CdZnTe探测器晶片的表面处理工艺

报道了CdZnTe探测器晶片表面钝化工艺对其性能的影响.先采用金相砂纸和化学腐蚀剂对CdZnTe晶片进行机械和化学抛光,然后分别用H2O2溶液和NH4F/H2O2溶液对晶片进行湿法钝化;再用ZC36微电流测试仪和扫描电镜测试研究了不同钝化时间对CdZnTe晶片电学性质和表面形态的影响.结果发现:用NH4F/H2O2溶液对CdZnTe探测器晶片进行钝化30min,晶片表面形成一层完整的高阻氧化层,表面漏电流最小、晶体电阻率提高1～2个数量级,达到109～10Ω·cm,适合探测器的制备.     

机械磨抛对CdZnTe薄膜阻变特性的影响

采用磁控溅射法在ITO玻璃上制备了CdZnTe薄膜,探究机械磨抛对CdZnTe薄膜阻变特性的影响。通过对XRD图谱、Raman光谱、AFM显微照片等实验结果分析阐明了机械磨抛影响CdZnTe薄膜阻变特性的物理机制。研究结果表明,磁控溅射制备的薄膜为闪锌矿结构,F43m空间群。机械磨抛提高了CdZnTe薄膜的结晶质量;CdZnTe薄膜粗糙度(Ra)由磨抛前的3.42 nm下降至磨抛后的1.73 nm;磨抛后CdZnTe薄膜透过率和162 cm^-1处的类CdTe声子峰振动峰增强;CdZnTe薄膜的阻变开关比由磨抛前的1.2增加到磨抛后的4.9。机械磨抛提高CdZnTe薄膜质量及阻变特性的原因可能是CdZnTe薄膜在磨抛过程中发生了再结晶。     

铝膜溅射功率对铝诱导CdZnTe薄膜结构及性能影响

采用磁控溅射法制备CdZnTe先驱薄膜/金属Al膜的层叠结构,利用铝诱导技术制备CdZnTe薄膜.通过原子力显微镜、X射线衍射、Raman光谱仪和半导体特性分析系统,研究了铝膜溅射功率对铝诱导CdZnTe薄膜结构及性能的影响.结果表明:随着铝膜溅射功率的增加,铝诱导CdZnTe薄膜表面的薄膜结晶质量、晶粒尺寸和薄膜电阻率先增大后减小.铝诱导晶化的效果与铝膜溅射功率有关,当铝膜溅射功率达到100 W,CdZnTe薄膜的晶化诱导效果最显著,薄膜结晶质量最好,晶粒尺寸最大.     

CdZnTe晶片表面钝化后的热处理研究

报道了CdZnTe晶片表面钝化后,热处理工艺对其性能的影响.先采用30;的H2O2钝化抛光好的CdZnTe 晶片,然后在恒温干燥箱中进行热处理;最后使用ZC36微电流测试仪、EDX能谱仪和扫描电镜(SEM)研究热处理对钝化后的CdZnTe晶片表面的电学性能、表面成分以及表面形貌的影响.分析表明:CdZnTe钝化后在大气氛围120℃下热处理40 min,表面H2TeO3、H6TeO6等分解较为完全,晶片表面氧化层分布均匀,表面漏电流显著减小,晶体电阻率提高1～2个数量级,对提高探测器的性能有重要作用.     

CdZnTe晶体光致发光谱"负热淬灭"现象研究

采用改进的垂直布里奇曼法生长了直径为60 mm的CdZnTe晶体,测试了其在10 K～150 K范围的PL谱.对760 nm和825 nm处的峰积分强度随温度变化关系进行研究发现,在30～50 K范围内,PL谱峰的强度呈现反常温度依赖现象,即随着温度的升高而减小,也就是所谓的"负热淬灭"现象,这在CdZnTe晶体中属首次观察到.进一步分析表明,随着温度的增加,其PL谱强度变化的过程包含了三个无辐射过程和一个负热淬灭过程.与没有发生"负热淬灭"现象的CdZnTe晶体对比,两者XRD图谱呈现明显差异.讨论了发生负热淬灭现象的原因以及可能路径.     

CdZnTe晶体位错处的Raman光谱及PL谱研究

利用显微Raman光谱技术,对比研究了CdZnTe晶体无位错区和位锘密集区的Raman光谱.研究发现,CdZnTe晶体无位错区的Raman光谱出现了与Te有关的A1模(119 cm-1)、类CdTe的TO1模(138 cm-1)和类ZnTe 的TO2模(179 cm-1);CdZnTe晶体位错密集区的Raman光谱中仅出现了与Te有关的A1模和类CdTe的TO1模,CdZnTe晶体类ZnTe的TO2模消失.对CdZnTe试样位错密集区进行变温光致发光谱测试,结果表明,束缚在中性施主上的激子的离解为电子空穴对,电子空穴的非辐射复合过程吸收了类ZnTe的TO2模声子能量,造成Raman 光谱中类ZnTe的TO2模缺失.     

采用低温PL谱研究探测器级CdZnTe晶体

采用低温光致发光谱技术研究了核辐射探测器用高阻CdZnTe晶体。发现PL谱中的三个特征峰均与晶体质量有关,其中(D0,X)峰FWHM值和I DAP/I(D0,X)与晶格完整性和浅能级缺陷密度有关联,D2峰则与位错密度密切相关。采用双晶X射线摇摆曲线和位错腐蚀坑密度对此表征进行了验证。低温PL谱测试结果显示晶体质量较高的CdZnTe晶片,其探测器的能谱分辨率也相对较高。     

板片状Al2O3磨料对碲锌镉晶体机械研磨的影响

采用具有不同形状特征的Al2O3磨料对CdZnTe晶片进行机械研磨,研究了磨粒形状、粒径对晶片的去除速率、研磨后晶片表面形貌的影响,并讨论了其影响机理.研究表明,多角形不规则磨粒易在晶片表面产生划痕,且易在磨盘与晶片之间发生滚动,导致去除速率下降.板片状磨粒因不易发生滚动,易形成二体磨粒以边缘凿削晶片表面的方式去除.棱角度较高的薄板片状磨粒有利于CZT晶片的机械研磨,且去除速率随粒径增大而增大,但当粒径较大时易形成深凹坑.表面圆润平滑的厚板片状磨粒对去除速率不利.粒径(D50)为3.34 μm的薄板片状磨料既能得到较高的去除速率,也能保证研磨后晶片表面波纹度Wa值和凹坑面积占比较低,晶片表面质量好.     

Cr,Nd:GSAG晶体生长、光谱及LD泵浦激光性能研究

Cr,Nd:GSAG是一种性能优良的激光晶体,但是关于它的LD泵浦激光性能的研究很少.用提拉法生长了Cr,Nd:GSAG晶体,测定了它的化学成分、结构,初步测试了它的激光性能.晶体的(111)面X射线摇摆曲线半高全宽为0.055°.采用Rietveld方法精修X射线粉末衍射谱得到了Cr,Nd:GSAG晶体的原子结构参数、温度因子等.Cr,Nd:GSAG的最强吸收峰位于808.6nm处,吸收截面为3.38×10-20cm2.808nm光激发下,Cr,Nd:GSAG的最强发射峰位于1060nm,发射截面为6.04×10-20cm2,并测得激光上能级4F3/2的荧光寿命为274μs.利用808nm连续波LD泵浦实现了1060nm的激光输出,在输入功率为8.88W时,最大输出功率为0.513W,斜效率为6.73;,光-光转换效率为5.78;.此外还讨论了Cr,Nd:GSAG晶体中的Cr3+与Nd3+之间的能量传递机理.     

CdZnTe平面核辐射探测器研究

采用垂直Bridgman方法生长的CdZnTe晶体,定向切割成12 mm×7 mm×2.5 mm单晶片.通过研磨、抛光、腐蚀、电极制备、钝化、退火等一系列工艺,制成了Au/CdZnTe/Al平面探测器.重点研究了快速退火对电极接触特性的影响.测试了Au/CdZnTe/Al平面探测器的能谱响应特性.结果表明:在室温偏压为350 V条件下,探测器的241Am 59.54 keV光谱能量分辨为3.95;(2.35 keV FWHM).     

Study of effects of polishing and etching processes on Cd1−xZnxTe surface quality

The effect of surface preparation on CdZnTe properties was investigated. Surface etching using bromine solutions enhances Te elemental composition, resulting in a Te rich surface layer that is prone to oxidize. This oxidation degrades the performance of the fabricated CZT gamma detector. Roughness results were identical for samples polished with 1 and 3 μm and subsequently etched in 2% Br-MeOH. The optimal concentration of etching was 2% Br-MeOH.     

Study of ammonium fluoride passivation time on CdZnTe bulk crystal wafers

The chemical etching and the passivation processes of CdZnTe wafers were studied. The treatment effects were tested through an X‐Ray Photoelectron Spectroscopy (XPS) analysis and I–V measurement. The chemical etching in 2%Br–MeOH solution may effectively remove the damaged layer and improve the ohmic contact between CdZnTe wafer and Au electrodes making rich the surface with Te. After different etching times, the CdZnTe wafers were passivated with NH₄F/H₂O₂.CdZnTe wafer passivated immediately after etching showed the best passivation efficiency because the enriched Te on the surface was fully oxidized to TeO₂, which results in the thickest oxide layer, and the most stoichiometric surface. Also the surface leakage current was reduced in comparison with the sample passivated 24 h after etching. (© 2011 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

大尺寸非规则碲锌镉晶片双面抛光技术

碲锌镉(CdZnTe)晶体性能优越,是高性能碲镉汞(HgCdTe)外延薄膜的首选衬底材料。双面抛光是一种加工质量较高的碲锌镉晶片表面抛光方式,其具有效率高、平整度好、晶片应力堆积少的优点。但当碲锌镉晶片尺寸增大后,其加工难度也随之上升,易出现碎片多、加工速率慢、表面平整度差等问题。本文开展了大尺寸非规则碲锌镉晶片双面抛光技术研究,深入分析了面积大于50 cm²的非规则碲锌镉晶片双面抛光工艺中,不同参数对抛光质量的影响,通过模拟并优化晶片运动轨迹,优化抛光液磨粒粒型、抛光压力、抛光液流量等抛光工艺参数,实现了具有较高抛光速率和较好表面质量的大尺寸非规则碲锌镉晶片双面抛光加工,对进一步深入研究双面抛光技术有着重要意义。     

Raman spectrum of vitreous As2S3

The spontaneous Stokes and anti-Stokes Raman spectrum of vitreous As₂S₃ is reported. The spectrum was recorded with both HeNe and Ar ion laser excitation lines in the transmission and reflection modes respectively. Spectra were recorded at various temperatures between 20°K and 465°K, the softening temperature of As₂S₃ glass. It is shown conclusively that the quasicontinous scattering observed at low wave number shifts (< 100 cm⁻¹) is real in agreement with the theory of Shuker and Gammon and not an arbitrary background as previously reported. An approximate density of vibrational states is deduced from the polarized Raman spectra.     

Characterization of mixed phase silicon by Raman spectroscopy

We have examined the common methods for determination of the crystallinity of mixed phase silicon thin films from the TO–LO phonon band in Raman spectra. Spectra are decomposed into contributions of amorphous and crystalline phase and empirical formulas are used to obtain crystallinity either from the integral intensities (peak areas) or from magnitudes (peak maxima). Crystallinity values obtained from Raman spectra excited by Ar⁺ laser green line (514.5 nm) for a special sample with a profile of structure from amorphous to fully microcrystalline were compared with surface crystallinity obtained independently from atomic force microscopy (AFM). Analysis of the Raman collection depth in material composed of grains with absorption depth 1000 nm in an amorphous matrix (absorption depth 100 nm), was used to explain reasons for systematic difference between surface and Raman crystallinities. Recommendations are given for obtaining consistent results.     

载气流量对氧化锌纳米棒阵列的影响

本文研究了在金属有机化学气相沉积法(MOCVD)生长过程中,锌(Zn)源和氧(O)源载气流量的改变对ZnO纳米棒阵列的影响.通过改变源材料载气的流量,得到了直径从150 nm到20 nm范围、均一性明显改善的ZnO纳米棒.采用扫描电子显微镜(SEM),X射线衍射图谱(XRD),拉曼光谱(Raman)和光致荧光光谱(PL)等测试手段对样品的形貌结构和光学特性进行了表征.SEM和XRD结果表明当Zn源和O源的载气流量均为1 SLM时,所得的纳米棒直径最均匀,排列整齐,垂直于衬底生长,且结晶度最好.PL谱显示纳米棒的紫外带边峰发生了蓝移,可能与表面效应的增加有关.     

Raman Scattering of Light in Diamond Microcrystals

Crystallography Reports - Raman spectra of monodisperse crystalline diamond powders have been studied in dependence of the sample sizes. Raman scattering was excited by a near-IR cw laser (λ0...