二氧化锆薄膜表面粗糙度的研究

采用电子束蒸发工艺,利用泰勒霍普森相关相干表面轮廓粗糙度仪,研究了不同基底粗糙度、不同二氧化锆薄膜厚度以及不同的离子束辅助能量下所沉积的二氧化锆薄膜的表面粗糙度。结果表明：随着基底表面粗糙度的增加,二氧化锆薄膜表面粗糙度呈现出先缓慢增加,当基底的粗糙度大于10nm后呈现快速增加的趋势;随着二氧化锆薄膜厚度的增加,其表面均方根粗糙度（RMS）先减小后增大;随着辅助沉积离子能量的增加,其表面粗糙度呈现出先减小后增加的趋势。     

Investigation of interface roughness cross-correlation properties of optical thin films from total scattering losses

The interface roughness and interface roughness cross-correlation properties affect the scattering losses of high-quality optical thin films. In this paper, the theoretical models of light scattering induced by surface and interface roughness of optical thin films are concisely presented. Furthermore, influence of interface roughness cross-correlation properties to light scattering is analyzed by total scattering losses. Moreover, single-layer TiO₂ thin film thickness, substrate roughness of K9 glass and ion beam assisted deposition (IBAD) technique effect on interface roughness cross-correlation properties are studied by experiments, respectively. A 17-layer dielectric quarter-wave high reflection multilayer is analyzed by total scattering losses. The results show that the interface roughness cross-correlation properties depend on TiO₂ thin film thickness, substrate roughness and deposition technique. The interface roughness cross-correlation properties decrease with the increase of film thickness or the decrease of substrates roughness. Furthermore, ion beam assisted deposition technique can increase the interface roughness cross-correlation properties of optical thin films. The measured total scattering losses of 17-layer dielectric quarter-wave high reflection multilayer deposited with IBAD indicate that completely correlated interface model can be observed, when substrate roughness is about 2.84 nm.     

提高叶片局部粗糙度对风机效率影响的实验研究

通过对三种风机在叶片上进行了加大局部粗糙度的实验,研究了风机叶片上不同位置的粗糙度变化对风机效率的影响,发现风机叶片内弧尾缘加大粗糙度时风机的效率会提高。实验得到了通过增加叶片局部粗糙度提高风机效率的粗糙带最佳宽度及其位置,并对不同的粗糙度对效率的影响进行了初步的探讨。本工作为风机节能开辟了一条新路。     

粗糙平板微通道流动和传热的数值模拟

以粗糙平行平板微通道为研究对象,以三角形锯齿状粗糙元模拟固体表面的粗糙度,采用CFD流体固体共轭传热技术数值研究了绝对粗糙度和相对粗糙度对平行平板微通道流动和传热特性的影响,着重分析了粗糙度和流体速度对水力入口段长度和热力入口段长度的影响规律,同时研究了相对粗糙度对微通道转捩雷诺数的影响,为进一步揭示微微通道的流动和传热机理提供了依据.     

二氧化钛薄膜表面粗糙度研究

为了探究二氧化钛(TiO₂)薄膜表面粗糙度的影响因素, 利用离子束辅助沉积电子束热蒸发技术对不同基底粗糙度以及相同基底粗糙度的K9玻璃完成二氧化钛(TiO₂)光学薄膜的沉积。采用TalySurf CCI非接触式表面轮廓仪分别对镀制前基底表面粗糙度和镀制后薄膜表面粗糙度进行测量。实验表明, TiO₂薄膜表面粗糙度随着基底表面的增大而增大, 但始终小于基底表面粗糙度, 说明TiO₂薄膜具有平滑基地表面粗糙的作用; 随着沉积速率的增大, 薄膜表面粗糙度先降低后趋于平缓; 对于粗糙度为2 nm的基底, 离子束能量大小的改变影响不大, 薄膜表面粗糙度均在1.5 nm左右; 随着膜层厚度的增大, 薄膜表面粗糙度先下降后升高。     

非均匀地表空气动力学有效粗糙度的统计特征

利用基于大气边界层Monin-Obukhov相似理论、通量守恒和质量守恒原理设计的非均匀地表空气动力学有效粗糙度计算方案, 研究了3种不同地表类型情况下有效粗糙度的统计特征, 并分析了大气层结稳定度和粗糙变率对有效粗糙度的影响. 结果表明, 有效粗糙度总是大于面积加权平均粗糙度, 大部分情况下有效拖曳系数比平均拖曳系数大10%以上; 有效粗糙度虽然和大气层结稳定度有关, 但对粗糙变率更敏感, 粗糙变率加倍将使有效粗糙度相对变化百分比达到加倍前的4倍, 有效拖曳系数相对变化百分比达到加倍前的3倍. 因此, 非均匀下垫面的数值模式中, 不能简单地采用面积加权平均粗糙度, 需要采用能表示下垫面非均匀性综合效应的有效粗糙度. 关键词： 非均匀性 有效粗糙度 粗糙变率 层结稳定度     

Spectral emissivity of type E235B low carbon structural steel with different roughnesses

A self-built experimental apparatus was employed to study the spectral emissivity of type E235B low carbon structural steel in the wavelength range 2–15 μm at different temperatures by energy comparison method. The surface roughness and topography of the steel E235B were determined by a roughness tester and a scanning electron microscopy, respectively. And then, the spectral emissivity of steel E235B with six different roughnesses was measured before and after oxidation. The measurement results showed that the spectral emissivity increased with the increasing temperature and surface roughness before oxidation. The effect of roughness on the spectral emissivity is different at different wavelength and temperature ranges. However, the oscillatory behavior of the spectral emissivity was observed after oxidation. To explore the possible reasons for emissivity variation, the changes of surface roughness and optical roughness were investigated after oxidation. It is found that both the surface roughness and optical roughness increased after oxidation. Although the optical roughness can be used as one of the parameters to evaluate the effect of surface roughness on the spectral emissivity, it is insufficient to describe the effect of surface morphology on the spectral emissivity.     

Law-of-the-wall in a boundary-layer over regularly distributed roughness elements

As opposed to the log-region, the roughness sublayer present above rough surfaces is still poorly understood due to the complex interaction between wakes developing behind roughness elements. To investigate the spatially averaged flow velocity in this region, a data-set has been collected from several direct numerical simulations and wind-tunnel experiments available in the literature. A generalised law-of-the-wall has been derived, applicable to a roughness sublayer present over regularly distributed roughness elements. The key roughness parameter of this new law is the effective height ?, which characterises the interaction between the roughness and the outer flow in a temporally and spatially averaged sense. A morphometric study reveals that ? is closely related to a new roughness density parameter, λ₂, that accounts for the roughness element shape and the inter-element spacing. This allows ? to be a universal parameter on roughness characterisation. The derived values of the classical roughness length z₀ of the log-law compare well with previous experimental data and geometrical model predictions. Finally, the main properties of the roughness sublayer such as its height are discussed using the geometrical and the roughness parameters proposed in the study.     

Application of an acoustic backscatter technique for characterizing the roughness of porous soil

An acoustic backscatter technique proposed by Oelze et al. [J. Acoust. Soc. Am. 109, 1826-1832 (2001)] was used to characterize the roughness of porous soil surfaces. Roughness estimation errors are minimized when the effective flow resistivity of the porous soil is high, e.g., above 300,000 mks Rayls/m. Four soil plots were constructed by roughening soil with farming implements. Three plots were sealed using Saran powder dissolved in methyl ethyl ketone (MEK) and then covered to prevent further weathering. A fourth plot was left in the open and exposed to rainfall, which also acted to seal the surface and further change the roughness. In sealing the surface the effective flow resistivity of the surface was increased above 300,000 mks Rayls/m, which is typical for weathered agricultural surfaces. The roughness power spectra of the soil surfaces were measured by acoustic backscatter and alternatively by a laser profiler. Regression analysis was used to approximate each roughness power spectrum versus roughness wave number with a best-fit line. The best-fit line was used to calculate the rms height and the correlation length of the rough surface by integrating the approximate roughness power spectrum over a range of roughness wave number values. The range of roughness wave number values defines the roughness length scales used in the statistical calculations. High-roughness wave numbers correspond to smaller length scales of roughness and low-roughness wave numbers correspond to larger length scales of roughness. Over certain ranges of roughness wave number values the statistics from the acoustic backscatter and laser profiler measurements is in good agreement. However, as the low-cutoff roughness wave number is decreased and the high-cutoff roughness wave number is increased, agreement between the laser and acoustic techniques diminishes.     

离子束作用下的光学表面粗糙度演变研究

 为了获得超光滑光学表面,介绍了离子束作用下改善表面粗糙度的抛光方法,并通过相关的实验进行了验证。光学材料是典型的硬脆材料,在加工过程中的表面粗糙度要经历复杂的演变过程。离子束加工作为光学镜面加工中的最后一道工序,如果在修正面形的同时,能够有效地改善表面粗糙度,那么离子束加工的性能就可以得到更好的延伸。分析了离子束作用下的粗糙度演变机理,在此基础上提出了倾斜入射抛光和牺牲层抛光技术2种改善表面粗糙度的方法,并使用原子力显微镜进行了测量。实验结果表明：以45°倾斜入射抛光熔石英样件,其粗糙度由初始的0.67nm RMS减小到0.38nm RMS;涂上牺牲层的材料表面粗糙度由0.81nm RMS减小到0.28nm RMS,倾斜入射抛光和牺牲层抛光技术能够有效地改善表面粗糙度。     

Effect of substrate morphology on the roughness evolution of ultra thin DLC films

The effect of substrate roughness on growth of ultra thin diamond-like carbon (DLC) films has been studied. The ultra thin DLC films have been deposited on silicon substrates with initial surface roughness of 0.15, 0.46 and 1.08 nm using a filted cathodic vacuum arc (FCVA) system. The films were characterized by Raman spectroscope, transmission electron microscope (TEM) and atomic force microscopy (AFM) to investigate the evolution of the surface roughness as a function of the film thickness. The experimental results show that the evolution of the surface morphology in an atomic scale depends on the initial surface morphology of the silicon substrate. For smooth silicon substrate (initial surface roughness of 0.15 nm), the surface roughness decreased with DLC thickness. However, for silicon substrate with initial surface roughness of 0.46 and 1.08 nm, the film surface roughness decreased first and then increased to a maximum and subsequently decreased again. The preferred growth of the valley and the island growth of DLC were employed to interpret the influence of substrate morphology on the evolution of DLC film roughness.     

Roughness evolution of highly ordered nanoporous anodic aluminum oxide films

In this paper, we report on the surface roughness evolution of highly ordered anodic aluminum oxide (AAO) films based on an atomic force microscopy (AFM) study. Root mean square of the surface roughness was measured on AFM images taken from highly ordered AAO films produced by two-step anodization under different conditions including electrolyte type, anodization voltage, and anodization time. Surface roughness of highly ordered AAO films increases step by step through the two-step anodizing process including electropolishing, first-step anodization, dissolution, and second-step anodization. However, increase of the surface roughness is proportional to the anodization voltage and time. The surface roughness of AAO films changes as a function of length scale until it finally approaches a maximum termed the saturation roughness. The variation of roughness of the growth of AAO could be scaled with an anomalous dynamic behavior as it saturates over a critical length scale while the saturation roughness is dependent on the anodizing time and voltage.     

粗糙微管道内液体流动特性的实验研究

利用实验方法研究了粗糙度对矩形截面微管道内液体流动阻力特性的影响，采用微观粒子图像测速技术测量了粗糙微管道内的流场结构.实验结果表明：在层流状态下，3%—7%的相对粗糙度可以导致微管道内流动阻力的明显增加，在粗糙单元附近形成的压差阻力是导致流动阻力增加的主要原因.粗糙单元还会引起微管道内的流动失稳，导致粗糙微管道内层流向湍流的转捩提前. 关键词： 微管道 粗糙度 微观粒子图像测速 转捩     

表面粗糙度的分形特征及其对微通道内层流流动的影响

基于分形几何学,研究了表面粗糙度的分形特征.采用Weierstrass- Mandelbrot函数对多尺度自仿射的表面粗糙度进行了描述;建立了微通道内层流流动的三维模型并对表面粗糙度的影响进行了数值模拟,分析了雷诺数、相对粗糙度和分形维数对流动阻力特性的影响.研究结果表明,与常规尺度通道不同,粗糙微通道的Poiseuille数不再是常数,而是随雷诺数近似线性增加;相对粗糙度越大,流动产生的回流和分离所导致的流动压降越明显.在相同的相对粗糙度下,粗糙表面的分形维数越大,表面轮廓变化就越频繁,这也将导致流动阻 关键词： 粗糙度 层流阻力系数 微通道 分形     

表面粗糙度对软X射线多层膜光学特性的影响

从理论和实验结果两方面探讨了基底表面和多层膜膜面的均方根粗糙度对软Ｘ射线多层膜的光学特性的影响。指出了分析表面粗糙度最合适的方法和对表面粗糙度的着重研究方向。     

Transition radiation from rough surfaces

The light emission of normally incident 77 keV electrons on silver surfaces of different roughness has been investigated. The roughness was quantitatively determined by measuring the scattered light of a normally incident laser beam. In addition to the transition radiation, which is expected for smooth surfaces, light emission of surface plasmons via surface roughness occurs. The shape and the intensity of the spectral distribution of this emission show a characteristic change with the surface roughness.     

Effect of Density and Surface Roughness on Optical Properties of Silicon Carbide Optical Components

The effect of density and surface roughness on the optical properties of silicon carbide optical components is investigated. The density is the major factor of the total reflectance while the surface roughness is the major factor of the diffuse reflectance. The specular reflectance of silicon carbide optical components can be improved by increasing the density and decreasing the surface roughness, in the form of reducing bulk absorption and surface-related scattering, respectively. The contribution of the surface roughness to the specular reflectance is much greater than that of the density. When the rms surface roughness decreases to 2.228nm, the specular reflectance decreases to less than 0. 7% accordingly.     

Three-dimensional turbulent flow over cube-obstacles

In order to investigate the influence of surface roughness on turbulent flow and examine the wall-similarity hypothesis of Townsend, three-dimensional numerical study of turbulent channel flow over smooth and cube-rough walls with different roughness height has been carried out by using large eddy simulation(LES) coupled with immersed boundary method(IBM). The effects of surface roughness array on mean and fluctuating velocity profiles, Reynolds shear stress, and typical coherent structures such as quasi-streamwise vortices(QSV) in turbulent channel flow are obtained. The significant influences on turbulent fluctuations and structures are observed in roughness sub-layer(five times of roughness height).However, no dramatic modification of the log-law of the mean flow velocity and turbulence fluctuations can be found by surface cube roughness in the outer layer. Therefore, the results support the wall-similarity hypothesis. Moreover, the von Karman constant decreases with the increase of roughness height in the present simulation results. Besides, the larger size of QSV and more intense ejections are induced by the roughness elements, which is crucial for heat and mass transfer enhancement.     

横向粗糙元壁面槽道湍流的大涡模拟研究

采用大涡模拟和浸没边界法相结合对不同高度和不同间距横向粗糙元壁面槽道湍流进行了模拟,得到了光滑壁面和粗糙壁面湍流的流向平均速度分布,雷诺剪切应力,脉动速度均方根和近壁区拟序结构。结果发现横向粗糙元降低了流向平均速度,增大了流动阻力,粗糙壁面湍流的雷诺剪切应力大于光滑壁面。粗糙元降低了流向脉动速度,增强了展向和法向脉动速度。粗糙元高度越高,对湍流流动影响越大,而粗糙元间距对湍流统计特性的影响不大。粗糙壁面仍然存在着和光滑壁面类似的条带结构。     

壁面粗糙度对水平后台阶气粒两相流动影响的PDPA实验研究

用相位多普勒颗粒测速仪(PDPA)测量了颗粒的平均与脉动速度,研究了壁面粗糙度对水平后台阶气粒两相流动的影响。研究结果表明,壁面粗糙度减小颗粒纵向平均速度,增大颗粒纵向和横向脉动速度。壁面粗糙度对流场中不同位置处颗粒运动影响的强弱不同,其中逆流区处较弱,下游处较强。壁面粗糙度对不同粒径颗粒运动影响的强弱不同,其中对细颗粒的影响较弱且被局限在壁面附近,对粗颗粒的影响较强且扩散到整个流场。