N型4H-SiC同质外延生长

利用水平式低压热壁CVD (LP-HW-CVD) 生长系统,台阶控制生长和衬底旋转等优化技术,在偏晶向的4H-SiC Si(0001) 晶面衬底上进行4H-SiC同质外延生长,生长温度和压力分别为1550℃和10⁴ Pa,用高纯N₂作为n型掺杂剂的4H-SiC原位掺杂技术,生长速率控制在5μm/h左右.采用扫描电镜(SEM)、原子力显微镜(AFM),傅里叶变换红外光谱(FTIR)和Hg/4H-SiC肖特基结构对同质外延表面形貌、厚度、掺杂浓度以及均匀性进行了测试.实验结果表明,4H-SiC同质外延在表面无明显缺陷,厚度均匀性1.74%, 1.99% 和1.32%(σ/mean),掺杂浓度均匀性为3.37%,2.39%和2.01%.同种工艺条件下,样品间的厚度和掺杂浓度误差为1.54%和3.63%,有很好的工艺可靠性. 关键词： 4H-SiC 同质外延生长 水平热壁CVD 均匀性     

δ掺杂对Si衬底GaN蓝光LED外延膜性能的影响研究

用X射线衍射方法通过不同晶面的ω扫描测试,分析了Si衬底GaN蓝光LED外延膜中n-型层δ掺杂Si处理对外延膜结晶性能的影响。报道了Si衬底GaN外延膜系列晶面的半峰全宽(FWHM)值。通过使用晶格旋转(Lattice-rotation)模型拟合,计算出样品的螺位错密度和刃位错密度。结果表明,δ掺杂Si处理后生长出的样品螺位错密度增大、刃位错密度减小,总位错密度有所减小。通过对未经δ掺杂处理和δ掺杂处理的GaN外延膜相应ω-2θ扫描半峰全宽值的比较,发现δ掺杂Si处理后生长出的样品非均匀应变较大;相应样品的LED电致发光光谱I、-V特性曲线显示δ掺杂后样品性能变好。     

GS-MBE生长的GaP/Si的XPS研究

利用X射线光电子能谱(XPS)深度剖析方法对气体源分子束外延(GS-MBE)生长的GaP/Si异质结构进行了详细的分析.其结果表明:(1)外延层内Ga、P光电子峰与GaP相相符,且组份分布均匀,为正化学比GaP.(2)在不同富PH₃流量条件下生长的样品,其表面富P量稍有不同,而GaP外延层内的测试结果相同.界面也未见有P的富集.(3)XPS剖析至GaP/Si界面附近,随外延层界面向衬底过渡,Si2p光电子峰向高结合能方向移动,且其结合能高于原衬底p型Si,接近于n型Si.但Ga、P光电子峰未发现有明显能移.(4)在XPS检测限内,外延层内和界面都未见有C、O等沾污.这一研究表明:无污染的本底超高真空、相对过剩的富₃生长环境、成功的Si衬底清洗方法等措施保证了GS-MBE生长出正化学比GaP/Si外延异质结构.     

GaSb衬底上外延InAsxSb1-x材料的LP-MOCVD研究

采用自制的低压金属有机化学汽相淀积LP-MOCVD设备, 在(100)面GaSb单晶衬底上外延生长了InAsSb材料.用X射线双晶衍射、光学显微镜和扫描电镜、电子探针能谱仪等对材料特性进行了表征，分析研究了生长温度、Ⅴ/Ⅲ比、过渡层等对外延层的影响.并且获得了与GaSb衬底晶格失配度较低的表面光亮的晶体质量较好的InAsSb外延层.     

磷化镓单晶外延工艺及其自支撑薄膜的制作

采用Ga—PCI_3—H_2系统开管式汽相外延的方法,在GaAs衬底上生长掺Zn的GaP单晶。经化学腐蚀去掉GaAs衬底得到自支撑GaP单晶薄膜。 研究了在P型GaAs衬底上外延P—型GaP的生长条件,生长速度与温度的关系,生长速度与输运气体中的PCI_3浓度的关系,以及晶向偏差,清洁条件等对外延层质薄的(井彡)响。     

HgCdTe外延薄膜临界厚度的理论分析

基于在任意坐标系内应力与应变的关系、晶体弹性理论和位错滑移理论，研究了生长方向分别为［111］和［211］晶向，HgCdTe外延薄膜临界厚度与CdZnTe衬底中Zn组分和HgCdTe外延层中Cd组分的关系. 结果表明，HgCdTe外延薄膜临界厚度依赖于CdZnTe衬底中Zn组分和HgCdTe外延层中Cd组分的变化. 对于厚度为10μm，生长方向为［111］晶向的液相外延HgCdTe薄膜，要确保HgCdTe/CdZnTe无界面失配位错的前提条件，是CdZnTe衬底中Zn组分和HgCdTe外延层中Cd组分的波动必须分别在±0.225‰和±5‰范围内；而对于相同厚度，生长方向为［211］晶向的分子束外延HgCdTe薄膜，CdZnTe衬底中Zn组分和HgCdTe外延层中Cd组分的波动范围分别为±0.2‰和±4‰. 关键词： HgCdTe/CdZnTe 临界厚度 位错滑移理论 失配位错     

温度对Si衬底上低压MOCVD外延生长ZnS薄膜质量的影响

用低压MOCVD系统在(111)Si衬底上,用两步生长方法(改变/流量比)在300～400℃时外延生长了ZnS单晶薄膜。随着衬底温度的降低,ZnS薄膜结晶质量提高,并在300℃生长时获得结晶完整性较好的(111)ZnS单晶薄膜。文中讨论了衬底温度对薄膜质量的影响。     

Y掺杂Si纳米线的光致发光特性

以n型单晶Si(111)为衬底,利用Au作为催化剂,在温度、N₂流量和生长时间分别为1 100 ℃,1.5 L·min-1和60 min的条件下,基于固-液-固生长机制,生长了直径为60～80 nm、长度为数十微米的高密度Si纳米线。随后,以Y₂O₃粉末为掺杂源,采用高温扩散方法对Si纳米线进行了钇(Y)掺杂。利用扫描电子显微镜、X射线衍射仪和荧光分光光度计对不同掺杂温度(900～1 200 ℃)、掺杂时间(15～60 min)和N₂流量(0～400 sccm)等工艺条件下制备的Y掺杂Si纳米线的形貌、成分、结晶取向以及激发光谱和发射光谱特性进行了详细的测量和表征。结果表明,在掺杂温度为1 100 ℃,N₂流量为200 sccm、掺杂时间为30 min和激发波长为214 nm时,Y掺杂Si纳米线样品表现出较好的发光特性。样品分别在470～500和560～600 nm范围内出现了两条发光谱带。560～600 nm的发光带由两个发光峰组成,峰位分别为573.6和583.8 nm,通过结构分析可以推测,这两个发光峰是由Y3+在Si纳米线的带隙中引入的杂质能级引起的。而470～500 nm较宽的发光带同样来源于Y离子在Si纳米线带隙中引入的与非晶SiO_x壳层中氧空位能级十分接近的杂质能级。     

La0.5Sr0.5CoO3薄膜的外延生长及其机理研究

利用脉冲激光制膜法,在多种衬底和温度条件下,系统研究了La_0.5Sr_0.5CoO₃(LSCO)薄膜的结构和外延生长特性,在LaAlO₃,SrTiO₃和MgO衬底上实现了LSCO薄膜的外延生长.外延生长的薄膜具有低的电阻率和金属性导电特征.研究表明,外延生长的最佳温度范围为700—800℃,最佳衬底为LaAlO₃.并着重探讨了衬底材料和淀积温度等多种因素对LSCO薄膜的生长与性 关键词：     

MOCVD生长InGaN/AlGaN双异质结构与GaN过渡层的工艺与特性

评述利用MOCVD技术在α-Al2O3衬底上生长GaN薄膜及InGaN／A1GaN双异质结(DH)结构的工艺与特性;从表面动力学观点着重讨论了GaN过渡层MOCVD生长条件(温度、气流束源等)对表面形貌、结晶形态、掺杂及其光电性能的影响。分析表明,GaN薄膜生长速率主要依赖于反应炉温度,气流束源摩尔流量速率。若生长温度太高,引起PL发光谱峰向长波侧移动;GaN缓冲层生长温度必须控制在550℃。高的V／Ⅲ双气束流比率能够抑制GaN发光谱中550nm辐射峰产生。为了获得高质量p-A1GaN、GaN层,控制生长温度和以Cp2Mg为杂质源的Mg受主掺杂量,并在N2气氛中800℃快速退火,有助于提高InGaN／AlGaN双异质结辐射复合效率。     

Characterisation of the reduction properties of La0.5Sr0.5Fe0.5Co0.5O3

We report here on the characterisation by temperature programmed reduction, ⁵⁷Fe Mössbauer spectroscopy and X-ray absorption spectroscopy of the phases resulting from treatment of the perovskite-related material La_0.5Sr_0.5Fe_0.5Co_0.5O₃ in a flowing 90% hydrogen/10% nitrogen atmosphere. The results show that treatment of La_0.5Sr_0.5Fe_0.5Co_0.5O₃ (which contains approximately 50% Fe⁴⁺ and 50% Fe³⁺) in the flowing 90% hydrogen/10% nitrogen atmosphere at 600°C does not result in the reduction of any of the constituent elements of the material and that the perovskite structure is still retained. The Mössbauer spectrum recorded following heating in the gaseous reducing environment at 1,000°C shows the presence of metallic iron, an Fe³⁺-containing phase with parameters compatible with the presence of SrLaFeO₄ which has a K₂NiF₄-type structure, and a paramagnetic Fe³⁺ phase. The X-ray absorption spectroscopy results show the presence of metallic cobalt. The Mössbauer spectrum recorded following heating at 1,200°C continues to show the Fe³⁺-containing components plus a larger contribution from metallic iron. The X-ray absorption spectroscopy results show the presence of metallic cobalt, SrLaFeO₄, La₂O₃ and SrO.     

Crystal structure and the magnetic state of Pr0.5Sr0.5Co0.5Fe0.5O3

The magnetic properties and crystal structure of the Pr_0.5Sr_0.5Co_0.5Fe_0.5O₃ compound are studied by neutron and x-ray diffractions using synchrotron radiation. These measurements show that this compound is a dielectric spin glass with a magnetic moment freezing temperature of about 70 K. As temperature decreases in the range 30–95 K, a structure phase transition of the first order occurs with an increase in the symmetry from orthorhombic (space group Imma) to tetragonal (space group I4/mcm). It is assumed that the transition is caused by a change in the 4f electron configuration of the Pr³⁺ ions.     

Ab initio study of Os0.5W0.5B2, Re0.5W0.5B2, and Os0.5Re0.5B2 with high shear modulus

By using first‐principles calculations, the authors investigate the structural, mechanical, and electronic properties of experimentally synthesized Os_0.5W_0.5B₂. The calculated structural parameters and elastic properties are in good agreement with the experimental results. In addition, two new 5d transition‐metal diborides (Re_0.5W_0.5B₂ and Os_0.5Re_0.5B₂) are predicted to have promising large shear moduli. The latter mainly come from the non‐uniform distribution of valence charge density, which raises the value of the shear moduli. We discuss potentially high hardness in these materials. (© 2009 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Energy sublevels in an Al0.5Ga0.5As/GaAs/Al0.5Ga0.5As quantum wire

We report the successful fabrication of a V-grooveAl_0.5Ga_0.5As/GaAs/Al_0.5Ga_0.5As quantum wire system and the temperature-dependent photoluminescence (PL) measurement. The PL spectra are dominated by four features at 681, 642, 635 and 621 nm attributed to the luminescences from quantum wire, top, vertical and side-wall well regions by micro-PL measurements. By the calculations of the energy structure, discrete states (localized sublevels) in the quantum wire region and continuum states (extended along the side-wall and vertical quantum wells) in side-wall and vertical quantum wells have been obtained in both the conduction and valence bands. The calculated excitation energies explain very well the peak positions and their temperature dependence in the photoluminescence measurements.     

High-temperature impedance spectroscopy of BaFe0.5Nb0.5O3 ceramics doped with Bi0.5Na0.5TiO3

Bi_0.5Na_0.5TiO₃ (BNT)-doped BaFe_0.5Nb_0.5O₃ (BFN) ceramics were synthesized by a two-step solid-state reaction. Temperature dependence of dielectric properties measured at different frequencies was investigated over broad temperature and frequency ranges. Impedance spectroscopy and universal dielectric response were employed to study the relaxation behavior and conductivity mechanism of the ceramics in a frequency range from 40 Hz to 100 MHz and a temperature range from 300 K to 800 K. The complex plane impedance data revealed the bulk and grain boundary contributions toward conductivity processes in the form of semicircular arcs. The high-temperature conductivity of ceramics is attributable to thermally activated second ionized oxygen vacancy.     

Intrinsic pinning properties of FeSe0.5Te0.5

The intrinsic pinning properties of FeSe_0.5Te_0.5, which is a superconductor with a critical temperature T_c of approximately 14 K, were studied through the analysis of magnetization curves obtained using an extended critical state model. For the magnetization measurements carried out with a superconducting quantum interference device (SQUID), external magnetic fields were applied parallel and perpendicular to the c-axis of the sample. The critical current density J_c under the perpendicular magnetic field of 1 T was estimated using the Kimishima model to be equal to approximately 1.6 × 10⁴, 8.8 × 10³, 4.1 × 10³, and 1.5 × 10³ A/cm² at 5, 7, 9, and 11 K, respectively. Furthermore, the temperature dependence of J_c was fitted to the exponential law of J_c(0) × exp(?αT/T_c) up to 9 K and the power law of J_c(0) × (1 ? T/T_c)ⁿ near T_c.     

0.5PZN-0.5PZT压电陶瓷拉曼散射研究

PZT基多元系压电陶瓷在三方相含量与四方相含量相等的准同型相界处(MPB)具有极为优异的压电性能。文章采用拉曼散射方法研究了0.5PZN-0.5PZT陶瓷体系中三方-四方相共存与弥散相变现象。研究发现,与纯PZT相比,0.5PZN-0.5PZT体系拉曼谱呈明显宽化特征,表明体系弛豫性较强,依据介温谱计算出弥散因子γ高达1.71。通过对拉曼谱峰进行Gauss函数拟合,定量计算三方相R₁模式与四方相E(3TO)和A₁(3TO)模式相对强度,以及四方相E(4LO)和A₁(3LO)模式与三方相R_h模式相对强度,结果表明0.5PZN-0.5PZT体系三方相与四方相含量相等,组成位于准同型相界,该结果得到XRD相分析验证。电学测量表明0.5PZN-0.5PZT陶瓷压电性能优异：k_p=0.66, d₃₃=425 pC/N,适宜作为压电致动器材料使用。     

Phase transitions in PbSc0.5Ta0.5O3

Ordered and partially ordered PbSc_0.5Ta_0.5O₃ ferroelectric single crystals are studied by diffraction, electrophysical, and optical methods. X-ray diffraction and electrophysical methods indicate the presence of a phase transition in the low-temperature range (at T = ?40°C).     

Negative and persistent photoconductivity in p-type Al0.5Ga0.5As/GaAs/Al0.5Ga0.5As heterostructures under uniaxial stress

Abstract

Illumination of a double p-Al_0.5Ga_0.5As/GaAs/Al_0.5Ga_0.5As heterostructure by a red light emitting diode results in a negative photoconductivity that, after the diode is switched off, slowly relaxes to a positive persistent photoconductivity, characterised by an approximately 1.5-fold increase of the two-dimensional hole concentration. This metastable state may be explained with a model in which deep electron traps are supposed to be located above the Fermi level on the inverted heterointerface. Under uni-axial compression the hole concentration in the persistent photoconductivity state, as well as in the dark state, demonstrates the same linear decrease.     

The intercalation/deintercalation kinetic studies on the structure-integrated cathode material 0.5Li2MnO3 0.5LiNi0.5Mn0.5O2

A cathode material, 0.5Li₂MnO₃ 0.5LiNi_0.5Mn_0.5O₂, was prepared by citric acid-assisted sol–gel method and its electrochemical performance was investigated. It delivered a charge capacity of 270 mAh g^?1 and a discharge capacity of 189 mAh g^?1 in the first cycle. With the increase of current density from 14 to 28 mA g^?1, the discharge capacity dropped severely to 130 mA g^?1. Obviously, the rate capability of the material was inferior to most of the oxide cathode materials. The diffusion coefficient of this material was calculated to be 6.04?×?10^?12 cm² s^?1 from the results of cyclic voltammetry measurements. Moreover, diffusion coefficients between 3.13?×?10^?12 and 1.22?×?10^?10 cm² s^?1 in the voltage range of 3.8–4.7 V were obtained by capacity intermittent titration technique. This, together with the localized Li₂MnO₃ domains in the crystal structure, may validate the poor rate capability.