Der Einfluß der Umklapp-Prozesse auf den elektrischen Widerstand der Metalle bei tiefen Temperaturen

Blochs integral equation is solved under the assumption of a rigidly displaced electron distribution and thermal equilibrium of the lattice yielding the following results: If the Fermi surfaceE (t)=ξ periodically repeated in (t)-space consists of closed separate parts which are very near to each other (distanceq ^*), then transitions between two neighbouring surfaces (Umklapp-processes) give especially at rather low temperatures a large contribution to the electrical resistance. In simple cases the temperature dependence is given by ?_UP ～ Polynomial (T/Θ^*)e ^Θ*/T . Calculations were performed for alkali metals taking into account their anisotropic elastic behaviour. It was found that the contribution of the Umklapp-processes could be as high as 100 times that of the normal-processes. The agreement between theory and experiment is satisfactory excepting Li.     

Lichtelektrische Messungen an stark gestörten Zinn-, Blei- und Cadmiumschichten

Thin films of Sn, Pb and Cd are produced by quenching condensation at low temperatures. The photoelectric emission and the electrical resistivity are measured after condensation and during annealing. In the case of Sn and Pb both the electrical resistance and the photoelectric sensitivity decrease during annealing. The resistance of Cd-films shows the same behaviour, but the photoelectric sensitivity is lowered only above 90 °K.     

Zur Theorie der Wärmeleitung bei tiefen Temperaturen

Zeitschrift für Physik A Hadrons and nuclei - Es wird der Koeffizient der Wärmeleitung bei tiefen Temperaturen nach der Blochschen Theorie gerechnet, wobei sich eine befriedigende...