Copper,the dominant acceptor in refined,undoped zinc telluride

Comparative measurements have been made of optical absorption and photoluminescence of refined undoped and Cu in-diffused ZnTe single crystals. Strong increases in a bound exciton BE line near 2.375 eV previously identified with the electrically dominant point defect acceptor ‘a’, with binding energy E_A ? 149 meV, suggests that this acceptor is substitutional Cu_Zn. Similarly strong increases in a relatively broad band at slightly higher energy suggests the simultaneous incorporation of shallow donors, possibly interstital Cu_I. These findings indicate that intrinsic defects such as V_Zn neither control the Fermi level in refined ZnTe nor produce shallow acceptors with E_A ? 250 meV, contrary to much previous speculation.     

Photoluminescence and capacitance transients in highly Mg-doped GaN

Behaviors of the photoluminescence blue-band and near-bandgap peak and the relevant thermal ionization energies of the shallow and deep Mg-related acceptors have been studied, respectively. The 2.989 eV blue-band is attributed to the deep donor–acceptor-pair transitions involving a deep Mg-related acceptor at E_v+0.427 eV. The blueshift with increasing excitation power is explained by variation in the contribution of close and distant donor–acceptor-pairs to the luminescence. The redshift with increasing temperature results from thermal release of carriers from close donor–acceptor-pairs. The 3.26 eV near-bandgap peak is attributed to the shallow donor–acceptor-pair transitions involving a shallow Mg-related acceptor at E_v+0.223 eV. The relevant thermal ionization energies of the shallow and deep Mg-related acceptors, being about E_v+0.16 and E_v+0.50 eV, are determined from deep-level transient Fourier spectroscopy measurements. Received: 11 July 2001 / Accepted: 9 August 2001 / Published online: 2 May 2002     

Study on the structure and optical property of Zn1−xCuxO sol–gel thin films on quartz substrate

Zn_1−xCu_xO thin films (x=0, 1.0, 3.0, 5.0%) are prepared on quartz substrate by sol–gel method. The structure and morphology of the samples are investigated by X-ray diffraction (XRD) and atomic force microscopy (AFM). The results show that Cu ions were effectively penetrated into the ZnO crystal lattices with substitutional and interstitial impurities to form stable solid solutions without changing the polycrystalline wurtzite structure. Two peaks at 420 nm (2.95 eV, violet), 485 nm (2.56 eV, blue) have been observed from the photoluminescence (PL) spectra of the samples. It is concluded that the violet peak may correspond to the exciton emission; the blue emission corresponds to the electron transition from the bottom of the conduction band to the acceptor level of zinc vacancy. The optical test shows that the optical band gap E_g is decreased with the increase amount of Cu doping in ZnO. The band gap decrease from 3.40 eV to 3.25 eV gradually. It is also found that the transmission rate is increased rapidly with the increase of Cu ions concentration.     

Electron Traps with a Wide Range of Capture Cross Sections in Powdery ZnS-Based Luminophors

Using the method of thermally stimulated luminescence, the phenomenon of spatial modulation of the capture cross section (S_t) of electron traps with a level of E_c − 0.18 eV in powdery luminophors Zn_0.97Cd_0.03S 〈Cu, Cl〉 with green luminescence and ZnS〈Ag, Cl〉 with blue luminescence by a collective electric field of macroinhomogeneity has been investigated. The maximum value of the effect (width of the range of values of S_t) attains five orders of magnitude, with the size of the powder grains being of order 1 µm. A model is suggested, according to which traps with E_c − 0.18 eV with an extended range of values of S_t represent an isolated anionic vacancy in a region of the collective field of macroscopic inhomogeneity that is the negatively charged surface of the powder grains. The extension of the range of values of S_t is the result of modulation of the kinetic parameters of electron traps E_c − 0.18 eV depending on the spatial position occupied by the anionic vacancy relative to the surface of the powder grains.__________Translated from Zhurnal Prikladnoi Spektroskopii, Vol. 72, No. 2, pp. 202–206, March–April, 2005.     

Electrical characterization of impurity-free disordering-induced defects in n-GaAs using native oxide layers

Defects created in rapid thermally annealed n-GaAs epilayers capped with native oxide layers have been investigated using deep-level transient spectroscopy (DLTS). The native oxide layers were formed at room temperature using pulsed anodic oxidation. A hole trap H0, due to either interface states or injection of interstitials, is observed around the detection limit of DLTS in oxidized samples. Rapid thermal annealing introduces three additional minority-carrier traps H1 (E_V+0.44 eV), H2 (E_V+0.73 eV), and H3 (E_V+0.76 eV). These hole traps are introduced in conjunction with electron traps S1 (E_C-0.23 eV) and S2 (E_C-0.45 eV), which are observed in the same epilayers following disordering using SiO₂ capping layers. We also provide evidence that a hole trap whose DLTS peak overlaps with that of EL2 is present in the disordered n-GaAs layers. The mechanisms through which these hole traps are created are discussed. Capacitance–voltage measurements reveal that impurity-free disordering using native oxides of GaAs produced higher free-carrier compensation compared to SiO₂ capping layers. Received: 12 March 2002 / Accepted: 15 July 2002 / Published online: 22 November 2002 RID="*" ID="*"Corresponding author. Fax: +61-2/6125-0381, E-mail: pnk109@rsphysse.anu.edu.au     

An interpretation of dlts spectra of Al/Si3N4/ultrathin SI/GaAs structures — Effect of quantum well or interface states?

We discuss DLTS andC-V measurements on Al/Si₃N₄/Si(2nm)/n-GaAs (≈ 5×10¹⁷ cm^?3) structures. Three discrete deep traps superimposed on a U-shaped interface-state continuum have been identified, with respective thermal energies:E _c?0.53 eV,E _c?0.64 eV, andE _v+0.69 eV. The second one (0.64 eV) is presented as an electric field sensitive level, its enhanced phonon-assisted emission resulting in a rapid shift of the corresponding DLTS peak to lower temperatures, as the applied (negative) reverse bias voltage increases. An interpretation through emission from the quantum well, introduced by means of the intermediate ultrathin Si layer, has failed.     

Energy levels of interstitial manganese in silicon

Interstitial manganese in silicon can exist in four charge states which imply single acceptor and double donor behaviour. The corresponding level scheme with the acceptor level ($\text{Mn}{}^{\mathrm{<mtext>?</mtext><mtext>0</mtext>}}$) at E_c-0.13eV, the first donor level ($\text{Mn}{}^{\mathrm{<mtext>0</mtext><mtext>+</mtext>}}$) at E_c?0.45eV and the second donor level (Mn^+/++) at E_v+0.30eV is established through EPR-controlled Hall measurements. Another deep donor level at E_c?0.54eV is produced by the donor acceptor pair (MnB) whereas a more shallow one around E_c-0.28eV was already attributed to a Mn₄-cluster.     

Boron-related deep centers in 6H-SiC

6H-silicon carbide layers are grown by a liquid phase epitaxy (LPE) process. The layers are doped with boron either by ion implantation or during the LPE process from a B-doped silicon melt. Deep-level transient spectroscopy (DLTS), admittance spectroscopy and photoluminescence (PL) are used to investigate deep impurity centers. Two electrically active defect centers are detected: the isolated boron acceptor at E _B=E _v+0.3eV and the boron-related D-center at E _D=E _v+0.58eV. The yellow luminescence observed in these layers is proposed to be due to pair recombination via D-center and nitrogen donor. Formation and origin of the D-center are discussed.     

Copper and native defects in zinc telluride

Zinc telluride crystals were grown from tellurium-rich solutions containing 10¹⁷–10²⁰ cm^?3 atoms of copper. The copper concentrations in these crystals were measured by activation analysis. Hall effect and resistivity measurements were performed. Photoluminescence spectra were also determined. Our interpretation of the different results is that copper brings about both acceptor defects Cu_Zn with a 0·12–0·13 eV ionization energy, and donor defects. The second acceptor level of the zinc vacancy was found to be at 0·15 eV.     

注硅半绝缘GaAs的深能级

用深能级瞬态谱(DLTS)详细研究了硅离子注入Liquid-encapsulated Czochralski(缩写为LEC)半绝缘GaAs的深中心。结果表明,在注硅并经高温退火的有源区中观测到4个多子(电子)陷阱,E₀₁,E₀₂,E₀₃和E₀₄。它们的电子表观激活能分别为0.298,0.341,0.555和0.821eV。其中E₀₄与EL2有关,但不是EL2缺陷。E₀₄的电子 关键词：     

Electronic properties and deep level transient spectroscopy of CdS/CdTe thin film solar cells

It is well known that preparing temperatures and defects are highly related to deep-level impurities. In our studies, the CdTe polycrystalline films have been prepared at various temperatures by close spaced sublimation (CSS). The different preparing temperature effects on CdS/CdTe solar cells and deep-level impurities have been investigated by I--V and C--V measurements and deep level transient spectroscopy (DLTS). By comparison, less dark saturated current density, higher carrier concentration, and better photovoltaic performance are demonstrated in a 580oC sample. Also there is less deep-level impurity recombination, because the lower hole trap concentration is present in this sample. In addition, three deep levels, E_v+0.341 eV(H4), E_v+0.226 eV(H5) and E_C-0.147 eV(E3), are found in the 580oC sample, and the possible source of deep levels is analysed and discussed.     

Transition metal impurities in silicon: New defect reactions

Recent investigations on transition-metal impurities in silicon emphasizing the effect of the combined diffusion of two transition metals are presented and briefly discussed. The electronic properties and basic thermal kinetics are analysed by DLTS. The conversion of a Pd-related multivalent defect atE _c-0.35 eV andE _c-0.57 eV to the Pd-related defect atE _c –0.22 eV is observed, and a Pd-Fe complex level atE _c –0.32 eV is identified. The annealing characteristics of the multivalent Rh levels atE _c-0.33 eV andE _c-0.57 eV are observed, and used to analyse the influence of prior Rh doping on the Au diffusion. A complex formed by the codiffusion of Au and Cu is observed atE _v+0.32eV andE _v+0.42 eV, and shown to exhibit bistable behavior as does a similarly produced Au-Ni complex observed atE _v + 0.35 eV andE _v+0.48 eV.     

A study of deformation-produced deep levels inn-GaAs using deep level transient capacitance spectroscopy

Deformation-produced deep levels, both of electron and hole traps, have been studied using deep level transient capacitance spectroscopy (DLTS) for an undopedn-type GaAs (HB grown) compressed at 440°C. Concentrations of two grown-in electron trap levels (E _c −0.65eV andE _c −0.74eV) and one grown-in hole trap level (E _v +∼0.4eV) increase with plastic deformation, while that of a grown-in electron trap level (E _c −∼0.3eV) decreases in an early stage of deformation. While no new peak appeared in the electron trap DLTS spectrum after plastic deformation, in the hole trap DLTS spectrum a broad spectrum, seemingly composed of many peaks, newly appeared in a middle temperature range, which may be attributed to electronic energy levels of dislocations with various characters.     

Studies of deep levels in He+-irradiated silicon

9 to 10¹³ particles/cm² have been investigated by the deep level transient spectroscopy technique and capacitance-voltage profiling. Under low fluence irradiation at least four main electron traps have been observed. With further increase in irradiation fluence, two new levels located at E_c-0.56 eV and E_c-0.64 eV appear on the high-temperature side of the DLTS signal. The slope change observed in the amplitude variations of the singly negative charge state of the divacancy versus the dose takes place when these two new levels appear. This suggests that both are multivacancy-related defects. After annealing at 350 °C for 15 min, all electron traps have disappeared. Moreover, no shallow levels are created during the annealing. Received: 12 December 1996/Accepted: 6 May 1997     

Investigation of the electrophysical properties and structures of impurity-defective complexes in silicon doped with palladium

Electric and structural methods are used to investigate formation of impurity-defective complexes in silicon doped with palladium. It is demonstrated that acceptor levels E _C – 0.18 and E _v + 0.34 eV detected in silicon during incorporation of palladium are caused by singly and doubly negatively charged states of [Pd–V] complexes, and the donor level E _v + 0.32 eV is a product of chemical compound of palladium with hydrogen forming the [Pd–H] complex. It is assumed that the palladium impurity in the doped silicon samples causes the elastic crystal energy to change and impurity clouds to be formed around microdefects. An increase in the temperature of palladium diffusion in silicon causes the impurity clouds to decay and the microdefect core sizes to decrease with their subsequent chaining into a needle.     

Iron-related deep levels in silicon

Deep levels in iron-doped p-Si are investigated by means of capacitance transient spectroscopy. Five Fe-related defects are observed in suitably prepared samples. Rapid quenching produces interstitial Fe_i and FeB, which give rise to levels at E_v + 0.43 eVand 0.10 eV, respectively. Three further levels at E_v + 0.33 eV, E_v + 0.40 eV and E_v + 0.52 eV are caused by slower quenching rates. The concentration of E_v + 0.33 eV in slowly cooled Czochralski-grown Si strongly exceeds the concentration in similarly treated float-zone Si.     

电子辐照硅层中缺陷能级的研究

用12MeV电子辐照硅p⁺n结,在硅中除引入氧空位E₁(E_c-0.19eV),双空位E₂(E_c-0.24eV)和E₄(E_c-0.44eV)外,还引入缺陷E₃(E_c-0.37eV)。用DLTS方法和反向恢复时间测量研究了这些能级的退火行为,可以看到,E₃的退火温度最高(≈520℃)。由退火特 关键词：     

Deep level transient spectroscopy (DLTS) study of defects introduced in antimony doped Ge by 2 MeV proton irradiation

Deep level transient spectroscopy (DLTS) and Laplace-DLTS have been used to investigate the defects created in Sb doped Ge after irradiation with 2 MeV protons having a fluence of 1×10¹³ protons/cm². The results show that proton irradiation resulted in primary hole traps at E_V +0.15 and E_V +0.30 eV and electron traps at E_C ?0.38, E_C ?0.32, E_C ?0.31, E_C ?0.22, E_C ?0.20, E_C ?0.17, E_C ?0.15 and E_C ?0.04 eV. Defects observed in this study are compared with those introduced in similar samples after MeV electron irradiation reported earlier. E_C ?0.31, E_C ?0.17 and E_C ?0.04, and E_V +0.15 eV were not observed previously in similar samples after high energy irradiation. Results from this study suggest that although similar defects are introduced by electron and proton irradiation, traps introduced by the latter are dose dependent.     

Trap centers in Au-implanted MOS structures

Trap centers in the Si-SiO₂ interface region of MOS structures doped by ion implantation of gold have been investigated using constant capacitance deep level transient spectroscopy (CC-DLTS). Gold doses of 10¹²–3 × 10¹³ cm^–2 were implanted into the back surface of the wafers and were then redistributed during a diffusion anneal for 30 min at 1100° or 900° C. Three Au-related trap levels have been observed in the interface region, which were attributed to the Au-donor (E _v +0.35 eV), the Au-acceptor (E _v +0.53 eV), and the Au-Fe complex (E _v +0.45 eV). The trap concentration profiles show that the Si-SiO₂ interface affects the Au concentration in a depth range of 1 m from the interface and that gettering of Au occurs at the interface. The interface state density is independent of the Au concentration at the interface even for concentrations of 10¹⁵ cm^–3.     

The effective-mass nature of deep-level point-defect states in semiconductors

The basic premise of Effective-Mass Theory (EMT) is that bound-state wavefunctions are constructible from Bloch functions in a small region or regions of k space. In contrast, deep-level wavefunctions are believed to involve Bloch functions from the entire Brillouin zone and several bands. In this paper we analyse the wavefunction of the deep vacancy level in Si obtained recently by self-consistent Green's-function calculations. We find that this wavefunction has a strong EMT character in that it is composed primarily of Bloch functions from the nearest bands and the corresponding coefficients, i.e. the envelope functions, are peaked about the band extrema. As a further check, we have used a spherical average of the self-consistent vacancy potential in the acceptor EMT equations. The resulting energy level is at E_v+0.9 eV, as compared with the Green's-function-theoretic value of E_v+0.8 eV. The resulting wavefunction, on the other hand, does not have the correct form. A check of the correction terms left out by the standard EMT equations reveals that their contributions to the energy level are large and tend to cancel one another.