The hydrophilization of polystyrene substrates by 172-nm vacuum ultraviolet light

This paper describes the photochemical surface modification of polystyrene (PS) substrates using vacuum ultraviolet (VUV) light 172 nm in wavelength. We have particularly focused on the effects of atmospheric pressure during VUV irradiation on the obtained surface's wettability and the stability of the wettability, in addition to its chemical structure, morphology, and photooxidation rate. Samples were photoirradiated with VUV light under pressures of 10, 10(3), or 10(5) Pa. Although, in each case, the originally hydrophobic PS surface became highly hydrophilic, the final water-contact angle and photooxidation rate depended on the atmospheric pressure. The samples treated at 10 Pa were less wettable than those prepared at 10(3) and 10(5) Pa due to the shortage of oxygen molecules in the atmosphere. The minimum water-contact angles of the samples treated at 10, 10(3), and 10(5) Pa were about 8 degrees, 0 degrees, and 0 degrees, respectively. With the samples prepared at 10 and 10(3) Pa, photooxidation reactions proceeded in the topmost region closest to the surface, while at 10(5) Pa photooxidation was found to be greatly enhanced in the deeper regions, as evidenced by angle-resolved X-ray photoelectron spectroscopy. Photoetching rates were determined through atomic force microscope observation of microstructured PS samples prepared by a simple mesh-contact method. As estimated from AFM images of the latticed microstructures obtained, the rates of samples prepared at 10(3) and 10(5) Pa were about 1.5 and 1.3 nm/min, respectively. However, no photoetched features were observable on the sample surface prepared at 10 Pa. Hydrophilic stability also varied greatly depending on atmospheric pressure. The hydrophilicity of samples treated at 10 and 10(3) Pa gradually decreased as they were exposed to air. On the other hand, the sample surface prepared at 10(5) Pa showed excellent hydrophilicity even after being left in air for 30 days.     

Regulation of pattern dimension as a function of vacuum pressure: alkyl monolayer lithography

Photopatterning of a hexadecyl (HD) monolayer has been demonstrated using vacuum ultraviolet (VUV; lambda = 172 nm) light under controlled vacuum pressure with the objective of minimizing the pattern dimension. X-ray photoelectron spectroscopy (XPS) and lateral force microscopy (LFM) studies reveal that photodegradation of the HD monolayer not only is limited to the regions exposed to VUV but also spreads under the masked regions. The strong oxidants generated by VUV irradiation to atmospheric oxygen and water vapor diffuse toward the masked regions through the nanoscopic channels and photodissociate the monolayer under the masked area, near the photomask apertures, resulting in broadening of the photopattern. Such broadening decreases with decreased vacuum pressure inside the VUV chamber, associated with a decrease of oxidant concentration and reduction of their diffusion. Gold nanoparticles (AuNPs) were immobilized on the VUV patterned features to probe the dimension of the chemically active pattern. Field emission electron microscopy reveals the construction of 565 nm wide pattern features at a vacuum pressure of 10 Pa. This pattern widens to 1,030 nm at 10 (4) Pa using the same size apertures (500 nm) as printed on the photomask. This study provides insight for fabricating submicron patterns with high reproducibility and its exploitation for different applications, which includes the patterning of nanoparticles, biopolymers, and other nano-objects at submicron dimensions.     

Rapid micropatterning of mesoporous silica film by site-selective low-energy electron beam irradiation

Rapid microfabrication of mesoporous silica film at low temperature was achieved with low-energy electron beam (LEEB) irradiation. A mesostructured film (thickness approximately 200 nm), which was prepared through hydrolysis and condensation of tetramethoxysilane in the presence of hexadecyltrimethylammonium chloride, was irradiated with LEEB at 25 kV and 300 microA under pressures of 10 and 1000 Pa. The surfactant molecules can be eliminated completely at temperatures less than 40 degrees C after only 10 min (10 Pa) and 5 min (1000 Pa) of irradiation, resulting in conversion to a highly ordered mesoporous silica film without cracking. The LEEB-irradiated film also showed reasonable chemical resistance toward dilute hydrofluoric acid solution due to sufficient consolidation by cross-linking of silicate networks during the irradiation. The unirradiated regions were etched away preferentially to the irradiated areas; therefore, rapid micropatterning of the mesoporous silica film was possible by area-selective LEEB irradiation followed by chemical etching.     

Solid‐state bonding of silicone elastomer to glass by vacuum oxygen plasma,atmospheric plasma,and vacuum ultraviolet light treatment

We experimentally demonstrated that treating a silicone elastomer by a vacuum oxygen plasma, an atmospheric pressure plasma, and vacuum ultraviolet (VUV) radiation resulted in different surface modifications that gave different contact angles, contact angle aging, and bond strengths. The aim of this study was to assess whether high‐throughput surface modification techniques of atmospheric pressure plasma and VUV radiation have the potential to replace conventional oxygen plasma modification. Four silicone elastomers with different hardnesses were used as specimens. The surfaces of all four silicone elastomers were successfully modified from hydrophobic to hydrophilic and they were also bonded to glass surfaces by the three surface modification techniques, although considerable variations were observed in the surface hydrophobicity and the bonding properties. The results clearly reveal that atmospheric pressure plasma and VUV treatment have the potential to replace conventional oxygen plasma treatment. In particular, VUV irradiation produced the most hydrophilic surface that was preserved for a long time. Thus, VUV irradiation is the most promising technique for realizing high‐throughput surface modification and bonding of silicone elastomers. Copyright © 2012 John Wiley & Sons, Ltd.     

Vacuum Ultraviolet Irradiation of Polymers

The interest in incoherent sources for wavelength-selective photochemistry has increased lately, but little is still known about the behavior of polymers when exposed to far UV and vacuum UV (VUV) radiation. The same dearth of information exists regarding UV (VUV) radiation emitted by low-pressure plasmas during polymer treatment. In order to study VUV-UV effects on several polymers (polyethylene - PE, polystyrene - PS, hexatriacontane - HTC, and poly(methyl methacrylate) - PMMA), we have used the well-characterized emissions from hydrogen (broad-band emission) and hydrogen/argon mixture (near-monochromatic radiation) plasmas as light sources. During irradiation, samples were kept under vacuum or in a flow of pure oxygen at low pressure; in both cases the radiation fluxes at the sample position have been precisely determined by careful spectroscopic calibration experiments. We have employed a quartz crystal microbalance (QCM) to measure in-situ any possible mass change of the various polymers. Following irradiation, samples were analysed by ellipsometry (for thickness and refractive index), X-ray photoelectron spectroscopy (XPS, to evaluate the near-surface composition and content of various functional groups), and atomic force microscopy (AFM, for surface topography and roughness measurements).     

X-ray microscopy studies of protein adsorption on a phase-segregated polystyrene/polymethyl methacrylate surface. 1. Concentration and exposure-time dependence for albumin adsorption

X-ray photoemission electron microscopy using synchrotron radiation illumination has been used to measure the spatial distributions of albumin on a phase-segregated polystyrene/poly(methyl methacrylate) (PS/PMMA) polymer thin film following adsorption from unbuffered, deionized aqueous solutions under a range of solution concentrations and exposure times. Chemical mapping of the albumin, PS, and PMMA shows that the distribution of albumin on different adsorption sites (PS, PMMA, and the interface between the PS and PMMA domains) changes depending on the concentration of the albumin solution and the exposure time. The preferred sites of absorption at low concentration and short exposure are the PS/PMMA interfaces. Albumin shows a stronger preference for the PS domains than the PMMA domains. The exposure-time dependence suggests that a dynamic equilibrium between albumin in solution and adsorbed on PS domains is established in a shorter time than is required for equilibrating albumin between the solution and the PMMA domains. The explanation of these preferences in terms of possible adsorption mechanisms is discussed.     

Electrochemical characterization of nanoporous films fabricated from a polystyrene-poly(methylmethacrylate) diblock copolymer: monitoring the removal of the PMMA domains and exploring the functional groups on the nanopore surface

Cyclic voltammetry (CV) was used to assess fabrication of a nanoporous film from a polystyrene-poly(methyl methacrylate) diblock copolymer (PS-b-PMMA) and also to explore the surface functional groups on the resulting nanopores. Polymer films containing vertically aligned cylindrical nanoscale pores (ca. 10 nm in pore radius, 20-30 nm in film thickness) were prepared on gold substrates by removing the cylindrical PMMA domains from PS-b-PMMA films via UV irradiation and subsequent acetic acid treatment. CV measurements provided a simple means for monitoring the extent of the removal of the PMMA domains and for assessing the formation of a recessed nanodisk-array electrode (RNE) structure. The resulting RNEs exhibited a decrease in redox current of anionic Fe(CN)6(3-) with increasing solution pH from 4.6 to 6.3 and a negligible change in CV of uncharged 1,1'-ferrocenedimethanol. The decrease in redox current of Fe(CN)6(3-) at the higher pH was due to electrostatic repulsion between Fe(CN)6(3-) and the electrical double layer formed in the neighborhood of the negatively charged nanopore surface. Indeed, the reduction of effective pore radius measured from CVs of Fe(CN)6(3-) was correlated to the change in the thickness of the electrical double layer. The pH range that showed the decrease in redox current of Fe(CN)6(3-) was consistent with the presence of -COOH groups on the nanopore surface, although they were not detected using Fourier transform infrared spectra of etched PS-b-PMMA films.     

Surface and interface morphology of polystyrene/poly(methyl methacrylate) thin‐film blends and bilayers

The surface and interface morphologies of polystyrene (PS)/poly(methyl methacrylate) (PMMA) thin‐film blends and bilayers were investigated by means of atomic force microscopy (AFM) and X‐ray photoelectron spectroscopy. Spin‐coating a drop of a PS solution directly onto a PMMA bottom layer from a common solvent for both polymers yielded lateral domains that exhibited a well‐defined topographical structure. Two common solvents were used in this study. The structure of the films changed progressively as the concentration of the PS solution was varied. The formation of the blend morphology could be explained by the difference in the solubility of the two polymers in the solvent and the dewetting of PS‐rich domains from the PMMA‐rich phase. Films of the PS/PMMA blend and bilayer were annealed at temperatures above their glass‐transition temperatures for up to 70 h. All samples investigated with AFM were covered with PS droplets of various size distributions. Moreover, we investigated the evolution of the annealed PS/PMMA thin‐film blend and bilayer and gave a proper explanation for the formation of a relatively complicated interface inside a larger PS droplet. © 2005 Wiley Periodicals, Inc. J Polym Sci Part B: Polym Phys 44: 9–21, 2006     

Transformation of a close-packed Au nanoparticle/polymer monolayer into a large area array of oriented Au nanowires via E-beam promoted uniaxial deformation and room temperature sintering

Transformation of 2D Au nanoparticle (NP) arrays into large scale, ordered, and oriented nanorod/nanowire arrays supported on a transferrable polymer film has been accomplished. E-beam irradiation followed by room temperature aging of a suspended Au NP/polymethylmethacrylate (PMMA) polymer close packed monolayer results in one-dimensional nanoparticle aggregation, reorientation, and sintering into a high density array of oriented Au nanowires with coherent single-crystal-like interfaces. Molecular dynamics simulations of alkane-thiol capped Au NPs, interacting through the Vincent potential and undergoing 2D Poisson compression, account semiquantitatively for the qualitative features of the transformation. This fabrication approach should be extendable to directing 1D aggregation of highly anisotropic nanostructures in arbitrary NP systems.     

Nanohole structure prepared by a polystyrene-block-poly(methyl methacrylate)/poly(methyl methacrylate) mixture film

Cylindrical nanoporous structures were prepared by using a mixture film of polystyrene-block-poly(methyl methacrylate) copolymer (PS-b-PMMA) and PMMA homopolymer (hPMMA), and they were analyzed by transmission electron microtomography (TEMT), X-ray reflectivity (XR), and grazing incidence small-angle X-ray scattering. For this purpose, the mixture film was spin-coated onto a silicon wafer modified by a neutral brush for PS and PMMA blocks, which generates PMMA cylindrical microdomains oriented normal to the substrate. Two methods were employed to prepare nanoporous structures: (1) all of the PMMA phase (PMMA block and PMMA homopolymer) in the film was removed by UV irradiation, followed by rinsing with a selective solvent (acetic acid) to PMMA and (2) only PMMA homopolymer was removed by selective solvent etching without UV irradiation. We found via TEMT and XR that the nanoporous structure in the film prepared by UV irradiation exhibited almost perfect cylindrical shape throughout the entire film thickness. However, when the film was rinsed with a selective solvent, nanoporous structures were not straight cylinders but had a funnel shape in which the diameter of nanopores located near the top of the film was larger than that located near the bottom of the film.     

Breath figures in polymer and polymer blend films spin-coated in dry and humid ambience

We investigate effects of two spin-coating parameters, relative humidity (5% < or = RH < or = 80%) in ambient atmosphere and water content (3 wt % < or = f(H2O) < or = 20 wt %) in solution (rich in tetrahydrofuran), on the structure of breath figures (BF) formed in spin-cast films of polar poly(methyl methacrylate) (PMMA) and PMMA mixed with nonpolar polystyrene (PS). Film morphologies, examined with atomic and lateral force microscopy, are analyzed with integral geometry analysis to yield morphological BF measures. In PMMA, water added to solution has much stronger impact than that from moisture on formed BFs, which could be ordered (with conformational entropy S approximately 0.9-1.0). In PMMA/PS, BFs decorate exclusively polar PMMA domains, resulting in morphologies with two length scales (sub-micrometer BFs and domains >10 microm). This suggests a novel strategy for herarchic structure formation in multicomponent polymer films. In PS/PMMA, BFs are better developed than in pure PMMA spin-coated in identical conditions. These observations show that the air boundary layer facing the spin-cast polymer film (region) is more important than the ambient atmosphere.     

Elucidation of protein adsorption behavior on polymeric surfaces: toward high-density, high-payload protein templates

The elucidation of protein adsorption behavior on polymeric surfaces is very important, since their use as arrays and carriers of biomolecules is ever growing for a wide variety of bioapplications. We evaluate protein adsorption characteristics on chemically homogeneous and heterogeneous polymeric surfaces by employing polystyrene-block-polymethylmethacrylate (PS-b-PMMA) diblock copolymer, PS homopolymer, PMMA homopolymer, and PS/PMMA blend as protein templates. We also investigate distance-dependent protein adsorption behavior on the interfacial region between PS and PMMA. We observe selective protein adsorption exclusively onto PS areas for the chemically heterogeneous PS-b-PMMA and PS/PMMA blend templates. On blend films, protein adsorption is highly favored on the PS regions located near the PS:PMMA interface over that on the PS areas situated away from the interface. Protein density on PS domains is inversely proportional to the separation distance between two neighboring PS:PMMA interfaces. We also observe a higher protein density on the PS-b-PMMA than on the PS or PMMA homopolymer templates. This effect is due to the fact that chemically heterogeneous PS-b-PMMA presents periodically spaced PS:PMMA interfaces on the nanometer scale, whereas no such interfaces are present on homopolymer films. The density of protein molecules on the heterogeneous PS-b-PMMA surface is approximately 3-4-fold higher than on the homogeneous PS surface for the identical experimental conditions. These results demonstrate that self-assembling, chemically heterogeneous, nanoscale domains in PS-b-PMMA diblock copolymers can be used as excellent, high-payload, high-density protein templates. The unique advantages of the diblock copolymer may prove the spontaneously constructed protein nanotemplates to be highly suitable as functional substrates in many proteomics applications.     

Etching of polyethylene terephthalate thin films by neutral oxygen atoms in the late flowing afterglow of oxygen plasma

Films of polyethylene terephthalate were deposited on quartz crystals and exposed to oxygen atoms to study their etching characteristics and quantify the etching rate. Oxygen (O) atoms were created by passing molecular oxygen through plasma created in a microwave discharge. The discharge power was fixed at 250 W, while the pressure of oxygen was 50 Pa. Before exposure to oxygen atoms, a thin polymer film of polyethylene terephthalate (PET) was deposited uniformly over a crystal with a diameter of 12 mm. The crystal was mounted on a quartz crystal microbalance to accurately determine the thickness of the polymer film. The polymer film was exposed to O atoms in the flowing afterglow. The density of O atoms was measured with a cobalt catalytic probe mounted next to the sample and was determined to be 1.2 × 10²¹ m^–3. Samples were treated with O atoms for different periods of up to 120 min. The thickness of the film decreased linearly with treatment time. After 90 min of treatment, a 65‐nm‐thick polymer film was completely removed. Therefore, the etching rate was 0.5 nm/min, so the interaction probability between an O atom and an atom in the sample was extremely low, just 1.4 × 10^–6. Samples treated for different periods were investigated by atomic force microscopy and X‐ray photoelectron spectroscopy to examine the etching characteristics of O atoms in the flowing afterglow. Copyright © 2012 John Wiley & Sons, Ltd.     

Use of block copolymer-stabilized cadmium sulfide quantum dots as novel tracers for laser scanning confocal fluorescence imaging of blend morphology in polystyrene/poly(methyl methacrylate) films

This paper describes the first use of polymer-coated quantum dots (QDs) as fluorescent tracers for LSCFM imaging of phase morphology in polymer blends. Cadmium sulfide (CdS) QDs stabilized at the surface with a PS-b-PAA block copolymer are shown to be well dispersed via their polystyrene (PS) brush layer in the PS phase of solvent-cast 40/60 (w/w) PS/PMMA blends. The QDs are excluded from the PMMA phase, providing excellent fluorescence contrast for LSCFM imaging of the phase-separated blends. The presence of PS-b-PAA-stabilized QDs does not appear to affect the blend morphology, since the observed morphologies are the same when the percentage of QDs within the PS phase is varied from 10 to 50 wt %. These QD fluorescent tracers are used to characterize several aspects of blend morphology in solvent-cast 40/60 PS/PMMA blends containing PS homopolymer with either 100 (low molecular weight) or 1250 (high molecular weight) repeat units. In the PS(1250)/PMMA blends, a percolating distribution of PMMA droplets (2-25 mum) in a PS matrix is observed in the bulk, and a distinct inversion in the continuous phase is found near the glass substrate. In the PS(100)/PMMA blends, a "phase-in-phase" morphology is found, consisting of large PS domains (20-100 mum) dispersed in a PMMA continuous phase and small PMMA domains (1-2 mum) scattered throughout the larger PS droplets. The observed change in blend structure is attributed to a lower interfacial tension for the lower molecular weight PS.     

X-ray microscopy studies of protein adsorption on a phase segregated polystyrene/polymethylmethacrylate surface. 2. Effect of pH on site preference

X-ray photoemission electron microscopy (XPEEM) using synchrotron radiation illumination has been used to study the adsorption of human serum albumin (HSA) onto a phase segregated polystyrene/polymethylmethacrylate (PS/PMMA) blend surface from solutions of five different pH values. The absolute coverage of albumin on each of three chemically distinct components of the surface, PS domains, PMMA domains, and the interface between the domains, was determined from a quantitative analysis of C 1s image sequences. At all pH values, the preferred adsorption site is the interface. At neutral pH (7.0), albumin showed a slight preference for PS regions relative to PMMA. At strongly acidic pH (2.0) and strongly basic pH (10.0), similar amounts of albumin adsorb on the PS and PMMA regions. However, at pH 4.0, the amount of albumin adsorbed on PMMA domains is approximately 1.6 times greater than that on PS domains, while at pH 8.6 the amount of albumin adsorbed on PMMA is one-half that adsorbed on PS domains. The pH dependence of the site preference is rationalized in terms of the known changes of albumin conformation with pH [Peters, T., Jr. All About Albumin: Biochemistry, Genetics, and Medical Applications; Academic Press: New York, 1995]. We infer from our results that the site preference of albumin adsorption on PS/PMMA blends is related mainly to changes in hydrophobic interactions, which are driven by pH-dependent electrostatic effects, that is, changes to the protein surface structure as the charge on the protein changes. The results provide insight into changes in the secondary structure of albumin in acid and basic media.     

基于常温无外压的转移印刷技术构筑半球状多级Ag基底

基于自组装技术制备了3种不同粒径的聚苯乙烯微球阵列,并翻制了与微球阵列互补的软模板.基于室温无外压的转移印刷技术制备了聚甲基丙烯酸甲酯半球形微纳阵列,然后基于原位光还原技术在聚甲基丙烯酸甲酯半球表面制备Ag纳米颗粒,构筑了拉曼增强的半球状多级Ag基底.转移印刷技术的关键是利用软模板自身的低表面能和表面羟基化的图案化材料与亲水基底界面间的氢键作用力.     

Solvent-induced self-assembly of mixed poly(methyl methacrylate)/polystyrene brushes on planar silica substrates: molecular weight effect

The effect of molecular weight on the solvent-induced self-assembly of mixed poly(methyl methacrylate) (PMMA)/polystyrene (PS) brushes on silicon wafers was studied. For a series of mixed brushes with a fixed PMMA M(n) and systematically changed PS M(n), a transition in water advancing contact angle (theta(a)) from 74 degrees, the value for a flat PMMA surface, to 91 degrees, the value for a flat PS film, was observed with increasing PS M(n) after treatment with CHCl(3). Atomic force microscopy studies showed smooth surfaces for all samples. While no significant changes in surface morphologies were observed after treatment with cyclohexane, a selective solvent for PS, contact angle and XPS studies indicated that the mixed brushes with a PS M(n) slightly smaller than that of PMMA underwent self-reorganization, exhibiting a different theta(a). Intriguing surface morphologies composed of relatively ordered nanoscale domains were found from mixed brushes with PS M(n) slightly smaller than or similar to that of PMMA after treatment with acetic acid, a selective solvent for PMMA. The nanodomains are speculated to be of a micellar structure, with PS chains forming a core shielded by PMMA chains.     

In situ preparation of cross‐linked polystyrene/poly(methyl methacrylate) blend foams with a bimodal cellular structure

In situ preparation of a cross‐linked poly(methyl methacrylate) (PMMA) and polystyrene (PS) blend and its foaming were investigated for creating a bimodal cellular structure in the foam. Methyl methacrylate (MMA) monomer was dissolved in PS under supercritical CO₂ at a temperature of 60 °C and a pressure of 8 MPa, and the polymerization of MMA was conducted at 100 °C and 8 MPa CO₂, with a cross‐linking agent in PS. The blend was successively foamed by depressurizing the CO₂. CO₂ played the roles of plasticizing the PS and enhancing the monomer dispersion in PS during the sorption process and as a physical blowing agent in the foaming process. The cross‐linking agent was used for controlling the elasticity of polymerized PMMA domains and differentiating their elasticity from that of the PS matrix. The difference in elasticity delayed the bubble nucleation in the PMMA domains from that in the PS and made the cell size bimodal distribution, in which the smaller cells ranging from 10 to 30 µm in diameter were located in the wall of large cells of 200–400 µm in diameter. The effects of the initial MMA content, the concentration of cross‐linking agent, and the depressurization rate on the bimodal cell structure and bulk foam density were investigated. Copyright © 2011 John Wiley & Sons, Ltd.     

Investigation of the photochemistry of the poly{p-phenylenevinylene} precursor system: implications for nanolithography

The photochemistry of poly{p-phenylene[1-(tetrahydrothiophen-1-io)ethylene chloride]} (PPTEC), a water soluble precursor of the semiconducting polymer, poly{p-phenylenevinylene} (PPV), has been studied both under atmospheric conditions and in environments devoid of oxygen. UV-visible spectroscopy and photoluminescence data has been used to provide a picture of the mechanistic pathways involved in UV irradiation of the PPTEC material. A new quantitative model for the effect of UV irradiation upon film morphology is presented, which leads to insights for the improved control of the characteristics of PPV nanostructures produced via near-field scanning optical lithography.     

In-situ synthesis of stable perovskite quantum dots in core-shell nanofibers via microfluidic electrospinning

Perovskite quantum dots (PQDs) possess remarkable optical properties, such as tunable photoluminescence (PL) emission spectra, narrow full width at half maximum (FWHM) and high PL quantum yield (QY), endowing the PQDs great application prospects. However, the inherent structural instability of PQDs has seriously hindered the application of PQDs in various photoelectric devices. In this work, a microfluidic electrospinning method was used to fabricate color-tunable fluorescent formamidinium lead halogen (FAPbX₃, X = Cl, Br, I) PQDs/polymer core-shell nanofiber films. The core-shell spinning nanofiber not only supplies the interspace for the in-situ formation of PQDs, but also significantly reduces the permeability of moisture and oxygen in the air, which greatly improves the stability of PQDs. After adjusting the composition of precursors, the blue-emissive polystyrene (core) and polymethyl methacrylate (shell) coated FAPbCl₃ QDs (abbreviated as PS/FAPbCl₃/PMMA, hereinafter), green-emissive PS/FAPbBr₃/PMMA and red-emissive PS/FAPbI₃/PMMA nanofiber films were fabricated with the highest PL QY of 82.3%. Moreover, the PS/FAPbBr₃/PMMA nanofiber film exhibits great PL stability under blue light irradiation, long-term storage in the air and water resistance test. Finally, the green- and red-emissive nanofiber films were directly applied as light conversion films to fabricate wide-color-gamut display with the color gamut of 125%, indicating their tremendous potentials in optoelectronic applications.