Cd0.96Zn0.04Te光致载流子动力学特性的太赫兹光谱研究

采用光抽运-太赫兹探测技术研究Cd_0.96Zn_0.04Te的载流子弛豫和瞬:态电导率特性.在中心波长800 nm的飞秒抽运光激发下,Cd_0.96Zn_0.04Te的载流子弛豫过程用单指数函数进行了拟合,其载流子弛豫时间长达几个纳秒,且在一定光激发载流子浓度范围内随光激发载流子浓度的增大而减小,这与电子-空穴对的辐射复合有关.在低.光激发载流子浓度(4.51×10¹⁶—1.81×10¹⁷ cm^-3)下,Cd_0.96Zn_0.04Te的太赫兹(terahertz,THz)瞬态透射变化率不随光激发载流子浓度增大而变化,主要是由于陷阱填充效应造成的载流子损失与光激发新增的载流子数量近似.随着光激发载流子浓度继续增大(1.81×10¹⁷—1.44×10¹⁸ cm^-3),THz瞬态透射变化率随光激发载流子浓度的增大而线性增大,是由于缺陷逐渐被...     

n型Bi2Te3基化合物的类施主效应和热电性能

晶粒细化是提高Bi₂Te₃基热电材料力学性能的重要方法,但晶粒细化过程中伴随的类施主效应严重劣化了材料的热电性能,并且一旦产生类施主效应,就很难通过简单的热处理等工艺消除.本文系统研究n型Bi₂Te₃基化合物烧结前粉体颗粒尺寸对材料类施主效应和热电性能的影响规律.随着颗粒尺寸减小,氧诱导的类施主效应明显增强,载流子浓度从10 M烧结样品的3.36×10¹⁹ cm^-3急剧增加到120 M烧结样品的7.33×10¹⁹ cm^-3,严重偏离最佳载流子浓度2.51×10¹⁹ cm^-3,热电性能严重劣化.当粉体颗粒尺寸为1—2 mm时,烧结样品的Seebeck系数为–195 μV/K,载流子浓度为3.36×10¹⁹ cm^-3,与区熔样品沿着ab面方向的Seebeck系数为–203 μV/K和载流子浓度为2.51×10¹⁹     

双光子激发ZnSe自由载流子超快动力学研究

采用Z扫描和抽运-探测实验技术, 在波长为532 nm、脉冲宽度为41 fs的条件下测得ZnSe晶体的双光子吸收系数, 并获得了不同激发光强下的自由载流子吸收截面、电子-空穴带间复合时间和电子-声子耦合时间. 研究发现, 随着激发光强的增大, 自由载流子吸收截面减小, 复合时间变短. 当激发光强增大导致载流子浓度大于10¹⁸ cm^-3时, 抽运-探测信号出现明显改变, 原因归结为强光场激发导致样品在短时间内带隙变窄和电子-空穴等离子体的形成.     

本征GaAs中电子自旋极化的能量演化研究

采用时间分辨圆偏振光抽运-探测光谱,研究9.6 K温度下本征GaAs中电子自旋相干弛豫动力学,发现反映电子自旋相干的吸收量子拍的振幅随光子能量的增加呈非单调性变化.考虑自旋极化依赖的带填充效应和带隙重整化效应,发展了圆偏振光抽运-探测光谱的理论模型.该模型表明量子拍的振幅依赖于所探测能级的电子初始自旋极化度,自旋探测灵敏度以及带填充因子,三者的乘积导致了量子拍振幅的非单调变化,与实验结果一致.给出了能级分裂的二能级系统中电子自旋极化度定义.发现在高能级上可以获得100%的初始电子自旋极化度. 关键词： 圆偏振光抽运-探测光谱 吸收量子拍 电子自旋极化度 GaAs     

半导体量子阱中电子自旋弛豫和动量弛豫

根据电子自旋轨道耦合对自旋极化弛豫影响的DP机理进一步导出了半导体中电子自旋弛豫与动量弛豫及载流子浓度的关系，并采用飞秒抽运探测技术在室温下测量AlGaAs/GaAs 多量子阱中载流子浓度在 1×10¹⁷—1×10¹⁸cm^-3范围内，电子自旋弛豫时间由58ps增加至82 ps的变化情况，与理论计算值符合，说明了随着载流子浓度的增加，载流子间的频繁散射加速了电子动量驰豫，减弱了电子自旋轨道耦合作用，从而延长了电子自旋寿命. 关键词： 电子自旋轨道耦合 电子自旋弛豫和动量弛豫 飞秒光谱技术     

自旋极化度对GaAs量子阱中吸收饱和效应与载流子复合动力学的影响研究

本文研究了(001) GaAs量子阱薄膜中重空穴激子近共振抽运-探测的载流子自旋弛豫动力学, 发现载流子的自旋极化对传统的线偏振光吸收饱和效应和载流子复合动力学都有影响. 进一步的抽运流依赖的自旋弛豫和复合动力学研究表明, 自旋极化对线偏振光的吸收饱和效应的影响随抽运流降低而变弱. 在低激发流时, 自旋极化对线偏振吸收饱和效应的影响才可忽略. 然而, 又显现出自旋极化对复合动力学的影响. 分析表明复合动力学的自旋极化依赖性起源于重空穴激子形成浓度的自旋极化依赖性. 复合动力学的自旋极化依赖性表明自旋弛豫时间计算中所涉及的复合时间应该使用自旋极化载流子的复合时间. 基于二维质量作用定律的激子浓度计算表明, 库仑屏蔽效应对激子形成的影响在较低激发载流子浓度下可以忽略.     

Ag离子注入非晶SiO2的光学吸收、拉曼谱和透射电镜研究

能量为200keV的Ag离子，以1×10¹⁶，5×10¹⁶，1×10¹⁷ cm^-2的剂量分别注入到非晶SiO₂玻璃，光学吸收谱显示：注入剂量为1×10¹⁶ cm^-2的样品的光吸收谱为洛伦兹曲线，与Mie理论模拟的曲线形状一致；注入剂量较大的5×10¹⁶，1×10¹⁷ cm^-2的谱线共振吸收增强，峰位红移并出现伴峰. 透射电镜观察分析表明，注入剂量不同的样品中形成的纳米颗粒的大小、形状、分布都不同，注入剂量较大的还会产生明显的表面溅射效应，这些因素都会影响共振吸收的峰形、峰位和峰强. 当注入剂量达到1×10¹⁷ cm^-2时，Ag纳米颗粒内部可能还形成了杂质团簇. 关键词： 离子注入 纳米颗粒 共振吸收 红移     

不同织构CVD金刚石膜的Hall效应特性

采用热丝化学气相沉积法在p型硅衬底上制备了不同织构的多晶金刚石膜,使用XRD表征了CVD金刚石膜的结构特征, 研究了退火后不同织构金刚石膜的电流特性, 使用Hall效应检测仪研究了金刚石膜的霍尔效应特性及随温度变化的规律, 结果表明所制备的金刚石膜是p型材料, 载流子浓度随着温度的降低而增加, 迁移率随着温度的降低而减小. 室温下[100]织构金刚石薄膜的载流子浓度和迁移率分别为4.3×10⁴ cm^-3和76.5 cm²/V·s.     

掺Ga对ZnO电子态密度和光学性质的影响

采用密度泛函理论下的第一性原理平面波赝势方法,研究了掺Ga对纤锌矿ZnO电子态密度和光学性质的影响.从晶体配位场理论分析了掺Ga前后ZnO的成键情况及态密度的变化.计算得到掺Ga后电子浓度为2.42×10²¹ cm^-3,ZnO的载流子浓度提高了10⁴倍.比较分析掺Ga前后ZnO的介电函数、复折射率、吸收光谱和反射光谱可得,ZnO光吸收边向高能端移动,光学带隙增大.在可见光区,ZnO光吸收系数与反射率减小,光透过率显著提高,使ZnO:Ga成为 关键词： 密度泛函理论 态密度 光学性质 ZnO:Ga     

含氮氟化类金刚石(FN-DLC)薄膜的研究：(Ⅱ)射频功率对薄膜光学带隙的影响

以CF₄,CH₄和N₂为源气体，采用射频等离子体增强化学气相沉积法，在不同射频功率下制备了含氮氟化类金刚石薄膜样品.原子力显微形貌显示，低功率下沉积样品表面致密均匀.拉曼及傅里叶变换红外光谱分析显示，随着射频功率的改变，薄膜的结构和组分也随之变化.紫外-可见光透射光谱证明薄膜具有紫外强吸收特性，通过计算得到其光学带隙在1.89—2.29 eV之间.结果表明，射频功率增加，薄膜内sp²C含量增加，或者说C=C交联相对浓度增加、F的相对浓度降低，导致薄膜内π-π^*带边态密度增大，光学带隙减小. 关键词： 含氮氟化类金刚石薄膜 射频功率 光学带隙     

Absorption edge shift in ZnO thin films at high carrier densities

The optical absorption edge has been measured as a function of carrier concentration for thin films of zinc oxide prepared by organometallic chemical vapour deposition and reactive R.F. magnetron sputtering. Large shifts of the absorption edge have been observed which are only a function of the carrier concentration. Below n = 3 × 10¹⁹ cm^-3 the shifts are well described by the Burstein-Moss model. For carrier concentrations between 3–5 ×10¹⁹cm^-3, the shift decreases very rapidly, finally increasing again with further increases in the carrier density. These effects are consistent with a merging of the donor band with the conduction band following a semiconductor-metal transition.     

Optical and electrical properties of quantum wells with electrically tunable two-dimensional electron density by selective contacts

We report on photoluminescence and absorption measurements in type-I hetero n-i-p-i structures. The electron density in the pseudomorphic InGaAs/GaAs quantum wells is tunable between zero and more then 5 · 10¹² cm^-2. This electrical tuning of the subband filling is achieved by a variable voltage applied between selective n-and p-contacts fabricated by epitaxial shadow mask MBE. One of the advantages of having selective contacts to the n- and p-layers is to get reliable information about the electron density, independent of measured absorption and luminescence spectra. This allows a more rigorous analysis of the data on bandgap renormalization, bandfilling and k_∥-conservation. Moreover, the experiments can be performed at low optical power and low carrier temperatures. In the present investigation a bandgap renormalization of -20 meV and a bandfilling induced shift of the absorption edge as large as +50 meV was observed for a sheet electron density of 5 · 10₁₂ cm_-2.     

EFFECTS OF BANDGAP SHRINKAGE IN FEMTOSECOND ABSORPTION SATURATION MEASUREMENTS OF GaAs FILM

Using CPM dye laser and self-mode-locked Ti sapphire laser as pump-probe optical sources, the effects of bandfilling and bandgap shrinkage on the femtosecond absorption saturation spectra of GaAs film have been studied, For exciting photon energy of 1.97eV and carrier density of 1×10¹⁸cm^-3, an optical-induced absorption increase is observed and is attributed to bandgap shrinkage, The dependence of the absorption coefficient change on the carrier temperature and the carrier densities is discussed.     

厚度对MOCVD生长InN薄膜位错特性与光电性质的影响

研究了金属有机物化学气相沉积法制备的不同厚度InN薄膜的位错特性与光电性质.基于马赛克微晶模型,通过X射线衍射非对称面摇摆曲线测量,拟合出样品刃型位错密度分别为4.2×10¹⁰cm^-2和6.3×10¹⁰cm^-2,并发现样品的微晶扭转角与位错密度随薄膜厚度增加而减小.通过室温霍尔效应测量得到样品载流子浓度分别为9×10¹⁸cm^-3和1.2×10¹⁸cm关键词： 氮化铟 位错 载流子起源 局域态     

Chemisorption of carbon monoxide on platinum {111}: Reflection-absorption infrared spectroscopy

Reflection-adsorption infrared spectroscopy has been combined with thermal desorption and surface stoichiometry measurements to study the structure of CO chemisorbed on a {111}- oriented platinum ribbon under uhv conditions. Desorption spectra show a single peak at coverages > 10¹⁴ molecules cm^?2, with the desorption energy decreasing with increasing coverage up to 0.4 of a monolayer, and then remaining constant at ≈135 kJ mol^?1 until saturation. The “saturation” coverage at 300 K is 7 × 10¹⁴ molecules cm^?2, and no new low temperatures state is formed after adsorption at 120 K. Infrared spectra show a single very intense, sharp band over the spectral range investigated (1500 to 2100 cm^?1), which first appears at low coverages at 2065 cm^?1 and shifts continuously with increasing coverage to 2101 cm^?1 at 7 × 10¹⁴ molecules cm^?2. The halfwidth of the band at 2101 cm^?1 is 9.0 cm^?1, independent of temperature and only slightly dependent on coverage. The band intensity does not increase uniformly with increasing coverage, and hysteresis is observed between adsorption and desorption sequences in the variation of both the band intensity and frequency as a function of coverage. The frequency shift and the virtual invariance of the absorption band halfwidt with increasing coverage (Jespite recent LEED evidence for overlayer compression in this system) are attributed to strong dipole-dipole coupling in the overlayer.     

Determination of the transport properties in 4H-SiC wafers by Raman scattering measurement

The free carrier density and mobility in n-type 4H-SiC substrates and epilayers were determined by accurately analysing the frequency shift and the full-shape of the longitudinal optic phonon--plasmon coupled (LOPC) modes, and compared with those determined by Hall-effect measurement and that provided by the vendors. The transport properties of thick and thin 4H-SiC epilayers grown in both vertical and horizontal reactors were also studied. The free carrier density ranges between 2×10¹⁸ cm^-3 and 8×10¹⁸ cm^-3 with a carrier mobility of 30--55 cm²/(V·s) for n-type 4H-SiC substrates and 1×10¹⁶--3×10¹⁶ cm^-3 with mobility of 290--490 cm²/(V·s) for both thick and thin 4H-SiC epilayers grown in a horizontal reactor, while thick 4H-SiC epilayers grown in vertical reactor have a slightly higher carrier concentration of around 8.1×10¹⁶ cm^-3 with mobility of 380 cm²/(V·s). It was shown that Raman spectroscopy is a potential technique for determining the transport properties of 4H-SiC wafers with the advantage of being able to probe very small volumes and also being non-destructive. This is especially useful for future mass production of 4H-SiC epi-wafers.     

红外激光对可见光CCD成像系统的干扰

采用连续波红外激光对可见光面阵CCD成像系统进行了干扰实验,观察到饱和串扰、全屏饱和等干扰现象,并测到串扰阈值小于2.0×102W/cm2,全屏饱和阈值为1.2×104W/cm2。通过分析CCD输出电压、视频信号,提出基于有效干扰面积的干扰效果评估方法,并利用该方法对干扰面积与激光功率密度、辐照时间之间的关系进行了半定量分析。结果显示:激光功率密度对干扰效果的影响较大,而辐照时间在0.5~2.0 s之间时,辐照时间对CCD干扰效果的影响不明显。     

Ag掺杂p型ZnO薄膜及其光电性能研究

采用超声喷雾热分解法在石英衬底上以醋酸锌水溶液为前驱体,以硝酸银水溶液为Ag掺杂源生长了Ag掺杂ZnO(ZnO：Ag)薄膜.研究了衬底温度对所得ZnO：Ag薄膜的晶体结构、电学和光学性质的影响规律.所得ZnO：Ag薄膜结构良好,在室温光致发光谱中检测到很强的近带边紫外发光峰,透射光谱中观测到非常陡峭的紫外吸收截止边和较高的可见光区透过率,表明薄膜具有较高的晶体质量与较好的光学特性.霍尔效应测试表明,在500℃下获得了p型导电的ZnO：Ag薄膜,载流子浓度为5.30×10¹⁵cm关键词： ZnO：Ag薄膜 p型掺杂 超声喷雾热分解 霍尔效应     

Accurate determination of the atomic number density in dense Cs vapors by absorption measurements of Cs2 triplet bands

The spectra of Cs metal vapor have been experimentally investigated by spatially resolved absorption in overheated cesium vapor generated in a heat pipe oven. The reduced absorption coefficients of the triplet satellite bands at 875.5 nm and the diffuse band between 705 nm and 720 nm were found to be independent of temperature in the range between 600 K and 1000 K. The absorption data of these molecular features can be successfully used for very simple and accurate Cs number density determination in the range from about 5×10¹⁷ cm^-3 to 5×10¹⁸ cm^-3. PACS 33.20.Ea; 33.20Kf; 33.70.Fd