Ni-Zn铁氧体薄膜的结构和磁性

采用交替溅射方法制备了Ni_Zn铁氧体薄膜，并研究了薄膜成分和制 备条件例如热处理温度、氧分压、膜厚、衬底层等因素对Ni_Zn铁氧体薄膜的影响.实验表明沉积态薄膜为非晶态，经大气中不同温度热处理后得到了尖晶石结构，其主峰为(311)峰 .另外，通过不同条件对Ni_Zn铁氧体薄膜的研究，找到了合适的Ni_Zn铁氧体薄膜的制备条件. 关键词： 薄膜 Ni_Zn铁氧体 交替溅射     

热丝CVD生长金刚石薄膜研究

本文研究了热丝CVD方法生长金刚石薄膜过程中,衬底表面的损伤处理对金刚石薄膜光学性能的影响,以及膜中非本征杂质吸收对其红外光学特性的影响。     

Beneficial effect of rapid recurrent thermal annealing on magnetic properties of SmCo-based films

The effects of conventional thermal annealing (CTA) and rapid recurrent thermal annealing (RRTA) on the magnetic properties of the SmCo-based films were investigated. The results show that the CTA-treated films exhibit amorphous structure with coercivity insensitively depending on annealing parameters as anticipated. As for the RRTA-treated films, single TbCu₇-type phase structure with well crystallization is observed. The coercivity of the RRTA-treated films is strongly correlated with annealing parameters, and its optimum value is larger than that of the CTA-treated films. It is suggested that the RRTA treatment has beneficial effects on the magnetic properties of the SmCo-based films.     

聚丁二炔Langmuir-Blodgett薄膜的光声谱研究(Ⅰ)结构表征与光声吸收系数

本文在用Ｘ－射线小角衍射对聚合与转载先后次序不同的ＰＤＡＬＢ膜进行结构表征的基础上,不同厚度ＰＤＡＬＢ膜的光声斩波频率效应说明,随着ＰＤＡＬＢ膜厚度增加,ＬＢ膜的热学性质逐渐明显。此外,还探讨了如何从ＰＤＡＬＢ膜的光声谱求得光声吸收系数问题,本文的研究结果表明,光声谱技术是研究ＬＢ膜热学特性的有效手段。     

聚丁二炔Langmuir—Blodgett薄膜的光声谱研究：（Ⅰ）结构表征与光声？…

本在用Ｘ－射线小角衍射聚合与转载先后次序不同的ＰＤＡ ＬＢ膜进行结构表征的基础上,不同厚度的ＰＤＡ ＬＢ膜的光声新斩波频率效应说明,随着ＰＤＡ ＬＢ膜厚度增加,ＬＢ膜的热学性质逐渐明显。此外,还探讨了如何从ＰＤＡ ＬＢ膜的光声谱求得光声吸收系数问题,本的研究结果表明,光声谱技术是研究ＬＢ膜热学特性的有效手段。     

Photoluminescence studies on nanostructured cadmium sulfide thin films prepared by chemical bath deposition method and annealed at different temperatures

Nanostructured cadmium sulfide (CdS) thin films have been prepared by chemical bath deposition (CBD) method and after post deposition annealing of the thin films at different temperatures, photoluminescence (PL) property has been studied. The effects of various photoexcitation wavelengths on the PL behaviour of different annealed films of CdS were studied by recording the PL spectra. The intensity of PL, the profile of the PL spectra and the effects of photoexcitation wavelength depend drastically on the temperature of the post deposition annealing of the thin films. The XRD patterns of the films show the presence of both the hexagonal and cubic phases (mixed phases). The emission peak arises from the surface defects of the CdS nanocrystalline thin films. Significant modification in the surface morphology of the CdS films upon annealing has been observed from the FESEM images. The morphology of the thin films is expected to influence the PL behaviour of the CdS thin films. The quantum size effect and size dependant PL have been observed.     

FeCuNbSiB单层膜和三明治膜的磁特性与巨磁阻抗效应

用射频溅射法制备了Fe_73.5Cu₁Nb₃Si_13.5B₉单层膜和 Cu或Ag作为中间层的三明治膜.溅态膜为非晶态结构.磁畴观察结果表明,单层膜在380℃退火后,呈现均匀磁化的纳米晶结构,该样品软磁特性最佳,其巨磁阻抗效应最大,在13MHz,最大磁阻抗比纵向为18％,横向为14％.溅态三明治膜具有较大的巨磁阻抗效应,在13MHz,Cu夹层三明治膜的最大磁阻抗比纵向为32％,横向为11％,Ag夹层三明治膜的最大磁阻抗比纵向为47％,横向为57％.Cu夹层三明治膜经250℃退火后,在低频下表现为巨磁电感效应,在100kHz,最大磁电感比为1733％. 关键词：     

椭偏光散射分析类金刚石薄膜的散射特性

 基于光学薄膜反射椭偏法的测量原理,对光学薄膜散射椭偏特性进行了研究。给出了光学薄膜散射逆问题的解决方法,并对不同脉冲频率下采用脉冲真空电弧离子镀技术沉积的类金刚石薄膜的散射特性进行了研究。分析了光学薄膜界面的相关特性以及膜层中局部缺陷对散射光椭偏特性的影响。结果表明:随着脉冲频率的增加,所沉积的类金刚石薄膜的相关性变差,且薄膜中的局部缺陷引起的体散射越明显。     

Demetalization of single-walled carbon nanotube thin films with microwave irradiation

The microwave irradiation effects on purified HiPCO and CoMoCat single-walled carbon nanotube (SWNT) thin films are investigated. The surface conductivities of the SWNT films are extracted from the measured THz transmission coefficients to provide a direct indication of the metallic content in the films. The observed drastic conductivity decrease indicates a significant metallic content reduction after the microwave irradiation. Two different laser excitations are applied for Raman spectroscopy to reveal the response of different nanotube species. The Raman spectra of both HiPCO and CoMoCat thin films confirm the decrease of metallic carbon nanotubes. The observed microwave-induced effects may potentially lead to a convenient scheme for demetalization of single-walled carbon nanotube mixtures.     

退火温度对原子层沉积法制备ZnMgO薄膜结构和光学性能的影响

针对目前关于退火温度对原子层沉积法(ALD)制备ZnMgO薄膜晶体结构和光学性质影响鲜有报道的现象,进行了相应的实验研究分析。采用ALD在石英衬底上制备ZnMgO合金薄膜,对制得的样品在空气中进行不同温度的退火处理。利用X射线多晶衍射仪(XRD)、光致发光谱(PL)和紫外可见(UV-Vis)吸收光谱测试,系统的分析了不同退火温度对ALD法制备ZnMgO薄膜晶体结构和光学性能的影响。XRD测试结果表明：退火温度为600 ℃时,薄膜的晶体质量得到改善,且(100)衍射峰的强度明显增强。结合PL和UV-Vis吸收光谱的测试分析得出：退火温度为600 ℃时,能明显促进薄膜中Mg组分的增加使薄膜的禁带宽度进一步增大。从而说明适当温度的退火处理可有效的改善ZnMgO薄膜的晶体质量及光学特性。     

衬底温度和硼掺杂对p型氢化微晶硅薄膜结构和电学特性的影响

以B₂H₆为掺杂剂,采用射频等离子体增强化学气相沉积技术在玻璃衬底上制备p型氢化微晶硅薄膜.研究了衬底温度和硼烷掺杂比对薄膜的微结构和暗电导率的影响.结果表明：在较高的衬底温度下很低的硼烷掺杂比即可导致薄膜非晶化;在实验范围内,随着衬底温度升高薄膜的晶化率单调下降,暗电导率先缓慢增加然后迅速下降,变化趋势与硼烷掺杂比的影响极为相似.最后着重讨论了p型氢化微晶硅薄膜的生长机理. 关键词： p型氢化微晶硅薄膜 衬底温度 晶化率 电导率     

Optical properties and adhesion of air oxidized vacuum evaporated bismuth thin films

Highly adhesive bismuth oxide thin films on glass have been prepared by air oxidation of vacuum evaporated bismuth thin films at various temperatures. The transmittance, optical band gap, refractive index and adhesion show temperature and oxidation time effects. The films show a direct band gap between 2 and 2.5 eV. The refractive indices are in the range 1.854-1.991. The transmittances of the bismuth oxide films are quite high in a large wavelength range. These bismuth oxide films can have potential use in optical waveguides.     

Effect of pit formation and surface roughness on size-dependent thermal conductivity of nanometer-thick semiconducting films

In this work, the thermal conductivity variation due to pit formation and surface roughness in nanometer-thick semiconducting films has been studied. It is shown that the thermal conductivity of thin films is reduced due to the presence of these effects in the films. This reduction in thermal conductivity is dependent on film thickness. The present analysis has been done on GaAs nanometer-thick films using the available experimental data.     

溅射功率对Mo薄膜微结构和性能的影响

 实验采用直流磁控溅射沉积技术在不同溅射功率下制备Mo膜,研究了不同溅射功率下Mo膜的沉积速率、表面形貌及晶型结构,并对其晶粒尺寸和应力进行了研究。利用原子力显微镜观察样品的表面形貌发现随着溅射功率的增加,薄膜表面粗糙度逐渐增大。X射线衍射分析表明薄膜呈立方多晶结构,晶粒尺寸为14.1～17.9 nm;应力先随溅射功率的增大而增大,在40 W时达到最大值(2.383 GPa),后随溅射功率的增大有所减小。     

靶压对磁控溅射GeC薄膜折射率的影响

采用磁控溅射技术,以碳氢气体和氩气为工作气体,在Ge基底上制备了GeC薄膜。研究了靶压对薄膜折射率的影响,发现在较高的靶压下制备的GeC薄膜具有较低的折射率,而在较低的靶压下则得到了高折射率的薄膜。通过控制溅射靶压,制备了折射率在2．5～3．8之间可变的GeC薄膜。利用拉曼光谱研究了GeC薄膜的结构。薄膜样品的硬度测试表明,较低折射率的GeC薄膜具有较高的硬度。     

Quantum confinement effects in highly conducting,ultrathin polyaniline films pursued through spectroscopic investigations

Polyaniline (PANI) is well-known for its remarkable electrical and optical properties which find immense applications in polymer optoelectronics. Though extensive work has been reported in polyaniline samples both in bulk and thin film forms, much attention has not been paid to investigate the quantum confinement effects in ultrathin polyaniline films. The present work is devoted to the search for quantum confinement effects in ultrathin polyaniline films having nanometer thickness, prepared from m-cresol, through conventional and less sophisticated spectroscopic techniques. Remarkable blue-shift has been observed in the absorption spectrum of these samples. Much intense photo-luminescent emission with considerable blue-shift observed in these ultrathin films is cited as the clear evidence for confinement effects.     

Stress impedance effects in flexible amorphous FeCoSiB magnetoelastic films

Amorphous FeCoSiB films were deposited on the flexible polyimide substrates (Kapton type (VN)) by DC magnetron sputtering. Stress impedance (SI) effects of the flexible amorphous FeCoSiB magnetoelastic films were investigated in details. The results show that a large stress impedance effect can be observed in the flexible amorphous FeCoSiB magnetoelastic films. And the results also show a bias magnetic field plays an important role in the stress impedance of FeCoSiB films. Applied a bias magnetic field during depositing can induce obvious in-plane anisotropy in the FeCoSiB films, and a larger SI effect can be obtained with a stronger anisotropy in FeCoSiB films. Argon pressure has a significant effect on the SI effect of the FeCoSiB films. The SI of the FeCoSiB films reaches a maximum of 7.6% at argon pressure of 1.5 Pa, which can be explained by the change of residual stress in FeCoSiB films.     

Stresses and deformation processes in thin films on substrates

The stresses that develop in thin films on substrates can be detrimental to the reliability of thin film electronic devices. In order to design these devices for improved mechanical reliability, an understanding of the origin of these stresses and the controlling deformation processes in thin films is needed. This review begins with a discussion of the basic techniques used for measuring stresses in thin films and for studying the mechanical properties of thin films. The proposed models for the origin of stresses in thin films are then reviewed. Finally, the effects of microstructure and substrate constraint on thin film deformation processes are discussed.     

Electron-phonon interaction in boron-doped silicon nanocrystals: Effect of Fano interference on the Raman spectrum

Raman spectroscopy is employed for studying silicon nanocrystal arrays in boron-doped amorphous silicon films. The nanocrystals were formed in the initial amorphous films by the pulsed impact of an excimer laser. The electron-phonon interaction effects are observed experimentally in the heterostructure formed by a silicon nanocrystal and an amorphous matrix. These effects can be described in the framework of the familiar Fano interference model.     

催化剂对纳米非晶碳膜场发射性能的影响

利用微波等离子体增强化学气相沉积(MPECVD)法,在经处理的单晶硅衬底上沉积了纳米非晶碳薄膜.通过Raman、SEM、XRD表征,研究了催化剂对纳米非晶碳膜的生长速率及场发射性能的影响.结果表明,在制备纳米非晶碳膜时使用FeC13,作为催化剂可大幅提高其生长速率.在相同的制备条件下,与未加FeCl3催化剂制备的纳米非...