Electrical properties and dielectric relaxation of thermally evaporated zinc phthalocyanine thin films

The electrical transport properties and dielectric relaxation of Au/zinc phthalocyanine, ZnPC/Au devices have been investigated. The DC thermal activation energy at temperature region 400-500 K is 0.78 eV. The dominant conduction mechanisms in the device are ohmic conduction below 1 V and space charge limited conduction dominated by exponential trap distribution in potentials >1 V. Some parameters, such as concentration of thermally generated holes in valence band, the trap concentration per unit energy range at the valence band edge, the total concentration of traps and the temperature parameter characterizing the exponential trap distribution and their relation with temperatures have been determined. The AC electrical conductivity, σ_ac, as a function of temperature and frequency has been investigated. It showed a frequency and temperature dependence of AC conductivity for films in the temperature range 300-400 K. The films conductivity in the temperature range 400-435 K increased with increasing temperature and it shows no response for frequency change. The dominant conduction mechanism is the correlated barrier hopping. The temperature and frequency dependence of real and imaginary dielectric constants and loss tangent were investigated.     

Dielectric and relaxation properties of thermally evaporated nanostructured bismuth sulfide thin films

Nanostructured bismuth sulfide thin films were prepared onto glass substrates with particle size of 21 nm by thermal evaporation using readily prepared bismuth sulfide nanocrystallite powder. The X-ray diffraction pattern revealed that bismuth sulfide thin films exhibit orthorhombic structure. The existence of quantum confinement effect was confirmed from the observed band gap energy of 1.86 eV. AC and DC electrical conductivity of Al/BiSnc/Al structures was investigated in the frequency range 0.5-100 kHz at different temperatures (303-463 K) under vacuum. The AC conductivity (σ_ac) is found to be proportional to angular frequency (ω^s). The obtained experimental result of the AC conductivity showed that the correlated barrier hopping model is the appropriate mechanism for the electron transport in the nanostructured bismuth sulfide thin films. DC conduction mechanism in these films was studied and possible conduction mechanism in the bismuth sulfide thin films was discussed.     

Spectroscopic investigations and electrical properties of PVA/PVP blend filled with different concentrations of nickel chloride

Films of PVA/PVP blend (50/50) filled with different concentrations of NiCl₂ were prepared by casting method. The prepared films were investigated by different techniques. XRD scans demonstrated that the peak intensity at 2θ≈20° decreased and the band width increased with increase in the concentrations of NiCl₂ content, which implied decrease in the degree of crystallization and hence causes increase in the amorphous region. UV-vis analysis revealed that the values of the optical band gap are affected with increase in NiCl₂ content. This indicates the formation of charge transfer complexes between the polymer blend and the filler. The rise of conductivity is significant with increased concentration of NiCl₂ filler; this reveals an increase in degree of amorphosity. AC conductivity (σ_ac) behavior of all the prepared films was investigated over the frequency range 42 Hz-5 MHz and under different isothermal stabilization in the temperature range 313-393 K. It suggests that the hopping mechanism might be playing an important role in the conduction process in high frequency region. The dielectric behavior was analyzed using dielectric permittivity (ε´, ε″) dielectric loss tangent (tan δ) and electric modulus (M″). The decrease in dielectric permittivity was observed with increase in the concentration of NiCl₂ filler. This suggests the role of NiCl₂ as filler to improve the electrical conductivity of PVA/PVP blend.     

Effect of iron doping on the characterization and transport properties of calcium phosphate glassy semiconductors

X-ray diffraction (XRD), differential scanning calorimeter (DSC), density (d) and dc conductivity (σ) of the glasses in Fe₂O₃-CaO-P₂O₅ system were reported. The dc conductivity in the temperature range 303-453 K was measured. The overall features of these XRD curves confirm the amorphous nature of the present samples. The density of glasses increases from 2.750 to 2.892 g/cm³ with increasing Fe₂O₃ content as a result of a strengthening of cross-linking within glass network. The glass temperature values (T_g) of the present glasses were larger than those of tellurite glasses. This indicates a higher thermal stability of the glass in the present system. The glasses had conductivities ranging from 10⁻⁹ to 10⁻⁵ Sm⁻¹ at temperatures from 303 to 453 K. Electrical conduction of the glasses was confirmed to be due to non-adiabatic small polaron hopping and the conduction was primarily determined by hopping carrier mobility.     

Structural characterization and electrical properties of quaternary CdGaInSe4 thin films

Stoichiometric bulk ingot material of the quaternary CdGaInSe₄ was prepared by direct fusion of the constituent elements in vacuum-sealed silica tubes. Nearly stoichiometric films could be deposited by thermal evaporation of the ingot material in 10⁻³ Pa vacuum at a deposition rate 1.5 nm/s. Crystal structure investigation was carried out using X-ray diffractometry and transmission electron diffraction. Elemental composition was determined by means of energy-dispersive X-ray spectrometry. CdGaInSe₄ possesses a tetragonal defective chalcopyrite structure (space group ) with lattice parameters a=0.5665 nm and c=1.1221 nm. All the films exhibited n-type conduction and ohmic behaviour with metallic films of Au, Cd, In, Ag and Sb. However, in the case of Al a nonlinear behaviour occurs. Analysis of the temperature dependence of the dark conductivity in the range 130-470 K has revealed three operating conduction mechanisms; a variable range hopping conduction process dominating at low temperatures below 270 K, followed by a transport of the charge carriers across intercrystalline barriers and grain boundaries in the temperature range 270-353 K, and finally an extrinsic conduction above 353 K.     

Electrical studies on bulk Se96Sn4 semiconducting glass before and after gamma irradiation

Bulk Se₉₆Sn₄ chalcogenide glass was prepared by melt quenching technique and irradiated by different doses of 4, 8, 12, 24 and 33 kGy using ⁶⁰Co gamma emitter. I-V characteristics were obtained for this glass, before and after gamma irradiation, in the temperature range 200-300 K. Ohmic behavior was observed at low electric fields (≤1×10⁴ V/m), while at higher fields, a deviation from ohmic towards non-ohmic behavior was observed. The plots of ln(I/V) vs. V were found to be straight lines and the slopes of these lines decrease linearly with temperature indicating the presence of SCLC. In the temperature range of measurements, the dependence of DC conductivity on temperature at low electric field shows two types of conduction channels, one in high temperature range 270-300 K and the other at low temperature range 200-270 K. Analysis of the experimental data shows that the conductivity at room temperature decreases with increase in irradiation dose. This is attributed to rupturing of SnSe_4/2 structural units, upon irradiation, and rebuilt of Se atoms between Se chains. This redistribution of bonds, induced by gamma irradiation, is responsible for the corresponding increase in the activation energy. The obtained values of the activation energy indicate that the conduction occurs due to thermally assisted charge carriers movement in the band tail of localized states. However, in the low temperature range, results obtained from Mott’s variable range hopping (VRH) model reveal that the density of localized states has its maximum value at a gamma dose of 12 kGy, while the disorder parameter T_o, hopping distance R_hop and hopping energy W have their minimum value at this particular dose.     

Electrical properties and Schottky diodes using N-N′diphenyl-1-4phenylenediamine

Thin films of, N-N′diphenyl 1-4phenylene-diamineane are prepared using vacuum sublimation technique. The electrical conductivity from room temperature down to 127 K is studied. It is found that the conduction of charge carriers obeys T^−1/2 dependence on temperature. The average hopping distance, hopping energy, density of states and their variation due to post-deposition heat treatment are studied. Schottky diodes are fabricated with gold as ohmic contact and aluminium as Schottky contact. From the observed current voltage characteristics the saturation current density, diode ideality factor and the barrier height are determined. Their variation with air annealing is also investigated.     

Conduction behaviour and thermoelectric power of Agx (As0.4Se0.6) 100−x chalcogenide system

Chalcogenide bulk alloys of Ag_x (As_0.4Se_0.6) _100−x (x=5, 7.5, 10, 12.5, 15 and 17.5) system were prepared by the conventional melt-quench technique. The d.c. electrical conductivity (σ) and thermoelectric power (TEP) measurements were carried out in the temperature range from 83 to 373 K and from 253 to 373 K, respectively. Variations of both σ and TEP with ambient temperature proved the p-type semiconducting behaviour of these materials. The current density-electric field characteristics were found to be linear. The activation energies, calculated from both the electrical conductivity E_σ and thermoelectric power E_s, were found to be dependent on composition.     

Effect of composition and thermal annealing on the absorption and electrical conduction of Se85−xTe15Sbx glasses

The optical absorption of the as-prepared and thermally annealed Se_85−xTe₁₅Sb_x (0≤x≤9) thin films was measured. The mechanism of the optical absorption follows the rule of non-direct transition. The optical energy gap (E₀) decreased from 1.12 to 0.84 eV with increasing Sb content of the as-prepared films from 0 to 9 at.%. The as-prepared Se₇₆Te₁₅Sb₉ films showed an increase in (E₀) with increasing the temperature of annealing in the range above T_g (363 K). The electrical conductivity of the as-prepared and annealed films was found to be of Arrhenius type with temperature in the range 300-360 K. The activation energy for conduction was found to decrease with increasing both the Sb content and temperature of annealing. The results were discussed on the basis of the lone-pair electron effect and of amorphous crystalline transformation.     

Effect of deposition pressure on structural, optical and electrical properties of zinc selenide thin films

ZnSe thin films have been prepared by inert gas condensation method at different gas pressures. The influence of deposition pressure, on structural, optical and electrical properties of polycrystalline ZnSe films have been investigated using X-ray diffraction (XRD), optical transmission and conductivity measurements. The X-ray diffraction study reveals the sphalerite cubic structure of the ZnSe films oriented along the (1 1 1) direction. The structural parameters such as particle size [6.65-22.24 nm], strain [4.01-46.6×10⁻³ lin⁻² m⁻⁴] and dislocation density [4.762-18.57×10¹⁵ lin m⁻²] have been evaluated. Optical transmittance measurements indicate the existence of direct allowed optical transition with a corresponding energy gap in the range 2.60-3.00 eV. The dark conductivity (σ_d) and photoconductivity (σ_ph) measurements, in the temperature range 253-358 K, indicate that the conduction in these materials is through an activated process having two activation energies. σ_d and σ_ph values decrease with the decrease in the crystallite size. The values of carrier life time have been calculated and are found to decrease with the reduction in the particle size. The conduction mechanism in present samples has been explained, and the density of surface states [9.84-21.4×10¹³ cm⁻²] and impurity concentration [4.66-31.80×10¹⁹ cm⁻³] have also been calculated.     

Contribution of weak localization, electron-electron interaction, and Zeeman spin-splitting effects in corrective term “mT” of the metallic conductivity in n-type GaAs

We present measurements of the electrical conductivity of barely metallic n-type GaAs that are driven to the metal-insulator transition (MIT) by magnetic field. The experiments were carried out at low temperature in the range (4.2-0.066 K) and in magnetic field up to 4 T. We have determined the magnetic field for which the conductivity changes from the metallic behavior to insulator regime. On the metallic side of the MIT, the electrical conductivity is found to obey σ=σ₀+mT^1/2 down to 66 mK. Physical explanation to the temperature dependence of the conductivity is given in metallic side of the MIT using a competition between different effects involved in the mechanisms of conduction, like electron-electron interaction effect, Zeeman spin-splitting effect, and weak localization effect.     

Structural and electrical properties of fluorine doped tin oxide films prepared by spray-pyrolysis technique

Fluorine doped SnO₂ films have been successfully prepared at optimized substrate temperature of 723 K by spray pyrolysis technique. The XRD analysis confirmed that films deposited with F/Sn ratio of 0.05 showed a partial amorphous nature whereas films deposited with F/Sn = 0.10 exhibited tetragonal structure (2 0 0) as the preferred orientation and polycrystalline structure. The lattice constants were found to be a = 0.4750 and c = 0.3197 nm. The theoretically constructed XRD pattern for SnO₂ was used to compare with experimental pattern, the difference between them is discussed. By using SEM analysis, the surface morphology of the films was observed as an effect of the variation of F/Sn ratio. At low temperature, the mobility due to lattice, polar, impurity, grain boundary and neutral scattering was estimated for SnO₂ and the possible scattering mechanisms were assigned to SnO₂:F films using experimentally obtained electrical data. The Mott parameters were determined by applying variable range hopping (VRH) conduction mechanism for SnO₂:F films (F/Sn = 0.05) where band conduction mechanism shifted to VRH conduction at below about 250 K.     

On the high-resistivity contacts to YBa2Cu3O7 thin films, electrical behavior in the regime of high temperatures and high-bias voltages

We prepared in-situ Au contacts on high-quality epitaxial YBa₂Cu₃O₇ (YBCO) films. Very high specific contact resistivity values up to ∼10⁻² Ω cm² at 4.2 K were obtained on 12×5 μm² contact areas. This resistivity value decreased by two orders of magnitude as the temperature was raised to room temperature. In the temperature range T<200 K, the contacts showed non-ohmic behavior suggesting the presence of a well-defined insulating native Y-Ba-Cu-O barrier between the two electrodes. The electrical transport in this barrier layer was analyzed in the limit of high temperatures and high voltages to follow Mott's variable-range hopping conduction mechanism with physically reasonable parameters describing the localized states in the barrier. The high-resistivity contacts were tested successfully in quasiparticles injection experiments where the critical current I_c of the YBCO microbridge could be strongly suppressed on injection of an additional current through the contact into the superconducting channel.     

Electrical and optical properties of GexFexSe100−2x chalcogenide thin films

Optical absorption at room temperature and electrical conductivity at temperatures between 283 and 333 K of vacuum evaporated Ge_xFe_xSe_100−2x (0≤x≤15) amorphous thin films have been studied as a function of composition and film thickness. It was found that the optical absorption is due to indirect transition and the energy gap increases with increasing both Ge and Fe content; on the other hand, the width of the band tail exhibits the opposite behavior. The optical band gap E_opt was found to be almost thickness independent. The electrical conductivity show two types of conduction, at higher temperature the conduction is due to extended states, while the conduction at low temperature is due to variable range hopping in the localized states near Fermi level. Increasing Ge and Fe contents were found to decrease the localized state density N(E_F), electrical conductivity and increase the activation energy for conduction, which is nearly thickness independent. Variation of the atomic densities ρ, molar volume V, glass transition temperature T_g cohesive energy C.E and number of constraints N_Co with average coordination number Z was investigated. The relationship between the optical gap and chemical composition is discussed in terms of the cohesive energy C.E, average heat of atomization and coordination numbers.     

Influence of indium content on the optical, electrical and crystallization kinetics of Se100−xInxthin films deposited by flash evaporation technique

Thin films of Se _100−xIn_x (x=10, 20 and 30 at%) have been prepared by the flash evaporation technique. The effect of the indium content on optical band gap of the Se_100−x In_x films has been investigated by the optical characterization. The optical band gap values of the Se_100−x In_x thin films were determined and are found to decrease with increasing indium content. This indium content changes the width of localized states in the optical band gaps of the thin films. It was found that the optical band gap, E_g, of the Se_100−x In_x films changes from 1.78 to 1.37 eV with increasing indium content from 10 to 30 at%, while the width of localized states in optical band gap changes from 375 to 342 meV. The temperature dependence of the dark electrical conductivity were studied in the temperature range 303-433 K and revealed two activation energies providing two electrical conduction mechanisms. The activation energy of the Se_100−x In_x films in the high temperature region changes from 0.49 to 0.32 eV with increasing indium content from 10 to 30 at%, while the hopping activation energy in the lower temperature region changes from 0.17 to 0.22 meV. The change in the electrical conductivity with time during the amorphous-to-crystalline transformation is recorded for amorphous Se_100−xIn_x films at two points of isothermal temperatures 370 and 400 K. The formal crystallization theory of Avrami has been used to calculate the kinetic parameters of crystallization.     

Effect of annealing temperature on the optical and electrical properties of amorphous As45.2Te46.6In8.2 thin films

The optical absorption of the As-prepared and annealed As_45.2Te_46.6In_8.2 thin films are studied. Films annealed at temperatures higher than 453 K show a decrease in the optical energy gap (E_o). The value of E_o increases from 1.9 to 2.43 eV with increasing thickness of the As-prepared films from 60 to 140 nm. The effect of thickness on high frequency dielectric constant (?_∞) and carrier concentration (N) is also studied. The crystalline structures of the As_45.2Te_46.6In_8.2 thin films resulting from heat treatment of the As-prepared film at different elevated temperatures is studied by X-ray diffraction. An amorphous-crystalline transformation is observed after annealing at temperatures higher than 453 K. The electrical conductivity at low temperatures is found due to the electrons transport by hopping among the localized states near the Fermi level. With annealing the films at temperatures higher than 473 K (the crystallization onset temperature) for 1 h, the electrical conductivity increases and the activation energy decreases, which can be attributed to the amorphous-crystalline transformations.     

Crystal structure,NMR study,dielectric relaxation and AC conductivity of a new compound [Cd3(SCN)2Br6(C2H9N2)2]n

The crystal structure, the ¹³C NMR spectroscopy and the complex impedance have been carried out on [Cd₃(SCN)₂Br₆(C₂H₉N₂)₂]_n. Crystal structure shows a 2D polymeric network built up of two crystallographically independent cadmium atoms with two different octahedral coordinations. This compound exhibits a phase transition at (T=355±2 K) which has been characterized by differential scanning calorimetry (DSC), X-rays powder diffraction, AC conductivity and dielectric measurements. Examination of ¹³C CP/MAS line shapes shows indirect spin–spin coupling (¹⁴N and ¹³C) with a dipolar coupling constant of 1339 Hz. The AC conductivity of this compound has been carried out in the temperature range 325–376 K and the frequency range from 10⁻² Hz to 10 MHz. The impedance data were well fitted to two equivalent electrical circuits. The results of the modulus study reveal the presence of two distinct relaxation processes. One, at low frequency side, is thermally activated due to the ionic conduction of the crystal and the other, at higher frequency side, gradually disappears when temperature reaches 355 K which is attributed to the localized dipoles in the crystal. Moreover, the temperature dependence of DC-conductivity in both phases follows the Arrhenius law and the frequency dependence of σ(ω,T) follows Jonscher's universal law. The near values of activation energies obtained from the conductivity data and impedance confirm that the transport is through the ion hopping mechanism.     

Electric, thermoelectrical and photoelectric properties of CuGaxIn1−xSe2 thin films

The electrical conductivity σ, Hall effect R_H, and thermoelectric power Q of CuGa_0.25In_0.75Se₂ thin films with different growth conditions have been measured at temperature 300-520 K. These properties were also measured at room temperature for different composition of CuGa_xIn_1−xSe₂ (0.75≥x≥0) deposited at the same evaporation conditions. All investigated films are p-type over the whole temperature range. Electrical conduction was studied in order to establish its mechanism.The room temperature photoelectric response of those films were measured as a function of wavelength (2.5≥λ≥0.3) μm. It is found that the energy gap values follow a second order equation in x giving a downward bowing parameter of about 0.31 eV.     

Optical and electrical properties of thermally evaporated In49Se48Sn3 films

Nearly stoichiometric thin films of In₄₉Se₄₈Sn₃ were deposited at room temperature, by conventional thermal evaporation of the presynthesized materials, onto precleaned glass substrates. The microstructural studies on the as-deposited and annealed films, using transmission electron microscopy and diffraction (TEMD), revealed that the as-deposited films are amorphous in nature, while those annealed at 498 K are crystalline. The optical properties of the investigated films were determined from the transmittance and reflectance data, in the spectral range 650-2500 nm. An analysis of the optical absorption spectra revealed a non-direct energy gap characterizing the amorphous films, while both allowed and forbidden direct energy gaps characterized the crystalline films. The electrical resistance of the deposited films was carried out during heating and cooling cycles in the temperature range 300-600 K. The results show an irreproducible behavior, while after crystallization the results become reproducible. The analysis of the temperature dependence of the resistance (ln(R) vs. 1000/T) for crystalline films shows two straight lines corresponding to both extrinsic and intrinsic conduction. The room temperature I-V characteristics of the as-deposited films sandwiched between similar Ag metal electrodes shows an ohmic behavior, while non-ohmic behavior attributed to space charge limited conduction has been observed when the films are sandwiched between dissimilar Ag/Al metal electrodes.