Optical and electrical properties of different oriented CVD diamond films

Due to different oriented diamond films having different properties, in this paper optical and electrical properties of different oriented diamond films have been investigated. The measured results indicate diamond films are of high quality and the properties of the (0 0 1)-oriented diamond film are better than those of the (1 1 1)-oriented one. Refractive index and extinction coefficient of (0 0 1)-oriented diamond film in the wavelength range of 2.5-12.5 μm is 2.391 and in the order of 10⁻⁵, respectively. And for the (1 1 1)-oriented one it is 2.375 and in the order of 10⁻⁴. The dark current of the (0 0 1)-oriented diamond film is 33.7 nA under an applied electric field of 100 kV/cm. The resistivity of the (0 0 1)-oriented diamond film obtained is about 2.33 × 10¹⁰ Ω cm. The current of (0 0 1)-oriented diamond film is almost no change with the time testing.     

Characterization of soft-X-ray detectors fabricated with high-quality CVD diamond thin films

We have characterized the performance of soft-X-ray detectors fabricated with undoped and B-doped homoepitaxial diamond layers of high quality which were grown on a commercially available type Ib (1 0 0) substrate by means of a high-power microwave-plasma chemical-vapor-deposition (CVD) method. The signal currents of the diamond-based detectors with thin TiN electrodes formed vertically (along the homoepitaxial growth direction) were measured at room temperature as a function of the applied voltage, V_a, for irradiations of 500-1200 eV soft-X-ray beams ranging from ≈6 × 10⁹ to ≈1 × 10¹¹ photons/s. The deduced apparent quantum efficiencies increased with the increasing V_a and reached to 2.5 × 10³ at V_a = 60 V. As expected from the device structure, the detector performance depended only very slightly on the applied magnetic field up to 10 T. The excellently high sensitivities attained for soft-X-ray photons are discussed in relation to carrier amplification mechanisms which invested the above diamond detectors.     

Flexible a‐Si:H/nc‐Si:H tandem thin film silicon solar cells on plastic substrates with i ‐layers made by hot‐wire CVD

In this letter we report the result of an a‐Si:H/nc‐Si:H tandem thin film silicon solar mini‐module fabricated on plastic foil containing intrinsic silicon layers made by hot‐wire CVD (efficiency 7.4%, monolithically series‐connected, aperture area 25 cm²). We used the Helianthos cell transfer process. The cells were first deposited on a temporary aluminum foil carrier, which allows the use of the optimal processing temperatures, and then transferred to a plastic foil. This letter reports the characteristics of the flexible solar cells obtained in this manner, and compares the results with those obtained on reference glass substrates. The research focus for implementation of the hot‐wire CVD technique for the roll‐to‐roll process is also discussed. (© 2008 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Short‐circuit current improvement of CuGaSe2 solar cells with a ZnS/(Zn,Mg)O buffer combination

CuGaSe₂ (CGS) thin‐film solar cells were prepared with an in‐line co‐evaporation process and the established buffer combination CdS/i‐ZnO was replaced by ZnS/(Zn,Mg)O. We obtained functional CGS solar cells with a strong gain in the short‐circuit current density as compared to the CdS/i‐ZnO buffer reference cells. The enhanced current density is a result of improved transmission in the wavelength region between 330 nm and 550 nm of the ZnS/(Zn,Mg)O buffer combination as compared to CdS/i‐ZnO. (© 2008 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Diamond coating deposition by synergy of thermal and laser methods—A problem revisited

Diamond coatings were deposited by synergy of the hot filament CVD method and the pulse TEA CO₂ laser, in spectroactive and spectroinactive diamond precursor atmospheres. Resulting diamond coatings are interpreted relying on evidence of scanning electron microscopy as well as microRaman spectroscopy. Thermal synergy component (hot filament) possesses an activating agent for diamond deposition, and contributes significantly to quality and extent of diamond deposition. Laser synergy component comprises a solid surface modification as well as the spectroactive gaseous atmosphere modification. Surface modification consists in changes of the diamond coating being deposited and, at the same time, in changes of the substrate surface structure. Laser modification of the spectroactive diamond precursor atmosphere means specific consumption of the precursor, which enables to skip the deposition on a defined substrate location. The resulting process of diamond coating elimination from certain, desired locations using the CO₂ laser might contribute to tailoring diamond coatings for particular applications. Additionally, the substrate laser modification could be optimized by choice of a proper spectroactive precursor concentration, or by a laser radiation multiple pass through an absorbing medium.     

Real-time monitoring of diamond nucleation and growth using field-enhanced thermionic emission current

Diamond nucleation and growth in the combustion-flame method were monitored in real time using thermionic emission current from the deposited diamond films. It was observed that the emission current evolved over three periods, the incubation, the fast increase, and the saturation periods. Ball-shaped diamond particles, faceted diamond crystals, and diamond films with well-faceted crystals were formed in the three periods. The current from a diamond-seeded substrate started to increase immediately without an incubation period, confirming that the current is from the diamond. Therefore, the current could be used for real-time monitoring of the diamond nucleation and growth.     

Characterization of phosphorus-doped homoepitaxial (1 0 0) diamond films grown using high-power-density MWPCVD method with a conventional quartz-tube chamber

Phosphorus-doped n-type homoepitaxial diamond films have been successfully grown at high substrate temperatures (>1000 °C) on high-pressure/high-temperature-synthesized type-Ib single-crystalline diamond (1 0 0) substrates, by using a conventional microwave plasma chemical-vapor-deposition (CVD) system with high power densities. The deposition system employed in this work had an easily exchangeable 36 mm inner-diameter quartz-tube growth chamber. The homoepitaxial diamond films thus grown were characterized by means of Hall-effect measurements with an AC magnetic field, atomic force microscope observations and secondary ion mass spectrometry techniques. The dependences of the substrate temperature (≤1300 °C) and the P/C ratio in the source gas (≤9900 ppm) on the specimen features were investigated. The optimum substrate temperature deduced was ≈1160 °C, which was also applicable to the CVD growth of undoped homoepitaxial diamond layers. The n-type conductions with an activation energy ≈0.6 eV were observed for the specimens with amounts of the P atoms incorporated to ≈1.5 × 10¹⁸ cm⁻³ whereas the doping efficiencies changed from ≈0.06% to ≈0.92% with the growth condition. Possible origins for these results are discussed in relation to the growth mechanism.     

Enhanced diamond nucleation on copper substrates by graphite seeding and CO2 laser irradiation

Diamond nucleation on copper (Cu) substrates was investigated by graphite seeding and CO₂ laser irradiation at initial stages of the combustion-flame deposition. A graphite aerosol spray was used to generate a thin layer of graphite powders (less than 1 μm) on Cu substrates. The graphite-seeded Cu substrates were then heated by a continuous CO₂ laser to about 750 °C within 1 min. It was found that diamond nucleation density after this treatment was more than three times as much as that on the virgin Cu substrates. As a consequence, diamond films up to 4 μm were obtained in 5 min. The enhancement of diamond nucleation on the graphite-seeded Cu substrates was attributed to the formation of defects and edges during the etching of the seeding graphite layers by the OH radicals in the flame. The defects and edges served as nucleation sites for diamond formation. The function of the CO₂ laser was to rapidly heat the deposition areas to create a favorable temperature for diamond nucleation and growth.     

Ultra‐thin nanocrystalline diamond films (<100 nm) with high electrical resistivity

Thick diamond films are known to exhibit remarkably high electrical resistivity and thermal conductivity. However, on thin films, difficulties are often observed to achieve such performances. In this study, the synthesis of ultra‐thin diamond films was optimized towards the possibility to maintain high dielectric performances on layers compatible with today requirements for Silicon‐On‐Diamond technology, and namely aiming at films with thicknesses equal or below 150 nm. The nucleation of diamond nanocrystals is crucial to obtain films with thickness lower than 100 nm. A Bias Enhanced Nucleation step (BEN) was improved to achieve nucleation densities above 10¹¹ cm^–2 although the process was also tuned to limit the size of the nanocrystals during this step. The control of the carbonization of the silicon substrate is also essential to reach such a density with a high reproducibility. The BEN is followed by a growth step with optimized conditions. The films were characterized by SEM and Spectroscopic Ellipsometry. Electrical conductivity measurements were conducted on thin diamond films and values obtained on layers below 100 nm were as high as 5 × 10¹³ Ω cm; a value significantly higher than the state of the art for such thin films. (© 2009 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Deep‐level characterization of emissive interface states in Alq3‐based OLEDs

We have succesfully investigated emissive interface states in fabricated indium‐tin‐oxide (ITO)/N,N′‐di‐1‐naphthyl‐N,N′‐diphenyl‐1,1′‐biphenyl‐4,4′diamine (α‐NPD)/tris(8‐hydroxyquinoline) aluminum (Alq₃)/LiF/Al organic light‐emitting diodes (OLEDs) by a modified deep‐level optical spectroscopy (DLOS) technique. In the vicinity of the α‐NPD/Alq₃ emissive interface, a discrete trap level was found to be located at ～1.77 eV below the conduction band of Alq₃, in addition to band‐to‐band transitions of carriers from α‐NPD to Alq₃. (© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Adsorption and decomposition of triethylsilane on Si(1 0 0)

The adsorption and decomposition of triethylsilane (TES) on Si(1 0 0) were studied using temperature programmed desorption (TPD), high resolution electron energy loss spectroscopy (HREELS), electron stimulated desorption (ESD), and X-ray photoelectron spectroscopy (XPS). TPD and HREELS data indicate that carbon is thermally removed from the TES-dosed Si(1 0 0) surface via a β-hydride elimination process. At high exposures, TPD data shows the presence of physisorbed TES on the surface. These species are characterized by desorption of TES fragments at 160 K. Non-thermal decomposition of TES was studied at 100 K by irradiating the surface with 600 eV electrons. ESD of mass 27 strongly suggests that a β-hydride elimination process is a channel for non-thermal desorption of ethylene. TPD data indicated that electron irradiation of physisorbed TES species resulted in decomposition of the parent molecule and deposition of methyl groups on the surface that desorbed thermally at about 900 K. Without electron irradiation, mass 15 was not detected in the TPD spectra, indicating that the production of methyl groups in the TPD spectra was a direct result of electron irradiation. XPS data also showed that following electron irradiation of TES adsorbed on Si(1 0 0), carbon was deposited on the surface and could not be removed thermally.     

Structure and gas-barrier properties of amorphous hydrogenated carbon films deposited on inner walls of cylindrical polyethylene terephthalate by plasma-enhanced chemical vapor deposition

The influence of radio-frequency (RF) power on the structure and gas permeation through amorphous hydrogenated carbon films deposited on cylindrical polyethylene terephthalate (PET) samples is investigated. The results show that a higher radio-frequency power leads to a smaller sp³/sp² value but produces fewer defects with smaller size. The permeability of PET samples decreases significantly after a-C:H deposition and the RF only exerts a small influence. However, the coating uniformity, color, and wettability of the surface are affected by the RF power. A higher RF power results in to better uniformity and it may be attributed to the combination of the high-density plasma and sample heating.     

Fabrication of c-Si：H（p）/c-Si（n） Heterojunction Solar Cells with Microcrystalline Emitters

The p-type microcrystalline silicon （μc-Si：H） on n-type crystalline silicon （c-Si） heterojunction solar cells is fabricated by radio-frequency plasma enhanced chemical vapour deposition （rf-PECVD）. The effect of the μc- Si：Hp-layers on the performance of the heterojunction solar cells is investigated. Optimum μc-Si：H p-layer is obtained with hydrogen dil u tion ratio of 99.65 %, rf-power of 0. 08 W/cm^2 , gas phase doping ratio of 0. 125 %, and the p-layer thickness of 15nm. We fabricate μc-Si：H（p）/c-Si（n） heterojunction solar cells without texturing and obtained an efficiency of 13.4%. The comparisons of the solar-cell performances using different surface passivation techniques are discussed.     

Growth, modulation and photoresponse characteristics of vertically aligned ZnO nanowires

Vertically aligned, c-axis oriented zinc oxide (ZnO) nanowires were grown on Si substrate by metal organic chemical vapor deposition (MOCVD) technique, where sputtered aluminum nitride (AlN) film was used as an intermediate layer and thermally evaporated barium fluoride (BaF₂) film as a sacrificial layer. The aspect ratio and density of the nanowires were also varied using only Si microcavity without any interfacial or sacrificial layer. The UV detectors inside the microcavity have shown the higher on-off current ratio and fast photoresponse characteristics. The photoresponse characteristics were significantly varied with the aspect ratio and the density of nanowires.     

Temperature‐dependent electroluminescence intensity in green and blue (In,Ga)N multiple‐quantum‐well diodes

The electroluminescence (EL) intensity has been investigated of green and blue (In,Ga)N multiple‐quantum‐well diodes grown on c ‐plane sapphire over a wide temperature range and as a function of current between 0.01 mA and 10 mA. The EL intensity of the green diode with p‐(Al,Ga)N electron blocking layer does not show low‐temperature quenching, especially at low injection levels, previously observed for the blue (In,Ga)N quantum‐well diodes. This finding rules out possi‐ bilities that the freeze‐out of holes at deep Mg acceptor levels and the failure of hole injections through the p‐(Al,Ga)N layer are directly responsible for the EL quenching at temperatures below 100 K. Variations of the EL efficiency with current level suggest that capture/escape efficiencies of injected carriers by the wells play an important role for the determination of EL external quantum efficiency. (© 2008 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Electroless deposition of copper and fabrication of copper micropatterns on CVD diamond film surfaces

Electroless deposition of copper on as-grown and amino-modification diamond substrates was investigated. The compact and uniform copper films were successfully electrolessly deposited on as-grown and amino-modification diamond substrates after activation by Pd/Sn colloid nanoparticles. The adhesion interaction between copper films and diamond substrates was roughly estimated by the ultrasonic treatment. The results showed the higher adhesion interaction between copper films and amino-modification diamond substrates than that between the copper films and as-grown diamond substrates due to the greater attractive force between the Pd/Sn colloid nanoparticles and amino-modified diamond surface. The favorable copper micropatterns were successfully constructed on diamond film surfaces by means of the catalyst lift-off method and the copper lift-off method. Furthermore, the electrochemical behavior of copper-modified boron-doped diamond (BDD) was studied for glucose oxidation in 0.2 M sodium hydroxide solution by using cyclic voltammetry, and the result indicated that copper-modified BDD exhibited high catalytic activity to electrochemical oxidation of glucose in alkaline media.     

Size effect in optical spectra of microcrystalline diamond powders and CVD films

Received: 24 March 1997/Accepted: 27 May 1997     

Compositional studies of near-room-temperature thermal CVD poly(chloro-p-xylylene)/SiO2 nanocomposites

Chemical-vapor-deposited (CVD) nanostructured thin films have been recently developed to overcome the limitations of thin films from one material class. In particular polymer/SiO₂ nanocomposite thin films have been developed to reduce power consumption, cross-talk, and RC delay in the next generation of ultralarge-scale integrated devices. Since polymers mainly possess electronic polarization they inherently have a low dielectric constant. However, they often suffer from poor dielectric anisotropy, low elastic and shear moduli, and have poor resistance to metallic diffusion. As a proof of concept, poly(chloro-p-xylylene)/SiO₂ thermal CVD nanocomposites have been developed to overcome such material deficiencies. Additionally, the CVD process allows for high manufacturing throughput and compositional control in situ, both potentially advantageous for IC fabrication. The study here focuses on the polymeric phase of the nanocomposite, which as a homopolymer can possess ≈60% crystallinity and a positive optical birefringence of 0.034, both post-deposition-annealed just before the polymer’s melting point. With increasing volume percent of SiO₂, the percent crystallinity is reduced, the thin film becomes more isotropic and the index of refraction can be varied depending on the volume percent SiO₂. Received: 15 December 1999 / Accepted: 7 January 2000 / Published online: 5 April 2000     

Electrical characteristics of hole resonant tunneling diodes with high Ge fraction (x > 0.4) Si/strained Si1−xGex/Si(1 0 0) heterostructure

Effectiveness of a Ge fraction modulated spacer in hole resonant tunneling diodes (RTDs) with Si/strained Si_1−xGe_x heterostructures epitaxially grown on Si(1 0 0) was investigated to improve the electrical characteristics at higher temperatures. Electrical characteristics measured for 30 RTDs, with the modulated spacer at higher Ge fraction (x = 0.48) on a single wafer, show that the deviation of the peak current and voltage at the resonant peak falls in ranges of ±25% and ±10%, respectively. For the RTDs, negative differential conductance (NDC) characteristics are obtained even at higher temperatures around 230 K than that for the RTDs with x = 0.42. The result indicates that the introduction of higher Ge fraction is effective for NDC in RTD at higher temperature.