Photon-stimulated desorption of F(-) ions from CF(3)Cl adsorbed on Si(111)-7x7

We report the photon-stimulated desorption of negative ions induced by direct dipolar dissociation and dissociative electron attachment. The photon-stimulated desorption of F(-) ions from CF(3)Cl physisorbed on a Si(111)-7x7 surface at 30 K in the photon energy range 12-35 eV was studied. The F(-) ion yield exhibits four resonances, at 12.8, 16.2, 19.5, and 22.3 eV, quite unlike the gas phase photodissociation cross section. The intensities of these resonances depend strongly on the CF(3)Cl coverage in a manner which varies from peak to peak. The resonances at 19.5 and 22.3 eV, which have a significant enhancement in the monolayer regime, are due to electron mediated dipolar dissociation of adsorbed CF(3)Cl molecules. The enhancement is attributed to surface electron attachment following molecular excitation. A significant enhancement in the monolayer regime has also been observed for the resonances at 12.8 and 16.2 eV. These two resonances are ascribable to a combination of electron mediated dipolar dissociation and dissociative electron attachment driven by photoelectrons generated in the neighboring molecules.     

Molecular modeling of alkyl and alkenyl monolayers on hydrogen-terminated Si(111)

On H-Si(111) surfaces monolayer formation with 1-alkenes results in alkyl monolayers with a Si-C-C linkage, while 1-alkynes yield alkenyl monolayers with a Si-C═C linkage. Recently, considerable structural differences between both types of monolayers were observed, including an increased thickness, improved packing, and higher surface coverage for the alkenyl monolayers. The precise origin thereof could experimentally not be clarified yet. Therefore, octadecyl and octadecenyl monolayers on Si(111) were studied in detail by molecular modeling via PCFF molecular mechanics calculations on periodically repeated slabs of modified surfaces. After energy minimization the packing energies, structural properties, close contacts, and deformations of the Si surfaces of monolayers structures with various substitution percentages and substitution patterns were analyzed. For the octadecyl monolayers all data pointed to a substitution percentage close to 50-55%, which is due the size of the CH(2) groups near the Si surface. This agrees with literature and the experimentally determined coverage of octadecyl monolayers. For the octadecenyl monolayers the minimum in packing energy per chain is calculated around 60% coverage, i.e., close to the experimentally observed value of 65% [Scheres et al. Langmuir 2010, 26, 4790], and this packing energy is less dependent on the substitution percentage than calculated for alkyl layers. Analysis of the chain conformations, close contacts, and Si surface deformation clarifies this, since even at coverages above 60% a relatively low number of close contacts and a negligible deformation of the Si was observed. In order to evaluate the thermodynamic feasibility of the monolayer structures, we estimated the binding energies of 1-alkenes and 1-alkynes to the hydrogen-terminated Si surface at a range of surface coverages by composite high-quality G3 calculations and determined the total energy of monolayer formation by adding the packing energies and the binding energies. It was shown that due to the significantly larger reaction exothermicity of the 1-alkynes, thermodynamically even a substitution percentage as high as 75% is possible for octadecenyl chains. However, because sterically (based on the van der Waals footprint) a coverage of 69% is the maximum for alkyl and alkenyl monolayers, the optimal substitution percentage of octadecenyl monolayers will be presumably close to this latter value, and the experimentally observed 65% is likely close to what is experimentally maximally obtainable with alkenyl monolayers.     

高覆盖率氟代癸基三氯硅烷自组装单分子膜的制备

通过液相沉积在云母表面制备1H, 1H, 2H, 2H-全氟癸基三氯硅烷(FDTS)自组装单分子膜(SAMs)。室温下,将1.0 mmol·L^-1的FDTS溶液静置水解15 min,再把云母浸入自组装30 min,原子力显微镜(AFM)表征发现,液相沉积过程中FDTS的团聚现象得到有效解决。该方法制备出了高覆盖率(85% ± 2%)和低均方根粗糙度(0.58 nm)的FDTS SAMs,且单分子膜的生长过程符合Langmuir一级动力学吸附模型。在液相沉积过程中,若水解和组装同时进行,过长的水解时间(大于30 min)或组装时间(大于30 min)均会导致FDTS的团聚,进而极大降低SAMs的质量。     

19F fast magic-angle spinning NMR studies of perfluoroalkanoic acid self-assembled monolayers

The bonding and dynamic properties of perfluoroalkanoic acid self-assembled monolayers (SAMs) on zirconia and titania powders were characterized by Fourier transform infrared and solid-state 19F magic-angle spinning NMR spectroscopy. The perfluoro fatty acids investigated included C(n)F(2n+1)CO2H, n = 7, 13, 15 and 17. The acids bind to both metal oxides via ionic carboxylate bonds, but complete monolayers are only formed on the zirconia. The shift of the CF3 group from -83 ppm in the bulk state to -85 ppm for the adsorbed monolayers is assigned to CF3 groups located at the air/monolayer interface. With the exception of the perfluorooctanoic acid, 19F spin lattice relaxation measurements indicate that the fluorocarbon chains of the adsorbed acids, even in the case of densely packed monolayers, are significantly more mobile than those in the bulk state. The motions associated with the enhanced mobility of the adsorbed acids are proposed to involve reorientations along the long chain axes. No evidence for chain melting in the fluorocarbon SAMs is found for temperatures well above the melting temperature of the bulk acids.     

Alkanethiol monolayers at reduced and oxidized zinc surfaces with corrosion protection: a sum frequency generation and electrochemistry investigation

In this work, octadecanethiol (ODT) was demonstrated to form ordered monolayers at either electrochemically reduced or oxidized Zn surfaces, by means of sum frequency generation (SFG) spectroscopy, cyclic voltammetry (CV), and electrochemical impedance spectroscopy (EIS). The SFG spectra of ODT-modified Zn electrodes featured three methyl group resonances in the C-H vibrational region (2800-3100 cm(-1)). A significant decrease in interfacial capacitance and an increase in charge-transfer resistance were observed in EIS measurement after ODT modification. The alkane chain tilt angle of ODT within a monolayer at the Zn surface was estimated as 0 degrees with respect to the surface normal by interfacial capacitance measurement via EIS. CV and SFG investigation revealed that ODT monolayers undergo reductive desorption from the Zn electrode in 0.5 M NaOH at -1.66 V (vs SCE) and in 0.5 M NaClO4 at -1.62 V. The integrated charge consumed to the desorption of ODT is determined as 87 mC/cm2 from the reductive peak on CV curve, resulting in a coverage of 9.0 x 10(-10) mol/cm2 (5.4 x 10(14) molecules/cm2) if assuming the reduction follows a one-electron process. ODT monolayers show corrosion protection to underlying zinc at the early immersion stage in base, salt, and acid media. However, the protection efficiency was reduced with immersion time due to the presence of defects within the monolayers.     

Construction of mixed mercaptopropionic acid/alkanethiol monolayers of controlled composition by structural control of a gold substrate with underpotentially deposited lead atoms.

Mixed monolayers of 3-mercaptopropionic acid (MPA) and alkanethiols of various chain lengths have been constructed on Au based on a novel concept, namely, control of the composition of the component thiols in mixed monolayers by controlling the surface structure of the substrate. The Au substrate surface was first modified with underpotentially deposited Pb (UPD Pb) atoms, followed by the formation of a self-assembled monolayer (SAM) of alkanethiol. The UPD Pb atoms were then oxidatively stripped from the surface to create vacant site, on which MPA was adsorbed to finally form the mixed monolayers. The surface coverages of Pb, alkanethiol and MPA, and the total numbers of thiols were determined using an electrochemical quartz crystal microbalance, X-ray photoelectron spectroscopy, and reductive desorption voltammetry. These results demonstrate that the surface coverage of MPA in the mixed monolayers is determined by the initial coverage of UPD Pb. Fourier transform infrared spectra also support this conclusion. The observed single peak in the cyclic voltammogram for the reductive desorption shows that MPA and alkanethiol do not form their single-component domains. Scanning tunneling microscopy revealed the single-row pinstripe structure for all the thiol adlayers formed during each step of the preparation. This shows that the surface structure of the mixed monolayers is determined by the structure of the initially formed SAM on Au partially covered with UPD Pb.     

Coupling versus surface-etching reactions of alkyl halides on GaAs(100): I. CF3CH2I reactions

We report the rich surface chemistry exhibited by the reactions of 1,1,1-trifluoroethyl iodide (CF3CH2I) adsorbed onto gallium-rich GaAs(100)-(4 x 1), studied by temperature-programmed desorption (TPD) and low-energy electron diffraction (LEED) studies and X-ray photoelectron spectroscopy (XPS). CF3CH2I adsorbs molecularly at 150 K but dissociates, below room temperature, to form a chemisorbed monolayer of CF3CH2 and I species. Recombinative desorption of molecular CF3CH2I competes with the further reactions of the CF3CH2 and I chemisorbed species. The CF3CH2 species can either undergo beta-fluoride elimination to yield gaseous CF2=CH2 or it can undergo self-coupling to form the corresponding higher alkane, CF3CH2CH2CF3. A second coupling product, CF3CH2CH=CF2, is also evolved, and it is postulated that migratory insertion of the liberated CF2=CH2 into the surface-carbon bond of the chemisorbed CF3CH2 is responsible for its formation. The iodines, formed by C-I scission in the chemisorbed CF3CH2I, and the fluorines, derived from beta-fluoride elimination in CF3CH2, react with the surface gallium dimers, and Ga-As back-bonds to generate five etch products (GaF, AsF, GaI, AsI, and As2) that desorb in the temperature range of 420 to >600 K. XPS data reveal that the surface stoichiometry remains constant throughout the entire annealing temperature range because of the desorption of both gallium- and arsenic-containing etch products, which occur sequentially. In this article, plausible mechanisms by which all products form and the binding sites of these reactions in the (4 x 1) reconstruction are discussed. Factors that control the rate constants of etch product versus hydrocarbon product formation and in particular how they impact on the respective desorption temperatures will be discussed.     

Adsorption, desorption, and clustering of H2O on Pt111

The adsorption, desorption, and clustering behavior of H2O on Pt111 has been investigated by specular He scattering. The data show that water adsorbed on a clean Pt111 surface undergoes a structural transition from a random distribution to clustered islands near 60 K. The initial helium scattering cross sections as a function of temperature are found to be insensitive to the incident H2O flux over a range of 0.005 monolayers (ML)/s-0.55 ML/s indicating that the clustering process is more complex than simple surface diffusion. The coarsening process of an initially random distribution of water deposited at 25 K is found to occur over a broad temperature range, 60相似文献   

Complex thermal chemistry of vinyltrimethylsilane on Si(100)-2x1

The surface chemistry of vinyltrimethylsilane (VTMS) on Si(100)-2x1 has been investigated using multiple internal reflection-Fourier transform infrared spectroscopy, Auger electron spectroscopy, and thermal desorption mass spectrometry. Molecular adsorption of VTMS at submonolayer coverages is dominating at cryogenic temperatures (100 K). Upon adsorption at room temperature, chemical reaction involving rehybridization of the double bond in VTMS occurs. Further annealing induces several reactions: molecular desorption from a monolayer by 400 K, formation and desorption of propylene by 500 K, decomposition leading to the release of silicon-containing products around 800 K, and, finally, surface decomposition leading to the production of silicon carbide and the release of hydrogen as H(2) at 800 K. This chemistry is markedly different from the previously reported behavior of VTMS on Si(111)-7x7 surfaces resulting in 100% conversion to silicon carbide. Thus, some information about the surface intermediates of the VTMS reaction with silicon surfaces can be deduced.     

Perfecting imperfect "monolayers": removal of siloxane multilayers by CO2 snow treatment

Self-assembled monolayers (SAMs) of N-(3-triethoxysilylpropyl)-4-hydroxybutyramide were prepared on silicon oxide on silicon (Si/SiO(2)). Initial silane adsorption and high-temperature annealing led to a stable base monolayer with many large over-lying islands of disordered multilayers as a result of the non-self-limited growth process. The disordered multilayers were hydrolyzed and subsequently removed by CO(2) snow treatment. The resulting films were one monolayer thick as measured by ellipsometry. Atomic force microscopy, attenuated total reflection Fourier transform infrared spectroscopy, and contact angle analysis showed that the films were composed of monolayers with full and uniform surface coverage rather than nonuniform coverage by islands or patches of multilayers. Monolayers of octadecyltrichlorosilane were also prepared by multilayer removal via CO(2) treatment, showing the general applicability of the technique toward siloxane SAMs. We believe that CO(2) is an excellent solvent for weakly bound and hydrolyzed molecules that compose multilayers, and this ability to prepare near-perfect monolayer films from imperfect ones allows for less stringent formation conditions.     

Atomic imaging of nucleation of trimethylaluminum on clean and H2O functionalized Ge(100) surfaces

The direct reaction of trimethylaluminum (TMA) on a Ge(100) surface and the effects of monolayer H(2)O pre-dosing were investigated using ultrahigh vacuum techniques, such as scanning tunneling microscopy (STM), scanning tunneling spectroscopy (STS), and x-ray photoelectron spectroscopy (XPS), and density functional theory (DFT). At room temperature (RT), a saturation TMA dose produced 0.8 monolayers (ML) of semi-ordered species on a Ge(100) surface due to the dissociative chemisorption of TMA. STS confirmed the chemisorption of TMA passivated the bandgap states due to dangling bonds. By annealing the TMA-dosed Ge surface, the STM observed coverage of TMA sites decreased to 0.4 ML at 250?°C, and to 0.15 ML at 450?°C. XPS analysis showed that only carbon content was reduced during annealing, while the Al coverage was maintained at 0.15 ML, consistent with the desorption of methyl (-CH(3)) groups from the TMA adsorbates. Conversely, saturation TMA dosing at RT on the monolayer H(2)O pre-dosed Ge(100) surface followed by annealing at 200?°C formed a layer of Ge-O-Al bonds with an Al coverage a factor of two greater than the TMA only dosed Ge(100), consistent with Ge-OH activation of TMA chemisorption and Ge-H blocking of CH(3) chemisorption. The DFT shows that the reaction of TMA has lower activation energy and is more exothermic on Ge-OH than Ge-H sites. It is proposed that the H(2)O pre-dosing enhances the concentration of adsorbed Al and forms thermally stable Ge-O-Al bonds along the Ge dimer row which could serve as a nearly ideal atomic layer deposition nucleation layer on Ge(100) surface.     

Desorption related to adsorption of hydrogen via detailed balance on the Si(1 0 0) surfaces

Recent progress on desorption and adsorption dynamics of hydrogen (deuterium) on monohydride and dihydride Si(1 0 0) surfaces is reviewed and discussed. The dynamics experiments reveal that the desorption dynamics of hydrogen is well related to the adsorption dynamics via detailed balance. Dependence of time-of-flight (TOF) distributions of desorbed molecules on H(D) coverage is noticed to be important in understanding the kinetics mechanism of the adsorption/desorption reactions of hydrogen on the Si(1 0 0) surface. The desorption dynamics varies from the situation of strongly translational heating to the other situation of less translational heating with D coverage. This trend seems to be consistent with the 2H/3H/4H interdimer mechanism. However, despites by far the richest 4H configuration at high H coverage, the 2H desorption prevails over the 4H desorption already at 0.8 ML. To reconcile this unexpected desorption kinetics, a diffusion-promoted desorption mechanism is proposed. Height of the adsorption barriers for the 2H and 3H pathways could be reduced by the H-atom diffusion along the Si dimer rows, but that for the 4H pathway could not be the case because of no capability of diffusion on the H saturated surface. The desorption dynamics of hydrogen from the (3 × 1) dihydride surface is also reviewed and compared with the case on the monohydride surface. The sticking coefficients of hydrogen molecules onto the monohydride surfaces are evaluated from the TOF curves and found to be strongly activated by the kinetic energy. Not only the degrees of freedom of the molecules but also the vibrational degrees of freedom of substrate Si atoms determine the barrier height for adsorption. The desorption dynamics of hydrogen from the monohydride and dihydride surfaces appears to be quite similar, but the dynamics of substrate Si atoms is expected to be quite dissimilar between the two desorption pathways.     

Investigation of the interactions between alkanethiol self-assembled monolayers and a liquid overlayer using impedance spectroscopy

We report on changes in the complex impedance response of a quartz crystal microbalance (QCM) that result from the growth of an alkanethiol monolayer on the electrodes of the device. The purpose of this work is to understand the evolution of the interactions between alkanethiol-gold monolayers and a liquid overlayer as a function of time after initial deposition by evaluating the position, shape, and linewidth of the impedance spectra associated with the monolayer formation. We relate the complex impedance response of the QCM to the mass and viscosity of the monolayer through an established equivalent circuit model. The data show the organization of alkanethiol SAMs occurs at approximately the same rate for aliphatic chain lengths in the range of C(9)-C(16), as long as the thiol is readily soluble in the solvent system used. Our data are consistent with SAM annealing being mediated by the sulfur-gold adsorption and desorption equilibrium. Additionally, we have found that examination of a C(18) SAM is limited by the deposition conditions and thiol solubility. Bulk deposition was confirmed visually and related to the evolution of the peak position and shape changes with deposition time.     

Single-component and mixed ferrocene-terminated alkyl monolayers covalently bound to Si(111) surfaces

Self-assembled ferrocene monolayers covalently bound to monocrystalline Si(111) surfaces have been prepared from the attachment of an amine-substituted ferrocene derivative to a pre-assembled acid-terminated alkyl monolayer using carbodiimide coupling. This derivatization strategy yielded nanometer-scale clean, densely packed monolayers, with the ferrocene units being more than 20 A from the semiconductor surface. The amount of immobilized electroactive units could be varied in the range 2 x 10(-11) to approximately 3.5 x 10(-10) mol cm(-2) by diluting the ferrocene-terminated chains by inert n-decyl chains. The highest coverage obtained for the single-component monolayer corresponded to 0.25-0.27 bound ferrocene per surface silicon atom. The electrochemical characteristics of the mixed n-decyl/ferrocene-terminated monolayers were found to not depend significantly on the surface coverage of ferrocene units. The reversible one-electron wave of the ferrocene/ferrocenium couple was observed at E degrees ' = 0.50 +/- 0.01 V vs SCE, and the rate constant of electron transfer kapp was about 50 s(-1).     

Chemisorption and reaction characteristics of methyl radicals on Cu(110)

Methyl radicals are generated by pyrolysis of azomethane, and the condition for achieving neat adsorption on Cu(110) is described for studying their chemisorption and reaction characteristics. The radical-surface system is examined by X-ray photoemission spectroscopy, ultraviolet photoemission spectroscopy, temperature-programmed desorption, low-energy electron diffraction (LEED), and high-resolution electron energy loss spectroscopy under ultrahigh vacuum conditions. It is observed that a small fraction of impinging CH3 radicals decompose into methylene possibly on surface defect sites. This type of CH2 radical has no apparent effect on CH3(ads) surface chemistry initiated by dehydrogenation to form active CH2(ads) followed by chain reactions to yield high-mass alkyl products. All thermal desorption products, such as H2, CH4, C2H4, C2H6, and C3H6, are detected with a single desorption peak near 475 K. The product yields increase with surface coverage until saturation corresponding to 0.50 monolayer of CH3(ads). The mass distribution is, however, invariant with initial CH3(ads) coverage, and all desorbed species exhibit first-order reaction kinetics. LEED measurement reveals a c(2 x 2) adsorbate structure independent of the amount of gaseous exposure. This strongly suggests that the radicals aggregate into close-packed two-dimensional islands at any exposure. The islanding behavior can be correlated with the reaction kinetics and is deemed to be essential for the chain propagation reactions. Some relevant aspects of the CH3/Cu(111) system are also presented. The new results are compared with those of prior studies employing methyl halides as radical sources. Major differences are found in the product distribution and desorption kinetics, and these are attributed to the influence of surface halogen atoms present in those earlier investigations.     

Inhomogeneous decomposition of ultrathin oxide films on Si(100): application of Avrami kinetics to thermal desorption spectra

Thermal decomposition of ultrathin oxide layers on silicon surface was investigated with temperature programed desorption. Oxide layers were formed on Si(100) at 400 degrees C by exposure to O(2) molecular beam. Desorption spectrum for oxygen coverages between 1.7 and 2.6 ML exhibits a single dominant peak with an additional broad peak at lower temperatures. The former peak corresponds to stable binding states of O atoms at dimer bridge sites and dimer backbond sites. The high peak intensity indicates that most O atoms are at stable states. The latter peak corresponds to an unstable binding state, where O atoms are presumably trapped at dangling bonds. The SiO desorption rate from the stable binding states is well described by Avrami kinetics, suggesting that the decomposition process is spatially inhomogeneous with void formation and growth. The rate-determining step is the reaction at void perimeter even if the overlap between voids becomes quite large. The Avrami exponents determined from our experiment indicate that the increase in the initial coverage makes the oxide layer more stable and suppresses the rate of void formation at the potential nucleation sites.     

Hydrogen reactivity on highly-hydroxylated TiO2(110) surfaces prepared via carboxylic acid adsorption and photolysis

Combined scanning tunneling microscopy, temperature programmed desorption, photo stimulated desorption, and density functional theory studies have probed the formation and reactivity of highly-hydroxylated rutile TiO(2)(110) surfaces, which were prepared via a novel, photochemical route using trimethyl acetic acid (TMAA) dissociative adsorption and subsequent photolysis at 300 K. Deprotonation of TMAA molecules upon adsorption produces both surface bridging hydroxyls (OH(b)) and bidentate trimethyl acetate (TMA) species with a saturation coverage of nearly 0.5 monolayers (ML). Ultra-violet light irradiation selectively removes TMA species, producing a highly-hydroxylated surface with up to ~0.5 ML OH(b) coverage. At high coverages, the OH(b) species typically occupy second-nearest neighbor sites along the bridging oxygen row locally forming linear (2 × 1) structures of different lengths, although the surface is less ordered on a long scale. The annealing of the highly-hydroxylated surface leads to hydroxyl recombination and H(2)O desorption with ~100% yield, thus ruling out the diffusion of H into the bulk that has been suggested in the literature. In agreement with experimental data, theoretical results show that the recombinative H(2)O desorption is preferred over both H bulk diffusion and H(2) desorption processes.     

Thermal chemistry of styrene on Si(100)2x1 and modified surfaces: electron-mediated condensation oligomerization and posthydrogenation reactions

The room-temperature (RT) adsorption and surface reactions of styrene on Si(100)2x1 have been investigated by thermal desorption spectrometry, low-energy electron diffraction, and Auger electron spectroscopy. Styrene is found to adsorb on Si(100)2x1 at a saturation coverage of 0.5 monolayer, which appears to have little effect on the 2x1 reconstructed surface. The chemisorption of styrene on the 2x1 surface primarily involves bonding through the vinyl group, with less than 15% of the surface moiety involved in bonding through the phenyl group. Except for the 2x1 surface where molecular desorption is also observed, the adsorbed styrene is found to undergo, upon annealing on the 2x1, sputtered and oxidized Si(100) surfaces, different thermally induced processes, including hydrogen abstraction, fragmentation, and/or condensation oligomerization. Condensation oligomerization of styrene has also been observed on Si(100)2x1 upon irradiation by low-energy electrons. In addition, large postexposure of atomic hydrogen to the chemisorbed styrene leads to Si-C bond cleavage and the formation of phenylethyl adspecies. Hydrogen therefore plays a decisive role in stabilizing and manipulating the processes of different surface reactions by facilitating different surface structures of Si.     

Probing the interaction of hydrogen chloride with low-temperature water ice surfaces using thermal and electron-stimulated desorption

The interaction and autoionization of HCl on low-temperature (80-140 K) water ice surfaces has been studied using low-energy (5-250 eV) electron-stimulated desorption (ESD) and temperature programmed desorption (TPD). There is a reduction of H(+) and H(2)(+) and a concomitant increase in H(+)(H(2)O)(n=1-7) ESD yields due to the presence of submonolayer quantities of HCl. These changes are consistent with HCl induced reduction of dangling bonds required for H(+) and H(2)(+) ESD and increased hole localization necessary for H(+)(H(2)O)(n=1-7) ESD. For low coverages, this can involve nonactivated autoionization of HCl, even at temperatures as low as 80 K; well below those typical of polar stratospheric cloud particles. The uptake and autoionization of HCl is supported by TPD studies which show that for HCl doses ≤0.5 ± 0.2 ML (ML = monolayer) at 110 K, desorption of HCl begins at 115 K and peaks at 180 K. The former is associated with adsorption of a small amount of molecular HCl and is strongly dependent on the annealing history of the ice. The latter peak at 180 K is commensurate with desorption of HCl via recombinative desorption of solvated separated ion pairs. The activation energy for second-order desorption of HCl initially in the ionized state is 43 ± 2 kJ/mol. This is close to the zero-order activation energy for ice desorption.     

Iso-branched semifluorinated alkanes in Langmuir monolayers

A series of semifluorinated n-alkanes (SFAs), of the general formula: (CF3)2CF(CF2)6(CH2)nH (in short iF9Hn), n = 11-20 have been synthesized and employed for Langmuir monolayer characterization. Surface pressure and electric surface potential measurements were performed in addition to Brewster angle microscopy results, which enabled both direct visualization of the monolayers structure and estimation of the monolayer thickness at different stages of compression. Our paper was aimed at investigating the influence of the iso-branching of the perfluorinated fragment of the SFA molecule on the surface behavior of these molecules at the air/water interface. It occurred that iF9 SFAs with the number of carbon atoms in the hydrogenated moiety from 11 to 20 are capable of Langmuir monolayer formation. Monolayers from iF9H11 to iF9H13 are instable, whereas those formed by iF9 SFAs with longer hydrogenated chains form stable films at the free surface of water. As compared to SFAs containing perfluorinated chain in a normal arrangement, iso-branched molecules have a greater tendency to aggregate. Lower stability of monolayers formed by iF9 SFAs as compared to F10 SFAs originated from the surface nucleation observed in BAM images, even at the very initial stages of compression. The dipole moment vector for iso-branched SFAs was found to be virtually aligned with the main axis of the molecule, contrary to F10 SFAs, where the dipole moment vector was calculated to be tilted with respect to the main molecular axis. Quantitative Brewster angle microscopy measurements (relative reflectivity experiments) enabled us to monitor the changes of monolayer thickness at different stages of monolayer compression.