一种具有减反射性能的Cu2ZnSnS4太阳能电池透明导电氧化物薄膜

通过研究一种新型透明导电氧化物薄膜(transparent conductive oxide, TCO)的减反射作用,探索增加入射光进入Cu₂ZnSnS₄ (CZTS)太阳能电池从而提高太阳能电池效率的新途径.在AM1.5光照条件下,设计了一种在宽波长范围内具有更好的减反射性能的TCO薄膜,即SiO₂/ZnO减反射TCO薄膜(antireflective transparent conductive oxide, ATCO).为了衡量300—800 nm波长范围内的减反射效果,引入了有效平均反射率方法 (effective average reflectance, EAR)进行测算.为充分考虑折射率色散的影响以及TCO, ATCO薄膜与有源层的耦合,本文采用多维光学传输矩阵对各关键材料层的耦合及膜厚进行了优化,以准确衡量最优的减反射效果.最后,通过比较常规CZTSSC和ATCO-CZTSSC的减反射性能,得到了新型ATCO膜,可以有效地减少光损耗并提高光电转换效率的结论.     

Cu2ZnSnS4晶界性质与光伏效应的第一性原理研究

本文应用第一性原理电子结构计算方法研究了锌黄锡矿Cu₂ZnSnS₄ (CZTS)晶界的性质: 包括微结构和电子结构及其对光伏效应的影响. 计算结果表明: 从p-n结区扩散过来空穴可以翻越一定势垒后被晶界俘获, 晶界进一步提供载流子扩散的快速通道, 使得这些空穴可以快速运动到阳极. 少数载流子电子在晶界中心区附近感受到很高的静电势垒, 但其高势垒两侧存在的势阱可以束缚少量电子. 对多数载流子空穴, 晶界中心则是势阱, 势阱两边有阻止空穴扩散到晶界中心的势垒. 由于CZTS晶体的易解理面是(112), 晶界面与(112)面平行的扭转晶界∑ 3^*[221]和∑ 6^*[221] 等不破坏原有晶体的基本结构, 它们的晶界能很小, 而且其电子结构与晶体内部基本相同, 因此尽管它们大量存在于CZTS材料中, 但是对材料性质仅有很小的影响. 通过比较晶体、晶界、空腔的表面和纳米棒的电子结构和光吸收系数, 我们可以看出: 这些微结构会在带隙内引入新的能级(复合中心), 同时高的孔隙率会降低(大于1.3 eV)光的吸收系数, 因此提高CZTS薄膜的致密度是提高CZTS太阳能电池效率关键.     

铜掺杂Cu2SnSe4的热电输运性能

Cu₂SnSe₄化合物具有本征的低热导率和可调控的电导率,同时不含稀贵元素、无毒和价格低廉,具有作为中温区热电材料的潜力.本文通过高能球磨结合放电等离子烧结制备了Cu₂SnSe₄以及Cu掺杂的Cu_2+xSnSe4块体材料(0.2≤z≤1).研究了Cu掺杂填充Cu/Sn位置上1/4本征空位对Cu_2+xSnSe₄热电性能的影响,发现Cu/Sn中1/4空位能够被Cu完全填满(x=1),且Cu掺杂能够大幅度地提升(可达两个数量级)样品的电导率,从而显著提高了功率因子.同时,发现在大Cu掺杂量范围(0.1≤x≤0.8)内,Cu_2+xSnSe4电导率增长与掺杂量增加呈线性关系,且载流子迁移率随Cu掺杂量的增加而增加.进一步的研究发现,载流子在Cu_2+xSnSe₄中的电输运行为遵循电子-声子耦合的小极化子模型.     

蓝宝石衬底上Gd2O3掺杂CeO2氧离子导体电解质薄膜的生长及电学性能

采用反应磁控溅射方法,在(0001)蓝宝石单晶衬底上,制备了纳米多晶Gd₂O₃掺杂CeO₂(GDC)氧离子导体电解质薄膜,采用X射线衍射仪(XRD)、原子力显微镜(AFM)对薄膜物相、结构、粗糙度、表面形貌等生长特性进行了表征,利用交流阻抗谱仪测试了GDC薄膜不同温度下的电学性能;实验结果表明,GDC薄膜为面心立方结构,在所研究的衬底温度范围内,均呈强(111)织构生长;薄膜表面形貌随衬底温度发生阶段性变化：衬底温度由室温升高到300℃时, 关键词： 2O₃掺杂CeO₂电解质薄膜')" href="#">Gd₂O₃掺杂CeO₂电解质薄膜 反应磁控溅射 生长特性 电学性能     

磁控共溅射法制备的Zn2GeO4多晶薄膜结构及其光致发光研究

用射频磁控共溅射方法在不同温度的单晶硅基片上生长薄膜,然后在800℃真空环境下对薄膜进行退火处理,成功获得了结晶状态良好的Zn₂GeO₄多晶薄膜.利用X射线衍射(XRD),X射线光电子能谱(XPS)和原子力显微镜(AFM)对薄膜进行了结构、成分和形貌分析,研究了基片温度对三者的影响. 结果显示,当基片温度升高到400℃以上时,薄膜中的Zn₂GeO₄晶粒在(220)方向上显示出了明显的择优取向. 当基片温度在500—600℃范围内,有利于GeO₂结晶相的形成. XPS显示薄膜中存在着Zn₂GeO₄,GeO₂,GeO,ZnO四种化合态. 同时,随着基片温度的升高,晶粒尺寸增大且薄膜表面趋于平整. 薄膜的光致发光在绿光带存在中心波长为530和550nm两个峰,应该归因于主体材料Zn₂GeO₄中两个不同的Ge²⁺的发光中心. 关键词： 射频磁控溅射 2GeO₄')" href="#">Zn₂GeO₄ 荧光体     

连续离子层吸附反应沉积后硫化法制备柔性铜锌锡硫薄膜太阳电池

在柔性钼箔衬底上采用连续离子层吸附反应法(successive ionic layer absorption and reaction)制备ZnS/Cu2SnSx叠层结构的预制层薄膜,预制层薄膜在蒸发硫气氛、550 C温度条件下进行退火得到Cu2ZnSnS4吸收层.分别采用EDS,XRD,Raman,SEM表征吸收层薄膜的成分、物相和表面形貌.结果表明,退火后薄膜结晶质量良好,表面形貌致密.用在普通钠钙玻璃上采用相同工艺制备的CZTS薄膜表征薄膜的光学和电学性能,表明退火后薄膜带隙宽度为1.49 eV,在可见光区光吸收系数大于104cm 1,载流子浓度与电阻率均满足薄膜太阳电池器件对吸收层的要求.用上述柔性衬底上的吸收层制备Mo foil/CZTS/CdS/i-ZnO/ZnO:Al/Ag结构的薄膜太阳电池得到2.42%的效率,是目前报道柔性CZTS太阳电池最高效率.     

反应溅射法制备TiO2薄膜

报道了用反应溅射法制备TiO₂薄膜的实验研究.详细研究了氧分压、基底温度和退火温度对成膜结构的影响.制备出了具有金红石和锐钛矿晶体结构的TiO₂薄膜.分析了金红石和锐钛矿晶体的形成条件,并对薄膜的表面形貌进行了测量. 关键词： 反应溅射 2薄膜')" href="#">TiO₂薄膜     

基于FTO/VO2/FTO结构的VO2薄膜电压诱导相变光调制特性

采用直流磁控溅射和后退火工艺在掺氟的SnO₂(FTO)导电玻璃衬底上制备VO₂薄膜, 研究了不同退火时间和不同比例的氮氧气氛对VO₂薄膜性能的影响, 对VO₂薄膜的结晶取向、表面形貌、表面元素的相对含量和透过率随波长变化进行了测试分析, 结果表明在最佳工艺条件下制备得到了组分相对单一的VO₂薄膜. 基于FTO/VO₂/FTO结构在VO₂薄膜两侧的透明导电膜上施加电压并达到阈值电压时, 观察到了明显的电流突变. 当接触面积为3 mm×3 mm时, 阈值电压为1.7 V, 阈值电压随接触面积的增大而增大. 与不加电压的情况相比, FTO/VO₂/FTO结构在电压作用下高低温的红外透过率差值可达28%, 经反复施加电压, 该结构仍保持性能稳定, 具有较强的电致调控能力.     

脉冲激光沉积原位生长MgB2薄膜的研究

文章介绍了我们利用脉冲激光沉积（PLD）方法原位生长MgB2超导薄膜的工作．实验采用两步法的方案：高真空条件下在Al2O3（001）衬底上沉积Mg-B混合物加覆盖Mg层的双层结构，然后将该前驱体在630℃左右的Ar气氛中原位退火。成功制备出了有较好重复性的MgB2超导薄膜，其最高的起始转变温度为36．5K。转变宽度在1K左右．我们认为该方法为进一步研究基于MgB2的多层结构器件提供了一种可行的发展思路．     

Cu2O-Au复合材料表面甲基橙降解过程的原位SERS研究

SERS技术因其极高的表面灵敏度和选择性而成为表界面反应过程研究的重要工具之一,而光催化性能的调控建立在对其反应过程的分子水平的认识基础上,通过SERS基底与光催化材料的结合可实现催化反应过程的现场监测。本文制备了具备催化活性和SERS活性的双功能Cu₂O-Au复合材料,研究了其SERS增强和光催化降解甲基橙(MO)性能,并采用SERS技术现场研究了光催化降解MO的过程。研究表明,双功能Cu₂O-Au复合材料可将SERS效应和光催化性能有效复合,实现Cu₂O-Au界面处光催化降解过程的现场监测。表面Au纳米粒子的引入可使Cu₂O的SERS效应增强两个数量级,催化降解性能增加1倍;现场SERS监测揭示了光催化降解过程中MO分子的N=N最易断裂,C=C最难断裂,各化学键断裂容易程度由高到低依次为N=N> Ph₁-N=、=N-Ph₂ 以及Ph₁-N=、C-N> Ph-N。     

Structural,optical,and electrical properties of Cu-doped ZrO_2 films prepared by magnetron co-sputtering

Copper(Cu)-doped ZrO_2(CZO) films with different Cu content(0 at.%～ 8.07 at.%) are successfully deposited on Si(100) substrates by direct current(DC) and radio frequency(RF) magnetron co-sputtering. The influences of Cu content on structural, morphological, optical and electrical properties of CZO films are discussed in detail. The CZO films exhibit ZrO_2 monocline(ˉ111) preferred orientation, which indicates that Cu atoms are doped in ZrO_2 host lattice. The crystallite size estimated form x-ray diffraction(XRD) increases by Cu doping, which accords with the result observed from the scanning electron microscope(SEM). The electrical resistivity decreases from 2.63 ?.cm to 1.48 ?·cm with Cu doping content increasing, which indicates that the conductivity of CZO film is improved. However, the visible light transmittances decrease slightly by Cu doping and the optical band gap values decrease from 4.64 eV to 4.48 eV for CZO films.     

Preparing Cu2ZnSnS4 films using the co-electro-deposition method with ionic liquids

Cu2ZnSnS4（CZTS） films are successfully prepared by co-electrodeposition in aqueous ionic solution and sulfurized in elemental sulfur vapor ambient at 400 C for 30 min using nitrogen as the protective gas.It is found that the CZTS film synthesized at Cu/（Zn＋Sn）=0.71 has a kesterite structure,a bandgap of about 1.51 eV,and an absorption coefficient of the order of 10 4 cm 1.This indicates that the co-electrodeposition method with aqueous ionic solution is a viable process for the growth of CZTS films for application in photovoltaic devices.     

H2 气对脉冲磁控溅射铝掺杂氧化锌薄膜性能的影响

实验采用脉冲磁控溅射法制备铝掺杂氧化锌(AZO)薄膜.为了进一步提高AZO薄膜的光电性能,在溅射过程中加入一定流量的氢气,以高纯ZnO ∶Al₂O₃陶瓷靶为溅射靶材,制备AZO/H透明导电薄膜.通过测试薄膜的结构特性、表面形貌及其光电性能,详细地研究了氢气流量对AZO薄膜性能的影响.溅射过程中引入氢气,可以促进薄膜的晶化,提高薄膜的迁移率和透过率(400—1100 nm).采用纯氩气溅射制备AZO薄膜的电阻率为5.664×10^-4 Ω·cm 关键词： 氧化锌 氢气流量 磁控溅射 太阳电池     

n-ZnO:Al/i-ZnO/n-CdS/p-Cu2ZnSnS4太阳能电池光伏特性的分析

具有高光吸收系数的半导体Cu₂ZnSnS₄ (CZTS)薄膜是一种新型太阳能电池材料. 本文对n-ZnO:Al/i-ZnO/n-CdS/p-CZTS结构的CZTS薄膜太阳能电池进行分析, 讨论CZTS薄膜的掺杂浓度、厚度、缺陷态和CdS薄膜的掺杂浓度、 厚度对太阳能电池转换效率的影响以及太阳能电池的温度特性. 分析表明, CZTS薄膜作为太阳能电池的主要光吸收层, CZTS薄膜的掺杂浓度和厚度的取值对太阳能电池的转换效率有显著影响, CZTS薄膜结构缺陷态的存在会导致太阳能电池性能的下降. CdS缓冲层的掺杂浓度、厚度对太阳能电池光伏特性的影响较小. 经结构参数优化得到的n-ZnO:Al/i-ZnO/n-CdS/p-CZTS薄膜太阳能电池的最佳光 伏特性为开路电压1.127 V、短路电流密度27.39 mA/cm²、填充因子87.5%、 转换效率27.02%,转换效率温度系数为-0.14%/K.     

Doctor-bladed Cu2ZnSnS4 light absorption layer for low-cost solar cell application

The doctor-blade method is investigated for the preparation of Cu₂ZnSnS₄ films for low-cost solar cell application. Cu₂ZnSnS₄ precursor powder, the main raw material for the doctor-blade paste, is synthesized by a simple ball-milling process. The doctor-bladed Cu₂ZnSnS₄ films are annealed in N₂ ambient under various conditions and characterized by X-ray diffraction, ultraviolent/vis spectrophotometry, scanning electron microscopy, and current-voltage (J-V) meansurement. Our experimental results indicate that (i) the X-ray diffraction peaks of the Cu₂ZnSnS₄ precursor powder each show a red shift of about 0.4°; (ii) the high-temperature annealing process can effectively improve the crystallinity of the doctor-bladed Cu₂ZnSnS₄, whereas an overlong annealing introduces defects; (iii) the band gap value of the doctor-bladed Cu₂ZnSnS₄ is around 1.41 eV; (iv) the short-circuit current density, the open-circuit voltage, the fill factor, and the efficiency of the best Cu₂ZnSnS₄ solar cell obtained with the superstrate structure of fluorine-doped tin oxide glass/TiO₂/In₂S₃/Cu₂ZnSnS₄/Mo are 7.82 mA/cm², 240 mV, 0.29, and 0.55%, respectively.     

XPS characterization of sensitized n-TiO2 thin films for dye-sensitized solar cell applications

TiO₂ thin films, employed in dye-sensitized solar cells, were prepared by the sol-gel method or directly by Degussa P25 oxide and their surfaces were characterized by X-ray photoelectron spectroscopy (XPS) and scanning electron microscopy (SEM). The effect of adsorption of the cis-[Ru(dcbH₂)₂(NCS)₂] dye, N3, on the surface of films was investigated. From XPS spectra taken before and after argon-ion sputtering procedure, the surface composition of inner and outer layers of sensitized films was obtained and a preferential etching of Ru peak in relation to the Ti and N ones was identified. The photoelectrochemical parameters were also evaluated and rationalized in terms of the morphological characteristics of the films.     

Two routes to polycrystalline CoSi2 thin films by co-sputtering Co and Si

Two processes for the fabrication of polycrystalline CoSi₂ thin films based on the codeposition of Co and Si by sputtering were studied and compared. The first process involved “annealing after deposition”, where Co and Si are codeposited at ambient temperature and then crystallized by annealing. This process yielded randomly oriented plate-like CoSi₂ grains with a grain size that is governed by the nanostructure of the as-deposited film. Polycrystalline CoSi₂ thin films were obtained at a process temperature of 170 °C, which was much lower than the annealing temperature of 500 °C needed for Co/Si bilayers. The second process involved “heating during deposition”, where Co and Si are codeposited on heated substrates. This process yielded CoSi₂ grains with a columnar structure, and the grain size and degree of (1 1 1) orientation are temperature dependent. The sheet resistance of the resulting films was determined by the preparation temperature regardless of the deposition process used, i.e. “annealing after deposition” or “heating during deposition”. Temperatures of 500 °C and higher were needed to achieve CoSi₂ resistivity of 40 μΩ cm or lower for both processes.     

衬底温度对反应磁控溅射W掺杂ZnO薄膜的微观结构及光电性能的影响

采用直流脉冲反应磁控溅射方法生长W掺杂ZnO（WZO）透明导电氧化物薄膜并研究了衬底温度对薄膜微观结构、组分、表面形貌以及光电性能的影响.实验结果表明,WZO薄膜具有良好的（002）晶面择优取向,且适当的衬底温度是制备优质WZO薄膜的关键因素.随着衬底温度升高,薄膜表面粗糙度先增大后减小;衬底温度较高时,薄膜的结构致密,结晶质量好,电子迁移率高.当衬底温度为325℃时,WZO薄膜获得最低电阻率9.25×10^-3Ω·cm,方块电阻为56.24Ω/□,迁移率为11.8 cm² V^-1·s^-1,其在可见光及近红外区域（400—1500 nm）范围的平均透过率达到85.7%.     

Cu2ZnSnSe4 thin films prepared by selenization of co-electroplated Cu-Zn-Sn precursors

A novel technique for growth of high quality Cu₂ZnSnSe₄ (CZTSe) thin films is reported in our work. The CZTSe thin films were fabricated onto Mo layers by co-electroplating Cu-Zn-Sn precursors followed by annealing in the selenium vapors at the substrate temperature of 550 °C. The morphology and structure of CZTSe thin films were characterized using scanning electron microscopy (SEM), energy dispersive spectrometer (EDS), X-ray diffraction (XRD) and Raman scattering spectrum, respectively. The results revealed that the single phase was in the CZTSe thin films, and the other impurities such as ZnSe and Cu₂SnSe₃ were not existed though they were difficult to distinguish both from EDS and XRD.