激光加热基座技术生长超细单晶光纤研究

单晶光纤(SCF)是具有纤维结构的“准一维”功能晶体材料,在高能激光、高温传感、辐射探测、信息通信等国防民生领域展现出了巨大的应用前景。本文采用激光加热基座技术成功制备出直径60~100 μm、长径比>6 000∶1的超细Al₂O₃、YAG单晶光纤,单晶光纤平均直径起伏<4%,展现出良好的柔韧性与波导特性,为单晶光纤器件的小型化与集成化创造了条件。     

单晶光纤生长技术研究进展

单晶光纤因其独特的结构特点以及优良的物理性能而被广泛应用于高功率激光器、辐射探测以及高温环境监测等领域。本文综述了单晶光纤的生长技术,探讨了微下拉法(μ-PD)、激光加热基座法(LHPG)以及导模法(EFG)的生长特点,并重点梳理了单晶光纤生长过程中存在的问题及解决方案。此外详细介绍了包层制备技术发展现状以及局限性。最后,阐述了现阶段单晶光纤的主要分类以及应用场景并对未来发展作出展望。     

MgAl2O4:Cr3+单晶光纤生长与荧光温度特性研究

采用激光加热基座法制备了0.5at;Cr3+掺杂镁铝尖晶石单晶光纤.通过XRD、荧光光谱、荧光寿命测试对所制备的单晶光纤的晶相、荧光温度特性进行了实验研究,结果表明所制备的MgAl2O4:Cr3+单晶光纤的主晶相为MgAl2O4晶相,镁铝尖晶石晶相结构并没有因Cr3+掺入而发生改变,在405nmLED激发下,随着温度升高MgAl2O4:Cr3+单晶光纤荧光强度下降,尤其是2E→4A2能级跃迁产生的荧光强度下降明显,同时随着温度的升高,MgAl2O4:Cr3+单晶光纤的荧光寿命随温度单调下降,系统荧光寿命从室温293K的7.74ms下降到723K的0.5ms左右.由于其相对较长的荧光寿命,MgAl2O4:Cr3+单晶光纤非常适合作为荧光温度敏感材料应用于荧光寿命型光纤温度传感器.     

MPCVD金刚石单晶的制备及其应用前景

金刚石具有优异的物理化学性能,在很多领域的应用前景十分诱人.用化学气相沉积(CVD)法实现高沉积速率、高质量、大面积金刚石单晶的制备成为了当今研究的一个热点.本文综述了影响微波等离子体化学气相沉积法制备单晶金刚石的工艺参数,并简单介绍了国内外在单晶金刚石制备上的进展,最后对CVD金刚石单晶的应用前景进行了展望.     

激光加热基座法制备Er:YAP单晶光纤及性能表征

本文采用了激光加热基座(LHPG)法逆向生长技术,实现了多组分Er∶YAP晶体的快速制备。利用LHPG法开展了Er∶YAP单晶光纤的生长研究,通过解决单晶光纤生长过程中存在的色心、开裂、直径起伏等关键问题,制备出直径0.8 mm、长度65 mm的高品质Er∶YAP单晶光纤。对不同掺杂浓度Er∶YAP晶体的光谱性能进行表征分析,结果表明掺杂浓度5%(原子数分数)时,Er³⁺间存在较强的能量传递过程,有利于实现高效率中红外激光输出。     

碳化硅单晶生长用高纯碳化硅粉体的研究进展

碳化硅(SiC)以其宽带隙、高临界击穿场强、高热导率、高载流子饱和迁移率等优点,被认为是目前较具发展前景的半导体材料之一。近年来,物理气相传输(PVT)法在制备大尺寸、高质量SiC单晶衬底方面取得了重大突破,进一步推动了SiC在高压、高频、高温电子器件领域的应用。SiC粉体是PVT法生长SiC单晶的原料,其纯度会直接影响SiC单晶的杂质含量,从而影响SiC单晶的电学性质,其中生长高质量的半绝缘SiC单晶更是直接受限于SiC粉体中N元素的含量。因此,合成高纯的SiC粉体是PVT法生长高质量SiC单晶的关键。本文主要介绍了高纯SiC粉体的合成方法及研究现状,重点对气相法和固相法合成高纯SiC粉体的优缺点进行了评述,并提出了今后高纯SiC粉体合成的发展方向。     

基于钠助熔剂法的GaN单晶生长研究进展

宽禁带氮化镓(GaN)材料以其独特的性质和应用前景成为国内外研究的热点,高质量GaN单晶衬底的制备是获得性能优异的光电子器件和功率器件的基础。钠助熔剂法生长条件温和,易获得高质量、大尺寸的GaN单晶,是一种具有广阔商业化前景的GaN单晶生长方法。钠助熔剂法自20世纪90年代末期被发明以来,经过20多年的发展,钠助熔剂法生长的晶体在尺寸与质量上都取得了长足的进步。本文从晶体生长原理和关键工艺(籽晶选择、温度梯度以及添加剂)等方面综述了钠助熔剂法生长GaN单晶研究进展,并对其面临的挑战和未来发展趋势进行了展望。     

LHPG法生长单晶光纤中熔区生长界面对消除气泡的影响

采用激光加热基座法(LHPG法)生长的单晶光纤一般具有较好的表面光学质量,但单晶光纤在生长过程中常产生包裹气泡.该类气泡的存在将严重劣化光纤的性能.由于其产生原因复杂,多年来一直没有有效的消除方法.本文采用LHPG法生长Nd3+:YAG单晶光纤,深入分析了熔区生长界面对消除气泡的影响.实验结果表明,相比于其它熔区,凹形熔区稳定性能较好,是最佳的熔区形状,采用此熔区生长出的单晶光纤没有气泡,具有极好的光学品质.     

微下拉晶体光纤生长设备研制及YAG单晶生长

介绍了一种新型单晶生长技术(微下拉:micro-pulling-down),并概述了该方法在Nd∶ YAG单晶光纤生长方面的应用及发展.率先在国内开展了微下拉单晶生长炉的研制工作,填补了该领域的空白.同时,生长了直径3mm,长度100 mm、300 mm的Nd∶ YAG单晶,晶体整体透明、内部无散射点,表现出了良好的单晶性,有望作为激光工作物质使用.     

单晶材料的新发展及其对生长技术的挑战

近年来,宽带隙半导体GaN、SiC、ZnO,弛豫铁电体PZNT,热电半导体β-FeSi2,超导体MgB2等功能晶体材料引起了人们的广泛关注.这些材料大多具有非常优异的性能和巨大的应用前景,但生长工业应用的体单晶非常困难.本文从晶体生长技术角度综述了这些晶体的研究进展,结合其物理化学特性探讨了单晶生长中遇到的一些关键问题.通观这些热点单晶材料的研究现状,一方面我们可以把晶体膜的制备技术看作是传统晶体生长技术的延伸,另一方面,膜技术的发展和单晶生长中存在的问题,也是对传统生长工艺的挑战.     

氧化锆纤维及其制品

氧化锆纤维是一种性能优良的特种无机纤维,耐高温、耐腐蚀、抗氧化,具有广泛的应用前景.本文介绍了氧化锆纤维的制备方法和前驱体法制备的氧化锆纤维的特殊性能,以及氧化锆纤维的相转变,最后介绍了氧化锆纤维制品的性能及用途并对其发展趋势进行了展望.     

立方氮化硼的研究进展

立方氮化硼(c-BN)作为闪锌矿面心立方结构的Ⅲ-Ⅴ族二元化合物,是第三代半导体中禁带宽度最大的材料,还具有高热导率、高硬度、耐高温、耐氧化、化学稳定性好、透光波长范围广、可实现p型或n型掺杂等一系列性能优点,不仅作为超硬磨料在各行业的加工领域有广泛的应用,而且作为极端电子学材料在大功率半导体和光电子器件等领域也具有潜在的应用价值,使其适用于高温、高功率、高压、高频以及强辐射等极端环境。本文综述了历年来国内外制备c-BN晶体和外延生长c-BN薄膜的发展历程,重点关注了生长技术进步和晶体质量提高的代表性成果,并对c-BN的机械性能、光学性能以及电学性能方面的研究进展进行阐述,最后对全文内容进行总结并对c-BN应用所面临的挑战进行展望。     

Sapphire waveguides and fibers for terahertz applications

Sapphire shaped crystals are considered as a favorable material platform of the terahertz (THz) waveguide and fiber optics. Unique physical properties of sapphire, along with advantages of the Edge-defined Film-fed Growth (EFG) technique, yield fabrication of the THz waveguides and fibers with a complex cross-section geometry directly from the Al₂O₃-melt, where no labour-intensive mechanical processing is required. Wide variability of the as-grown sapphire shaped crystal geometries yields different physical mechanisms of electromagnetic waveguidance. In this review, recent advantages in the THz waveguides and fibers based on the EFG-grown sapphire shaped crystals are discussed. While possessing moderate THz-wave absorbtion and quite high dispersion, flexible sapphire fibers with a simple step-index cross-section geometry yield strong confinement of guided modes in a fiber core due to a high refractive index of sapphire in the THz range. This effect opens novel opportunities of sapphire fibers in high-resolution THz imaging, using the principles of either scanning-probe near-field optical microscopy or optical fiber bundles. In turn, antiresonant and photonic crystal hard hollow-core waveguides demonstrate advanced optical performance, along with wide capabilities in THz endoscopy and sensing in harsh environments. This review highlights that the EFG-grown sapphire shaped crystals hold strong potential in different branches of THz optics.     

高温溶液法生长SiC单晶的研究进展

碳化硅(SiC)作为第三代半导体材料,不仅禁带宽度较大,还兼具热导率高、饱和电子漂移速率高、抗辐射性能强、热稳定性和化学稳定性好等优良特性,在高温、高频、高功率电力电子器件和射频器件中有很好的应用潜力。高质量、大尺寸、低成本SiC单晶衬底的制备是实现SiC器件大规模应用的前提。受技术与工艺水平限制,目前SiC单晶衬底供应仍面临缺陷密度高、成品率低和成本高等问题。高温溶液生长(high temperature solution growth, HTSG)法生长SiC单晶具有晶体结晶质量高、易扩径、易实现p型掺杂等独特的优势,有望成为大规模量产SiC单晶的主要方法之一,目前该方法的主流技术模式是顶部籽晶溶液生长(top seeded solution growth, TSSG)法。本文首先回顾总结了TSSG法生长SiC单晶的发展历程,接着介绍和分析了该方法的基本原理和生长过程,然后从晶体生长热力学和动力学两方面总结了该方法的研究进展,并归纳了该方法的优势,最后分析了TSSG法生长SiC单晶技术在未来的研究重点和发展方向。     

Fiber Crystal Growth From the Melt

The literature on melt growth of single crystalline fibers is reviewed. The paper introduces in the characteristic features and wide field of advanced applications of micro single crystals in elongated form having a small diameter in the region mykrometer-millimeter. A brief historical survey is given. After that typical melt growth methods for production of fiber crystals are shown - micro zone floating (i.e. LHPG) and pulling from a die (i.e. Stepanow, EFG and micro pulling down techniques). Some selected fundamentals of the fiber growth process are described in detail, like mass and heat balance, capillary stability and segregation behaviour. In the centre of interest is the discussion of growth and analytical results obtained for various materials - oxides, mainly suitable for wave guides, lasers and nonlinear optics (sapphire, YAG, KRS-5, BBO, LiNbO₃ and further niobates etc.), eutectics for composites, semiconductors for fundamental studies, and metals for high-speed filament production. Special measures for fiber cladding, in-situ core doping and periodically ferroelectric domain adjustment are included. For the sake of completeness a look at the modern branch of polycrystalline and amorphous alloy fiber spinning and melt extrusion is taken too. In conclusion, the special suitability of fiber crystal growth for fundamental research is demonstrated.     

Crystal growth and structure of pure and rare-earth doped barium sodium niobate (BNN)

Through the exploitation of the corresponding ternary phase diagram, the barium sodium niobate (BNN) crystal growth by several techniques: Czochralski, Laser Heated Pedestal Growth and Micro-Pulling Down is surveyed. It is pointed out that the fiber crystal growth contributed to obtain important advances on the crystal structure, doping by rare-earth ions and growing behavior leading to what can be considered as an attractive new material. The further growth of high optical quality bulk crystals could now lead to the commercial development of this material with outstanding non-linear optical properties.     

Selective epitaxy and lateral overgrowth of 3C-SiC on Si – A review

This review article attempts to present a comprehensive picture of the progress in selective epitaxial growth (SEG) of cubic silicon carbide (3C-SiC) to make it a cheap and practical material for high temperature and high power, high frequency and MEMS (Micro Electromechanical Systems) applications. Selective epitaxial growth followed by epitaxial lateral overgrowth (ELO) is a suitable approach to minimize the interfacial defects and other planar defects in case of thin film growth. Different techniques of SEG and its application to Si, GaAs and III–V nitrides are reviewed briefly in the first section of this article. Various SEG techniques like epitaxial lateral overgrowth, pyramidal growth and pendeo epitaxial growth, etc. have been discussed extensively for growing 3C-SiC on Si, together with the characterization of the grown films. The influence of various experimental parameters such as temperature of growth, choice of mask material, influence of an etchant, pattern shape and size, etc. is also discussed. On the basis of these data, it is believed that SEG and related techniques are a promising approach for heteroepitaxial growth of 3C-SiC films useful for devices and MEMS applications.