共查询到19条相似文献,搜索用时 78 毫秒
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采用液相电化学沉积技术制备了ZnO纳米颗粒掺杂的类金刚石(DLC)薄膜, 研究了ZnO纳米颗粒掺杂对DLC薄膜场发射性能的影响. 利用X射线光电子能谱、透射电子显微镜、Raman光谱以及原子力显微镜分别对薄膜的化学组成、 微观结构和表面形貌进行了表征. 结果表明: 薄膜中的ZnO纳米颗粒具有纤锌矿结构, 其含量随着电解液中Zn源的增加而增加. ZnO纳米颗粒掺杂增强了DLC薄膜的石墨化和表面粗糙度. 场发射测试表明, ZnO纳米颗粒掺杂能提高DLC薄膜的场发射性能, 其中Zn与Zn+C的原子比为10.3%的样品在外加电场强度为20.7 V/μm时电流密度达到了1 mA/cm2. 薄膜场发射性能的提高归因于ZnO掺杂引起的表面粗糙度和DLC薄膜石墨化程度的增加. 相似文献
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采用自行设计的液相法沉积装置,以甲醇有机溶剂作为碳源,利用液相电化学沉积技术在不锈钢及Si基底上制备了类金刚石薄膜;用扫描电镜、Raman光谱仪表征了沉积薄膜的表面形貌和结构;用UMT-2M摩擦磨损试验机对两种沉积薄膜进行了摩擦性能测试。结果表明:经电化学沉积的类金刚石薄膜均匀、致密,表面粗糙度小;Raman光谱在1 332cm-1处有强的谱峰,与金刚石的特征峰相吻合,其中不锈钢基底上薄膜的sp3含量更高;不锈钢基底沉积膜的摩擦系数为0.12,Si片基底沉积膜的摩擦系数为0.10;不锈钢基底沉积膜的耐磨性较Si片沉积膜高。 相似文献
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采用自行设计的液相法沉积装置,以甲醇有机溶剂作为碳源,利用液相电化学沉积技术在不锈钢及Si基底上制备了类金刚石薄膜;用扫描电镜、Raman光谱仪表征了沉积薄膜的表面形貌和结构;用UMT-2M摩擦磨损试验机对两种沉积薄膜进行了摩擦性能测试。结果表明:经电化学沉积的类金刚石薄膜均匀、致密,表面粗糙度小;Raman光谱在1332 cm-1处有强的谱峰,与金刚石的特征峰相吻合,其中不锈钢基底上薄膜的sp3含量更高;不锈钢基底沉积膜的摩擦系数为0.12,Si片基底沉积膜的摩擦系数为0.10;不锈钢基底沉积膜的耐磨性较Si片沉积膜高。 相似文献
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利用微波等离子体增强化学气相沉积技术制备出了CNx薄膜,并利用x射线光电子能谱、x射线衍射、扫描电子显微镜和Raman光谱等测试手段对所制备的CNx薄膜的微结构和成分进行了分析.研究了其场致电子发射特性.发现薄膜的结构和场发射特性与反应系中的甲烷、氮气及氢气的流量比有关,当甲烷、氢气及氮气流量比为8/50/50sccm时,制备的薄膜具有弯曲层状的纳米石墨晶体结构(类富勒烯结构)和很好的场发射特性.场发射阈值电场降低至1.1V/μm.当电场为5.9V/μm时,平均电流密度达70μA/cm2,发射点密度大于1×104cm-2. 相似文献
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采用高温热解法在860℃分别制备出了碳、碳氮和硼碳氮纳米管,提纯后利用丝网印刷工艺分别将它们制备成薄膜,并测试了它们的场发射性能.结果表明:碳纳米管、碳氮纳米管和硼碳氮纳米管薄膜的开启电场分别为2.22,1.1和4.4V/μm,当电场增加到5.7V/μm时,它们的电流密度分别达到1400,3000μA/cm2和小于50μA/cm2.碳和碳氮纳米管薄膜的场增强因子分别为10062和11521.可见,碳氮纳米管的场发射性能优于碳纳米管,而硼碳氮纳米管的场发射性能比前两者要差.解释了这三种纳米管场发射性能差别的原因.
关键词:
碳纳米管
碳氮纳米管
硼碳氮纳米管
场发射 相似文献
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Fabrication of ZnO nanoparticles-embedded hydrogenated diamond-like carbon films by electrochemical deposition technique 下载免费PDF全文
ZnO nanoparticles-embedded hydrogenated diamond-like carbon (ZnO-DLC) films have been prepared by electrochemical deposition in ambient conditions. The morphology, composition, and microstructure of the films have been investigated. The results show that the resultant films are hydrogenated diamond-like carbon films embedded with ZnO nanoparticles in wurtzite structure, and the content and size of the ZnO nanoparticles increase with increasing deposition voltage, which are confirmed by X-ray photoelectron spectroscopy (XPS), Raman, and transmission electron microscope (TEM). Furthermore, a possible mechanism used to describe the growth process of ZnO-DLC films by electrochemical deposition is also discussed. 相似文献
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利用微波等离子体增强化学气相沉积技术制备出了CNx薄膜,并利用x射线光电子能谱、x射线衍射、扫描电子显微镜和Raman光谱等测试手段对所制备的CNx薄膜的微结构和成分进行了分析.研究了其场致电子发射特性.发现薄膜的结构和场发射特性与反应系中的甲烷、氮气及氢气的流量比有关,当甲烷、氢气及氮气流量比为8/50/50 sccm时,制备的薄膜具有弯曲层状的纳米石墨晶体结构(类富勒烯结构)和很好的场发射特性.场发射阈值电场降低至1.1V/μm.当电场为5.9V/μm时,平
关键词:
类富勒烯
x薄膜')" href="#">CNx薄膜
场致电子发射
微波等离子体增强化学气相沉积 相似文献
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Field emission characteristics of nano-sheet carbon films deposited by quartz-tube microwave plasma chemical vapour deposition 下载免费PDF全文
Nano-sheet carbon films are prepared on Si wafers by means of quartz-tube microwave plasma chemical vapour deposition (MPCVD) in a gas mixture of hydrogen and methane. The structure of the fabricated films is investigated by using field emission scanning electron microscope (FESEM) and Raman spectroscopy. These nano~carbon films are possessed of good field emission (FE) characteristics with a low threshold field of 2.6 V/μm and a high current density of 12.6 mA/cm^2 at an electric field of 9 V/μm. As the FE currents tend to be saturated in a high E region, no simple Fowler-Nordheim (F-N) model is applicable. A modified F N model considering statistic effects of FE tip structures and a space-charge-limited-current (SCLC) effect is applied successfully to explaining the FE data observed at low and high electric fields, respectively. 相似文献
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Tribological properties of diamond-like carbon films deposited by pulsed laser arc deposition 总被引:1,自引:0,他引:1 下载免费PDF全文
A novel method, pulsed laser arc deposition combining the advantages
of pulsed laser deposition and cathode vacuum arc techniques, was
used to deposit the diamond-like carbon (DLC) nanofilms with
different thicknesses. Spectroscopic ellipsometer, Auger electron
spectroscopy, x-ray photoelectron spectroscopy, Raman spectroscopy,
atomic force microscopy, scanning electron microscopy and
multi-functional friction and wear tester were employed to
investigate the physical and tribological properties of the deposited
films. The results show that the deposited films are amorphous and
the sp$^{2}$, sp$^{3}$ and C--O bonds at the top surface of the films
are identified. The Raman peak intensity and surface roughness
increase with increasing film thickness. Friction coefficients are
about 0.1, 0.15, 0.18, when the film thicknesses are in the range of
17--21~nm, 30--57~nm, 67--123~nm, respectively. This is attributed to
the united effects of substrate and surface roughness. The wear
mechanism of DLC films is mainly abrasive wear when film thickness
is in the range of 17--41~nm, while it transforms to abrasive
and adhesive wear, when the film thickness lies between 72 and 123~nm. 相似文献
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Carbon nitride thin films were prepared by electron-beam evaporation
assisted with nitrogen ion bombardment and TiN/CNx composite films were by
unbalanced dc magnetron sputtering, respectively. It was found that the
sputtered films were better than the evaporated films in hardness and
adhesion. The experiments of atomic oxygen action, cold welding, friction
and wearing were emphasized, and the results proved that the sputtered
TiN/CNx composite films were suitable for space application. 相似文献
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利用直流-射频-等离子体增强化学气相沉积技术在单晶硅表面制备了类金刚石薄膜,采用原子力显微镜、Raman光谱、x射线光电子能谱、红外光谱和纳米压痕仪考察了射频功率对类金刚石薄膜表面形貌、微观结构、硬度和弹性模量的影响.结果表明,制备的薄膜具有典型的含H类金刚石结构特征,薄膜致密均匀,表面粗糙度很小.随着射频功率的升高,薄膜中成键H的含量逐渐降低,而薄膜的sp33含量、硬度以及弹性模量先升高, 后降低,并在射频功率为100W时达到最大.
关键词:
等离子增强化学气相沉积
类金刚石薄膜
射频功率
结构和性 相似文献
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Diamond-like carbon (DLC) films have been deposited using three different
techniques: (a) electron cyclotron resonance---plasma source ion
implantation, (b) low-pressure dielectric barrier discharge, (c)
filtered---pulsed cathodic arc discharge. The surface and mechanical properties of
these films are compared using atomic force microscope-based tests. The experimental results
show that hydrogenated DLC films are covered with soft surface layers
enriched with hydrogen and sp$^{3}$ hybridized carbon while the soft surface
layers of tetrahedral amorphous carbon (ta-C) films have graphite-like
structure. The formation of soft surface layers can be associated with the
surface diffusion and growth induced by the low-energy deposition process.
For typical CVD methods, the atomic hydrogen in the plasmas can contribute
to the formation of hydrogen and sp$^{3}$ hybridized carbon enriched
surface layers. The high-energy ion implantation causes the
rearrangement of atoms beneath the surface layer and leads to an increase in film
density. The ta-C films can be deposited using the medium energy carbon ions
in the highly-ionized plasma. 相似文献