Effects of SiO2 overlayer at initial growth stage of epitaxial Y2O3 film growth

We investigated the dependence of the Y₂O₃ film growth on Si surface at initial growth stage. The reflection high-energy electron diffraction, X-ray scattering, and atomic force microscopy showed that the film crystallinity and morphology strongly depended on whether Si surface contained O or not. In particular, the films grown on oxidized surfaces revealed significant improvement in crystallinity and surface smoothness. A well-ordered atomic structure of Y₂O₃ film was formed on 1.5 nm thick SiO₂ layer with the surface and interfacial roughness markedly enhanced, compared with the film grown on the clean Si surfaces. The epitaxial film on the oxidized Si surface exhibited extremely small mosaic structures at interface, while the film on the clean Si surface displayed an island-like growth with large mosaic structures. The nucleation sites for Y₂O₃ were provided by the reaction between SiO₂ and Y at the initial growth stage. The SiO₂ layer known to hinder crystal growth is found to enhance the nucleation of Y₂O₃, and provides a stable buffer layer against the silicide formation. Thus, the formation of the initial SiO₂ layer is the key to the high-quality epitaxial growth of Y₂O₃ on Si.     

Solidification of superalloy in a SiO2–ZrO2–B2O3 coating mould

The preparation of glass-lined coating mould from gels in the ternary system of SiO₂–ZrO₂–B₂O₃ has been investigated. The crystallization characterization and high temperature structure stability of this coating mould are demonstrated. We can find that the crystallization of t-ZrO₂ as well as the tetragonal to monoclinic phase transformation are, respectively, retarded and impeded owing to the encasement of SiO₂ matrix. While the inhibitive effect of B₂O₃ on crystallization of the SiO₂–ZrO₂–B₂O₃ coating mould is explained. Finally, DD3 single crystal superalloy melt can realize highly undercooled rapid solidification by adopting this coating mould, which further evinces that SiO₂–ZrO₂–B₂O₃ coating mould has an ideal nucleation inhibition for superalloy.     

First measurements of time-dependent nucleation as a function of composition in Na2O · 2CaO · 3SiO2 glasses

First measurements of the composition dependence of the time-dependent nucleation rate are presented. Nucleation rates of the stoichiometric crystalline phase, Na₂O · 2CaO · 3SiO₂, from quenched glasses made with different SiO₂ concentrations were determined as a function of temperature and glass composition. A strong compositional dependence of the nucleation rates and a weak dependence for the induction times were observed. Using measured values of the liquidus temperatures and growth velocities as a function of glass composition, these data are shown to be consistent with predictions from the classical theory of nucleation, assuming a composition-dependent interfacial energy.     

Cracking assisted nucleation in chemical vapor deposition of silicon nanoparticles on silicon dioxide

Deposition of sub-monolayer silicon on SiO₂/Si(1 0 0) greatly facilitates nucleation in subsequent thermal chemical vapor deposition (CVD) of silicon nanoparticles. Sub-monolayer seeding is accomplished using silicon atoms generated via disilane decomposition over a hot tungsten filament. The hot-wire process is nonselective towards deposition on silicon and SiO₂, is insensitive to surface temperature below 825 K, and gives controlled coverages well below 1 ML. Thermal CVD of nanoparticles at 1×10⁻⁴ Torr disilane and temperatures ranging from 825 to 925 K was studied over SiO₂/Si(1 0 0) surfaces that had been subjected to predeposition of Si or were bare. Seeding of the SiO₂ surface with as little as 0.01 ML is shown to double the nanoparticle density at 825 K, and densities are increased twenty fold at 875 K after seeding the surface with 30% of a monolayer.     

Nanocrystallization of fresnoite glass. I. Nucleation and growth kinetics

We determined the internal nucleation, crystal growth and overall crystallization kinetics of fresnoite crystal (2BaO · TiO₂ · 2SiO₂) in an almost stoichiometric fresnoite glass. Due to the extremely high nucleation rates (10¹⁷ m⁻³ s⁻¹) that limit the maximum crystal size to 700 nm the nucleation densities and crystal sizes were estimated by scanning electron microscopy (SEM). The volume fraction crystallized was measured by X-ray diffraction. The nucleation rates obtained directly from SEM measurements reasonably agree with those calculated from the combination of overall crystallization with crystal growth kinetics. The activation enthalpies for viscous flow, transport of structural units across the nucleus/melt interface (nucleation) and crystal growth: ΔH_η, ΔH_τ and ΔH_U respectively, follow a similar trend to that observed for other stoichiometric silicate glasses that nucleate internally: ΔH_η=294>ΔH_τ=87>ΔH_U=61 kJ/mol. Fresnoite glass displays the highest internal nucleation rates so far measured in inorganic glasses. These rates are comparable to some metallic glasses and can lead to nanostructured glass-ceramics.     

Structure and Raman spectra of glasses containing several glass-forming oxides and no glass-modifying oxide

Binary glasses containing no modifying oxides, such as SiO₂---GeO₂, SiO₂---B₂O₃, SiO₂---P₂O₅, GeO₂---B₂O₃, Al₂O₃---P₂O₅ and ternary glasses SiO₂---GeO₂---P₂O₅, Al₂O₃---B₂O₃---P₂O₅, B₂O₃---SiO₂---P₂O₅, Al₂O₃---ZrO₂---P₂O₅ have been prepared by melting and CVD methods. The Raman spectra have also been measured. Structural characteristics of SiO₂, GeO₂, B₂O₃, P₂O₅ in different glass systems are analysed. There exist coordination number changes in B₂O₃- and GeO₂-containing glasses and linkage changes between tetrahedra (SiO₄) and (PO₄) in SiO₂ and P₂O₅ containing glasses. The structure of Al₂O₃ containing glasses is homogeneous and the structure of B₂O₃ containing glasses is inhomogeneous. These experimental results are in coincidence with the X-ray small angle scattering analysis.     

Effect of CaO on the surface morphology and strength of water soaked Na2O–B2O3–Al2O3–SiO2 vitrified bond

The surface morphology of Na₂O–B₂O₃–Al₂O₃–SiO₂ vitrified bond with and without calcium oxide was studied by soaking vitrified bonded microcrystalline alumina composites in water. The content of water introduced to the vitrified bond was determined by thermal gravity analysis, and the effects of water and calcium on the phase separation and nucleation of the vitrified bond were investigated using scanning electron microscope and energy-dispersive X-ray spectrometer. Soaked in water for 72 h, the Na₂O–B₂O₃–Al₂O₃–SiO₂ vitrified bond presented a porous surface, and its bending strength declined with increasing sintering temperature. However, the Na₂O–CaO–B₂O₃–Al₂O₃–SiO₂ vitrified bond was more durable against aqueous coolant even needle-shape crystals were found clustered on the surface of the vitrified bond. The crystals were enriched with aluminosilicate tested by energy-dispersive X-ray spectrums. The appearance of crystals lessened the dissolution of the vitrified bond and made the bending strength increase in the sintering temperature region between 870 °C and 930 °C.     

基于抛光基材的热蒸镀铜箔生长高平整单层石墨烯薄膜

在石墨烯的化学气相沉积工艺中,铜箔是决定石墨烯薄膜质量的重要因素。传统铜箔由于制备工艺的限制,存在大量的缺陷,导致石墨烯薄膜的成核密度较高。本工作选用抛光铝板、抛光不锈钢板、微晶玻璃和SiO₂/Si作为基材,用热蒸镀法制备了不同粗糙度的铜箔,并详细讨论了以该系列铜箔生长高平整度石墨烯薄膜的条件及铜箔对石墨烯薄膜品质的影响。实验结果表明,铜箔以(111)取向为主,与基材分离后,表面具有纳米级平整度。在生长石墨烯后,从SiO₂/Si剥离的铜箔成核密度是4种基材中最小的。同时,从SiO₂/Si剥离的铜箔晶体结构变化最不明显,具有良好的结晶性,表面几乎不存在铜晶界缺陷。当压强为3 000 Pa,氢气和甲烷流速分别为300 mL/min和0.5 mL/min时,可以获得约1 mm横向尺寸的石墨烯单晶晶畴。     

Surface modification of a TiO2 film electrode prepared by the sol-gel method and its effect on photoelectrochemical behavior

The surface of a TiO₂ film electrode, about 1 μm thick, prepared by the sol-gel method, was modified by being additionally coated with about 0.1 μm thick TiO₂---SiO₂, TiO₂---ZrO₂ or TiO₂---Al₂O₃ films. The effect of the additional coating on the photoelectrochemical properties of a TiO₂ film electrode was investigated in detail. On addition of the second additive to TiO₂, the flat band potential was shifted toward negative potential for SiO₂ and positive potential for ZrO₂ and Al₂O₃, which is attributed to the change in the point of zero zeta potential (pzzp), not in the electron affinity (EA). However, enhancement in photocurrent was not observed for all the cases.     

Surface modification of SiO2 glass by laser processing

Various oxide films on SiO₂ glass substrates were irradiated by a laser beam. A continuous CO₂ laser source (wavelength 10.6 μm) was used for this purpose; the composition change at the surface layer was determined by Rutherford backscattering spectrometry (RBS). All the alkaline-earth oxides as well as those of lanthanum and yttrium, entered the glass after treatment. ZrO₂ and CeO₂, however, did not enter the SiO₂ glass due to laser irradiation. It is interesting, however, that a film of ZrO₂ + Al₂O mixture easily entered into the SiO₂ glass by laser processing. The conditions and mechanism of laser-enhanced interaction of ZrO₂ or other oxide films with SiO₂ glass surfaces are discussed especially in view of their structural behaviour in glass.     

TOPCon太阳电池发射极Al2O3/SiNx与SiO2/Al2O3/SiNx叠层膜钝化性能的比较

本文对TOPCon电池发射结的叠层钝化膜进行了研究,对比了3种不同叠层钝化膜(SiO₂/SiN_x、Al₂O₃(1.5 nm)/SiN_x、SiO₂/Al₂O₃(1.5 nm)/SiN_x)的钝化性能。结果表明:Al₂O₃(1.5 nm)/SiN_x的钝化性能优于SiO₂/SiN_x,SiO₂/Al₂O₃(1.5 nm)/SiN_x的钝化水平最佳,隐开路电压均值可达到705 mV。基于Al₂O₃/SiN_x叠层膜研究了Al₂O₃厚度(1.5 nm、3 nm和5 nm)对钝化性能和电池转换效率的影响。当Al₂O₃厚度由1.5 nm增加到3 nm时,钝化性能得到明显提升,隐开路电压均值提高了20 mV,达到707 mV,对应电池的光电转换效率升高了0.23个百分点,与SiO₂/Al₂O₃(1.5 nm)/SiN_x叠层膜电池的转换效率持平。然而,当Al₂O₃厚度继续增加至5 nm时,隐开路电压均值保持不变。因此可以使用Al₂O₃(3 nm)/SiN_x叠层膜代替SiO₂/Al₂O₃(1.5 nm)/SiN_x叠层膜,不仅简化了电池的工艺步骤,而且降低了生产成本。     

Large-scale synthesis of ultrafine Si nanoparticles by ball milling

Si nanoparticles have been synthesized by ball-milling of graphite and SiO₂ powders. The solid-phase reaction, C(graphite)+SiO₂→Si+CO₂, was found to be a novel technique for fabrication of ultrafine Si particles. The reduced Si in the powder assembled as nanoparticles with a wide range of diameters. Multiple-peak structures were observed in the photoluminescence spectra of the Si nanoparticles at room temperature. The peak energies were found to coincide with the PL peak pinning energies previously reported in porous Si. Thus, the fine structures of luminescence spectra could be attributed to the size quantization of the Si nanoparticles formed via solid-phase reaction during ball-milling.     

Nuclear magnetic resonance studies of alkaline earth phosphosilicate and aluminoborosilicate glasses

The ¹¹B, ²⁷Al, ²⁹Si and ³¹P magic angle spinning (MAS) NMR spectra of MO–P₂O₅, MO–SiO₂–P₂O₅ and MO(M^′₂O)–SiO₂–Al₂O₃–B₂O₃ (M=Mg, Ca, Sr and Ba, M^′=Na) glasses were examined. In binary MO–P₂O₅ (M=Ca and Mg) glasses, the distributions of the phosphate sites, P(Q_n), can be expressed by a theoretical prediction that P₂O₅ reacts quantitatively with MO. In the ternary 0.30MO–0.05SiO₂–0.65P₂O₅ glasses, the 6-coordinated silicon sites were detected, whose population increases in the order of MgOxCaO–0.05SiO₂–(0.95−x)P₂O₅ glasses, its population increases with an increase in f (=([P₂O₅]−[MO]−[B₂O₃]−[Na₂O])/[SiO₂]) and has maximum at f=9. The signal due to the 5-coordinated silicon atoms is also observed when x is smaller than 0.45. When three network-forming oxides such as SiO₂, Al₂O₃ and B₂O₃ coexist, Al₂O₃ reacts preferably with MO. The populations of 4-coordinated boron atoms, N₄, are expressed well with r/(1−r), where r=([Na₂O]−[Al₂O₃])/([Na₂O]−[Al₂O₃]+[B₂O₃]). The correlation of the Raman signal at 1210 and 1350 cm⁻¹ with the NMR signal of Si(Q₆) at −215 ppm is also seen.     

Silicate groupings in glassy and crystalline 2PbO·SiO2

The type and the amount of silicate groupings existing in glassy and crystalline 2PbO·SiO₂ have been determined by direct chemical methods: paper chromatography, trimethylsilylation combined with gas-liquid partition chromatography and by the molybdate method. The results obtained by these three different methods are in good agreement and demonstrate, that glassy 2PbO·SiO₂ and each of the three main crystalline polymorphs are characterized by its own specific silicate anion distribution: the distribution in vitreous 2PbO·SiO₂ is of a polyanionic nature; in T---Pb₂SiO₄ dimetic groups [Si₂O₇]⁶⁻ prevail; M₁---Pb₂SiO₄ contains predominantly [Si₄O₁₂]⁸⁻ rings and H---Pb₂SiO₄ is a typical polysilicate with chain anions [SiO₃²⁻]_n. The results fit a structural model according to which glass is a random array of discrete polyatomic groupings; the gradual transition from the glassy state to the stablest crystalline structure is connected with degradation and polymerization of silicate anions.     

Reaction sintering of gel derived ceramic composites

Fibrous SiC/SiO₂ matrix monolithic composites which have previously been fabricated using the sol-gel technique showed difficulty in densification. To enhance the sinterability of the SiC/SiO₂ composites, reactive ceramic species including furfuryl alcohol, alumina, and chromia were added to SiO₂ sol which was obtained by hydrolyzing tetraethoxysilane (TEOS). Physical and mechanical properties of these composites as a function of the reactive additives and of temperatures are presented.     

Electrical conductivities of mixed cation glasses

The electrical conductivities of (1−x) Li₂O · x BaO · 2 SiO₂, (1−x) Na₂O · x MgO ·2 SiO₂, (1−x) Na₂O · x CaO · SiO₂ and (1−x) Na₂O · x BaO · 2SiO₂ glasses were measured at temperature ranging from room temperature to 450°C. The transport numbers for Na⁺ ion in (1−x) Na₂O · x BaO · 2 SiO₂ glasses were measured. It was found that the alkali ion carried a significant part of the current in these glasses except one that had no alkali ions, and the conductivity decreased markedly as the alkali oxide was substituted by an alkaline earth oxide. The results of conductivity measurements combined with the data hitherto reported on mixed alkali glasses led to the proposal that the so-called mixed alkali effect could be explained on the basis of the independent path model in which it is assumed that cations can move only through vacant sites left by those of the same type.     

Toughened glass-ceramics containing ZrO2 and Al2O3 prepared by the sol-gel process from metal alkoxides

Glasses of compositions 5ZrO₂·5SiO₂(ZS), 5ZrO₂·Al₂O₃·4SiO₂(ZAS) and 5 5ZrO₂·0.5Al₂O₃·0.5Na₂O·4SiO₂(ZANS) were prepared by the sol-gel process from metal alkoxides and sintered to make glass-ceramics. Tetragonal ZrO₂ was precipitated by heat treatment at 900 to 1300°C. The activation energy for tetragonal ZrO₂ crystal growth was extremely high in Al₂O₃ containing glasses. ZAS and ZS were sintered to the near theoretical densities above 1200°C, at which the predominant phase was tetragonal ZrO₂. On the other hand, for ZANS, high densification was not attained owing to the large pores enclosed by the glass phase. Strength and fracture toughness increased with the densification and the crystal growth of tetragonal ZrO₂, reaching 450 MPa and 9 MN/m^1.5, respectively.     

Correlation between interfacial structure and c-axis-orientation of LiNbO3 films grown on Si and SiO2 by electron cyclotron resonance plasma sputtering

Thin films of crystalline lithium niobate (LN) grown on Si(1 0 0) and SiO₂ substrates by electron cyclotron resonance plasma sputtering exhibit distinct interfacial structures that strongly affect the orientation of respective films. Growth at 460–600 °C on the Si(1 0 0) surface produced columnar domains of LiNbO₃ with well-oriented c-axes, i.e., normal to the surface. When the SiO₂ substrate was similarly exposed to plasma at temperatures above 500 °C, however, increased diffusion of Li and Nb atoms into the SiO₂ film was seen and this led to an LN–SiO₂ alloy interface in which crystal-axis orientations were randomized. This problem was solved by solid-phase crystallization of the deposited film of amorphous LN; the degree of c-axis orientation was then immune to the choice of substrate material.     

Structure and thermal stability of MOCVD ZrO2 films on Si (1 0 0)

The structure and thermal stability of ZrO₂ films grown on Si (1 0 0) substrates by metalorganic chemical vapor deposition have been studied by high-resolution transmission electron microscopy, selected area electron diffraction and X-ray energy dispersive spectroscopy. As-deposited films consist of tetragonal ZrO₂ nanocrystallites and an amorphous Zr silicate interfacial layer. After annealing at 850°C, some monoclinic phase is formed, and the grain size is increased. Annealing a 6 nm thick film at 850°C in O₂ revealed that the growth of the interfacial layer is at the expense of the ZrO₂ layer. In a 3.0 nm thick Zr silicate interfacial layer, there is a 0.9 nm Zr-free SiO₂ region right above the Si substrate. These observations suggest that oxygen reacted with the Si substrate to grow SiO₂, and SiO₂ reacted with ZrO₂ to form a Zr silicate interfacial layer during the deposition and annealing. Oxygen diffusion through the tetragonal ZrO₂ phase was found to be relatively easier than through the monoclinic phase.     

Oscillator strength of the infrared absorption band near 1080 cm in SiO2 films

It has been well known that the absorption maximum of the peak near 1080 cm⁻¹ in amorphous SiO₂ films shifts continuously with variation of thickness and properties such as stress. This is a first report on the oscillator strength of the absorption against frequency at the absorption maximum. SiO₂ films on silicon wafers were prepared by thermal growth in either dry O₂ or an O₂/H₂ mixture or liquid-phase deposition in HF saturated with silica gel. The oscillator strength continuously decreased from 1×10⁻⁴ down to 1×10⁻⁵ with the frequency shift from 1099 to 1063 cm⁻¹.