Cerium dioxide thin film optical waveguides

Cerium dioxide thin film optical waveguides were fabricated by an RF magnetron sputtering process. The films were deposited on glass substrates and on silicon dioxide layers grown on silicon substrates. Optical loss measurements for the fabricated waveguides are reported. It is seen that the volume losses in the films were fairly high compared with the surface losses.     

聚硅氧烷改性及多模光波导制备

采用含氢聚硅氧烷(HPSO)和二乙烯基苯(DVB)的交联体掺入聚二甲基硅氧烷(PDMS)中,使改性的聚二甲基硅氧烷(M-PDMS)折射率发生1%～1.8%的改变。M-PDMS及PDMS薄膜具有良好的光透射率和低的传输损耗,是低成本制备用于高速芯片间光互连聚合物光波导的理想材料。采用软成型和图案转移法,用M-PDMS及PDMS分别作波导的芯层和包层制备了截面为50μm×50μm,长度大于20cm的聚硅氧烷多模光波导。用数字化散射法测量了所制备波导的传输损耗,测得输入光波长为633nm时平均传输损耗为0.137dB/cm。     

Liquid-core/liquid-cladding integrated silicon ARROW waveguides

The fabrication and characterization of a liquid-core/liquid-cladding integrated antiresonant reflecting optical waveguide (L²-ARROW) is presented. In this waveguide, the light is confined vertically by the ARROW mechanism, whereas the lateral confinement is obtained by using liquid-core/liquid-cladding (L² waveguides) with different refractive indexes. This approach permits to realize L² waveguides with very low refractive index core (n ≈ 1.333) and represents a new solution to solve the difficulty to reduce the optical losses in 2D-ARROWs due to the TM polarization in lateral direction. The device has been fabricated with standard silicon technology. The results show that the optical properties can be tuned by changing the type and the flow velocity of the core and the cladding liquids.     

PDL free plasma enhanced chemical vapor deposition SiC optical waveguides and devices

Planar silicon carbide (SiC) waveguides are proposed for fabrication on a silicon substrate with an oxide isolation layer. Using post deposition annealing it is possible to achieve low polarisation-dependent loss (PDL) within optical SiC waveguides fabricated using a low temperature deposition technique. The proposed waveguides are optically characterised and successfully used in power splitters and vibration sensors. Results before and after annealing cycles for those devices are discussed. The interesting optical characteristics of SiC waveguides as well as the first passive components presented open the way for photonic sensing in harsh environment where SiC is a very promising material.     

硅键合SOI平面光波导探索

本文分析了ＳＩＭＯＸ／ＳＯＩ和ＤＷＢ／ＳＯＩ结构的性能特点。尝试用ＤＷＢ／ＳＯＩ材料制备不同波导层厚度的平面光波导样品，并测试了１．１５μｍ和１．５２３μｍ激光的ＴＥ和ＴＭ模的传输损耗。１．５２３μｍ光的ＴＥ模的最小传输损耗已达０．２７ｄＢ／ｃｍ。说明ＤＷＢ／ＳＯＩ材料是一种有潜力的光波导材料。     

Polycrystalline silicon optical fibers with atomically smooth surfaces

We investigate the surface roughness of polycrystalline silicon core optical fibers fabricated using a high-pressure chemical deposition technique. By measuring the optical transmission of two fibers with different core sizes, we will show that scattering from the core-cladding interface has a negligible effect on the losses. A Zemetrics ZeScope three-dimensional optical profiler has been used to directly measure the surface of the core material, confirming a roughness of only ~0.1 nm. The ability to fabricate low-loss polysilicon optical fibers with ultrasmooth cores scalable to submicrometer dimensions should establish their use in a range of nonlinear optical applications.     

二维硅基平板光子晶体器件

硅材料在红外通讯波段具有低损耗和高折射率的特性,使得其成为集成光学领域中应用最广的材料之一.主要介绍了本课题组在二维硅基平板光子晶体中实现微纳尺度上光调控的研究进展,讨论了利用光子晶体的缺陷态实现各种集成光学器件,包括光子晶体波导、微腔和利用光子晶体波导和微腔形成的滤波器.还介绍了光子晶体中特殊的光折射现象,包括红外波...     

溶胶-凝胶法制备SiO2-TiO2平板光波导工艺研究

采用溶胶-凝胶法制备了SiO₂-TiO₂平板光波导,计算了平板光波导通光条件,分析了硅/钛溶胶-凝胶材料的热性能,观测了平板光波导的结构形貌,并测试了其通光损耗。结果表明：经过200℃,30 min干燥处理的凝胶薄膜呈疏松多孔状态,对于非对称平板波导,存在芯层通光截止厚度,而且当SiO₂-TiO₂芯层厚度为0.5 μm时,SiO₂下包层厚度至少有6 μm才能防止1550 nm波长光泄露入单晶硅衬底中。制备的光波导对于1550 nm波长光传输损耗最小值为0.34 dB/cm。     

Optical waveguides in porous silicon pre-patterned by localised nitrogen implantation.

FIPOS technology forms islands of silicon isolated from a silicon substrate by (oxidised) porous silicon. The larger refractive index of the silicon islands suggests their use as optical waveguides. Sets of these silicon islands have been fabricated and the anticipated waveguiding has been observed at wavelengths of 1.15 and 1.3 μm in the silicon islands. However, the dominant waveguiding in these FIPOS structures is observed in the porous silicon between the silicon islands, close to the sample surface. A simple dynamic model of the anodisation process has been developed to explain the origin of this unexpected waveguiding.     

Imprinted bidirectional waveguide platform for large-core optical transceiver

We introduce a new configuration for large-core optical transceiver platforms based on asymmetric three-dimensional multimode Y junctions. We developed a simply structured bidirectional waveguide platform without using a wavelength division multiplexing filter or angled mirror. This structure was designed with two different size waveguides by using the three-dimensional ray-tracing method. This structure transmitted nearly 100% power in each direction, upstream and downstream. This simple and cost-effective structure was fabricated by the imprint process using a metallic master fabricated by an ultraprecision machining method. The experimental results show that this structure is suitable for bidirectional communications in large-core optical transceivers at 155 Mbits/s.     

Optical modulator using metal-oxide-semiconductor type Si ring resonator

Electric-field drive optical modulators using a Si ring resonator were fabricated on silicon-on-insulator (SOI) wafers. The fabricated resonators consisted of Si waveguides with width and thickness of 1.0 and 0.3 μm, respectively. In order to induce the linear electro-optic (EO) effect in the Si core layer, the strain was applied by covering the layer with Si₃N₄ film (0.26 μm thick) deposited by low pressure chemical vapor deposition (LPCVD) at 750 °C. The vertical electric-field was applied to the Si waveguide through the top and bottom cladding layers, and the optical output from the drop port at the resonance wavelength was measured. At a wavelength of 1501.6 nm, the optical modulation of 33% was obtained at 200V (electric-field at the silicon surface ∼3 × 10⁵ V/cm, nearly the breakdown field). The resonance wavelength was shifted toward the short wavelength side by applying both positive and negative voltages, this shift was explained by carrier concentration modulation. The linear EO effect in the Si core layer was not observed, presumably because the strain in the Si core layer was too small.     

Imprinted diffractive optics for terahertz radiation

Terahertz diffractive optic elements have been fabricated in polypropylene by imprinting with a silicon master. A silicon master is created with eight phase levels for high diffraction efficiency and etched using inductively coupled plasma reactive ion etching. This technique enables the rapid replication of complex optical structures in a high transmission material. Excellent replication of multilevel high efficiency Fresnel lenses is shown. The resulting lenses were tested with a 2 THz quantum cascade laser. The signal strength at the focus was 70 times the base signal strength.     

硅衬底上锗硅合金光波导的研制

报道锗硅合金在λ＝１．３μｍ的脊形单模光波导的设计，工艺及测量结果。这种光波导的传播损耗已达０．７ｄＢ／ｃｍ。脊形的高４－８μｍ，宽８－１２μｍ，均和单模光纤芯径相当，此外，其数值孔径在光波导的输入，输出端均能和单模光纤匹配，它已满足硅光集成对光波导的要求。文中最后报道了用这种锗硅合金光波导试制Ｙ分支器，并观察到二支分路输出的单模光斑。     

Enhancement of the evanescent field using polymer waveguides fabricated by deep UV exposure on mesoporous silicon

Polymer integrated reverse symmetry waveguides on porous silicon substrate fabricated by using deep ultraviolet radiation in poly(methyl methacrylate) are presented. The layer sequence and geometry of the waveguide enable an evanescent field extending more than 3 microm into the upper waveguide or analyte layer, enabling various integrated optical devices where large evanescent fields are required. The presented fabrication technique enables the generation of defined regions where the evanescent field is larger than in the rest of the waveguide. This technology can improve the performance of evanescent-wave-based waveguide devices.     

Propagation characteristics of the silica and silicon subwavelength-diameter hollow wire waveguides

The basic propagation properties of the silica and silicon subwavelength-diameter hollow wire waveguides have been investigated by comparison. It shows that the silica and silicon subwavelength-diameter hollow wire waveguides have some interesting properties, such as enhanced evanescent field in the cladding, enhanced intensity in the hollow core, and large waveguide dispersion. For the different confinement ability, the enhanced field in the hollow core and cladding of the silica subwavelength-diameter hollow wire is much stronger than that of the silicon one for the same size.     

可调谐集成光学Ti:LiNbO3光波导定向耦合滤波器

波分复用技术是当今光纤通信系统中的关键技术之一。具有增加光纤通信系统容量的巨大潜力,集成光学复用技术对于单模光纤通信系统特别重要本文给出了一种集成光学复用器件的设计和制作,这种集成光学滤波器是在之切LiNbO₃衬底上用非对称钛扩散条波导定向耦合器构成,它适于1.32μm和1.55μm波长耦合滤波。为了使单模光纤和条波导有效耦合,我们研制出了硅V型槽,并给出了一种光纤与波导的连接结构。提供了一种切实可行的途径。     

SOI-based trapezoidal waveguide with 45° microreflector for noncoplanar optical interconnect

A silicon on insulator (SOI)-based trapezoidal waveguide with a 45° reflector for noncoplanar optical interconnect is demonstrated. The proposed waveguide is fabricated on an orientation-defined (100) SOI substrate by using a single-step anisotropic wet-etching process. The optical performances of proposed waveguides are numerically and experimentally studied. Transmittance of -4.51 dB, alignment tolerance of ±20 μm, cross talk of -53 dB, and propagation loss of -0.404 dB/cm are achieved The proposed waveguide would be a basic element and suitable for the future intrachip optical interconnects.     

Low cost fabrication of SiO2 optical waveguides by laser direct writing on Ti-doped Sol-Gel films

A commercial direct laser writing (DLW) system operating at 1070 nm was used to fabricate SiO₂ optical waveguides on silicon wafers. A Ti-doped SiO₂ Sol-Gel film was deposited on the SiO₂/Si substrate by the dip-coating technique, based on which SiO₂ optical waveguides were patterned by DLW using a Ytterbium fiber laser and followed by chemical etching. The effects of laser parameters and the preheated temperature of Sol-Gel films on the dimensions of optical waveguides were studied systematically. The differences of etching rate between laser irradiated and non-irradiated areas in Sol-Gel films preheated at various temperatures are characterized by measuring the thickness of the films. Results demonstrate that the available laser power density range for laser densification and the width of the patterned optical waveguides are influenced strongly by the preheated temperature of the Sol-Gel films. The width of the optimized optical waveguide in this work is 25 μm. The minimum propagation loss of the fabricated optical waveguides is 1.7 dB cm⁻¹ at the wavelength of 1550 nm.     

A search-and-track algorithm for controlling the number of guided modes of planar optical waveguides with arbitrary refractive index profiles

A search-and-track algorithm is proposed for controlling the number of guided modes of planar optical waveguides with arbitrary refractive index profiles. The algorithm starts with an initial guess point in the parameter space that supports a specific number of guided modes. Then, it searches for, and tracks, the boundaries of this space or another space supporting different number of modes. It does so by monitoring the sign of a unified cutoff dispersion function. The algorithm is applied to both symmetric and asymmetric silicon-based parabolic-index waveguides. It shows that unlike asymmetric waveguides, the single-mode condition of symmetric waveguides is controlled by TM-, as opposed to TE-, polarization. This abnormal polarization control is strongest for high index contrast waveguides of sub-micrometer core sizes. The results are verified by full-vectorial beam propagation method.     

Electro-optical modulator using SiO2 waveguides with thermal poling on a Si substrate

A novel optical modulator using SiO₂ waveguides on a silicon substrate is proposed. The modulator is analyzed and designed with the finite element method. The numerical results have shown that an optimally designed modulator can give a broad bandwidth, good impedance match, and low cost. The proposed modulator can be fabricated easily using Si-based very large-scale integrated technology, and it is very suitable for opto-electronic integrated circuits.