SSF and CF₃SF₂SCF₃ are found to be ca. 8 h and ca. 2 h respectively, and for the decomposition of SF₂ and CF₃SF (p ～ 13 mbar) the values are ca. 10 h and 1 year respectively.     

A quantum mechanical study of the decomposition of CF3OCF3 and CF3CF2OCF2CF3 in the presence of AlF3

The effect of AlF3 on the decomposition of CF3OCF3 and CF3CF2OCF2CF3 is investigated using ab initio theory. Previous work by Pancansky et al. [Pacansky, J.; Waltman, R. J. J Fluorine Chem. 1997, 83, 41] showed that AlF3 significantly reduces the activation energy of the decomposition of CF3OCF3 due to the strong electrostatic interaction between the aluminum trifluoride and the reactant. In this work, a new transition-state structure and reaction mechanism have been identified for the decomposition of CF3OCF3 in the presence of AlF3. This new mechanism shows that AlF3 functions by accepting a fluorine atom from one carbon and simultaneously donating a fluorine atom to the other carbon. We show that the same pathway is obtained independently of the level of theory. The reaction rate, generated via statistical mechanics and transition-state theory, is 2-3 orders of magnitude higher for the new transition state when compared to that of the old one. The study was also performed for CF3CF2OCF2CF3 in order to ascertain the effect of chain length on the reaction mechanism and rate. We find that an analogous transition state, with lower activation energy, provides the lowest-energy path for decomposition of the longer chain.     

Synthesis of chromophores combining second harmonic generation and two photon induced fluorescence properties

The design of new chromophores presenting simultaneous SHG and TPEF properties is reported.     

Electron attachment to SF5X compounds: SF5C6H5, SF5C2H3, S2F10, and SF5Br, 300-550 K

Rate constants and ion product channels have been measured for electron attachment to four SF5 compounds, SF5C6H5, SF5C2H3, S2F10, and SF5Br, and these data are compared to earlier results for SF6, SF5Cl, and SF5CF3. The present rate constants range over a factor of 600 in magnitude. Rate constants measured in this work at 300 K are 9.9+/-3.0x10(-8) (SF5C6H5), 7.3+/-1.8x10(-9) (SF5C2H3), 6.5+/-2.5x10(-10) (S2F10), and 3.8+/-2.0x10(-10) (SF5Br), all in cm3 s-1 units. SF5- was the sole ionic product observed for 300-550 K, though in the case of S2F10 it cannot be ascertained whether the minor SF4- and SF6- products observed in the mass spectra are due to attachment to S2F10 or to impurities. G3(MP2) electronic structure calculations (G2 for SF5Br) have been carried out for the neutrals and anions of these species, primarily to determine electron affinities and the energetics of possible attachment reaction channels. Electron affinities were calculated to be 0.88 (SF5C6H5), 0.70 (SF5C2H3), 2.95 (S2F10), and 2.73 eV (SF5Br). An anticorrelation is found for the Arrhenius A-factor with exothermicity for SF5- production for the seven molecules listed above. The Arrhenius activation energy was found to be anticorrelated with the bond strength of the parent ion.     

Kinetics of electron attachment to SF3CN, SF3C6F5, and SF3 and mutual neutralization of Ar+ with CN- and C6F5(-)

The additions of two sulfur fluoride derivatives (SF(3)C(6)F(5) and SF(3)CN) to a flowing afterglow were studied by variable electron and neutral density mass spectrometry. Data collection and analysis were complicated by the high reactivity of the neutral species. Both species readily dissociatively attach thermal electrons at 300 K to yield SF(3) + X(-) (X = C(6)F(5), CN). Attachment to SF(3)C(6)F(5) also results in SF(3)(-) + C(6)F(5) as a minor product channel. The determined electron attachment rate constants were 1(-0.6) (+1) × 10(-7) cm(3) s(-1) for SF(3)C(6)F(5), a lower limit of 1 × 10(-8) cm(3) s(-1) for SF(3)CN, and 4 ± 3 × 10(-9) cm(3) s(-1) for SF(3). Mutual neutralization rate constants of C(6)F(5)(-) and CN(-) with Ar(+) at 300 K were determined to be 5.5(-1.6) (+1.0) × 10(-8) and 3.0 ± 1 × 10(-8) cm(3) s(-1), respectively.     

Experimental and theoretical vibrational study of 2,2,2-trifluoroethyl trifluoromethanesulfonate, CF3SO2OCH2CF3

The infrared spectra of 2,2,2-trifluoroethyl trifluoromethanesulfonate (CF3SO2OCH2CF3) were obtained in the gaseous, liquid and solid states as well as the Raman spectrum of the liquid. Quantum chemistry calculations using the density functional theory were used to predict the most stable geometry and conformation of the studied molecule. Subsequently, the harmonic vibrational frequencies and force field were calculated. An assignment of the observed spectral features made after comparison with the related molecules and with the predicted frequencies was used as the basis of a scaling of the original force field in order to reproduce as well as possible the experimental frequencies. With this purpose a set of scale factors was calculated by a least square procedure, leading to a final root mean square deviation (RMSD) of 9.7 cm(-1).     

Surface modification of polypropylene with CF4, CF3H,CF3Cl,and CF3Br plasmas

ESCA and contact angle measurements were used to characterize the surfaces of polypropylene and glass substrates exposed to CF₄, CF₃H, CF₃Cl, and CF₃Br plasmas. The use of both organic and inorganic substrates allowed clear distinction between treatments which led to plasma polymerization and treatments which caused grafting of functional groups directly to the substrate surfaces. CF₄ plasmas were the only treatments studied which fluorinated polypropylene surfaces directly, without the deposition of a thin, plasma-polymerized film. CF₃H polymerized in a plasma, while CF₃Cl and CF₃Br plasmas caused chlorination and bromination of polypropylene surfaces, respectively. Correlations were made between the active species present in the plasmas and the surface chemistry observed on the treated polypropylene substrates.     

Kinetics of the thermal decomposition of bis-pentafluorosulfur trioxide(SF5O3SF5) in the presence of carbon monoxide

The thermal decomposition of SF₅O₃SF₅ in the presence of CO has been investigated between -9.8°C and + 9.9°C. Besides traces of S₂F₁₀, equimolecular amounts of SF₅O₂SF₅ and CO₂ are formed. The reaction is homogeneous. Its rate is proportional to the pressure of the trioxide and in dependent of the total pressure, the pressure of inert gases and of carbon monoxide: where k = k_1∞ = 10^16.32±0.40 exp(?25,300 ± 500 cal)/RT sec^?1. Consequently, In the presence of oxygen a sensitized CO₂ formation is observed. A mechanism is given which explains the experimental results.