Substrate temperature effects on film chemistry in plasma deposition of organics. III. Analysis by static secondary ion mass spectrometry

Static secondary ion mass spectrometry (SIMS) was used to examine the effect of reducing the substrate temperature during the radio frequency plasma deposition of organic films. Studies of two polymerizable plasma precursors (2-hydroxyethyl methacrylate and acrylic acid) and one nonpolymerizable precursor (acetone) deposited without substrate cooling and with liquid nitrogen cooling are presented. Acetone deposited with methanol/dry ice cooling was also investigated. Spectra of polymerizable precursors were analyzed by comparison to spectra for the corresponding conventionally-polymerized polymer films [i.e., poly(hydroxyethyl methacrylate) and poly(acrylic acid)]. Acetone spectra were interpreted by reference to SIMS analysis of plasma-deposited films prepared from isotopically-labelled acetone and to reference homopolymers. Comparison of the SIMS spectra of films deposited at different substrate temperatures indicates that a reduction in substrate temperature generally results in higher intensity of peaks characteristic of oxygenated ion structures. SIMS also suggests that the reduction of substrate temperature results in less polymer unsaturation and fewer structures which form by hydrogen redistribution during the deposition process. These results support the hypothesis that deposition at low substrate temperatures leads to an increase in the proportion of precursor incorporated into the film without substantial fragmentation. Corroborative results from high resolution x-ray photoelectron spectroscopy (XPS) and assays for precursor functional groups by chemical derivatization reactions in conjunction with XPS are also presented. © 1992 John Wiley & Sons, Inc.     

Chemical and thermo‐responsive characterisation of surfaces formed by plasma polymerisation of N‐isopropyl acrylamide

Plasma polymerisation of N ‐isopropyl acrylamide (NIPAAm) presents an exciting route for the production of thermally responsive coatings on a wide variety of substrates for applications in tissue culture and microfluidics. One issue associated with the polymerisation of NIPAAm via plasma polymerisation is the limited volatility of the monomer and the subsequent requirement for monomer and reactor heating to create and maintain the vapour. It is already well established that power is critical in the balance between polymer functionality and coating stability in plasma polymers. However, little is known of how reactor and substrate temperatures may be used to influence the physico‐chemical characteristics of polymers produced from such low‐volatility monomers. In this paper, we examine the effects of a range of plasma deposition parameters on the functionality and stability of plasma‐polymerised NIPAAm surfaces. X‐ray photoelectron spectroscopy (XPS), near‐edge X‐ray absorption fine structure spectroscopy (NEXAFS), ellipsometry and contact angle goniometry have been used to examine coating chemistry, stability in aqueous environments, deposition rates and thermo‐responsive behaviour. Our results indicate that plasma polymerisation at low powers and low temperatures enhances the ability of plasma‐polymerised NIPAAm to display a wettability phase transition, but also contributes to instability of the coating to dissolution or delamination in water. Our spectroscopic measurements confirm that retention of the monomer structure is facilitated by low power and temperature deposition and reveal that conversion of the amide groups to amine and nitrile groups occurs during the polymerisation process, particularly at high discharge powers. Copyright © 2006 John Wiley & Sons, Ltd.     

Molecular adsorption and the chemistry of plasma-deposited thin organic films: Deposition of oligomers of ethylene glycol

Weakly ionized, radio-frequency, glow-discharge plasmas formed from methyl ether or the vapors of a series of dimethyl oligo(ethylene glycol) precursors (general formula: H-(CH₂OCH₂)_n-H;n=1 to 4) were used to deposit organic thin films on polytetrafluoroethylene. X-ray photoelecton spectroscopy (XPS) and static secondary ion mass spectrometry (SIMS) of the thin films were used to infer the importance of adsorption of molecular species from the plasma onto the surface of the growing, organic film during deposition. Films were prepared by plasma deposition of each precursor at similar deposition conditions (i.e., equal plasma power (W), precursor flow rate (F), and deposition duration), and at conditions such that the specific energy (energy/mass) of the discharge (assumed to be constrained byW/FM, whereM=molecular weight of the precursor) was constant. At constantW/FM conditions, two levels of plasma power (and, hence, twoFM levels) and three substrate temperatures were examined. By controlling the energy of the discharge (W/FM) and the substrate temperature, these experiments enabled the study of effects of the size and the vapor pressure of the precursor on the film chemistry. The atomic % of oxygen in the film surface, estimated by XPS, and the intensity of theC-O peak in the XPS C_ls spectra of the films, were used as indicators of the degree of incorporation of precursor moieties into the plasma-deposited films. Analysis of films by SIMS suggested that these two measures obtained from XPS were good indicators of the degree of retention in the deposited films of functional groups from the precursors. The XPS and SIMS data suggest that adsorption of intact precursor molecules or fragments of precursor molecules during deposition can have a significant effect on film chemistry. Plasma deposition of low vapor pressure precursors provides a convenient way of producing thin films with predictable chemistry and a high level of retention of functional groups from the precursor.     

Plasma polymerization. XI. A comparison of the plasma polymerization of the isomeric perfluorinated diazines

Plasma polymers synthesized by inductively coupled RF techniques have been investigated as a function of operating parameters for the isomeric perfluorinated diazines (pyrazine, pyrimidine, and pyridazine). A combination of ESCA and microanalytical studies shows that plasma polymers are produced by rearrangement mechanisms: the C/F and C/N stoichiometric ratios are similar to those of the starting monomers over a range of operating parameters. A comparison of rates of formation of plasma polymer films reveals distinctive differences between the isomeric diazines that suggest that equilibration of valence isomers occurs on a substantially slower time scale than for isomeric fluorinated benzenes^5–9 which, in general, polymerize at essentially the same rates. In contrast to the remarkably low critical surface tension of plasma polymers based on perfluorobenzenes (ca. 20 dynes cm^?2), the plasma polymer films from the perfluorinated diazines which are initially hydrophobic become hydrophilic in contact with water droplets. This is attributed to the hydrolytic instability of films associated with the labilizing influence of nitrogen on nucleophilic displacement of fluoride which is a feature of the chemistry of monomers.     

Plasma polymerization using pulsed microwave power

Pulsed microwave power was used to polymerize a variety of monomers containing different functional groups. We examined the effects of pulse frequency and duty cycle on the deposition rates and the composition of the polymers. For monomers that do not contain oxygen we find that there is an increase in deposition rate with increasing pulse frequency and that the pulsed deposition rate is always less than the continuous power deposition rate. For monomers that contain oxygen, or for co-depositions of hydrocarbon monomers with O₂ or CO, we find that there is a decrease in deposition rate with increasing frequency, however the deposition rate using pulsed power is greater than the rate using continuous power. This result is shown to be related to the amount of etching that takes place during the deposition process. Infrared studies reveal that pulsed power can alter the composition of plasma polymers of some oxygen-containing monomers. The presence or absence of vinyl unsaturation, nitrile groups, or a cyclic structure have no effect on the polymerization process.     

Plasma polymerization of cyano compounds

Plasma polymerizations of three cyano compounds—acrylonitrile (AN), 1,2-dicyanoethylene (FN), and tetracyanoethylene (TCE)—were investigated by FT IR and XPS, and the transforamtion of cyano groups during the plasma polymerization was discussed. The results pointed out an aspect of the preparation of plasma films with cyano groups. Plasma polymerizations of AN, FN, and TCE deposited brown or dark brown films that contained carbon, nitrogen, and oxygen. The elemental composition of the plasma films, especially N/C atomic ratio, showed a monomer dependence but no rf power dependence. The plasma films contained amide and amino groups, and ketene-imine and conjugated — C = N — structures as well as cyano groups as nitrogen functionalities, and carbonyl and carboxyl groups as oxygen functionalities. For the preparation of plasma films with cyano groups, compounds with more than two cyano groups themselves are not suitable as monomers. The operation of plasma polymerization under mild plasma conditions at low rf power and in no oxygen atmosphere is favorable for the preparation of plasma films with cyano groups. © 1992 John Wiley & Sons, Inc.     

Surface characterization of the SiOx films prepared by a remote atmospheric pressure plasma jet

The deposition rate and surface properties of SiO_x films were prepared and investigated using remote atmospheric pressure plasma (APP) jet. The APP, generated with low frequency power at 16 kHz, was fed with tetraethoxysilane (TEOS)/air gas mixture. After deposition, the SiO_x films were analyzed for chemical characteristics, elemental composition, surface morphology, and hardness. It was found that the deposition substrate temperature is the key factor to affect the deposition rate of remote APP chemical vapor deposition process. Fourier transform infrared (FTIR) spectra indicated that APP deposited SiO_x films are an inorganic feature. XPS examination revealed that the SiO_x films contained approximately 30% silicon, 58% oxygen and 12% carbon. Atomic forced microscopy (AFM) analysis results indicated a smooth surface of SiO_x films in deposition under higher substrate temperature. Also, pencil hardness tests indicated that the hardness of APP deposited SiO_x films was greatly improved with increasing substrate temperatures. Copyright © 2008 John Wiley & Sons, Ltd.     

Plasma-enhanced deposition of diamond-like carbon films on high temperature tolerant polymers

The feasibility of depositing carbon films with a diamond-like structure on high temperature polymers, using established plasma-enhanced chemical vapor deposition techniques, is explored. Potential uses for such a film will depend upon the adhesion of the film to the substrate, the properties of the deposited film, and the effect of the deposition process on the bulk properties of the polymer substrate. Amorphous carbon (diamond-like carbon) coatings with thicknesses ranging from 2 to 18 μm were deposited on polyimide substrates at temperatures below 420°C. Extended exposure to the plasma processing conditions caused no visible damage but halved the room-temperature tensile strength of the polymer films. Diamond-like carbon, graphitic carbon, and a precursor to the diamond-like carbon structure, attributed to an aromatic carbon ring structure, were observed. The optical transparency of the coated polymer film was attenuated uniformly across the spectral range, 2.5-22 μm. Static oxidation and limited thermal cycling of the coated polymer produced no widespread delamination of the coating from the substrate: neither the deposited film nor the coated regions of the polymer showed any effect when oxidized at 370°C, for 450 h. © 1994 John Wiley & Sons, Inc.     

Plasma polymerization in the design of new materials: looking through the lens of maleic anhydride plasma polymers

Plasma polymerization is a well-established process for the deposition of thin polymeric films on various types of substrates. The potential of this technique for promoting changes of substrate’s wettability constitutes one of the most basic and often reported applications. However, as novel technological demands emerge, and with it the range of available characterizations, plasma polymers are having their niche of applications and properties expanded. The properties of these materials are commonly tailored through the variation of polymer chemistry, postfunctionalization, or other post-treatment processes. That chemical versatility allows the use of plasma polymers in adhesives, water treatment, biomedicine, and many other fields. The creation of nanostructures via lithography or during the deposition process itself constitutes other dynamic fields for new plasma polymer materials. In the current review, the design of materials through plasma polymerization is addressed with the direction given by our expertise in maleic anhydride plasma polymers (MAPP). A non-exhaustive number of applications of plasma polymers is provided to non-specialists as an overview of the materials coming out from the field of this chemical-vapor deposition process. A complete analysis of the literature on maleic anhydride plasma polymers is also performed.     

Pulsed Plasma Polymerization of Cyclic Ethers: Production of Biologically Nonfouling Surfaces

Polymerization of low molecular weight cyclic ethers was investigated under pulsed plasma conditions. Film formation conditions were adjusted to optimize retention of ethylene oxide (EO) content of the monomers in the resultant plasma generated polymers. To a large extent this goal was achieved with the 12-crown-4 and 15-crown-5 monomers, but not with dioxane. Films obtained from the 12-crown-4 monomer under ultra low power inputs are shown to be highly resistant to protein adsorption, while exhibiting good chemical compositional stability and adhesion during prolonged immersion in aqueous solutions. The dramatic differences observed in contrasting polymer film compositions from 12-crown-4 and dioxane are believed to arise from distinctive differences in the low electron impact fragmentation patterns of these two compounds, as discussed in this report.     

Phenylated poly(P-phenylene vinylenes) prepared via the chlorine precursor route (CPR)

The synthesis of several highly phenylated PPV derivatives by a chlorine precursor route (CPR) was investigated in order to understand its scope. Three 1,4-bis(chloromethyl)benzene monomers were prepared via a robust and versatile synthetic procedure involving the Diels-Alder reaction. The monomers were then polymerized to the corresponding precursor polymers with about 1.0 equivalent of potassium t-butoxide in THF. Only one monomer gave a soluble precursor polymer while the other two gave insoluble precursor polymers. The soluble precursor polymer was deposited as thin films and then converted to the corresponding PPV derivative, which showed green photoluminesence and electroluminesence.     

Synthesis,characterization, and thermal properties of novel silicon 1,1,3,3-tetramethylguanidinate derivatives and use as single-source chemical vapor deposition precursors

A series of chemical vapor deposition (CVD) precursors have been synthesized by a single-step reaction of 1,1,3,3-tetramethylguanidine and a variety of silicon chlorides. The structures of the 1,1,3,3-tetramethylguanidinate-based compounds were verified by ¹H NMR, ¹³C NMR, XPS, EI-MS, and elemental analysis. The thermal stability, transport behavior, and vapor pressures of these compounds were evaluated by simultaneous thermal analyses (STA). These compounds are highly stable and those in liquid form are very volatile. Silicon carbonitride (SiCN) thin films were prepared by using bis (tetramethylguanidine)-dimethyl-silane as the precursor in helicon wave plasma chemical vapor deposition (HWP-CVD). The properties of the films were investigated by SEM, AFM, and XPS. The results showed that the films have good uniformities, low friction coefficient, and high hardness, enabling the films for fabrication of semiconductor devices.     

Pulsed-Spray Radiofrequency Plasma Enhanced Chemical Vapor Deposition of CuInS2 Thin Films

Thin films of CuInS₂ were grown on various substrates at a temperature of 523 K from two metal-organic precursors using radiofrequency plasma enhanced chemical vapor deposition (PECVD). Two precursor molecules, with different solubility properties, were dissolved in appropriate solvents and sprayed into the plasma region in the PECVD chamber. The resulting films were examined for atomic composition, growth rate, crystalline orientation, and uniformity. Films made from each precursor differed in thickness, atomic composition, and crystallinity. The uniformity of the film was fairly good from near the edge to the center of the substrate, and evidence for a chalcopyrite-like structure was found in several samples deposited from one of the precursor molecules.     

Process study of thermal plasma chemical vapor deposition of diamond,part II: Pressure dependence and effect of substrate pretreatment

The effect of pressure during thermal plasma chemical vapor deposition of diamond films has been investigated for a pressure range from 100 to 760 Torr. The maximum growth rate in our experiments occurs at 270 Torr for substrate temperatures around 1000°C. The existence of an optimum pressure for diamond deposition may he related to the balance between generation and recombination of atomic hydrogen and carbon-containing active species in front of the substrate. To estimate the concentrations of atomic hydrogen and methyl radicals under thermal plasma conditions, calculations based on thermodynamic equilibrium have been performed. This approximate evaluation provides useful guidelines because rapid diffusion results in a near frozen chemistry within the boundary layer. The effect of substrate pretreatment on diamond deposition depends on the type of substrate used. Two growth modes have been observed-layer growth and island growth of diamond crystals on various substrates. Screw dislocations have been observed in diamond deposition in thermal plasmas, and defects such as secondary nucleations are more concentrated along (III) directions than along (100) directions.     

Initiated chemical vapor deposition of trivinyltrimethylcyclotrisiloxane for biomaterial coatings

Organosilicon polymers show great utility as both biocompatible and electrically insulating materials. In this work, thin films of a novel organosilicon polymer are synthesized by initiated chemical vapor deposition utilizing trivinyltrimethylcyclotrisiloxane as a monomer and tert-butyl peroxide as a free-radical-generating initiator. Use of an initiator allows for the formation of polymer films at filament temperatures as low as 250 degrees C, significantly lower than those required to thermally polymerize the monomer species. The mild reaction conditions allow for the retention of all siloxane ring moieties within the resulting polymer. Films deposited at filament temperatures of 600 degrees C or higher exhibit damage to this moiety. The all-dry deposition process generates a highly cross-linked matrix material in which over 95% of the vinyl moieties present on the monomer units have been reacted out to form linear polymerized hydrocarbon chains. While each hydrocarbon backbone chain averages 8.9 monomer units in length, as evaluated by X-ray photoelectron spectroscopy analysis, each monomer unit is involved in three independent chains, resulting in polymer films of such high molecular weight that they are completely insoluble. Kinetic analysis of the deposition process indicates that the film formation rate is limited by the adsorption of reactive species to the deposition substrate, with an apparent activation energy of -23.2 kJ/mol with respect to the substrate temperature. These results are consistent with a surface growth mechanism, ideal for the coating of nonuniform or high aspect ratio substrates.     

Deposition conditions influence the postdeposition oxidation of methyl methacrylate plasma polymer films

Plasma polymer films were deposited from methyl methacrylate (MMA) vapor under various plasma conditions and XPS and FTIR used to study the changes to the compositions of the films as they were stored in air for longer than 1 year. The plasma power input per monomer mass unit (W/FM) markedly affected the composition of the freshly deposited MMA plasma polymers. A low value of W/FM led to a high degree of retention of the original monomer structure, whereas a high value of W/FM resulted in substantial monomer fragmentation and the formation of a partially unsaturated material considerably different to conventional PMMA. As the MMA plasma coatings were stored in ambient air after fabrication, all showed spontaneous oxidative changes to their composition, but the extents and reaction products differed substantially. Deposition at low W/FM led to moderate oxidative changes, whereas high power led to a pronounced increase in the oxygen content over time and resulted in a wide range of carbon–oxygen functionalities in the aged material. As the initial compositions/plasma deposition conditions thus influenced the oxidative postdeposition reactions, MMA plasma polymers deposited under different conditions not only varied in their initial composition but then became even more diverse as they aged. © 1998 John Wiley & Sons, Inc. J Polym Sci A: Polym Chem 36: 985–1000, 1998     

A transparent boron-nitrogen thin film formed by plasma CVD out of the discharge region

A transparent boron-nitrogen thin film of thickness 550 nm was successfully deposited out of the discharge region by rf plasma CVD. The deposition was performed with diborane (4.8 vol % in N₂) as the reactant gas and argon as the carrier gas by an inductively coupled reactor at a frequency of 13.56 MHz. The transparent films could be obtained at a low pressure of about 30 Pa, at a discharge power level of 30 W, and at room temperature without heating the substrate. The thin films obtained by rf plasma are compared with those obtained by microwave plasma. Both the refractive index and the deposition rate for the films deposited by microwave plasma are discussed according to the deposition conditions.     

Radiofrequency Plasma Polymers Containing Ionic Phosphonate Groups: Effect of Monomer Structure and Carrier Gas on Properties and Deposition Rate

Radiofrequency (RF) plasma polymers prepared from perfluoroallylphosphonic acid (PAPA) are hydrophilic and have ionic properties. Unfortunately, deposition rates are low. The current study focuses on RF plasma polymers prepared from PAPA and pentafluoroallyldiethylphosphonate (PADP) with and without argon carrier gas. Plasma polymerized PADP films were similar in composition, structure, and properties to plasma polymerized PAPA films, but were deposited at much higher rates. The addition of argon to the PAPA discharges resulted in a decrease in mean deposition rate from 41.7 Å/min to less than 20 Å/min, while the deposition rate of plasma polymerized PADP increased significantly with the addition of argon to the discharge. PADP derived plasma polymer deposition rates ranged from 136 Å/min to 390 Å/min, depending on position in the reactor and presence or absence of argon carrier gas. PAPA-derived plasma polymers exhibited deposition rates and properties that were uniform throughout the reactor, while PADP-derived plasma polymers had maximum deposition under the upstream induction coil and linearly decreasing deposition rate with downstream distance in the reactor. Additionally, the PADP-derived plasma polymers exhibited downstream changes in atomic composition, structure, and physical properties, such as wettability and hardness. These changes were attributed to a getter effect upstream in the reactor in which ablated hydrogen species scavenge etching fluorine species in the plasma phase.     

Deposition of Super-Hydrophobic and Oleophobic Fluorocarbon Films in Radio Frequency Glow Discharges

Fluorocarbon films using a monomer, 1H, 1H, 2H-perfluoro–1-dodecene were deposited in a continuous radio frequency (RF) glow discharge, the process was carried out in a parallel-plate RF discharge onto stainless steel reactor in order to produce coating with a water-and oil–repellent surface. Fourier-Transform Infrared spectroscopy (FT-IR) and X-ray Photoelectron Spectroscopy (XPS) revealed that the films obtained contain mainly perfluoromethylene (CF₂) species. Film wettability was tested using water and hydrocarbon liquids for contact angle measurements, furthermore surface energy was also calculated. Oil-repellency was found to increase as the amount of CF₂ species increases in the film structure. Film morphology was studied by Atomic Force Microscopy (AFM), films showing an usual morphology from that typical of Plasma Polymerised Fluorocarbon (PPFC) films. The combination of the low surface energy coating and the surface morphology produces materials which are both water and oil repellency.     

Preparation of films from aluminum acetylacetonate by plasma sputtering

Aluminum acetylacetonate has been reported as a precursor for the deposition of alumina films using different approaches. In this work, alumina‐containing films were prepared by plasma sputtering this compound, spread directly on the powered lowermost electrode of a reactor, while grounding the substrates mounted on the topmost electrode. Radiofrequency power (13.56 MHz) was used to excite the plasma from argon atmosphere at a working pressure of 11 Pa. The effect of the plasma excitation power on the properties of the resulting films was studied. Film thickness and hardness were measured by profilometry and nanoindentation, respectively. The molecular structure and chemical composition of the layers were analyzed by Fourier transform infrared spectroscopy and energy dispersive spectroscopy. Surface micrographs, obtained by scanning electron microscopy, allowed the determination of the sample morphology. Grazing incidence X‐ray diffraction was employed to determine the structure of the films. Amorphous organic layers were deposited with thicknesses of up to 7 µm and hardness of around 1.0 GPa. The films were composed by aluminum, carbon, oxygen and hydrogen, their proportions being strongly dependent on the power used to excite the plasma. A uniform surface was obtained for low‐power depositions, but particulates and cracks appeared in the high‐power prepared materials. The presence of different proportions of aluminum oxide in the coatings is ascribed to the different activations promoted in the metalorganic molecule once in the plasma phase. Copyright © 2013 John Wiley & Sons, Ltd.