A multiple-cathode arc-discharge plasma source

A plasma source for obtaining a 1-cm length of high-fractional ionized plasmas with electron densities in the range of 10¹⁵-10¹⁷ cm^-3 is described. The source consists of a capacitive discharge between a metal anode and an array of small metal cathodes embedded in epoxy, each with a current-limiting resistor. The effect is to have an array of sources which merge into each other, producing the plasma as a whole. The design and performance of the plasma source are presented. The entire system consists of the main electrode and shielding structures, the preionization circuit, and the main discharge circuit. Each of these components is described and the operating parameters and results are given     

Microwave resonant-cavity-produced air discharges

Air discharges produced in an Asmussen microwave cavity (0-300 W, 2.45 GHz, CW) between 0.5 and 100 torr were investigated. Gas temperatures (1000-2500 K) were estimated from rotational temperatures obtained from optical emission spectroscopy (OES). These agreed with a simple model of the heat transfer of the gas where joule heating was included as the source term. Vibrational temperatures (3700-7300 K) were also determined from OES and followed the electron energy trends. Electron density (10¹¹-10¹³ cm^-3), collisional frequency (10¹¹-10¹² s^-1), and plasma conductivity (0.09-0.3 (Ω-m)^-1) were calculated from a self-consistent electromagnetic model of the cavity where the plasma was assumed to be a lossy dielectric. Absorbed power, electric, and optical probe measurements were used as the input parameters to the model     

Validity conditions for complete and partial local thermodynamicequilibrium of nonhydrogenic level systems and their application tocopper vapor arcs in vacuum

Validity conditions for complete and partial local thermodynamic equilibrium (CLTE and PLTE) of homogeneous, time-dependent, and optically thin plasmas are derived. For Cu I, electron densities of n_e⩾(5×10²²-5×10²³ ) m^-3 are required for the establishment of CLTE. For Cu I and Cu II, n_e⩾(5×10²¹-5×10²¹ -5×10²²) m^-3 is necessary for PLTE (for electron temperatures of 1-2 eV). Application to low-current copper vapor arcs in vacuum shows that CLTE can be expected for r<200-600 μm (r=distance from the cathode spot). A further limitation follows for temperatures of 2 eV or higher if diffusion effects are taken into consideration. Consequently, the use of the LTE formulas in plasma spectroscopy of low-current vacuum arcs is very limited     

Experimental investigation of large-volume PIA plasmas atatmospheric pressure

Large-volume atmospheric-pressure plasmas have been the subject of previous research as a laboratory simulation of ball lightning, but measurements of the plasma properties have been unavailable. The present investigation employed a non-resonant microwave chamber with a 1000-W microwave-source operating at 2.45-GHz frequency to produce large volume (up to 0.8 L) plasmas that persisted after microwave shutoff. A Langmuir probe was used to measure electron density and temperature, and the highest values measured were 10¹⁰ cm^-3 at 0.67 eV, respectively. Plasma lifetimes after microwave shutoff were also measured, using both a photocell and a video camera, and were found to average 200 ms. A working hypothesis of the formation of shared electron orbitals in dense gas discharges is put forth to explain this phenomenon     

A two-component model for the electron distribution function in ahigh-current pseudospark or back-lighted thyratron

Temperature, energy, and densities of two electron distribution function components, including an isotropic bulk part and an anisotropic beam, are analyzed for a hydrogen pseudospark and/or back-lighted thyratron switch plasma with a peak electron density of 1-3×10¹⁵ cm^-3 and peak current density of ≈10⁴ A/cm². Estimates of a very small cathode-fall width during the conduction phase and high electric field strengths lead to the injection of an electron beam with energies ⩾100 eV and density of 10¹³-10¹⁴ cm^-3 into a Maxwellian bulk plasma. Collisional and radiative processes of monoenergetic beam electrons, bulk plasma electrons and ions, and atomic hydrogen are modeled by a set of rate equations, and line intensity ratios are compared with measurements. Under these high-current conditions, for an initial density n_H2=10¹⁶ cm^-3 and electron temperature of 0.8-1 eV, the estimated beam density is ≈10¹³ -10¹⁴ cm^-3. These results suggest the possibility of producing in a simple way a very high-density electron beam     

Inductive plasma sources for plasma implantation and deposition

External and reentrant radio frequency inductive plasma sources are developed for plasma ion implantation and deposition processes in a 1.8 m³ vacuum vessel. Plasma densities in the range 10¹⁶ -10¹⁷ m^-3 desirable for the above processes. External plasma sources could not yield the required plasma densities because of high particle losses in the transition region between the source and the main vessel. The particle losses are clarified through experiments and analysis, with and without multipole magnetic confinement. Reentrant plasma sources eliminate transmission losses and yield high plasma densities with good spatial uniformity     

Investigation of arc roots of constricted high current vacuum arcs

The anodic and cathodic arc roots of constricted high current vacuum arcs were investigated with a fast framing charge-coupled device camera of 1 μs exposure time. The experiments were performed with cup-shaped contacts, with sinusoidal currents of amplitudes between 20 and 100 kA, and a sine halfwave duration of 10-12 ms. The arcs were drawn by contact separation and accelerated by the Lorentz force between the arc current and the transverse magnetic field generated by the contrate contact. The anode and cathode arc roots behave reproducibility and arc scaleable within the range of currents investigated. Both types of arc roots are elliptical, with a major to minor axis ratio of 1.4. The major axis points are in the direction of arc propagation. Anodic and cathodic arc root cross-sectional areas as a function of current can both be described by a potential law with a common exponent of 0.76. For currents of 20-100 kA, mean current densities of 81-121 and 41-60 kA/cm ² were found in anode and cathode arc roots, respectively. Estimations of their temperature and vapor densities were performed. For the investigated current range T_A≈3300-3600 K, n_A ≈1.6*10¹⁹-2.2*10¹⁹cm^-3 and T _C≈3200-3400 K, n_C≈0.8*10¹⁹-1.2*10 ¹⁹ cm^-3 were found for anode and cathode, respectively     

Excitonic versus plasma screening in highly excited gallium arsenide

We report band edge absorption spectra of GaAs under conditions of high electron-hole pair excitation in the range of 10¹³-10¹⁷ cm^-3 achieved with picosecond light pulses tuned (i) to the 1s exciton energy and (ii) to the continuum (ω#62;E_g), where critical densities for bleaching of the exciton absorption lines are much lower. A substantial blue shift of the 2s absorption line relative to the 1s exciton was found, the latter remained constant in energy up to complete bleaching.     

Production of cold CN molecules by photodissociating ICN precursors in brute-force field

We theoretically investigate the production of cold CN molecules by photodissociating ICN precursors in a brute-force field. The energy shifts and adiabatic orientation of the rotational ICN precursors are first investigated as a function of the external field strength. The dynamical photofragmentation of ICN precursors is numerically simulated for cases with and without orienting field. The CN products are compared in terms of their velocity distributions. A small portion of the CN fragments are recoiled to near zero speed in the lab frame by appropriately selecting the photo energy for dissociation. With a precursor ICN molecular beam of ～ 1.5 K in rotational temperature, the production of low speed CN fragments can be improved by more than 5 times when an orienting electrical field of 100 k V/cm is present. The corresponding production rate for decelerated fragments with speeds ≤ 50 m/s is simulated to be about ～2.1×10~(-4) and CN number densities of 10~(8) –10~(10) cm~(-3) can be reached with precursor ICN densities of ～10~(12) –10~(14) cm~(-3) from supersonic expansion.     

Simulation study of a capacitively coupled plasma torch array

Using capacitively coupled electrical discharges, an array of three plasma torches powered by a single 60-Hz source are lit up simultaneously to produce a dense plasma in the open air. The discharge voltage and current of each torch is measured for three cases of one to three torches being lit up in the array. The results determine the ν-i characteristic of the discharge which indicates that the torch is operating in a diffuse are mode. The torch array is modeled by an equivalent circuit for simulating its operation. The simulation results of the discharge voltage and current of a torch are shown to agree well with those from the experimental measurements for the three cases. The lump circuit model is then used to carry out numerical simulations of the discharge for a broad parameter space of plasma species. By fitting the simulation results, a function giving the parametric dependence of the consumed average power density 〈P〉 on the normalized average electron density 〈n_e〉 maintained in the plasma is determined to be 〈P〉 48 〈n_e〉 ^1.9α_^0.4(W/cm³), where 〈n_e〉 is normalized to 10¹³cm^-3 and α_, the electron-ion recombination coefficient normalized to 10^-7 cm³·s^-1, is used as a variable parameter in the simulation     

Plasma deposition of thin films utilizing the anodic vacuum arc

Anodic vacuum arcs operating with cold cathodes in the spot mode and hot evaporating anodes are investigated to explore their technical potential as a plasma deposition technique. This discharge provides a unique source of a highly ionized, metal vapor plasma by autogeneration of the working gas to evaporation of the anode. This gas-free and droplet-free metal vapor plasma expands into the ambient vacuum (10^-4 mbar) and produces thin metallic films at the surface of substrates. An analysis of Al and Cu plasmas at the position of a possible substrate for arc currents between 20 and 200 A leads to the following results: electron densities, 10¹⁵-10¹⁸/ m³; degree of ionization, 0.5-25%; directed ion energy, 5 eV; and electron temperatures, 0.2-1 eV. Metallic coatings generated with deposition rates between 0.1 and 100 nm/s show the following properties: purity, 99.9%; polycrystalline structure with grain sizes between a few and a few hundred nm, same mass density as the respective bulk material, electrical conductivity rather close to that of the bulk material, and excellent optical properties. The coatings show good adhesion, which can be enhanced by a plasma-supported pretreatment of the substrate surface and by an acceleration of the ions towards the substrate     

A cold thermionically emitting dusty air plasma formed by radiativeheating of graphite particulates

Formation of an atmospheric pressure dusty air plasma is explored experimentally in this paper. The plasma is created by seeding an air flow with graphite particles and irradiating the particulates with a focused CO₂ laser beam. The graphite particles are, thus, heated to thermionically emitting temperatures, and average particle temperatures and average particle number densities are measured. The presence of charges is inferred both from these measured quantities using a simple theoretical transient model, and experimentally by applying a dc bias across the irradiated region. It is found that an electron density of ~6.7 × 10⁵ cm^-3 (6.7 × 10¹¹ m^-3) can be produced at steady state in the presence of O₂. This value can be increased to 3.6 × 10⁷ cm^-3 (3.6 × 10¹³ m ^-1) in the ideal case where an electron attachment to O₂ is suppressed and where a lower work function particulate is used     

���ý����赲̽�뷨��������ѹ�������������������ܶ�

The electron densities in the atmospheric pressure helium plasma were calculated by means of electron drift velocity and the jet velocity respectively. The electron velocity and jet velocity can be calculated by means of helium plasma jet current measured by a dielectric probe and plasma discharge current signal measured by voltage probes. The results show that the estimated electron densities of the helium plasma jet calculated from electron drift velocity and the jet velocity are in the order of 10 ¹¹ cm ^-3 and they increase with applied voltage. There is a little fluctuation in the value of the electron density along the jet axis of the plasma. This result is the same as the measured electron density in atmospheric pressure helium non-thermal plasma jet by using a Rogowski coil and a Langmuir probe. This is in one order lower than the electron density measured by microwave antenna.     

Lithium-argon discharges in a multicusp-ECR microwave resonantcavity

Argon and lithium-argon discharges have been created in a multicusp-ECR microwave resonant cavity. A double Langmuir probe has been used to determine discharge characteristics, indicating ion densities of 10¹⁰-10¹¹ cm^-3 and electron temperatures of about 3 eV with operating pressures of 4-20 mtorr and input powers of 100-250 W. Lithium is introduced to the system in the form of lithium chloride or lithium carbonate which is then heated by a background argon discharge allowing dissociation of lithium. The dissociation is evidenced by the observation of strong Li-I lines in the discharge using optical emission spectroscopy. LiCl was found to give a strong Li-I optical signal for about 15 min run time whereas Li ₂CO₃ gave lower intensity lines, but for about 60 min run time     

利用介质阻挡探针法测量大气压氦等离子体射流电子密度

分别利用电子的漂移速度和等离子体的传播速度计算了大气压下氦等离子体射流的电子密度。     

恒星的星核区坍缩与物态方程(一)——坍缩计算输入物理因素

本文采用由自由核子,α粒子及平均重核组成的核统计平衡模型描述由自由核子和许多种类原子核组成的系铣。由半径验核质量及核激发态熵公式描述核的性质,给定系统温度、密度及电子浓度y_e,由系统自由能在电中性及强子数守恒约束下求极小得我们的物态方程EOS(Ⅰ),并与E1 Eid等物态方程(在密度ρ~10⁹-10¹²g cm^-3)和与Lgmb等物态方程(在ρ~10¹²-10¹⁴g cm^-3,ye=0.3,σ=1.5k)作了比较,符合程度较好。本文对电子俘获率也作了更细致的考虑。     

N极性GaN/AlGaN异质结二维电子气模拟

通过自洽求解薛定谔方程和泊松方程,较系统地研究了GaN沟道层、AlGaN背势垒层、Si掺杂和AlN插入层对N极性GaN/AlGaN异质结中二维电子气(2DEG)的影响,分析表明,GaN沟道层厚度、AlGaN背势垒层厚度及Al组分变大都能一定程度上提高二维电子气面密度,AlGaN背势垒层的厚度和Al组分变大也可提高二维电子气限阈性,且不同的Si掺杂形式对二维电子气的影响也有差异,而AlN插入层在提高器件二维电子气面密度、限阈性等方面表现都较为突出,在模拟中GaN沟道层厚度小于5nm时无法形成二维电子气,超过20nm后二维电子气面密度趋于饱和,而AlGaN背势垒厚度超过40nm后二维电子气也有饱和趋势,对均匀掺杂和delta掺杂而言AlGaN背势垒层Si掺杂浓度超过5×10~(19)cm~(-3)后2DEG面密度开始饱和,而厚度为2nmAlN插入层的引入会使2DEG面密度从无AlN插入层时的0.93×10~(13)cm~(-2)提高到1.17×10~(13)cm~(-2)。     

基于气体放电等离子体射流源的模拟离子引出实验平台物理特性

离子引出过程是原子蒸气激光同位素分离中非常重要的物理过程之一,而其中关键的等离子体参数(等离子体初始密度和电子温度等)均会对离子引出特性产生影响.基于千赫兹电源驱动的氩气高压交流放电等离子体射流源,建立了离子引出模拟实验平台-2015 (IEX-2015),开发了用于诊断氩等离子体参数的"碰撞-辐射"模型,对等离子体射流区的电子温度和电子数密度等关键参数进行了测量.结果表明,电源输入功率和驱动频率以及工作气体流量均会对等离子体射流区的电子温度和数密度产生影响;在真空腔压强为10~(-2)Pa量级下,射流区电子数密度和电子温度的可调参数范围分别为10~9—10~(11)cm~(-3)和1.7—2.8 e V,这与实际离子引出过程中的等离子体参数范围相近.在此基础上,开展了不同引出电压、极板间距和电子数密度条件下初步的离子引出实验,所得到的离子引出电流变化规律亦与实际原子蒸气激光同位素分离中的离子引出特性定性一致.上述研究结果验证了在IEX-2015上开展离子引出模拟实验的可行性,为后续深入开展离子引出特性的实验研究准备了良好的条件.     

电磁波在非磁化等离子体中衰减效应的实验研究

针对等离子体隐身技术在航空航天领域的良好应用前景, 开展垂直入射到具有金属衬底的非磁化等离子体中电磁波衰减特性的理论与实验研究. 利用WKB方法对电磁波衰减随等离子体参数的变化规律进行了理论分析. 利用射频电感耦合放电方式产生稳定的大面积等离子体层, 搭建了等离子体反射率弓形测试系统, 进行了电磁波在非磁化等离子体中衰减效应的实验研究. 利用微波相位法和光谱诊断法, 得到不同放电功率下的等离子体电子密度, 其范围为8.17×10⁹–7.61× 10¹⁰ cm^-3. 本实验获得的等离子体可以使2.7 GHz 和10.1 GHz电磁波分别得到一定的衰减, 且电磁波衰减的理论与实验结果符合较好. 结果表明, 提高等离子体电子密度和覆盖均匀性有利于增强等离子体对电磁波的衰减效果.     

温稠密钛电导率计算

温稠密物质是惯性约束核聚变、重离子聚变、Z箍缩动作过程中物质发展和存在的重要阶段. 其热力学性质和辐射输运参数在聚变实验和内爆驱动力学模拟过程中有至关重要的作用. 本文通过建立非理想Saha方程, 结合线性混合规则的理论方法模拟了温稠密钛从10^-5-10 g·cm^-3, 10⁴ K到3×10⁴ K区间的粒子组分分布和电导率随温度密度的变化, 其中粒子组分分布由非理想Saha方程求解得到. 线性混合规则模型计算温稠密钛的电导率时考虑了包括电子、原子和离子之间的多种相互作用. 钛的电导率的计算结果与已有的爆炸丝实验数据相符. 通过电导率随温度密度变化趋势判断, 钛在整个温度区间, 密度0.56 g·cm^-3时发生非金属相到金属相相变. 对于简并系数和耦合系数的计算分析, 钛等离子体在整个温度和密度区间逐渐从弱耦合、非简并状态过渡到强耦合部分简并态.