The growth of InGaAsP by CBE for SCH quantum well lasers operating at 1.55 and 1.4 μm

InGaAsP has been grown by CBE at compositions of 1.1, 1.2 and 1.4 μm for the development of MQW-SCH lasers. The observed incorporation coefficients for TMI and TEG show strong temperature sensitivity while the phosphorus and arsenic incorporation behavior is constant over the substrate temperature range explored, 530 to 580°C setpoint. For higher substrate temperatures the growth rate increases with the largest growth rates occurring for the 1.4 μm quaternary. Low temperature photoluminescence indicates the possibility of compositional grading or clustering for the 1.1 μm material and also for the 1.2 μm material grown at the lowest substrate temperature. The final laser structure was grown with the InP cladding regions grown at 580°C with the inner cladding and active regions grown at 555°C. Using this approach we have successfully grown MQW-SCH lasers with the composition of the active In_xGa_1−xAs ranging from x=0.33 to x=0.73. Threshold current densities as low as 689 A/cm² have been measured for an 800 μm×90 μm broad area device with x=0.68.     

Growth of InP in chemical beam epitaxy with high purity tertiarybutylphosphine

InP layers were grown by chemical beam epitaxy (CBE) using high purity thermally precracked tertiarybutylphosphine (TBP) and trimethylindium (TMI) as the source of the group III element. For optimized substrate temperature and V/III ratio, InP films of good electrical and optical quality have been obtained; the n-type background carrier concentration is (1–2) × 10¹⁵ cm^-3, with a Hall mobility at 77 K being μ₇₇ = 45,000 cm² V^-1 s^-1. Given the low value of the V/III ratio, and according to mass spectrosc measurements, the phosphorus species giving rise to epitaxy is expected to be the dimer P₂. The TBP consumption in CBE is very low when compared to organometallic vapour phase epitaxy (OMVPE), typicaly below 0.25 g/μm of InP layer.     

Kinetics and mechanisms of surface reactions in epitaxial growth of Si from SiH4 and Si2H6

Surface science and kinetic modelling studies of the surface chemical mechanisms active during low pressure chemical vapor deposition (CVD) and chemical beam epitaxy (CBE) growth of Si from mono- and disilane are summarized. Time-of-flight direct recoiling (DR) is discussed as an in situ method to analyze the composition of the growth interface. Steady state measurements of surface hydrogen coverage (θ_H) are made by DR in situ during CBE Si growth from Si₂H₆ and SiH₄, and are illustrated here. Key results using other experimental methods are briefly discussed.     

CBE growth of low threshold 1.5 μm InGaAs/InGaAsP MQW lasers

This paper reports on low-threshold InGaAs/InGaAsP multiple quantum well (MQW) lasers emitting at a wavelength of 1.52 μm. Separate confinement heterostructure (SCH) lasers were grown using chemical beam epitaxy (CBE) with source material pressure-control systems. A continuous wave threshold current of 12 mA and internal quantum efficiency of 73% (both facets) are observed in uncoated double-channel planar buried heterostructure (DCPBH) lasers. The internal loss is 15 cm^-1. More than 90% of 50 laser chips have a threshold current of 15±3 mA.     

宽周期掩膜法HVPE侧向外延自支撑GaN的研究

GaN膜在传统生长过程中主要通过异质外延获得,这往往会产生晶格失配和热失配,给GaN带来严重的位错和应力。目前降低位错最广泛的方法是使用侧向外延技术。在这项工作中,首先在蓝宝石基GaN衬底上沉积了一层SiO₂,并用光刻的方法将其制备成高掩膜宽度(窗口宽度20 μm/掩膜宽度280 μm)的宽周期掩膜,再通过氢化物气相外延(HVPE)侧向外延了厚度为325 μm的GaN厚膜,通过胶带可以将其进行剥离形成自支撑衬底。同时通过二维的Wulff结构图研究了GaN生长过程中晶面的变化趋势。宽周期掩膜法对于生长可剥离的低位错密度自支撑GaN有着重大意义。     

Laser-assisted chemical beam epitaxy for selective growth

A recent exciting development in the growth of compound semiconductors is the use of light to modify the film growth rate in the irradiation area. We report Ar⁺-laser-assisted CBE of GaAs, InP, GaP and InGaAs to generate various patterned films without lithography. A linked-circle pattern is formed by laser beam scanning and a 0.85 μm pitch corrugation pattern formed by a holographic interference technique. Relationships between the growth rate and substrate temperature for the materials are compared. The mechanism of the growth rate enhancement is revealed to be photolytic decomposition of metalorganic molecules. In the case of InGaAs, laser irradiation above 500°C results in new phenomena of growth rate suppression and composition variation.     

InP/InGaAlAs distributed Bragg reflectors grown by low-pressure metal organic chemical vapor deposition

Long-wavelength vertical cavity surface emitting lasers (VCSELs) are considered the best candidate for the future low-cost reliable light sources in fiber communications. However, the absence of high refractive index contrast in InP-lattice-matched materials impeded the development of 1.3–1.5 μm VCSELs. Although wafer fusions provided the alternative approaches to integrate the InP-based gain materials with the GaAs/AlAs materials for their inherent high refractive index contrast, the monolithic InP-based lattice-matched distributed Bragg reflectors (DBRs) are still highly attractive and desirable. In this report, we demonstrate InP/InGaAlAs DBRs with larger refractive index contrast than InP/InGaAsP and InAlAs/InGaAlAs DBRs. The switching between InP and InGaAlAs layers and growth rate control have been done by careful growth interruption technique and accurate in situ optical monitoring in low-pressure metal organic chemical vapor deposition. A 35 pairs 1.55 μm centered InP/InGaAlAs DBRs has the stopband of more than 100 nm and the highest reflectivity of more than 99%. A VCSEL structure incorporating 35 pairs InP/InGaAlAs DBR as the bottom mirror combined with a 2λ thick periodic gain cavity and 10 pairs SiO₂/TiO₂ top dielectric mirrors was fabricated. The VCSELs lased at 1.56 μm by optical pumping at room temperature with the threshold pumping power of 30 mW.     

Growth of 1.55 μm DH laserstructures using TBAs and TBP in MOMBE

In a comparative study we have chosen TBAs and TBP as well as AsH₃ and PH₃ for the growth of InP/GaInAs(P) heterostructures for laser applications in a production metalorganic molecular beam epitaxy (MOMBE) system. The n-type doping was performed with Si from an effusion cell, whereas for the p-type doping Be and DEZn were utilized. InP layers using TBP under optimized cracking conditions exhibit excellent surface morphology with good electrical properties in the low 10¹⁵ cm⁻³ range of carrier concentrations. The MOMBE growth mechanism is not disturbed by the hydride replacement compound. This allows for a convenient replacement without losing calibration data from the hydride process. Broad-area DH laserstructures with GaInAsP (λ = 1.55 μm) active regions were grown with AsH₃/PH₃ and TBAs/TBP. Comparable threshold current densities in the range of 1.6-2.3 kA/cm² are achieved for the lasers, grown with both sets of precursors combined with DEZn source doping. These results are in good agreement with the standard set by the hydride MOVPE process.     

Growth and spectral properties of Nd:LaVO4 crystal

This paper reports the growth and spectral properties of 3.5 at% Nd³⁺:LaVO₄ crystal with diameter of 20×15 mm² which has been grown by the Czochralski method. The spectral parameters were calculated based on Judd–Ofelt theory. The intensity parameters Ω_λ are: Ω₂=2.102×10⁻²⁰ cm², Ω₄=3.871×10⁻²⁰ cm², Ω₆=3.235×10⁻²⁰ cm². The radiative lifetime τ_r is 209 μs and calculated fluorescence branch ratios are: β₁(0.88μm)=45.2, β₂(1.06μm)=46.7, β₃(1.34μm)=8.1. The measured fluorescence lifetime τ_f is 137 μm and the quantum efficiency η is 65.6%. The absorption band at 808 nm wavelength has an FWHM of 20 nm. The absorption and emission cross sections are 3×10⁻²⁰ and 6.13×10⁻²⁰ cm², respectively.     

The role of Sb in the molecular beam epitaxy growth of 1.30–1.55 μm wavelength GaInNAs/GaAs quantum well with high indium content

Sb-assisted GaInNAs/GaAs quantum wells (QWs) with high (42.5%) indium content were investigated systematically. Transmission electron microscopy, reflection high-energy electron diffraction and photoluminescence (PL) measurements reveal that Sb acts as a surfactant to suppress three-dimensional growth. The improvement in the 1.55 μm range is much more apparent than that in the 1.3 μm range, which can be attributed to the difference in N composition. The PL intensity and the full-width at half maximum of the 1.55 μm single-QW were comparable with that of the 1.3 μm QWs.     

InxGa1−xAs/GaAs quantum wire structures grown on GaAs (100) patterned substrates with [001] ridges

In_xGa_1−xAs/GaAs (x = 0.12-0.23) quantum well (QW) structures were grown by molecular beam epitaxy (MBE) on [001] ridges with various widths (1.1-12 μm) of patterned GaAs (100) substrate. The smallest lateral width of the InGaAs/GaAs quantum wire (QWR) structures was estimated to be about 0.1 μm by high-resolution scanning electron microscope (SEM). The In contents of the grown InGaAs/GaAs QWs on the ridges were studied as a function of ridge top width (ridge width of the MBE grown layer) by cathodoluminescence (CL) measurements at 78 K. Compared to the InGaAs QW grown on a flat substrate, the In content of the InGaAs/GaAs QW on the ridge increases from 0.22 to 0.23 when the ridge top width decreases to about 2.9 μm, but it decreases steeply from 0.23 down to 0.12 with a further decrease of the ridge width from 2.9 to 0.05 μm. A simulation of MBE growth of InGaAs on the [001] ridges shows that this reduced In content for narrow ridges is due to a large migration of Ga atoms to the (100) ridge top region from {110} side facets.     

Infrared and Raman spectroscopy of particle-beam induced damage of silicon carbide

The damaging of 6H-SiC by ion implantation (Ar⁺, 320 keV) leads to the formation of a light-absorbing surface layer with a thickness of about 0.4 μm and a dielectric function which indicates a disordering of the crystal structure. Raman spectra show the existence of amorphous carbon, silicon and silicon carbide. Ion bombardment with 1.4 MeV He⁺ ions generates a 3 μm thick surface layer with small lattice distortions and light-absorbing centers and a 0.4 μm thick interface layer with a larger refractive index.     

High-resolution XRD study of stress-modulated YBCO films with various thicknesses

High-quality epitaxial YBa₂Cu₃O_7−δ (YBCO) superconducting films with thicknesses between 0.2 and 2 μm were fabricated on (0 0 l) LaAlO₃ with direct-current sputtering method. The influence of film thickness on the structure and texture was investigated by X-ray diffraction conventional θ–2θ scan and high-resolution reciprocal space mapping (HR-RSM). The films grew with strictly c-axis epitaxial, and no a-axis-oriented growth was observed up to a thickness of 2 μm. Lattice parameters of the YBCO films with different thicknesses were extracted from symmetry and asymmetry HR-RSMs. The X-ray lattice parameter method was used to determine the residual stress in YBCO films by measuring the a-, b-, c-axis strains, respectively. The results showed that YBCO films within thinner than 1 μm were under compressive stress, which was relieved increasing of film thickness. However, beyond 1 μm in thickness, YBCO films exhibited a tensile stress. Based on the experimental analysis, the variety of residual stresses in the films is mainly attributed to oxygen vacancies with thickness of YBCO film increasing.     

Reduction of tensile stress in GaN grown on Si(1 1 1) by inserting a low-temperature AlN interlayer

We studied the selective growth behaviors of InP through narrow openings (<2 μm) by metal-organic chemical vapor deposition. The lateral overgrowth was observed to be significantly affected by both the opening width and orientation. It was found that the lateral overgrowth length reached the maximum at 60° off [0 1 1] direction. The lateral overgrowth also showed a ‘diffraction-like’ behavior, with the overgrowth length increasing with decreasing opening width. Based on these results, a novel InP/InGaAs heterojunction bipolar transistor (HBT) structure with extrinsic base laterally overgrown on SiO₂ is proposed. The device behaviors of the laterally regrown-base HBT prototypes are demonstrated.     

Growth of MgO doped LiNbO3 single crystal fibers by a novel drawing down method

MgO-doped LN (LiNbO₃) fibers were automatically grown by an improved drawing down method. The smallest fiber diameter ever attained was 10 μm and the fluctuation in diameter was reduced to ±0.2 μm. The poling process was done during the growth process by the thermal electric effect. The dislocation which was observed in the X-ray topographs of the optical grade bulk crystals did not appear in the fiber. The fibers and optical grade bulk crystals did not have a uniform distribution of the MgO concentration as determined by electron probe micro analysis (EPMA).     

Formation and behavior of surface layers on electron emission glasses

The thermochemical reduction of thin surface layers on multicomponent lead-silicate glasses is fundamental to their use in electron multiplier and microchannel plate devices. These surface layers can exhibit a specific conductivity as high as 10⁻² (Ω cm)⁻¹ and secondary electron yields up to 3.5. However, due to the complex processing used in the fabrication of the devices, a basic understanding of the chemical and structural surface characteristics responsible for these properties has not been established. Moreover, the effects of prolonged electron bombardment upon the chemical characteristics of the surface have not been extensively investigated, nor related to any associated degradation of the electron emission properties.

In this study, the clean fracture surfaces of these glasses were investigated. The effects of hydrogen reduction, chemical etching, and prolonged electron bombardment were determined. Ion-scattering spectroscopy (ISS) was used for its monolayer sensitivity, especially to alkali species, while secondary ion mass spectroscopy (SIMS) provided depth profiles. The hydrogen profile created by the reduction could also be obtained with SIMS. X-ray photoelectron spectroscopy (XPS) was employed selectively to examine changes in the oxidation state of the surface species.

It was found that the hydrogen reduction of these glasses creates a thin 20–50 nm silica-rich surface layer. The layer of reduced lead atoms is beneath this zone, and is visible to depths of the order 5 μm, but the hydrogen profiles which are found in these surfaces extend only 0.5 μm in depth. The electron bombardment of these surfaces leads to a decrease in concentration of alkali and lead in the surface monolayer, and to a change in the hydrogen profile. The cross-section for this bombardment-induced change in the surface composition correlates with the reported gain degradation in microchannel plate devices.     

Growth of heavily C-doped GaAs/AlGaAs MQW structures by MOVPE for 2–3 μm normal incidence photodetectors

The growth and intersubband optical properties of high quality heavily doped p-type GaAs/AlGaAs multiple quantum well (MQW) structures are reported. The MQWs were fabricated by the atmospheric pressure metalorganic vapor phase epitaxy process using liquid CCl₄ to dope the wells with C acceptors (N_a ≈ 2 × 10¹⁹ cm⁻³). A constant growth temperature was maintained for the entire structure while different V/III ratios were used for the well and barrier regions. By this process it is possible to achieve both high C doping densities in the wells and to simultaneously obtain good quality AlGaAs barriers. Fourier transform infrared spectroscopy measurements on heavily doped 10-period MQW structures reveal a new absorption peak at 2 μm with an effective normal incidence absorption coefficient of 4000 cm⁻¹. Photocurrent measurements on mesa-shaped diodes show a corresponding peak at 2.1 μm. The photodiodes exhibit a symmetrical current-voltage characteristic and a low dark current, which are indicative of a high quality MQW structure and a well-controlled C doping profile. The 2 μm absorption represents the shortest wavelength ever reported for any GaAs/AlGaAs or InGaAs/AlGaAs MQW structure and should be very useful for implementing multicolor infrared photodetectors.     

Surface morphology and lattice distortion of heteroepitaxial GaInP on InP

We examine the relation between surface morphology and lattice distortions of a number of Ga_xIn_1-xP epilayers (x ≈ 0.04) grown on InP (001) substrates using atomic force microscopy (AFM) and high resolution X-ray diffractometry (HRXRD). The heteroepitaxial layers (thickness ≈ μm) were grown by low pressure metalorganic vapour phase epitaxy (MOVPE) at temperatures from 600 to 660°C. AFM images over a scale of 75 μm by 75 μm show no surface corrugations for samples grown at 640°C. For other growth temperatures between 600 and 660°C, unidirectional corrugations aligned along the [1 0] direction or a cross-hatched pattern can be seen on the sample surfaces with a typical interline separation of 10 μm. Another feature revealed by AFM is the presence, for some samples, of weak parallel corrugations along the direction making a 54° angle with the [1 0] direction. HRXRD spectra recorded first with the [110] and then with the [1 0] direction in the plane of incidence reveal an asymmetric relaxation in the sample plane accompanied by a broadening of the epilayer X-ray peak for diffraction with the [110] direction in the plane of incidence. The lattice distortion changes from tetragonal to orthorhombic as the surface corrugations appear along the [1 0] direction. Proton microprobe scans indicate that these samples are compositionally uniform so that the asymmetry is not the result of lateral variations of the alloy composition. Finally, low temperature photoluminescence from these samples shows good agreement between observed and calculated peak positions on the basis of the strains obtained from HRXRD measurements.     

Growth kinetics of sodium perborate from batch crystallization

The size distribution of sodium perborate crystals was continually monitored using a Malvern sizer during batch crystallization from aqueous solutions carried out under falling supersaturation established at the experiment onset. The growth rate was determined from the time shift of the crystal size distribution expressed in cumulative oversize numbers. The size independent overall growth rate was first order with respect to supersaturation for crystals larger than 150 μm. Crystals between 20 and 150 μm exhibited a significant size-dependent growth rate. Furthermore, the fraction of crystals smaller than 20 μm, formed by primary nucleation, grew extremely slowly or did not grow at all.     

Observation of the periodic fluctuant dendritic structure in an Al–38 wt% Cu hypereutectic alloy processed by ACRT-B method

The microstructure of periodic fluctuant dendritic θ in a matrix of +θ eutectic was obtained in an Al–38 wt% Cu alloy processed by ACRT-B method grown at growth velocities (V) ranging from 5 to 60 μm/s and crucible rotating in a trapezoidal way with maximum rotation rates (Ω_max) ranging from 100 to 400 rpm. Formation of this structure is explained by the influence of the periodical Ekman flow on the growth of dendritic θ during the spin-up and spin-down process. It was also observed that the +θ eutectic between the primary dendrites of θ (CuAl₂) is not periodic and fluctuant during ACRT-B process. This is quite different from our previous observation of periodic eutectic in Al–Cu eutectic processed by similar ACRT-B method.