多孔硅光致发光峰半峰全宽的压缩

硅发光对于在单一硅片上实现光电集成是至关重要的.目前已有的使硅产生发光的方法有:掺杂深能级杂质、掺稀土离子、多孔硅、纳米硅以及Si/SiO₂超晶格.声空化所引发的特殊的物理、化学环境为制备光致发光多孔硅薄膜提供了一条重要的途径.实验表明,声化学处理对于改善多孔硅的微结构,提高发光效率和发光稳定性都是一项非常有效的技术.超声波加强阳极电化学腐蚀制备发光多孔硅薄膜,比目前通用的常规方法制备的样品显示出更优良的性质.这种超声波的化学效应源于声空化,即腐蚀液中气泡的形成、生长和急剧崩溃.在多孔硅的腐蚀过程中,由于超声波的作用增加了孔中氢气泡的逸出比率和塌缩,有利于孔沿垂直方向的腐蚀,使多孔硅光致发光峰的半峰全宽压缩到了3.8nm.     

镶嵌于多孔硅微腔中8-羟基喹啉铝的窄峰发射

利用浸渍法将8羟基喹啉铝(Alq₃)镶嵌到多孔硅微腔中,制备了多孔硅微腔—Alq₃镶嵌膜,研究了多孔硅微腔对镶嵌其中的Alq₃自发发射的微腔效应,观察到了光谱窄化、发光强度增强等现象。镶嵌于多孔硅微腔中的Alq₃荧光光谱的半峰全宽只有15nm,而非微腔样品,即镶嵌于普通的单层多孔硅中Alq₃荧光谱半峰全宽在85nm以上。并且有微腔时Alq₃发光强度比没有微腔时Alq₃发光强度增强一个数量级。随机改变微腔中Bragg反射镜高折射率层的几何厚度可使高反射区展宽,从而更加有效地抑制了多孔硅本身的发光模,使发光色度更纯,但由于峰值透射率减小,导致共振峰强度有所减小。多孔硅微腔有机镶嵌膜有可能成为进一步发展Alq₃在电致发光器件方面应用的一条新途径。     

电致发光色纯性增强的硅基有机微腔

报道了硅基有机微腔的电致发光（EL）.该微腔由上半透明金属膜、中心有源多层膜和多孔硅分布Bragg反射镜（PS DBR）组成.半透明金属膜由Ag（２０nm）构成，充当发光器件的负电极和微腔的上反射镜.有源多层膜由Al (1 nm) / LiF(05 nm) /Alq3/Alq3:DCJTB/NPB/CuPc/ITO/SiO2组成，其中的Al/LiF为电子注入层，ITO为正电极，SiO2为使正、负电极电隔离的介质层.该PS DBR是采用设备简单、成本低廉且非常省时的电化学腐蚀法用单晶Si来制备的；该PS 关键词： 电化学腐蚀 电致发光 窄峰发射 硅基有机微腔     

Two‐dimensional microcavity lasers

Advances in processing technology, such as quantum‐well structures and dry‐etching techniques, have made it possible to create new types of two‐dimensional (2D) microcavity lasers which have 2D emission patterns of output laser light although conventional one‐dimensional (1D) edge‐emitting‐type lasers have 1D emission. Two‐dimensional microcavity lasers have given nice experimental stages for fundamental researches on wave chaos closely related to quantum chaos. New types of 2D microcavity lasers also can offer the important lasing characteristics of directionality and high‐power output light, and they may well find applications in optical communications, integrated optical circuits, and optical sensors. Fundamental physics of 2D microcavity lasers has been reviewed from the viewpoint of classical and quantum chaos, and recently developed theoretical approaches have been introduced. In addition, nonlinear dynamics due to the interaction among wave‐chaotic modes through the active lasing medium is explained. Applications of 2D microcavity lasers for directional emission with strong light confinement are introduced, as well as high‐precision rotation sensors designed by using wave‐chaotic properties.     

Photoluminescence studies of porous silicon microcavities

Narrow photoluminescence peaks with a full-width at half-maximum of 14–20 nm are obtained from porous silicon microcavities (PSM) fabricated by the electrochemical etching of a Si multilayer grown by molecular beam epitaxy. The microcavity structure contains an active porous silicon layer sandwiched between two distributed porous silicon Bragg reflectors; the latter were fabricated by etching a Si multilayer doped alternatively with high and low boron concentrations. The structural and optical properties of the PSMs are characterised by scanning electron microscopy and photoluminescence (PL). The wavelength of the narrow PL peaks could be tuned in the range of 700–810 nm by altering the optical constants.     

Optical characteristics of one-dimensional photonic crystals composed of high-aspect-ratio Si walls fabricated on V-grooved wafer

We demonstrate optical properties of one-dimensional photonic crystals (PC), which are fabricated using high-aspect-ratio etching on a V-grooved silicon wafer. The measured transmission spectrum has an obvious band gap; the suppression is over 30 dB. The quite small insertion loss of 1.9 dB is achieved by induced coupled plasma (ICP) cryogenic etching and direct coupling to the optical fiber aligned in the V-groove. We also successfully observed peaks originating from a localized cavity mode. Such a microcavity enables control of the light, which qualifies photonic crystal as a fundamental structure of optical functional devices. These results lead to achievement of integrated Si-based photonic circuits.     

Silica-based microcavity fabricated by wet etching

Silica whispering gallery mode(WGM) microcavities were fabricated by the buffered oxide etcher and potassium hydroxide wet etching technique without any subsequent chemical or laser treatments. The silicon pedestal underneath was an octagonal pyramid, thus providing a pointed connection area with the top silica microdisk while weakly influencing the resonance modes. The sidewalls of our microdisks were wedge shaped, which was believed to be an advantage for the mode confinement. Efficient coupling from and to the 60 μm diameter microdisk structure was achieved using tapered optical fibres, exhibiting a quality factor of 1.5×10~4 near a wavelength of 1550 nm. Many resonance modes were observed, and double transverse electric modes were identified by theoretical calculations. The quality factor of the microdisks was also analysed to deduce the cavity roughness. The wet etching technique provides a more convenient avenue to fabricate WGM microdisks than conventional fabrication methods.     

Conformal coverage for two-dimensional arrays of microcavites with quasi-three dimensional confinement by distributed Bragg reflectors

Different from conventional three-dimensional confined microcavity fabrication method in which micropillar microcavities were obtained through the etching of planar semicoductor microcavities, we adopted the conformal coverage to fabricate two-dimensional arrays of quasi three-dimensional confined optical microcavities providing both vertical and lateral optical confinement by the distributed Bragg reflectors (DBRs). Our microcavity samples were directly deposited on the patterned substrates with two-dimensional arrays of air holes. The SEM and cross-section TEM images show that the periodicity of the patterned substrate was still kept after deposition while the growth of DBRs along the sidewalls occurred simultaneously, which provided the transverse optical confinement. In order to probe the optical modes of this kind of microcavities, room temperature photoluminescence signals from prepared microcavities were detected. Three resonant modes were presented and exhibited obvious angular dependence. We attributed these phenomena to quantization of the in-plane wave vector components confined by lateral DBRs.     

Inducing photonic transitions between discrete modes in a silicon optical microcavity

We show the existence of direct photonic transitions between modes of a silicon optical microcavity spaced apart in wavelength by over 8 nm. This is achieved by using ultrafast tuning of the refractive index of the cavity over a time interval that is comparable to the inverse of the frequency separation of modes. The demonstrated frequency mixing effect, i.e., the transitions between the modes, would enable on-chip silicon comb sources which can find wide applications in optical sensing, precise spectroscopy, and wavelength-division multiplexing for optical communications and interconnects.     

A Method for Preparation of Ordered Porous Silicon Based on a 2D SiO_2 Template

A new method for fabricating ordered porous silicon is reported.A two-dimensional silica nanosphere array is used as a template with a hydrofluoric acid-hydrogen peroxide solution for etching the nanospheres.The initial diameter and distribution of the holes in the resulting porous silicon layer are determined by the size and distribution of the silica nanospheres.The corrosion time can be used to control the depths of the holes.It is found that the presence of a SiO_2 layer,formed by the oxidation of the rough internal surface of the hole,is the primary reason allowing the corrosion to proceed.Ultraviolet reflection and thermal conductivity measurements show that the diameter and distribution of the holes have a great influence on properties of the porous silicon.     

Planar silicon-based light polarizers

Silicon-based thin-film polarizers operating in the visible and near-infraed spectral range are fabricated by electrochemical etching of bulk silicon wafers. Anisotropically etched (110) porous silicon layers exhibit a strong in-plane anisotropy of the refractive index. Stackes of alternating layers with different mean refractive indices and thicknesses act as dichroic Bragg reflectors or microcavities, respectively. Both structures have two distinct reflection and transmission bands depending on the polarization of the incident linearly polarized light. Planar polarizers are realized through the combination, in one structure, of a dichroic reflector with either a second reflector or a microcavity with different spectral responses.     

All-optical tunable photonic bandgap microcavities with a femtosecond time response

An all-optical tunable photonic bandgap microcavity made from a two-dimensional polystyrene photonic crystal is fabricated by focused ion beam etching. The pump and probe scheme is adopted to measure tunability based on the femtosecond optical Kerr effect. An ultrafast response time of less than 120 fs is achieved for the tunable photonic bandgap microcavity. The microcavity resonant wavelength shifts 3.1 nm under excitation of 9.4 GW/cm2 pump intensity, which is in agreement with the theoretical prediction.     

Fabrication of Two-Dimensional Organic Photonic Crystal Microcavity

A two-dimensional polystyrene photonic crystal microcavity is fabricated by the method ot tocused ion Oeam etching. The scanning electron microscopy and the transmittance spectrum are used to characterize the properties of the photonic crystal microcavity. The quality factor and the transmittance of the photonic crystal microcavity is more than 530 and 90%, respectively. The measured results are in agreement with the theoretical predictions.     

Demonstration of ultralow-threshold 2 micrometer microlasers on chip

We demonstrate ultralow-threshold thulium-doped, as well as thulium-holmium-codoped, microtoroid lasers on silicon chips, operating at the wavelength of around 2 ?m. High quality factor whispering gallery mode(WGM) microtoroid cavities with proper thulium and holmium concentrations are fabricated from the silica sol-gel films. The highly confined WGMs make the microcavity lasers operate with ultralow thresholds, approximately 2.8 ?W and 2.7 ?W for the thulium-doped and the thulium-holmium-codoped microlasers, respectively.     

Light emission from porous silicon single and multiple cavities

Experimental and theoretical techniques are used to examine the effects of microstructuring on the optical properties of multilayer, single and multiple microcavity structures fabricated from porous silicon. Measurements of the reflectivity and photoluminescence spectra of three multilayer samples are presented. The results are modelled using a transfer matrix technique including a negative absorption term to represent the effect of spontaneous emission which gives luminescence. The emitted light is strongly controlled by the optical modes of the structures and very good agreement is observed between theory and experiment.     

Lasing in microdisks with an active region based on lattice-matched InP/AlInAs nanostructures

The emissivity of unstrained quantum-dimensional InP/AlInAs nanostructures and their lasing properties in microdisk cavities prepared by wet etching have been studied. For as-prepared structures, it has been found that they radiate owing to quantum-dimensional InP islands 50–300 nm in diameter. At temperatures below 160 K, whispering gallery modes have been observed in the microdisks. Experimental data on the PL intensity for microcavity modes versus the pump power, which were obtained at liquid helium temperature, have made it possible to find the lasing threshold, 50 W/cm². The half-width of the laser line at above-threshold powers equals 0.06 nm, which corresponds to a Q factor of 15 000.     

Single-mode lasing in a coupled twin circular-side-octagon microcavity

We demonstrate the curvature of coupled twin circular-side-octagon microcavity (TCOM) lasers as the degree of freedom to realize manipulation of mode quality ($Q$) factor and lasing characteristics. Numerical simulation results indicate that mode $Q$ factors varying from 10$^{4 }$ to 10$^{8}$, wavelength intervals of different transverse modes, and mode numbers for four-bounce modes can be manipulated for five different deformations. Global mode distributes throughout coupled microcavity with mode $Q$ factor around the order of 10$^{4 }$ or 10$^{5}$. Four-bounce modes lase with injection currents applied single microcavity. By pumping both microcavities simultaneously, single-mode lasing for global modes with side mode suppression ratios (SMSRs) of 30, 32, 32, 31, and 36 dB is achieved at the deformation of 0, 0.5, 1, 1.5, and 2 with four-bounce modes suppressed, respectively. Moreover, the linewidths less than 11 MHz for the single mode are obtained with the deformation of 2. The results show that the lasing modes can be efficiently manipulated considering variable curvature for TCOM lasers, which can promote practical applications of microcavity lasers.     

多孔硅的微结构与发光特性研究

利用原子力显微镜（AFM）和光致荧光（PL）光谱对一系列直流腐蚀和脉冲腐蚀的多孔硅的微结构及发光特性进行了对比研究．表面和侧面的AFM结果表明，多孔硅表面呈“小山”状，有许多小的、突出的硅颗粒．在相同的腐蚀条件（等效）下，脉冲腐蚀的样品表面Si颗粒更加尖锐、突出，侧面的线状结构更明显，多孔硅层更厚．对应的PL谱，脉冲腐蚀的样品发光更强．量子限制效应的理论可以比较成功地解释这个结果 关键词：     

Ultralow-threshold Yb(3+):SiO(2) glass laser fabricated by the solgel process

A Yb-doped silica microcavity laser on a silicon chip is fabricated from a solgel thin film. The high-Q micro-toroid cavity, which has a finesse of 10,000, is evanescently coupled to an optical fiber taper. We report a threshold of 1.8 microW absorbed power that is, to the best of our knowledge, the lowest published threshold to date for any Yb-doped laser. The effect of Yb(3+) concentration on laser threshold is experimentally quantified.     

一种简单高效的制备硅纳米孔阵结构的方法

本文介绍了一种简单高效的制备硅纳米孔阵结构的方法. 利用激光干涉光刻技术, 结合干法和湿法刻蚀工艺, 直接将光刻胶点阵刻蚀为硅纳米孔阵结构, 省去了图形反转工艺中的金属蒸镀和光刻胶剥离等必要步骤, 在2英寸的硅 (001) 衬底上制备了高度有序的二维纳米孔阵结构. 利用干法刻蚀产生的氟碳有机聚合物作为湿法刻蚀的掩膜, 以及在干法刻蚀时对样品进行轻微的过刻蚀, 使SiO₂点阵图形下形成一层很薄的硅台面, 是本方法的两个关键工艺步骤. 扫描电子显微镜图片结果表明制备的孔阵图形大小均匀, 尺寸可控, 孔阵周期为450 nm, 方孔大小为200–280 nm. 关键词： 激光干涉光刻 纳米阵列 刻蚀 氟碳有机聚合物