Photoluminescence of the ZnSe single crystals doped by thermal diffusion of nitrogen

Photoluminescence (PL) spectra of ZnSe single crystals annealed in different ambients containing molecular nitrogen are investigated. The compensating activity of N impurity in n-ZnSe crystals is shown. It is caused by the formation of N_Se acceptor centers, having 101-108 meV activation energy. The intensity of amplification of both long-wave luminescence spectra bands and the edge luminescence spectra bands caused by the presence of nitrogen in annealing medium is investigated. The presented results allow one to assign the long-wave luminescence to deep acceptors caused by uncontrollable impurities, and the relevant bands of the edge luminescence spectra to the excitons bound with the same deep acceptors. The model explaining the transformations of the luminescent properties of ZnSe crystals by means of nitrogen impurity doping is proposed. The model considers the presence of donors having 75 meV activation energy, acceptors having 220-720 meV activation energy and centers having levels localized near the middle of the band gap.     

Effect of annealing on the electrical properties of nitrogen-doped silicon single crystals grown by crucibleless zone melting

The electrical properties of nitrogen-doped silicon single crystals of the n and p types grown by crucibleless zone melting and annealed at 680°C have been studied. It is shown that the annealing brings about the appearance, in the crystals, of nitrogen-containing centers, which form deep donor and acceptor levels in the band gap. The process is accompanied by an increase in the electrical resistivity; the increase is particularly substantial in the initially high-resistance single crystals. On the other hand, in slightly boron-doped single crystals of the n and p types, the conversion of the conduction type is observed. In a converted material of the n-type, the electron mobility is anomalously low, which demonstrates its high electrical spatial inhomogeneity. The energy of the deep acceptor level near E _c ? 0.35 eV introduced during annealing has been determined. The model explaining the phenomena observed is proposed.     

Evidence for two energy levels associated with EL2 trap in GaAs

By photocapacitance technique, applied to n-type LEC-grown GaAs, two energy levels:E _v +0.45 eV andE _c –0.75 eV are identified, for the first time, as being associated with the EL2 trap. As follows from the analysis of photo-EPR results on highly resistive GaAs crystals, the same energy levels can be attributed to the arsenic antisite defect, As_GA. In view of these findings, it is argued that the occupied EL2 level corresponds to the neutral charge state of As_Ga defect.     

Photoluminescence studies of vacancies and vacancy-impurity complexes in annealed GaAs

Photoluminescence measurements made at various depths below the surface of annealed GaAs single crystals are compared with vacancy distribution profiles obtained from electrical measurements. Results on undoped n-GaAs indicate that isolated Ga or As vacancies form non radiative centers. A broad-band emission at 1.20 eV, arising from V_Ga-donor complexes, is observed in spectra taken from n-type samples doped with Si, Sn or Te. The intensity of the 1.20eV band varies with depth and reaches its maximum value in the region where Ga vacancies are dominant. These results show the consistency between photoluminescence and electrical measurements. A band at 1.37eV has previously been assigned to V_As-acceptor complexes. This band was observed in this study only when the samples had been annealed in ampoules prepared from quartz containing traces of Cu. It is concluded that the 1.37eV band is due to Cu contamination rather than V_As-acceptor complexes.     

The Measurements of Photostimulated Luminescence in Alkali Doped BaFBr:Eu2☎ at Liquid Nitrogen Temperature

Considerable increase of the photostimulated luminescence (PSL) intensity and red shift of the excitation spectrum was obtained by alkali doping of BaFBr:Eu^2? crystals [1]. The band of the F_A(Br^?) centers about 0.1 eV shifted to low energy side against the “normal” F(Br^?) centers. The F_A(Br^?) centers are destroyed after heating to 330 K.     

ZnSe晶体中Cu杂质深能级的ODLTS谱

用控制Cu杂质在ZnSe品格中占据位置的方法,成功地得到了Cu-G和Cu-R中心分别占优势的ZnSe:Cu晶体.首次用ODLTS方法测得与Cu-R和Cu-G中心相应的受主能级分别位于价带顶上0.72eV和0.30eV.     

On the determination of thermal ionization energy of deep centers from ESR data

It is shown that the skin effect due to thermal generation of free carriers may affect the ESR signal more than deep center depopulation. Experimental results for 0.33 eV deep Eu²⁺ donor in CdF₂ crystals are presented, to show the way in which the thermal energy of deep centers is deduced from the ESR data.     

Simulation of the structure of oxygen hole centers in Mg2SiO4 and Mg2SiO4: Cr forsterite crystals by the interatomic potential method

The structure of oxygen hole centers in forsterite crystals has been simulated using the interatomic potential method. The energies of isolated oxygen hole centers, as well as the energies of their clusters with intrinsic and extrinsic defects of the crystal, have been estimated for different arrangements of point defects in the structure. It has been shown that the most energetically favorable position for isolated oxygen hole centers is the O3 position, in which the gain in the formation energy is equal to 0.17 eV as compared to the O2 position and 1.66 eV as compared to the O1 position. The maximum energy gain due to the association energy can be achieved when the oxygen hole centers are located at the vertices of the tetrahedron with a silicon vacancy. The presence of chromium in the forsterite crystal can increase the probability of the formation of silicon vacancies. The obtained results have been discussed in terms of the experimental investigations of the color centers generated in the Mg₂SiO₄ and Mg₂SiO₄: Cr crystals under ionizing radiation.     

PbWO4闪烁晶体的发光动力学模型

在对PbWO₄闪烁晶体的光谱特性、发光衰减及其温度依赖以及热释光的研究基础上,并结合理论计算,提出了PbWO₄晶体发光的动力学模型,给出了PbWO₄晶体的基本能带结构及激子发光中心能态、陷阱能级在能隙中的位置。用此模型可以完整说明PbWO₄的发光过程,特别是导致室温下发光效率低的原因。最后还对其主发射成分蓝、绿发光中心的起源作了简要讨论。     

Improvement of the scintillation properties of Gd3Ga3Al2O12:Ce,B single crystals having tailored defect structure

A novel approach is reported to minimize various defect centers in Ce doped Gd₃Ga₃Al₂O₁₂ single crystals to improve the scintillation properties. The crystals of Gd₃Ga₃Al₂O₁₂ codoped with 0.2 at% Ce and B (GGAG:Ce,B) have been grown in air and argon ambient using the Czochralski technique. The scintillation light output of crystals grown in Ar ambient was significantly increased after annealing the crystals in air. The measured light output of 60000 ph/MeV for annealed crystals is the highest value reported among this class of materials. As a consequence, the energy resolution at 662 keV gamma‐rays from a ¹³⁷Cs source was improved from 8% for the crystals grown in air to 6% for crystals grown in Ar and subsequently annealed in air. Further, the thermal quenching energy of photoluminescence (PL) emission was increased to be 470 meV for the annealed crystals. The thermoluminescence (TL) measurements suggest that the crystals grown in Ar ambient and post‐growth annealed in air may have a lesser concentration of trap centers which subsequently lead to the improvement in optical and scintillation properties leading to a superior detector performance. (© 2015 WILEY‐VCH Verlag GmbH &Co. KGaA, Weinheim)     

Photoelectronic and electrical properties of Tl2InGaS4 layered crystals

Tl₂InGaS₄ layered crystals are studied through the dark electrical conductivity, space charge limited current and illumination- and temperature-dependent photoconductivity measurements in the temperature regions of 220-350 K, 300-400 K and 200-350 K, respectively. The space charge limited current measurements revealed the existence of a single discrete trapping level located at 0.44 eV. The dark electrical conductivity showed the existence of two energy levels of 0.32 eV and 0.60 eV being dominant above and below 300 K, respectively. The photoconductivity measurements reflected the existence of two other energy levels located at 0.28 eV and 0.19 eV at high and low temperatures, respectively. The photocurrent is observed to increase with increasing temperature up to a maximum temperature of 330 K. The illumination dependence of photoconductivity is found to exhibit supralinear recombination in all the studied temperature ranges. The change in recombination mechanism is attributed to exchange in the behavior of sensitizing and recombination centers.     

深能级对AlGaInP/GaAs异质结双极晶体管性能的影响

用深能级瞬态光谱和光致发光(PL)方法研究了AlGaInP/GaAs异质结双极晶体管(HBT)发射区AlGaInP中的深能级.得到了两个深能级,分别为E_c-E_t1＝0.42eV和E_c-E_t2＝0.59eV,其复合截面为σ_n1＝6.27×10^-17cm²和σ_n2＝6.49×10^-20cm². 关键词：     

Electronic and optical parameters of an oxygen-related center in Zn-Te

An electron trapping center (E_c ? 0.44 eV) has been characterized by the photocapacitance technique. This center appears in oxygen contaminated crystals after ion implantation and annealing in Zn vapour. It has also been created by oxygen implantation in oxygen-free crystals. This center might result of an O_Te-D⁺ associate.     

Electrical properties and diffusion behavior of hafnium in single crystal silicon

Electrical properties and diffusivity of Hf in single crystal Si have been studied. Several deep level defects were found for Hf in both the upper and lower half of the silicon band gap, and their parameters were measured. Energy levels, concentrations, and capture cross sections were determined for all Hf defects. The DLTS spectra depend on the cooling rate. Analysis of electrical properties yielded a dominant deep level defect at E_C -0.27 eV, which showed field enhanced emission due to Poole–Frenkel effect, confirming its donor nature. This agreed with results obtained using CV and TSCAP. In the lower half of the bandgap, a defect level at E_V +0.24 eV was found to have a capture barrier of 0.04 eV. Diffusivity of Hf was studied using two methods for Hf incorporation in Si – ion implantation and sputtering. Analysis of broadening of the Hf profile in implanted samples, which were annealed for 168 h, allowed us to estimate the diffusivity of Hf as 1.7×10^-15 cm²/s at 1250 °C: the spreading of implanted profiles at lower temperatures was too small. Analysis of Hf depth profiles in the sputtered and annealed samples reveals that Hf appears to have a fast and slow component to its diffusivity whose migration energy was determined to be 3.5±0.3 eV and 4.1±0.3 eV respectively. The fast and slow component are ascribed to interstitial and substitutional Hf with an energy level of E_C -0.27 eV and E_V +0.43 eV respectively. The mechanism for the fast component seems to indicate a direct interstitial diffusion mechanism whereas the diffusion of the substitutional Hf seems most consistent with the concerted exchange diffusion mechanism. In addition, estimates of solubility for both, interstitial and substitutional Hf, are included. PACS 61.72.Tt; 66.30.Jt; 71.55.Cn     

Thermally stimulated current and high temperature resistivity measurements of 4H semi-insulating silicon carbide

High purity semi-insulating 4H SiC single crystals have potential applications for room temperature radiation detectors because of the wide band gap and radiation hardness. To control carrier lifetime, a key parameter for high performance radiation detectors, it is important to understand the nature of the deep traps in this material. For this purpose, we have successfully applied thermally stimulated current (TSC) and high temperature resistivity measurements to investigate deep level centers in semi-insulating 4H SiC samples grown by physical vapor transport. High temperature resistivity measurements showed that the resistivity at elevated temperatures is controlled by the deep level with an activation energy of 1.56 eV. The dominant traps revealed by TSC measurements were at 1.1-1.2 eV. The deep trap levels in 4H-SiC samples, the impurity and point defect nature of TSC traps peaked at ∼106 K (0.23 eV), ∼126 K (0.32 eV), ∼370 K (0.95 eV), ∼456 K (1.1-1.2 eV) are discussed.     

Photocapacitance studies of the C1-related deep center in CdTe

The C1-related deep center in n-CdTe has been investigated using photocapacitance methods. The photoionization threshold energy for electrons of the center has been found to distribute in the photon energy range from 0.80 to 1.30 eV. The experimental results have been analyzed in connection with properties of the center and have been explained using a configuration coordinate.     

Multiphonon mechanism of the ionization of traps in Al<Subscript>2</Subscript>O<Subscript>3</Subscript>: Experiment and numerical simulation

Charge transfer in Al₂O₃ has been investigated experimentally and theoretically. The experimental results are in qualitative agreement with the theory of the multiphonon ionization of deep centers. The thermal (W _T = 1.5 eV) and optical (W _opt = 3.0 eV) energies of the deep centers have been determined. It has been found that the experimental data are unsatisfactorily described by the Pool-Frenkel mechanism, which provides a non-physically small frequency factor and anomalously large effective tunneling mass.     

Characterization of N-doped ZnO layers grown on (0 0 0 1) GaN/Al2O3 substrates by molecular beam epitaxy

We investigated the optical properties and electrical properties of N-doped ZnO layers grown on (0 0 0 1) GaN/Al₂O₃ substrates by molecular beam epitaxy, employing 10 K photoluminescence (PL) measurements, current–voltage (IV) measurements, capacitance–voltage (CV) measurements, and 100 K photocapacitance (PHCAP) measurements. 10 K PL spectra showed that excitonic emission is dominant in N-doped ZnO layers grown after O-plasma exposure, while overall PL emission intensity is significantly reduced and deep level emission at around 2.0 2.2 eV is dominant in N-doped ZnO layers grown after Zn exposure. IV and CV measurements showed that N-doped ZnO layers grown after Zn exposure have better Schottky diode characteristics than O-plasma exposed samples, and an N-doped ZnO layer grown at 300 °C after Zn exposure has best Schottky diode characteristics. This phenomenon is presumably due to lowered background electron concentration induced by the incorporation of N. PHCAP measurements for the N-doped ZnO layer revealed several midgap trap centers at 1.2 1.8 eV below conduction band minimum.     

Incorporation of deep centres in VPE GaAs

The incorporation of deep levels in high purity vapour phase epitaxy (VPE) GaAs is studied as a function of the crystal growth conditions. Two deep levels, at 0.4 eV and 0.75 eV above the valence band, are investigated using photocapacitance. It is shown that their concentrations are always equal and vary together as a function of the AsCl₃ mole fractionX. Two regimes are observed, respectively, characterized by different variations of the total deep level concentrationN _T:N _TαX for lowX, andN _TαX⁻² for highX. In this last range,N _T andN _D are found to vary similarly. This work has been supported by the DRME.     

Photoemission from Ni0.84Cu0.16(111): Observation of surface energy band dispersion

Angle-resolved photoemission spectra have been obtained for annealed Ni_0.84Cu_0.16(111) single crystals. Emission peaks 1.8–4.0 eV below the Fermi energy are attributed to electronic states of the Cu-rich surface layer. The measured dispersion of these peaks is in close correspondence with the calculated energy bands of a free Cu (111) monolayer. Ni-derived bulk transitions are also identified.