液封坩埚下降法生长非掺杂InP单晶的特性研究

用液封坩埚下降（ＬＥ－ＶＢ）法沿〈１００〉晶向成功地生长了非掺杂ＩｎＰ单晶．ＬＥ－ＶＢ晶体的４．２Ｋ光致发光谱包含束缚于中性浅受主上的激子发光、与Ｚｎ受主相关的施主－受主（ＤＡ）对发光及其声子伴线、以及与本征缺陷等有关的深能级发光三部分．通过与液封直拉（ＬＥＣ）生长的籽晶的光致发光谱比较表明，在ＬＥ－ＶＢ晶体中，束缚于中性浅受主上的激子发光与籽晶中的相差不大；ＤＡ对发光的晶格弛豫比籽晶中的小；与本征缺陷等有关的深能级发光强度比籽晶中的弱．晶体的室温光致发光谱仅包含带—带发光，其发光强度形貌测试结果表明，ＬＥ－ＶＢ晶体的带—带发光强度比ＬＥＣ籽晶的强．用Ｈｕｂｅｒ法对晶片腐蚀的结果表明，在ＬＥ－ＢＶ晶体中，位错密度仅为ＬＥＣ籽晶中的三分之一．分析认为，在ＬＥ－ＶＢ晶体中，本征缺陷和位错等浓度较低，可能是其带—带发光强度比在ＬＥＣ籽晶中强的物理起因．     

InAs 单量子点精细结构光谱

在5 K下,采用光致发光光谱和时间分辨光谱研究了不同单量子点的精细结构和对应发光光谱的偏振性、单激子/双激子发光光谱和相应发光动力学。给出InAs单量子点发光光谱所对应能级的精细结构及激子本征态的偏振特性。当精细结构能级劈裂为零时, 激子的本征态为简并的圆偏振态。而当精细结构能级劈裂大于零时,一般在几十到几百μeV,激子的本征态为非简并的线偏振态。相对于单激子发光寿命,激子-激子间的散射使单激子的复合发光寿命减小。     

聚氧化乙烯表面修饰对ZnO光学性质的影响

利用聚氧化乙烯(PEO)对ZnO表面进行修饰,研究有机包覆对ZnO光学性质的影响。用吸收光谱和光致发光光谱来表征和研究PEO包覆对ZnO纳米粒子光学性质的影响。吸收光谱结果表明随着ZnO薄膜中PEO含量的增加,激子吸收峰逐渐向低能侧方向移动。光致发光光谱是由紫外发射和与氧空位有关的深能级缺陷发光组成,且随着ZnO薄膜中PEO含量的增加,紫外发射与深能级发光强度之比逐渐增大,当ZnO薄膜中的PEO达到最大值时,其比值为31．5,远远大于纯ZnO薄膜的紫外发射与深能级发光强度之比1．04。由此可见,ZnO被PEO包覆后,提高了紫外发光效率,改善了ZnO薄膜的质量。     

本征富受主型ZnO微米管光致发光的温度调控机制

热效应是影响半导体器件发光性能的最关键因素之一.本文针对光学气化过饱和析出法制备的本征富受主型ZnO微米管,系统研究了其光致发光的温度调控机制.研究表明,所制备ZnO微米管具有规则的六边形截面形貌,长度达5 mm、直径达100μm,室温下的光学带隙约为3.30 eV;随着环境温度的提高,其光致发光强度呈现"热淬灭-负热淬灭-热淬灭"的反常变化.在80—200 K温区内的热淬灭行为与浅施主的退/电离、自由激子热离化以及中性受主束缚激子的转变有关;在200—240 K温区内发生的负热淬灭行为与导带底以下488 me V处深能级陷阱上电子的热激发有关;在240—470 K温区内发生的热淬灭行为则与导带底以下628 me V处非辐射复合中心的Shockley Read-Hall复合有关.非辐射复合中心和陷阱中心的形成均与本征富受主型ZnO微米管的氧空位缺陷有关.上述研究结果在高温高效富受主型ZnO微米管基光电器件的设计与研发方面具有重要指导意义.     

Ⅳ族元素与Ⅲ-Ⅴ族化合物中浅受主的能谱

研究纯净半导体的边缘发光光谱能提供有关浅杂质能级的详细资料,以补充和完善从红外杂质吸收测量得到的资料。研究自由电子到受主的跃迁和施主受主对谱带可以得到浅受主离化能的精确数值。研究束缚激子发光中的“双空穴”(two-hole)跃迁可得到受主激发态的精确能级。     

Si离子注入对分子束外延Si1-xGex/Si量子阱发光特性的影响

对分子束外延生长带边激子发光的Si_1-xGe_x/Si量子阱结构，通过Si离子自注入和不同温度退火，观测到深能级发光带和带边激子发光的转变.Si离子注入量子阱中并在600℃的低温退火，形成链状或小板式的团簇缺陷，它导致深能级发光带的形成，在850℃的高温退火后重新观测到带边激子发光.这种团簇缺陷的热离化能约为0.1eV，比Si中空穴或填隙原子缺陷的热激活能(约0.05eV)高.这表明早期文献中报道的深能级发光带是由类似的团簇缺陷产生的. 关键词：     

Fe掺杂对CdS光学特性的影响

采用低压金属有机化学气相沉积技术,在固定源流量的条件下,通过调节衬底温度(270~360℃)生长了不同Fe掺杂浓度的CdS薄膜。光谱测量表明低铁掺杂对CdS晶格振动的影响较小,但对光致发光性质影响较为明显。样品的光致发光谱包括两部分:2.5eV附近带-带跃迁的发光以及2.0~2.4eV之间与缺陷相关的发光。随着铁含量的增加,带-带跃迁逐渐被抑制,发光光谱被缺陷相关的发光主导,同时薄膜的电导也由n型转为p型,说明Fe离子掺入在薄膜引入了受主杂质。通过不同激发密度下的光致发光光谱测量,我们将2.0~2.4eV的发光归结为铁受主相关的D-A对发射,并根据掺杂浓度和发光峰位置估算了Fe受主的能级位置。     

Ⅱ-Ⅵ族化合物的光致发光

本文综述了宽带隙Ⅱ－Ⅵ族化合物的低温光致发光过程，分析了ＣｄＴｅ，ＺｎＳｅ和ＺｎＴｅ的光致发光谱并总结了这类化合物中束缚激子发光的研究结果．     

共轭高分子中激子演化过程的非绝热动力学研究

有机共轭高分子受光激发或被电荷掺杂后可能会产生各种激发状态的激子,激子的演化过程对有机发光光谱有着至关重要的影响.通过非绝热动力学演化的方法模拟了受光激发后有机高分子中激子驰豫的动力学过程,结果表明高激发态激子不稳定,由于电声耦合作用,高激发态激子会持续向低激发态激子演化,同时,低激发态激子的复合发光会发生红移.稳定的激子复合发光光谱中,基态激子发光强度最大,可高达70-80%;第一激发态激子及其它激发态激子发光强度的总和不超过20%.     

微纳跨尺度ZnO结构的紫外发射机理研究

利用气相输运的方法在Si(100)衬底上生长了ZnO的微纳跨尺度结构.扫描电镜照片可以明显地看到样品表面为椎顶六角微米柱-纳米棒的复合结构.样品在室温下的光致发光谱出现了很强的紫外发射峰,没有观察到与杂质或缺陷相关的深能级发射,表明样品有很好的光学质量.通过详细的研究样品的紫外发射谱与温度(83—307K)的依赖关系,发现在室温下样品的近带边发射包含两个部分,分别与自由激子发射和自由载流子到施主(受主)的跃迁(FB跃迁)相关,这个施主(受主)束缚态的离化能为124.6meV. 关键词： ZnO微纳跨尺度结构 光致发光谱 自由载流子到施主(受主)的跃迁 自由激子发射     

In1-xGaxAsyP1-y/InP异质界面晶格失配对外延晶体质量的影响

用X-射线双晶衍射,双晶形貌术和光致发光方法综合研究了In1-xGaxAsyP1-y/InP异质界面晶格失配对LPE晶体质量的影响。实验表明,异质界面晶格失配是导致外延层中位错和缺陷增多,杂质凝聚和辐射复合深中心增多的重要因素。     

Temperature dependent photoluminescence processes in ZnO thin films grown on sapphire by pulsed laser deposition

Temperature dependence of the photoluminescence (PL) transitions in the range of 10–300 K was studied for ZnO thin films grown on sapphire by pulsed laser deposition. The low temperature PL spectra were dominated by recombination of donor bound excitons (B_X) and their phonon replicas. With increasing temperature, free exciton (F_X) PL and the associated LO phonon replicas increased in intensity at the expense of their bound counterparts. The B_X peak with line width of ∼6 meV at 10 K exhibited thermal activation energy of ∼17 meV, consistent with the exciton-defect binding energy. The separation between the F_X and B_X peak positions was found to reduce with increasing temperature, which was attributed to the transformation of B_X into the shallower donor bound exciton complexes at consecutive lower energy states with increasing temperature, which are possible in ZnO. The energy separation between F_X peak and its corresponding 1-LO phonon replica showed stronger dependence on temperature than that of 2-LO phonon replica. However, their bound counterparts did not exhibit this behavior. The observed temperature dependence of the energy separation between the free exciton and it is LO phonon replicas are explained by considering the kinetic energy of free exciton. The observed PL transitions and their temperature dependence are consistent with observations made with bulk ZnO crystals implying high crystalline and optical quality of the grown films.     

Optical properties of Zn0.5Cd0.5Se thin films grown on InP by molecular beam epitaxy

We report photoluminescence (PL) and reflectivity measurements of Zn_0.5Cd_0.5Se epilayers grown by molecular beam epitaxy on InP substrates. The low-temperature PL spectra are dominated by asymmetric lines, which can be deconvoluted into two Gaussian peaks with a separation of ∼8 meV. The behavior of these peaks is studied as a function of excitation intensity and temperature, revealing that these are free exciton (FE) and bound exciton emission lines. Two lower energy emission lines are also observed and assigned to the first and second longitudinal optical phonon replicas of the FE emission. The temperature dependence of the intensity, line width, and energy of the dominant emission lines are described by an Arrhenius plot, a Bose-Einstein type relationship, Varshni's and Bose-Einstein equations, respectively.     

Direct recognition of non-radiative recombination centers in semi-insulating LEC InP:Fe using double excitation photoluminescence

In order to observe the effect of intra-band gap excitation on the photoluminescence (PL) properties of undoped InP and iron doped InP (InP:Fe), PL measurements were performed in InP crystals with thickness of 360 μm and area of about 4×3 mm², grown by the liquid encapsulated Czochralski (LEC) technique upon excitation with both Ar-ion laser and 980 nm light. The PL intensities for InP:Fe under 980 nm wavelength light illumination relative to no illumination increased by about 52%, 33%, and 12% for the 1.337, 1.380, and 1.416 eV peaks, respectively, at 10 K, whereas there was no illumination effect for undoped InP. This is a strong indication that Fe centers play a role as non-radiative recombination centers to decrease the PL intensity. PL experiments were performed in the spectral range of 1320-1440 meV for InP in the sample temperature range of 10-160 K. The electron and hole photoionization cross-sections at 980 nm wavelength light illumination were calculated as and , respectively.     

Native defect changes in cds single crystal platelets induced by vacuum heat treatments at temperatures up to 600°C

Physical properties of selected CdS single crystal platelets as-grown and after vacuum heat treatments at temperatures up to 600°C have been studied using u.v. excited edge emission, mass spectrometry, electrical resistivity and electron paramagnetic resonance (EPR). It was found that sulfur leaves the crystal at temperatures as low as 100°C creating a depletion layer. The native defect changes were monitored by edge emission studies at 4.2°K in combination with etch treatments. The defect structure throughout the crystal is not only dependent upon the temperature and atmosphere of the treatments, but is also strongly dependent upon the cooling rate.     

Thermally induced native defect transform in annealed GaSb

Undoped p-type Ga Sb single crystals were annealed at 550–600?C for 100 h in ambient antimony. The annealed Ga Sb samples were investigated by Hall effect measurement, glow discharge mass spectroscopy(GDMS), infrared(IR)optical transmission and photoluminescence(PL) spectroscopy. Compared with the as-grown Ga Sb single crystal, the annealed Ga Sb samples have lower hole concentrations and weak native acceptor related PL peaks, indicating the reduction of the concentration of gallium antisite related native acceptor defects. Consequently, the below gap infrared transmission of the Ga Sb samples is enhanced after the thermal treatment. The mechanism about the reduction of the native defect concentration and its influence on the material property were discussed.     

硅中位错增殖的实验观察

用化学侵蚀法研究了在机械应力和热应力作用下硅中位错的增殖和非均匀成核。结果表明,在使位错增殖和成核作用上,热应力同机械应力是等效的。硅中小角晶界中的位错,原生孤立位错都能成为位错源;晶体内部的缺陷及表面蚀斑处的应力集中能够引起位错成核;硅中螺型位错能够通过交叉滑移机制发生增殖。对新生位错环空间分布的研究表明,Frank-Read机制可能是位错增殖的主要形式。位错能否发生增殖,主要决定于位错源所受分切应力的数值、晶体温度、位错本身的结构特点以及钉扎情况等。     

Si1－xGex/Si量子阱发光材料的分子束外延生长及其结构研究

采用固源Si分子束外延,在较高的生长温度于Si(100)衬底上制备出Si1－xGex/Si量子阱发光材料。发光样品的质量和特性通过卢瑟福背散射、X射线双晶衍射及光致发光评估。背散射实验中观察到应变超晶格的反常沟道效应;X射线分析表明材料的生长是共度的、无应力释放的,结晶完整性好。低温光致发光主要是外延合金量子阱中带边激子的无声发射和横光学声子参与的激子复合。并讨论了生长温度对量于阱发光的影响。     

Si_（1－x）Ge_x／Si量子阱发光材料的分子束外延生长及其结构研究

采用固源Ｓｉ分子束外延，在较高的生长温度于Ｓｉ（１００）衬底上制备出Ｓｉ１－ｘＧｅｘ／Ｓｉ量子阱发光材料．发光样品的质量和特性通过卢瑟福背散射、Ｘ射线双晶衍射及光致发光评估．背散射实验中观察到应变超晶格的反常沟道效应；Ｘ射线分析表明材料的生长是共度的、无应力释放的，结晶完整性好．低温光致发光主要是外延合金量子阱中带边激子的无声发射和横光学声子参与的激子复合．并讨论了生长温度对量于阱发光的影响．     

Annealing-induced changes of the 3.31 eV emission in ZnO nanorods

The effect of annealing on the 3.31 eV (A line) emission in ZnO nanorods is studied in detail by temperature-dependent photoluminescence (PL). Annealing results in obvious changes in peak energy and lineshape of the A line, indicating different luminescence origin in the as-grown and annealed ZnO nanorods. In the as-grown nanorods, the A line is a result of competition between free-to-neutral acceptor (FA) transition and the first longitude optical phonon replica of free exciton (FX-1LO) recombination. While for the annealed nanorods, FA transition disappears and the A line is attributed to FX-1LO only. In combination with trace impurity analysis, the results allow us to conclude that the acceptor involved in the FA transition is stacking faults rather than unintentional acceptor impurities.