H掺杂对ZnCoO稀磁半导体薄膜结构及磁性能的影响

利用磁控溅射法,采用亚分子分层掺杂技术交替溅射Co靶和ZnO靶,在Si衬底上制备了不同氢氩流量比的H:ZCO薄膜样品,研究了氢氩流量比对薄膜结构特性和磁学性能的影响。所制备的薄膜样品具有c轴择优取向。由于H对表面和界面处悬挂键的钝化作用,随H₂流量比的增加,薄膜的择优取向变差。磁性测量结果显示,薄膜样品的铁磁性随着氢氩流量比的增大而增强。XPS结果表明,随着H含量的增大,金属态Co团簇的相对含量逐渐增加,而氧化态Co离子的相对含量逐渐减小。H:ZCO样品中的铁磁性可能来源于Co金属团簇,H的掺入促使ZnO中的Co离子还原成Co金属团簇,从而增强了薄膜样品的室温铁磁性。     

高压处理对稀磁半导体Zn1-xMnxO磁性的影响

用固相反应法制备出过渡金属Mn掺杂的ZnO系列样品,并对其进行了高压处理.高压处理后的样品,通过扫描电子显微镜和X射线衍射仪进行了微观结构的表征分析.通过磁性能的测量,初步研究了压力对Mn掺杂ZnO稀磁半导体磁性能的影响.结果表明:适当的高压处理可以有效增强材料的室温铁磁性,但当压力超过一定值后,压力会使材料的磁性能下降.     

Mn掺杂ZnO稀磁半导体材料的制备和磁性研究

采用共沉淀方法制备了名义组分为Zn_1-xMn_xO(x=0.001,0.005,0.007,0.01)的Mn掺杂的ZnO基稀磁半导体材料,并研究了在大气气氛下经过不同温度退火后样品的结构和磁性的变化.结果表明：样品在600℃的大气条件下退火后, 仍为单一的六方纤锌矿结构的ZnO颗粒材料;当样品经过800℃退火后,Mn掺杂量为0.007,0.01的样品中除了ZnO纤锌矿结构外还观察到ZnMnO₃第二相的存在.磁性测量表明,大气条件下600℃退火后的样品,呈现出室温铁磁性;而800℃退火后的样品,其室温铁磁性显著减弱,并表现为明显的顺磁性.结合对样品的光致发光谱的分析,认为合成样品的室温铁磁性是由于Mn离子对ZnO中的Zn离子的替代形成的. 关键词： ZnO 掺杂 稀磁半导体 铁磁性     

稀磁半导体的制备与性质

报道了稀磁半导体的制备、性质与实验研究进展，介绍了稀磁半导体的应用及发展前景．     

Cu对Zn1－xFexO稀磁半导体磁性的影响

采用水热法，在温度430 ℃，填充度35%，矿化剂为3 mol·L^-1KOH，前驱物为添加适量的FeCl₂·6H₂O的Zn(OH)₂，反应时间24h，合成了Zn_1-xFe_xO和Zn_1-xFe_xO：Cu稀磁半导体晶体.当在Zn(OH)₂中添加一定量的FeCl₂·6H₂O为前驱物，水热反应产物为掺杂Fe的Zn_1-xFe_xO多种形态晶体混合物，其个体较大的晶体中的Fe原子百分比含量为0.49%—0.52%.采用超导量子干涉磁强计测量了材料的磁性，晶体的磁化强度随温度下降而减小.在前驱物中同时加入适量比例的Cu化合物，合成了共掺杂Cu的Zn_1-xFe_xO：Cu，和Zn_1-xFe_xO相比，其室温下的磁化强度有明显的提高，且在室温下具有铁磁性. 关键词： 氧化锌 水热 稀磁半导体 晶体     

稀磁半导体的研究进展

本文主要介绍了III-V族稀磁半导体(Ga,Mn)As的研究进展,包括(Ga,Mn)As的生长制备、基本磁性质、磁输运特征、磁光性质、磁性起源、相关的异质结构和自旋注入等,同时还简单介绍了其它稀磁半导体如IV族、III-VI族和IV-VI族等稀磁半导体的研究进展,在文章的最后描述了理想的稀磁半导体应该具备的特征以及对未来的展望。     

稀磁半导体的研究进展

本文主要介绍了III-V族稀磁半导体(Ga,Mn)As的研究进展,包括(Ga,Mn)As的生长制备、基本磁性质、磁输运特征、磁光性质、磁性起源、相关的异质结构和自旋注入等,同时还简单介绍了其它稀磁半导体如IV族、III-VI族和IV-VI族等稀磁半导体的研究进展,在文章的最后描述了理想的稀磁半导体应该具备的特征以及对未来的展望。     

室温下Ga1-xHoxN (x=0.0 and 0.05)稀磁半导体薄膜磁性

采用热蒸镀技术和后续氨退火制备了Ho掺杂GaN稀磁半导体薄膜. X射线衍射分析表明,所有的峰属于六角纤锌矿结构. 利用扫描电子显微镜和能量色散谱分别进行了表面形貌和成分分析. 用振动样品磁强计在室温测定了Ga_1-xHo_xN(x=0.0,0.05)的室温铁磁性. 磁性测量结果表明,未掺杂薄膜GaN具有抗磁性行为,而Ho掺杂Ga_0.95Ho_0.05N的薄膜表现出铁磁行为.     

稀磁半导体材料居里温度的极值点

以Zener模型为基础,考虑反铁磁性交换作用对DMS材料居里温度的影响,理论计算得到了居里温度关于掺杂浓度和反铁磁性交换作用的二元函数,对GaAs ∶ TM(Ga,TM)As (TM=Sc,Ti,V,Cr,Mn,Fe,Co,Ni)的居里温度做了详细分析得到:n型半导体居里温度有一个极大值,而p型掺杂是单调的递增。     

稀磁半导体Zn1—xCoxSe的光谱特性

本文首次报道一类新型半导体材料：含Ｃｏ＾＋６＋离子的稀磁半导体Ｚｎ１－ｘＣｏｘＳｅ晶体的光谱特性研究实验结果。对组分ｘ＝０．００１，０．００９７，０．０３０，０．０３７系列样品，在７３Ｋ－３００Ｋ范围内分别在可见和近红外区测量了吸收光谱和光致发光谱。实验观测到一系列与ｘ值无关的吸收峰和光致发光峰，两者一一对应，它们分别对应于具有Ｔｄ对称的晶体场中Ｃｏ＾＋＾＋离子不同能级间的跃迁，对这些峰进行了初步     

氧空位对钴掺杂氧化锌半导体磁性能的影响

从实验和理论上阐述了氧空位对Co掺杂ZnO半导体磁性能的影响.采用磁控溅射法在不同的氧分压下制备了Zn_095Co_005O薄膜,研究了氧分压对薄膜磁性能的影响.实验结果表明,高真空条件下制备的Zn_095Co_005O薄膜具有室温铁磁性,提高氧分压后制备的薄膜铁磁性逐渐消失.第一性原理计算表明,在Co掺杂ZnO体系中引入氧空位有利于降低铁磁态的能量,铁磁态的稳定性与氧空位和Co之间的距离密切相关. 关键词： Co掺杂ZnO 稀磁半导体 第一性原理计算 氧空位缺陷     

共沉淀法制备Co掺杂ZnO的室温铁磁性的研究

利用共沉淀法并在5vol.%H₂/Ar气流中于300 ℃退火3 h,制备了Zn_1-xCo_xO稀磁半导体. 扫描电子微探针分析表明,对Co的名义组分分别为0.05,0.10,0.15的样品,其实际组分分别为x＝0.054, 0.100和0.159. X射线衍射表明, 主相为纤锌矿结构, x=0.100和 0.159的样品中含有CoO杂相. X射线光电子谱显示出Co有３种状态: 替代进入Z 关键词： 稀磁半导体 ZnO 共沉淀法 磁性来源     

脉冲磁场下水热法制备Cr掺杂ZnO稀磁 半导体晶体

本文以ZnCl₂, CrCl₃. 6H₂O和氨水缓冲溶液为原料, 在4T脉冲磁场下水热法制备了Cr掺杂ZnO稀磁半导体晶体, 通过X射线衍射分析、扫描电子显微镜观察及采用振动样品磁强计进行磁性分析等, 探讨了脉冲磁场对其微观结构及磁性能的影响. 结果表明: Cr掺杂ZnO稀磁半导体晶体仍保持ZnO的六方纤锌矿结构, 脉冲磁场具有促进晶粒生长及取向排列的作用, 4T脉冲磁场条件下合成的Cr掺杂ZnO稀磁半导体具有良好的室温铁磁性, 其饱和磁化强度(M_s)为0.068 emu/g, 而无脉冲磁场情况下制备的样品室温下呈顺磁性, 并且, 脉冲磁场下制备将稀磁半导体的居里温度提高了16 K.     

Structural and magnetic studies on Zr doped ZnO diluted magnetic semiconductor

In this study, Zirconium doped Zn_1−xZr_xO (with x = 0.00–0.10) samples have been prepared by formal solid-state reaction technique. The Zr doped ZnO samples annealed at 1100 °C and characterized by different characterization techniques, such as X-ray diffraction (XRD), Scanning electron microscope (SEM), Vibrating sample magnetometer (VSM) and Fourier transform infrared spectroscopy (FTIR). The X-ray diffraction (XRD) used to study the structural properties. XRD pattern showed that lattice parameters, “a”, “c”, unit cell volume and Zn–O bond length increase with doping content (x ≤ 0.04) where as these decrease with x > 0.04. On the other hand, reverse trend observed with lattice distortion. The crystallite size decreases with increasing doping content of Zr. FTIR employed to investigate functional chemical bonding properties of different elements and compounds present in materials. The low, medium and high frequency absorption bands observed at 630, 1500 and 3435 cm⁻¹, which were the common features of Zn–O, H–O–H and O–H bond respectively. SEM used to study surface morphology and measured grain size of specimen. The surface becomes dense and grain size decreases with increasing degree of Zr contents. The SEM micrograph also shows the presence of spherical micro size particles and formation of pores in samples. Magnetic properties were obtained using VSM. The samples exhibit room temperature ferromagnetism. The magnetic hysteresis loops show variation in the value of magnetic parameter. The saturation magnetization (M_s) and coercivity (H_c) decrease, while remanence magnetization (M_r) shows gradually increasing trend with Zr content. VSM measurement reveals that sample Zn_0.96Zr_0.4O show better result as compared to x = 0.06–0.10.     

Room-temperature anomalous Hall effect and magnetroresistance in (Ga, Co)-codoped ZnO diluted magnetic semiconductor films

This paper reports that the(Ga,Co)-codoped ZnO thin films have been grown by inductively coupled plasma enhanced physical vapour deposition.Room-temperature ferromagnetism is observed for the as-grown thin films.The x-ray absorption fine structure characterization reveals that Co 2+ and Ga 3+ ions substitute for Zn 2+ ions in the ZnO lattice and exclude the possibility of extrinsic ferromagnetism origin.The ferromagnetic(Ga,Co)-codoped ZnO thin films exhibit carrier concentration dependent anomalous Hall effect and positive magnetoresistance at room temperature.The mechanism of anomalous Hall effect and magneto-transport in ferromagnetic ZnO-based diluted magnetic semiconductors is discussed.     

Room-temperature ferromagnetism of Cu ion-implanted Ga-doped ZnO

1 MeV Cu²⁺ ions have been implanted into un-doped ZnO and Ga-doped ZnO films with a dose of 1 × 10¹⁷ ions/cm² at room-temperature. Cu ion-implanted Ga-doped ZnO had ferromagnetism at room-temperature and the saturation magnetization of this sample was estimated to be 0.12 μ_B per Cu, while the Cu ion-implanted un-doped ZnO did not show ferromagnetic behavior. Near-edge X-ray fine structure (NEXAFS) spectroscopy revealed that a partial amount of implanted Cu ions existed as Cu²⁺ (d⁹) state in Ga-doped ZnO film. On the other hand, almost Cu atoms existed as Cu¹⁺ (d¹⁰) state in un-doped ZnO film. However, the subsequent annealing at temperature above 800 °C on this ferromagnetic sample induced the annihilation of ferromagnetism due to the formation of non-ferromagnetic Cu₂O phase.     

脉冲磁场对水热法制备Mn掺杂ZnO稀磁半导体的影响

本文以Zn(CH₃COO)₂·2H₂O, Mn(CH₃COO)₂·4H₂O和氨水缓冲溶液为原料, 在4 T脉冲磁场下利用水热法制备了Mn掺杂ZnO稀磁半导体晶体, 通过X射线衍射、 扫描电子显微镜、透射电子显微镜、拉曼光谱、荧光分光光度计及振动样品磁强计等对样品的微观结构及磁性能等进行了表征, 结果表明: Mn掺杂ZnO稀磁半导体晶体仍保持ZnO六方纤锌矿结构, 4 T脉冲磁场下合成的Mn掺杂ZnO稀磁半导体晶体具有明显的室温铁磁性, 其饱和磁化强度(M_s)为0.028 emu/g, 比无脉冲磁场下制备的样品提高一倍以上, 且4 T 脉冲磁场将样品的居里温度提高了15 K.     

Magnetic properties of Mn-doped ZnO diluted magnetic semiconductors

A series of Mn-doped ZnO films have been prepared in different sputtering plasmas by using the inductively coupled plasma enhanced physical vapour deposition. The films show paramagnetic behaviour when they are deposited in an argon plasma. The Hall measurement indicates that ferromagnetism cannot be realized by increasing the electron concentration. However, the room-temperature ferromagnetism is obtained when the films are deposited in a mixed argon-nitrogen plasma. The first-principles calculations reveal that antiferromagnetic ordering is favoured in the case of the substitution of Mn^2＋ for Zn^2＋ without additional acceptor doping. The substitution of N for O （NO^-） is necessary to induce ferromagnetic couplings in the Zn-Mn-O system. The hybridization between N 2p and Mn 3d provides an empty orbit around the Fermi level. The hopping of Mn 3d electrons through the empty orbit can induce the ferromagnetic coupling. The ferromagnetism in the N-doped Zn-Mn-O system possibly originates from the charge transfer between Mn^2＋ and Mn^3＋ via NO^-, The key factor is the empty orbit provided by substituting N for O, rather than the conductivity type or the carrier concentration.     

A first-principles study of the magnetic properties in boron-doped ZnO

First-principles calculations based on density functional theory are performed to study the origin of ferromagnetism in boron-doped ZnO. It is found that boron atoms tend to reside at Zn sites. The induced Zn vacancy is a key factor for ferromagnetism in Zn1-xBxO (0相似文献   

Room-temperature ferromagnetism in Zn1−xMnxO

In view of recent controversies on above room-temperature ferromagnetism (RTFM) in transition-metal-doped ZnO, the present paper aims to shed some light on the origin of ferromagnetism by investigating annealing effects on structure and magnetism for polycrystalline Zn_1−xMn_xO powder samples prepared by solid-state reaction method and annealed in air at different temperatures. Magnetic measurements indicate that the samples are ferromagnetic at room temperature (RTFM). Room temperature ferromagnetism has been observed in the sample annealed at a low temperature of 500 °C with a saturated magnetization (M_s) of 0.159 emu/g and a coercive force of 89 Oe. A reduction in RTFM is clearly observed in the sample annealed at 600 °C. Furthermore, the saturation magnetic moment decreases with an increase in grain size, suggesting that ferromagnetism is due to defects and/or oxygen vacancy confined to the surface of the grains. The experimental results indicate that the ferromagnetism observed in Zn_1−xMn_xO samples is intrinsic rather than associated with secondary phases.