Co/GaAs(100)界面形成以及Co超薄膜磁性质的研究

利用同步辐射光电发射和铁磁共振(FMR)研究了Co/GaAs(100)界面形成以及Co超薄膜的磁性质.结果表明,在低覆盖度(约为0.2nm)下,Co吸附原子与衬底发生强烈的界面反应,在覆盖度为0.9nm时,形成稳定的界面.从衬底扩散出的Ga原子与Co覆盖层合金化,而部分As原子与Co原子发生反应,形成稳定的键合,这些反应产物都停留在界面处很窄的区域(0.3—0.4nm)内.另一部分As原子偏析在Co覆盖层表面.结合理论模型,详细地讨论了界面结构及Ga，As原子的深度分布.FMR结果表明,生长的Co超薄膜具 关键词：     

Co/S钝化GaAs(100)界面形成的SRPES研究

利用同步辐射光电发射谱研究了Co与CH\-3CSNH\-2处理的S钝化GaAs(100)的界面形成.发现 其界面反应较弱,Co覆盖层达到0.8nm时,形成稳定的界面.GaAs表面上和S原子形成桥 键的Ga原子与Co发生交换反应并扩散到覆盖层中,形成Co—S键.Co覆盖层表面无偏析As的出现,与Co/GaAs(100)界面不同,这表明GaAs表面的S钝化可有效地阻止As原子向覆盖层的扩散. 关键词：     

NaZn13型Fe基化合物的结构和热力学性质研究

利用Chen-Mbius晶格反演获得的原子间相互作用势,对NaZn₁₃型Fe基金属间化合物进行原子级模拟研究.计算结果表明,Si原子和Co原子均优先占据96i晶位,Si原子和Co原子替代Fe原子后晶体平均结合能降低.随着Co含量的增加,LaFe_13-x-yCo_ySi_x和NdFe_13-x-yCo_ySi_x的晶格参数逐渐降低.声子态密度中,稀土原子主要激发低频模,Si原子主要激发高频模.LaFe_11.5-yCo_ySi_1.5化合物的德拜温度随Co含量的增加而增高. 关键词： 晶格反演 原子间相互作用势 热力学性质 磁致冷材料     

Si在TiAl3中取代行为的第一性原理研究

采用基于密度泛函理论的第一性原理方法,研究了Si原子在TiAl₃中的格点取代行为.通过对不同原子被置换后的c/a值、形成能以及电子态密度的计算和比较,发现Si原子倾向于取代TiAl₃中的Al原子,其取代行为主要由系统的电子结构决定,计算结果与实验相符.为了进一步研究Si原子的取代行为,对Si原子占据的格点以松散或紧凑分布下体系的总能、形成能以及电子态密度进行了计算,结果表明Si原子倾向于取代TiAl₃中松散分布的Al（2）原子.对c/a值的计算表明,随Al（2）格点Si原子浓度的增加,c/a值逐渐增大;而当Si取代Al（1）格点时,c/a值随Si原子浓度的增加而减小.研究表明,Si在TiAl₃中的极限固溶度介于12.5at%—18.75at%之间. 关键词： 密度泛函理论 第一性原理 电子结构 3')" href="#">TiAl₃     

CH3CSNH2钝化对铁磁金属与GaAs界面扩散的影响

通过实验对比,研究了CH₃CSNH₂钝化对铁磁金属与GaAs界面处As扩散行为的影响.发现S钝化处理改变了表面As元素的化学环境,减弱了As元素向铁磁金属外延层中的扩散现象,削弱了As与铁磁金属的反应,形成了较窄的反应层,并且改善了界面磁性.初步探讨了S钝化影响As扩散的原因. 关键词： S钝化 半导体界面 电子结构 磁性     

低能Cl原子刻蚀Si(100)表面的分子动力学模拟

使用分子动力学模拟方法研究了不同能量(0.3—10 eV)的Cl原子对表面温度为300 K的Si(100)表面的刻蚀过程.模拟中采用了Tersoff-Brenner势能函数来描述Cl-Si体系的相互作用.模拟结果显示,随着入射Cl原子在表面的吸附达到饱和,Si表面形成一层富Cl反应层.这和实验结果是一致的.反应层厚度随入射能量增加而增加.反应层中主要化合物类型为SiCl,且主要分布于反应层底部.模拟结果发现随初始入射能量的增加,Si的刻蚀率增大.在入射能量为0.3,1和5 eV时,主要的Si刻蚀产物为Si 关键词： 分子动力学 Cl刻蚀Si 分子动力学模拟 微电子机械系统     

(TiO2)n(n=3—6)团簇吸附水分子的理论研究

给出了优化小分子在团簇表面吸附结构的遗传算法.结合经验势函数,搜寻了水分子在(TiO₂)_n(n=3—6)团簇上可能的吸附方式;利用B3LYP/6-31G^**方法对各种吸附结构进行了优化.结果表明水分子主要通过O原子以非解离方式吸附到团簇中配位数较低或位置比较凸出的Ti原子上.分子轨道分析表明,水分子与团簇之间的成键主要来自吸附位Ti原子3s3p轨道的贡献,水分子的轨道保持了气相水分子中的基本特征,但离域化程度增大 关键词： 2团簇')" href="#">TiO₂团簇 2O吸附')" href="#">H₂O吸附 遗传算法 DFT     

添加剂(2Fe)·(Sn)对SmCo5永磁体X射线衍射相对强度I200/I111影响的研究

本文研究了SmCo₅永磁体添加剂(2Fe)·(Sn)后Fe和Sn原子进入晶格对X射线衍射相对强度的影响,得出:Sn原子较易置换3g位上的Co原子,而Fe原子可以置换各个晶位上的Co原子,比较起来置换2c晶位上的Co原子更容易一些,3g位上的Co原子被Sn原子置换会增高I₂₀₀/I₁₁₁的比值,但使强度比改变的原因还有取向、形成Fe和Sn原子有序排列、应力状态改善和控制了～750℃相变的缘故。 关键词：     

利用Gupta势结合遗传算法研究ConCu55－n(n=0—55)混合团簇的结构演化及基态能量

采用半经验的Gupta多体势结合遗传算法对Co_nCu_55－n(n=0—55)混合团簇的基态结构和能量进行了研究,发现这些混合团簇的基态结构是在Co₅₅,Cu₅₅单质团簇(Mackay二十面体)的基础之上发生的畸变;从n=0(Cu₅₅)开始,Co原子从中心到表面,从棱到顶点依次、连续替换Cu原子;基态结构与键能较大键的数目及其平均键长有关;Co₁₃Cu₄₂具有最稳定的结构,13个Co原子全部位于团簇内部形成Mackay二十面体对整个团簇的稳定性有显著影响. 关键词： 团簇 结构和能量 Gupta势 遗传算法     

分子动力学模拟H原子与Si的表面相互作用

通过分子动力学模拟了入射能量对H原子与晶Si表面相互作用的影响. 通过模拟数据与实验数据的比较, 得到H原子吸附率随入射量的增加 呈先增加后趋于平衡的趋势. 沉积的H原子在Si表面形成一层氢化非晶硅薄膜, 刻蚀产物(H₂, SiH₂, SiH₃和SiH₄)对H原子吸附率趋于平衡有重要影响, 并且也决定了样品的表面粗糙度. 当入射能量为1 eV时, 样品表面粗糙度最小. 随着入射能量的增加, 氢化非晶硅薄膜中各成分(SiH, SiH₂, SiH₃)的量以及分布均有所变化. 关键词： 分子动力学 吸附率 表面粗糙度 氢化非晶硅薄膜     

Magnetism in nanometer-thick TiOx/Co/TiOx/TiN/Si multilayered structures

Most studies on Co-doped TiO₂ system were focused on thin films grown by MBE-based methods. In this work we report the ferromagnetism of nanometer-thick-layered TiO₂/Co/TiO₂/TiN film grown on Si substrate by conventional magnetron sputtering. For the growth of TiO₂ on silicon, a non-oxide thermally stable material, TiN, was introduced to prevent Ti penetration into the Si substrate. Structural, magnetic, and transport measurements respectively by Raman, SQUID and Hall effect show that our samples are n-type semiconductors and exchange bias effect due to exchange coupling between Co and interfacial CoO. For the rapid vacuum annealed specimen, we found an enhanced loss and a Perminvar-type constricted hysteresis loop, which attributed to pinning of domain walls due to an induced anisotropy by the pair ordering in the metallic alloy of Co-Ti-Si.     

Formation and investigation of cobalt silicide ultrathin layers in Ti/Co/Ti-, TiN/Ti/Co-, and TiN/Co-on-silicon structures

The formation of ultrathin CoSi₂ layers in Ti(8 nm)/Co(10 nm)/Ti(5 nm), TiN(18 nm)/Ti(2 nm)/Co(8 nm), and TiN(18 nm)/Co(8 nm) systems magnetron-sputtered on the Si(100) surface is studied. The systems are subjected to two-step rapid thermal annealing. In between the annealing steps, the “sacrificial” layer is chemically removed and the second and third systems are additionally covered by a 17-nm-thick amorphous silicon (α-Si) layer. In the course of the fabrication process, the structures are examined using time-of-flight secondary-ion (cation) mass spectrometry, Auger electron spectroscopy, and scanning electron microscopy combined with X-ray energy dispersion microanalysis. It is shown that the above complex of analytical investigation provides efficient physical control of ultrathin silicide layer formation.     

Growth of magnetic materials and structures on Si(0 0 1) substrates using Co2Si as a template layer

We report in this paper the use of Co₂Si silicide as a template layer for the integration of magnetic materials and structures on silicon substrate. By undertaking Co deposition on silicon at a temperature of about 300 °C, we show that it is possible to obtain a smooth and epitaxial Co₂Si layer, which can act as a template layer preventing the reaction between Co and other transition metals with silicon. Two examples of over-growth of magnetic materials and structures on this template layer will be presented: growth of ferromagnetic Co layers and of magnetic tunnel junctions (Co(Fe)/AlO_x/NiFe).     

Magnetic resonance in multilayer Gd/Si/Co magnetic films

The magnetic properties of multilayer Gd/Si/Co magnetic films are experimentally studied by electron magnetic resonance and analyzed theoretically. The introduction of a semiconductor silicon interlayer is found to substantially affect the magnetic interlayer coupling and the magnetic dynamics of the system. The interlayer coupling is shown to be ferromagnetic for the (Gd/Si)_n films and to be antiferromagnetic for the (Gd/Si/Co/Si)_n films. The temperature dependences of the exchange parameters and the gyromagnetic ratios are determined. Possible mechanisms responsible for the formation of the interlayer coupling are discussed.     

Investigation of formation mechanism of Ti3SiC2 by high pressure and high-temperature synthesis

ABSTRACT

In this paper, synthesis of titanium silicon carbide (Ti₃SiC₂) under high pressure and high-temperature condition has been investigated by using the reactant systems Ti/Si/C, Ti/SiC/TiC, Ti/SiC/C and Ti/TiC/Si. Results reveal that Ti/TiC/Si is unsuited to the synthesis of Ti₃SiC₂ under a high pressure of 2.0?GPa, while an elemental mixture of Ti/Si/C is applicable. By the addition of Al, Ti₃SiC₂ with 95.8?wt% purity was obtained from elemental mixture with a large excess of silicon. The optimum experimental parameters were determined as Ti/Si/Al/C having the molar ratio of 3:1.5:0.5:1.9, holding at 2.0?GPa and 1300?°C for 60?min.     

Formations and morphological stabilities of ultrathin CoSi2 films

In this paper we investigate the formations and morphological stabilities of Co-silicide fihns using 1-8-nm thick Co layers sputter-deposited on silicon （100） substrates. These ultrathin Co-silicide films are formed via solid-state reaction of the deposited Co films with Si substrate at annealing temperatures from 450 ℃ to 850 ℃. For a Co layer with a thickness no larger than i nm, epitaxially aligned CoSi2 films readily grow on silicon （100） substrate and exhibit good morphological stabilities up to 600 ℃. For a Co layer thicker than 1 nm, polycrystalline CoSi and CoSi2 films are observed. The critical thickness below which epitaxially aligned CoSi2 film prevails is smaller than the reported critical thickness of the Ni layer for epitaxial alignment of NiSi2 on silicon （100） substrate. The larger lattice mismatch between the CoSi2 film and the silicon substrate is the root cause for the smaller critical thickness of the Co layer.     

同步辐射光激励的二氧化硅薄膜刻蚀研究

利用热氧化法在硅晶片上生长SiO₂薄膜，结合光刻和磁控溅射技术在SiO₂薄膜表面制备接触型钴掩模，通过掩模方法在硅表面开展了同步辐射光激励的表面刻蚀研究，在室温下制备了SiO₂薄膜的刻蚀图样.实验结果表明：在同步辐射光照射下，通入SF₆气体可以有效地对SiO₂薄膜进行各向异性刻蚀，并在一定的气压范围内，刻蚀率随SF₆气体浓度的增加而增加，随样品温度的下降而升高；如果在同步辐射光照射下，用SF₆和O₂的混合气体作为反应气体，刻蚀过程将停止在SiO₂/Si界面，即不对硅刻蚀，实现了同步辐射对硅和二氧化硅两种材料的选择性刻蚀；另外，钴表现出强的抗刻蚀能力，是一种理想的同步辐射光掩模材料. 关键词： 同步辐射刻蚀 接触型钴掩模 二氧化硅薄膜     

Photoluminescence spectra of laser-synthesized Si/C/N ultrafine powders

Ultrafine Si/C/N ceramic powders were synthesized by a CO₂-laser-induced reaction between silane (SiH₄), ammonia (NH₃) and acetylene (C₂H₂). The powders were characterized by infrared (IR) reflection and photoluminescence (PL) spectroscopy. From the infrared reflection spectra of Si/C/N powders, we have identified the causes of the strong photoluminescence present in these powders. The photoluminescence spectra of Si/C/N powders originate from the presence of hydroxylated and amorphous silicon (a-SiO₂) formed at the porous surface of these powders. We have shown that different chemical bonding between Si, C and N atoms, the degree of crystallinity of ternary powders and their porosity strongly influence the processes at their surface, i.e. the formation of amorphous silicon and silanole. Received: 16 June 2000 / Accepted: 24 June 2000 / Published online: 9 November 2000     

The influence of Co doping on the dielectric, ferroelectric and ferromagnetic properties of Ba0.70Sr0.30TiO3 thin films

Ba_0.70Sr_0.30TiO₃ (BST) thin films doped by Co (BSTC) are fabricated by sol-gel method on a Pt/Ti/SiO₂/Si substrate. A strong correlation is observed among the microstructure, dielectric, ferroelectric, ferromagnetic properties and Co concentration. The dielectric constant of BST thin films can be tailored from 343 to 119 by manipulating the Co concentration. The dielectric loss of BSTC thin films are still kept below 0.020 and the tunability is above 30% at a dc-applied electric field of 500 kV/cm. With increasing Co doping up to 10 mol%, the coexistence of ferromagnetism and ferroelectrics is found. Suitable dielectric constant, low-dielectric loss, and high tunability of this kind of thin films can be useful for potential tunable applications.     

Cobalt-induced polycrystalline silicon film growth

Cobalt (Co)-induced crystalline silicon (Si) growth was investigated. The Co catalyst reacted to dc magnetron sputtered Si at 600 °C forming a Co silicide layer. The polycrystalline Si (poly-Si) was epitaxially grown above the Co silicide template, which has a small lattice misfit to Si. Annealing followed to improve the Si crystallinity. X-ray diffraction was performed to trace Co silicide phase formation and transition. The Co-rich silicide phase transitioned to CoSi₂ by annealing. The crystallinity of Si films was identified using reflection absorption Fourier transform-infrared spectroscopy, which detected unique peaks at 689 and 566 cm⁻¹ after the annealing process. The thin poly-Si film was used to fabricate a Schottky diode to prove the electronic quality. A good quality Si thin film was achieved by the metal-induced Si growth.