Growth and properties of Pb[(Zn1/3Nb2/3)0.91Ti0.09]O3 single crystals directly from melt

Pb[(Zn_1/3Nb_2/3)_0.91Ti_0.09]O₃ (PZNT91/9) single crystals were grown by a modified Bridgman method directly from melt using an allomeric Pb[(Mg_1/3Nb_2/3)_0.69Ti_0.31]O₃ (PMNT69/31) single crystal as a seed. X-ray diffraction (XRD) measurement confirmed that the as-grown PZNT91/9 single crystals are of pure perovskite structure. Electrical properties and thermal stabilization of PZNT91/9 crystals grown directly from melt exhibit different characters from those of PZNT91/9 crystals grown from flux, although segregation and the variation of chemical composition are not seriously confirmed by X-ray fluorescence analysis (XPS). The [0 0 1]-oriented PZNT91/9 crystals cut from the middle part of the as-grown crystal boules exhibit broad dielectric-response peaks at around 105 °C, accompanied by apparent frequency dispersion. The values of piezoelectric constant d₃₃, remnant polarization P_r, and induced strain are about 1800–2200 pC/N, 38.8 μC/cm², and 0.3%, respectively, indicating that the quality of PZNT crystals grown directly from melt can be comparable to those of PZNT91/9 single crystals grown from flux. However, further work deserves attention to improve the dielectric properties of PZNT crystals grown directly from melt. Such unusual characterizations of dielectric properties of PZNT crystals grown directly from melt are considered as correlating with defects, microinhomogeneities, and polar regions.     

还原氧化石墨烯/TiO2纳米线复合膜的制备及对Cu2+吸附性的影响

以石墨烯和自制TiO₂粉末为原料,通过两步水热法联合真空抽滤法制备还原氧化石墨烯/TiO₂纳米线(rGO/TiO₂ NWs)复合膜。通过扫描电子显微镜(SEM)、透射电子显微镜(TEM)、X射线衍射仪(XRD)、拉曼光谱对rGO/TiO₂ NWs复合膜的形貌、结构进行表征。研究结果表明,还原氧化石墨烯和TiO₂ NWs成功地复合在一起,复合材料中TiO₂ NWs分散性较好。Cu²⁺吸附实验结果表明,复合材料中TiO₂ NWs所占比例、pH值是影响Cu²⁺吸附效果的重要因素,研究复合材料对Cu²⁺的吸附效果应该在pH值为6.0的近中性环境。其中TiO₂ NWs含量为50%时,复合膜对Cu²⁺的吸附量最高,达到rGO薄膜的4倍。复合薄膜有较好的吸附稳定性,重复使用5次后,吸附率是原吸附量的91%。     

AgBr/TiO2纳米纤维的制备及其光催化性能研究

以钛酸丁酯、聚乙烯吡咯烷酮(PVP)、无水乙醇为原料,利用静电纺丝技术制备出Ti(OC4H9)4/PVP纳米纤维,经500～1000℃高温煅烧制得TiO2纳米纤维,再通过水热法将AgBr纳米颗粒负载到TiO2纳米纤维表面.利用X射线衍射仪、场发射扫描电镜、差热-热重分析对AgBr/TiO2纳米纤维进行表征分析.利用甲基...     

The effect of oxygen pressure on the microstructures of Co-doped rutile TiO2 thin films grown by pulsed laser deposition

Comprehensive microstructures of 7% cobalt-doped rutile TiO₂ thin films grown on c-plane sapphire by pulsed laser deposition were characterized using transmission electron microscopy (TEM). The effects of oxygen pressure during growth on the Co distribution inside the films were investigated, and the detailed growth mechanism of both TiO₂ and TiO₂+Co was discussed. The similar oxygen sublattices and low mismatch between (1 0 0) rutile and c-plane sapphire favors the rutile phase. However, the three-fold symmetry of the substrate surface resulted in three rutile domain orientation variants, and they grow adjacent to each other. Cobalt was found to precipitate out as nanocrystals inside the TiO₂ matrix as the growth pressure of oxygen was decreased. At 0.05 mTorr oxygen pressure, almost all of the Co segregates into crystallographically aligned nanocrystals with a particle size of 4.4±0.15 nm. All the samples have magnetic coercivity at room temperature. The magnetic moment per Co atom increased with decreased oxygen pressure, suggesting that the Co that replaced the Ti²⁺ in the TiO₂ lattice does not have a large magnetic moment.     

Low-temperature fabrication and photocatalytic activity of clustered TiO2 particles formed on glass fibers

Clustered anatase phase TiO₂ particles were uniformly formed on the surface of glass fibers by a liquid phase deposition (LPD) method at 60 °C using TiF₄ and H₃BO₃ as the precursors. The clustered TiO₂ particles deposited on the glass fibers and as a photocatalyst these particles not only have a larger surface area than TiO₂ thin films, but also can avoid the disadvantages of using TiO₂ powders encountered in air purification or water treatment. The photocatalytic activity of the sample was evaluated by the photocatalytic oxidation of nitrogen monoxide (NO) in the gaseous phase. The deposition conditions and chemical composition of the clustered TiO₂ particles were discussed. It was found that the clustered TiO₂ particles that formed on the glass fibers obviously showed photocatalytic activity without high-temperature calcination. A formation mechanism was proposed to account for the formation of TiO₂ clustered morphology on the glass fibers.     

Effect of the substrate temperature on the crystallization of TiO2 films prepared by DC reactive magnetron sputtering

Titanium oxide (TiO₂) films were deposited on silicon substrates at the temperature in the range 50–600 °C by DC reactive magnetron sputtering. It was found that the anatase and rutile phases co-existed in the TiO₂ films deposited at 450–500 °C, while only the anatase phase existed in those deposited at other temperatures. The mechanism of such a crystallization behavior of TiO₂ films is preliminarily explained.     

Flux growth of BPO4 crystals

Single crystals of BPO₄ with sizes up to 15×10×12 mm³ were grown by top-seeded solution growth method using Li₂O–Li₄P₂O₇ as fluxes. The components volatilized from the melt were characterized by the method of X-ray powder diffraction. The defects of grown crystals have also been investigated. The measured ultraviolet cutoff edge of BPO₄ was about 130 nm. Its density was 2.82 g/cm³ determined using drainage method.     

Structural and thermal properties of some tellurite glasses

Tellurium oxide glasses were prepared by the hammer and anvil technique. The glass systems are (0.85TeO₂ + 0.15Z), where Z = K₂O, TiO₂, V₂O₅, MnO, Fe₂O₃, CoO, NiO or CuO. A second group is a ternary system 0.85TeO₂+(0.15 − x)TiO₂ + xFe₂O₃) with x=0.0, 0.05, 0.1, 0.15 mol. X-ray diffraction, infrared spectroscopy and differential thermal analysis measurements were carried out. The present study showed the different glass-forming groups, the glass transition and crystallization temperatures as well as the crystallization processes.     

Vapor phase epitaxy of pure VO2 and V1−xCrxO2

The vapor phase epitaxy of thin epilayers of VO₂ and V_1−xCrxO₂ on TiO₂ transparent substrates is described. Chemical vapor deposition occurs by reacting a (VOCL₃/CrO₂Cl₂/H₂O/H₂) mixture at about 800°C using argon as a carrier gas. The preparation of pure VO₂ requires special care to make it homogeneously stoichiometric and to obtain steep concentration profiles at the TiO₂/VO₂ interface. Layers were obtained which had electrical and optical properties comparable to the best bulk crystals grown by other techniques. Homogeneous solid solutions of V_1−xCr_xO₂ epilayers were also grown for the first time in the range o < x < 0.17. Chromium concentration and homogeneity were determined by electron microprobe analysis. The separation coefficient k was also found to vary with x. It is close to unity below x = 0.001 and above this value Cr is incorporated more easily. High quality heteroepitaxial layers (1 cm² area, 1 to 30 μm thickness) of V_1−xCr_xO₂ have for the first time allowed the measurement of the optical absorption coefficient.     

不同形貌TiO2薄膜的可控制备及其光电化学性能研究

采用水热法在FTO(fluorine-doped tin oxide)基底上制备不同形貌的锐钛矿结构TiO₂薄膜。通过不断增大反应前驱物中盐酸浓度,TiO₂薄膜由球状颗粒薄膜逐渐演变生长成大面积高能(001)面裸露的TiO₂纳米片阵列薄膜。通过对形貌演化规律及X射线衍射图谱变化规律进行分析,提出了不同形貌TiO₂薄膜的生长演化机制,并对盐酸在其中的作用进行了说明。为了进一步改善TiO₂薄膜的性能,采用连续离子层吸附反应法对不同形貌的TiO₂薄膜进行CdS量子点敏化。采用紫外可见吸收光谱分析法和三电极体系对复合薄膜的光吸收性能和光电化学(PEC)性能进行了研究,实验数据显示CdS/TiO₂复合薄膜的光电化学性能皆明显优于单纯TiO₂薄膜,而且纳米片阵列薄膜的性能明显优于其他形貌薄膜,说明了大面积高能(001)面裸露的TiO₂纳米片阵列薄膜的性能优越性。     

Formation and structure of titanate glasses

The formation of high titanium oxide (30–60 wt%) containing glasses was studied. Stable titanate glasses with high content of TiO₂ and BaO could be obtained even without other glass-forming oxides. It is demonstrated that the coloration of titanate glasses with high content of TiO₂ is due to oxygen loss during the melting. A systematic study of controlling melting and heat treatment conditions led to the successful decoloration of titanium oxide containing glasses. Infrared spectra and X-ray diffraction studies showed that Ti⁴⁺ in titanate glasses is in sixfold coordination. Phase separation was observed by electron microscopy when the titanate glasses were heat-treated at the temperature above T_g. The crystallization of titanate glasses is generally preceded by phase separation. The obtained crystalline phases are mainly different titanates.     

Surface modification of a TiO2 film electrode prepared by the sol-gel method and its effect on photoelectrochemical behavior

The surface of a TiO₂ film electrode, about 1 μm thick, prepared by the sol-gel method, was modified by being additionally coated with about 0.1 μm thick TiO₂---SiO₂, TiO₂---ZrO₂ or TiO₂---Al₂O₃ films. The effect of the additional coating on the photoelectrochemical properties of a TiO₂ film electrode was investigated in detail. On addition of the second additive to TiO₂, the flat band potential was shifted toward negative potential for SiO₂ and positive potential for ZrO₂ and Al₂O₃, which is attributed to the change in the point of zero zeta potential (pzzp), not in the electron affinity (EA). However, enhancement in photocurrent was not observed for all the cases.     

SiW12、CsPbI3协同提高TiO2纳米管光电转换效率的研究

为克服TiO₂纳米管在光电转换时电子-空穴复合率高和吸收光谱范围窄的缺陷,利用多酸H₄SiW₁₂O₄₀(SiW₁₂)和CsPbI₃量子点对其协同修饰,采用电沉积法将SiW₁₂沉积在TiO₂纳米管上,制备了SiW₁₂/TiO₂纳米管复合薄膜;使用高温热注射法合成出CsPbI₃量子点,再通过化学浴沉积法沉积CsPbI₃量子点到复合薄膜上,得到SiW₁₂/CsPbI₃/TiO₂纳米管复合薄膜,探究SiW₁₂沉积时间、CsPbI₃沉积次数对TiO₂纳米管光电性能的影响。利用扫描电子显微镜(SEM)、能谱仪(EDS)、透射电子显微镜(TEM)、X射线衍射(XRD)仪、红外分光光度计(FT-IR)、紫外-可见分光光度计(UV-Vis)对薄膜进行表征,使用电化学工作站测试薄膜的光电化学性能。结果表明:TiO₂纳米管沉积多酸SiW₁₂和CsPbI₃量子点后,光吸收范围扩大、电荷转移电阻降低,光电转换效率得到显著提升,最高达到0.52%。说明SiW₁₂和CsPbI₃的协同作用很好地抑制了TiO₂纳米管电子-空穴的复合,并拓宽了吸收光谱范围,提高了TiO₂纳米管的光电转换效率。     

CrO2 (1 0 0) and TiO2 (1 0 0) film heteroepitaxy on a BaF2 (1 1 1)/Si (1 0 0) substrate

Multi-domained heteroepitaxial rutile-phase TiO₂ (1 0 0)-oriented films were grown on Si (1 0 0) substrates by using a 30-nm-thick BaF₂ (1 1 1) buffer layer at the TiO₂–Si interface. The 50 nm TiO₂ films were grown by electron cyclotron resonance oxygen plasma-assisted electron beam evaporation of a titanium source, and the growth temperature was varied from 300 to 600 °C. At an optimal temperature of 500 °C, X-ray diffraction measurements show that rutile phase TiO₂ films are produced. Pole figure analysis indicates that the TiO₂ layer follows the symmetry of the BaF₂ surface mesh, and consists of six (1 0 0)-oriented domains separated by 30° in-plane rotations about the TiO₂ [1 0 0] axis. The in-plane alignment between the TiO₂ and BaF₂ films is oriented as [0 0 1] TiO₂ || BaF₂ or [0 0 1] TiO₂ || BaF₂ . Rocking curve and STM analyses suggest that the TiO₂ films are more finely grained than the BaF₂ film. STM imaging also reveals that the TiO₂ surface has morphological features consistent with the BaF₂ surface mesh symmetry. One of the optimally grown TiO₂ (1 0 0) films was used to template a CrO₂ (1 0 0) film which was grown via chemical vapor deposition. Point contact Andreev reflection measurements indicate that the CrO₂ film was approximately 70% spin polarized.     

Influence of oxygen, hydrogen, helium, argon and vacuum on the surface behavior of molten InSb, other semiconductors, and metals on silica

Sessile drop experiments were performed on molten indium antimonide on clean quartz (fused silica) surfaces. A cell was constructed through which argon, helium, oxygen, hydrogen or a mixture of these was flowed at 600 °C. Some of the InSb was doped with 0.1% Ga. The surface tension σ of oxide-free molten InSb was smaller in Ar than in He, may have increased with increasing O₂ in the gas, and was not influenced by Ga or H₂. The contact angle θ on silica was higher in the presence of Ar, was lowered by O₂, and was not influenced by H₂ or Ga. The work of adhesion W and the surface energy σ_sv of the silica were higher in He than in Ar. The surface remained free of solid oxide only in flowing gas containing 0.8 ppm O₂. This behavior is attributed to reaction of O₂ at the surface of the melt to form In₂O gas. When solid oxide formed on Ga-doped material, it was strongly enriched in Ga, with the Ga/In ratio increasing with the concentration of O₂ in the gas.

Examination of published sessile-drop results for liquid metals and semiconductors on silica revealed that W and σ_sv were highest for reactive melts, in which SiO₂ dissolves. For non-reactive melts, W and σ_sv were lower and θ higher in a gas than in a vacuum, regardless of whether the experiments had been carried out in sealed ampoules, a flowing gas, or dynamic vacuum. The implication is that the surface of silica was different in a vacuum than in a gas at 1 bar.     

Surface crystallization of rare-earth aluminosilicate glasses

Surface crystallization in a rare-earth aluminosilicate glass (Nd₂O₃–Al₂O₃–SiO₂–TiO₂) was studied using an isothermal method and the crystal growth rate of the glasses was evaluated as a function of the composition. For measuring the surface crystal growth rate, two different methods: measurement of the crystal layer in the longitudinal and lateral growth direction. It was found that crystallization proceeded by surface crystallization only and TiO₂ did not act as a nucleating agent. The growth rate was strongly dependent on the viscosity of glass and agreed with prediction from the Preston model using the known viscosity and melting temperature. As the Si/Nd and Si/Al ratios decreased, the crystal growth rate increased. TiO₂ and Nd₂O₃ played the role of network modifier, which decreased the viscosity of the glass, facilitating crystallization of the rare-earth aluminosilicate glass.     

Ambient-condition growth of superconducting YBa2Cu4O8 single crystals using KOH flux

YBa₂Cu₄O₈ is a stoichiometric oxide superconductor of T_c80 K. Unlike YBa₂Cu₃O_7−δ, this compound is free from oxygen vacancy or twin formation and does not have any microscopic disorder in the crystal. Doping with Ca raises its T_c to 90 K. The compound is a promising superconductor for technological application. Up to now, single crystals have not been grown without using specialized apparatus with extremely high oxygen pressure up to 3000 bar and at over 1100 °C due to the limited range of reaction kinetics of the compound. This fact has delayed the progress in the study of its physical properties and potential applications. We present here a simple growth method using KOH as flux that acts effectively for obtaining high-quality single crystals in air/oxygen at the temperature as low as 550 °C. As-grown crystals can readily be separated from the flux and exhibit a perfect orthorhombic morphology with sizes up to 0.7×0.4×0.2 mm³. Our results are reproducible and suggest that the crystals can be grown using a conventional flux method under ambient condition.     

Mechanochemical synthesis of non-crystalline ZrTiO4 precursor from inhomogeneous mixed gels

The effects of vibration ball-milling of a mixture of two gels, prepared from mixing ZrO₂ and TiO₂ sols, on crystallization processes during heating are studied in order to determine enhanced mechanochemical reactions with the aid of hydroxyl groups. Data of differential thermal analysis (DTA) and X-ray diffractometry show that TiO₂ (anatase) and ZrO₂ (tetragonal) crystallized at 698 and 712 K, respectively, when a powdered gel mixture was heated to 1023 K to 10 K min⁻¹ in air. No reactions between the two phases were detected. After vibro-milling a powdered gel mixture at room temperature for 3 to 30 h, a new exothermic DTA peak appeared around 950 K and ZrTiO₄ (orthorhombic) was detected on heating to 1023 K. After vibro-milling, the compositional micro-homogeneity of non-heated gels was estimated from the fluctuations of elemental compositions in local areas using energy dispersive spectrometer with a 25 nm electron beam. The fraction of ZrTiO₄ crystallized on heating the gels to 1023 K, determined by Raman spectroscopy, increased linearly with increasing the micro-homogeneity for non-heated gels. It is suggested that atomic movement and short-range ordering of ZrTiO₄ rather than crystallization of individual oxides occur when applying mechanical stress to a powdered mixture of ZrO₂ and TiO₂ gels.     

Crystallization behavior and hydrophilic performances of V2O5–TiO2 films prepared by sol–gel dip-coating

Homogeneous and transparent V₂O₅–TiO₂ composite nanometer thin films were prepared on glass substrates by sol–gel processing and dip-coating technique. The films as well as the dried powder of bulk gel were characterized by different techniques like X-ray diffraction (XRD), high-resolution scanning electron microscopy (HRSEM), atomic force microscope (AFM) and thermogravimetry–differential thermal analysis (TG–DTA). The hydrophilicity of the films was determined by measuring the water contact angles on the films. The results showed that the dopant of V₂O₅ on TiO₂ thin films could produce a visible-light response to the films, and the introduction of V₂O₅ could suppress the structural phase transition and crystal growth of TiO₂ crystal. Finally, the relationship between crystalline size and hydrophilicity under sunlight was investigated in this article.     

Preparation and physical properties of amorphous V2O5 containing TiO2, Na2O or Li2O

V₂O₅ gels containing up to 18 mol% of TiO₂ were obtained through the simultaneous hydrolysis of alkoxides in ethanol solution. V₂O₅ gels containing Na₂O or Li₂O were obtained through the ion exchange method. The crystallization temperature, T_cr, of the gels increased and the H₂O content of the gels decreased by the addition of TiO₂ or Na₂O. These additives seem to stabilize the amorphous state of the gels. On the other hand, T_cr and the H₂O-content slightly varied with the addition of Li₂O. No ionic polarization was observed in coating films of the gels dried at temperatures below T_cr. The dc conductivity of the films was anisotropic, and increased with the addition of Li₂O or Na₂O. However, it decreased with increasing TiO₂ content. The fiber-like structure of gels was observed by TEM. The gels obtained from alkoxides were thin and short in comparison with the gels obtained through the ion exchange method.