Chemical and physical modification and electret properties of polytetrafluoroethylene films

Composites with titanium oxide structures on the surface of a polymer matrix were prepared by preliminary plasma activation of polytetrafluoroethylene films, followed by chemical treatment with vapors of titanium tetrachloride and water. The chemical composition and structure of the modified film surface were studied by scanning electron microscopy, atomic force microscopy, and X-ray photoelectron spectroscopy. The stability of the formed surface charge increases in going from the initial film to the plasma-activated film, then to the film successively treated with vapors of titanium tetrachloride and water, and finally to the plasma-activated film treated subsequently with vapors of titanium tetrachloride and water. The modified polytetrafluoroethylene films are of interest as electrets with enhanced operation characteristics.     

研究简报聚苯乙烯接枝TiO2有机无机杂化超疏水涂层的制备

采用自由基聚合的方法,在经乙烯基三乙氧基硅烷(VTEOS)修饰的纳米TiO2表面上接枝聚苯乙烯(PS),而后制得PS-g-TiO2有机无机纳米杂化超疏水薄膜。利用场发射扫描电子显微镜和傅里叶变换红外光谱仪对PS-g-TiO2进行了形貌和结构表征,并探讨了VTEOS修饰对TiO2纳米粉体表面浸润性能的影响。测试结果表明,纳米TiO2经VTEOS改性后所制备的PS-g-TiO2薄膜和仅用硅烷偶联剂修饰的TiO2薄膜都具有良好的超疏水性能,水滴在薄膜上的最大静态接触角分别为160°和154°,滑动角分别为3°和4°。     

Silica-Titania Mesostructured Films

Mesostructured silica-titania mixed oxide films in which the titania is well accessible on the silicate pore wall have been synthesized by a ligand-assisted templating (LAT) approach in combination with sol-gel processing. Control over the different hydrolysis and condensation rates of silicon and titanium alkoxides was achieved by complexation of the titanium species to the poly(ethylene oxide) part of an amphiphilic surfactant molecule (Brij56®). This modified precursor was used as structure-directing agent in the formation of thin mesostructured films. The structure and composition of the resulting material was characterized by X-ray diffraction, UV-vis spectroscopy and transmission electron microscopy.     

Superhydrophobic surface by immobilization of polystyrene on vinyl-modified titania nanoparticles

Abstract  

The organic–inorganic nanocomposite films were fabricated by grafting polystyrene (PS) onto the vinyltriethoxysilane (VTEOS) modified titanium dioxide nanopowders using free radical polymerization. The composition of the surfaces and the structure for the PS grafted titania (PS-g-TiO₂) were examined by infrared spectroscopy, X-ray photoelectron spectroscopy and thermogravimetric analysis, and the rough surface was confirmed by the evaluation of the morphological characteristics of the coating using hybrid particles. The wetting properties of the VTEOS modified titania and PS-g-TiO₂ films were investigated, which show the maximum static water contact angles of 160° and 154°, and minimum sliding angles of 3° and 4°, respectively.     

Characteristics of morphology,structure and composition of titanium surface under its modification by electrochemical polarization in phosphate‐alkaline solutions

The modification of titanium surface under electrochemical polarization (EP) in the phosphate‐alkaline solutions has been studied using the methods of X‐ray diffraction, electron probe microanalysis, atomic force microscopy, X‐ray photoelectron spectroscopy (XPS), cyclic voltammetry and spectroscopic ellipsometry. It is shown that the morphological parameters of the surface, e.g. roughness and stringiness, as well as its structural‐chemical characteristics, e.g. preferred orientation, size and habit of crystallites, titanium chemical forms, thickness and phase composition of oxide film are generally dependent on the polarization potential. The characteristics of titanium surface modified at low anodic potentials 500, 750 and 1000 mV and 10‐min polarization time have been measured. The processes of Ti surface dissolution and etching along grain boundaries are found to be most intensive at 750 mV. Under 500 mV, these processes are poorly developed yet, while at 1000 mV, the surface passivating film formation limits the previous processes. Despite relatively low polarization potentials (1 V), the surficial oxide films have sufficient thickness (up to ~20 nm) and a specific multilayer structure of variable composition and oxidation state of titanium. The data obtained allow to assert that EP represents an effective tool for morphological and a structural chemical modification of a titanium surface. Copyright © 2015 John Wiley & Sons, Ltd.     

Nickel- and copper-containing oxide films on titanium

We have studied the composition and structure of films 20–30 μm thick prepared by plasmaassisted electrochemical oxidation (PEO) and additionally modified by impregnation in aqueous solutions of nickel and copper nitrates and then annealed. The investigative tools used were powder X-ray diffraction, electron probe microanalysis (EPMA), X-ray photoelectron spectroscopy (XPS), and atomic force microscopy. Unmodified film/titanium composites have a certain catalytic activity in CO oxidation to CO₂ at temperatures above 300°C; for modified layers, these temperatures are noticeably higher. Modification influences the surface structure, relief, and elemental composition. Relations between the composition and catalytic properties of the oxide layers are discussed.     

离子束修饰对电极表面结构和析氢活性的影响

采用了离子束对工业钛电极进行表面改性，用电化学方法研究了改性电极在Ｈ２ＳＯ４溶液中的析氢活性，用表面能谱分析了电极表面的组分和结构。结果表明：通过离子束修饰在电极表面引入微量的活性元素即可明显改善工业纯钛电极的析氢催化活性；离子束修饰改变了电极表面的组分和相结构，从而达到了改性的目的。     

The influence of fluoride on the physicochemical properties of anodic oxide films formed on titanium surfaces

The influence of fluoride (and its concentration) on the electrochemical and semiconducting properties of anodic oxide films formed on titanium surfaces was investigated by performing electrochemical measurements (potentiodynamic/pontiostatic polarization, open circuit potential (OCP), and capacitance measurements) for a titanium/oxide film/solution interface system in fluoride-containing 1.0 M HClO(4) solution. On the basis of the Mott-Schottky analysis, and with taking into account both the surface reactions (or, say, the specifically chemical adsorption) of fluoride ions at the oxide film surface and the migration/intercalation of fluoride ions into the oxide film, the changes in the electrochemical behavior of titanium measured in this work (e.g., the blocked anodic oxygen evolution, the increased anodic steady-state current density, the positively shifted flat band potential, and the positively shifted film breakdown potential) were interpreted by the changes in the surface and the bulk physicochemical properties (e.g., the surface charges, surface state density, doping concentration, and the interfacial potential drops) of the anodic films grown on titanium. The fluoride concentrations tested in this work can be divided into three groups according to their effect on the electrochemical behavior of the oxide films: < or =0.001 M, 0.001-0.01 M, and >0.01 M. By tracing the changes of the OCP of the passivated titanium in fluoride-containing solutions, the deleterious/depassive effect of fluoride ions on the titanium oxide films was examined and evaluated with the parameter of the film breakdown time. It was also shown that the films anodically formed on titanium at higher potentials (>2.5 V) exhibited significantly higher stability against the fluoride attack than that either formed at lower potentials (<2.5 V) or formed natively in the air.     

Characterization of poly(sodium styrene sulfonate) thin films grafted from functionalized titanium surfaces

Biointegration of titanium implants in the body is controlled by their surface properties. Improving surface properties by coating with a bioactive polymer is a promising approach to improve the biological performance of titanium implants. To optimize the grafting processes, it is important to fully understand the composition and structure of the modified surfaces. The main focus of this study is to provide a detailed, multitechnique characterization of a bioactive poly(sodium styrene sulfonate) (pNaSS) thin film grafted from titanium surfaces via a two-step procedure. Thin titanium films (～50 nm thick with an average surface roughness of 0.9 ± 0.2 nm) prepared by evaporation onto silicon wafers were used as smooth model substrates. X-ray photoelectron spectroscopy (XPS) and time-of-flight secondary ion mass spectrometry (ToF-SIMS) showed that the titanium film was covered with a TiO(2) layer that was at least 10 nm thick and contained hydroxyl groups present at the outermost surface. These hydroxyl groups were first modified with a 3-methacryloxypropyltrimethoxysilane (MPS) cross-linker. XPS and ToF-SIMS showed that a monolayer of the MPS molecules was successfully attached onto the titanium surfaces. The pNaSS film was grafted from the MPS-modified titanium through atom transfer radical polymerization. Again, XPS and ToF-SIMS were used to verify that the pNaSS molecules were successfully grafted onto the modified surfaces. Atomic force microscopy analysis showed that the film was smooth and uniformly covered the surface. Fourier transform infrared spectroscopy indicated that an ordered array of grafted NaSS molecules were present on the titanium surfaces. Sum frequency generation vibration spectroscopy and near edge X-ray absorption fine structure spectroscopy illustrated that the NaSS molecules were grafted onto the titanium surface with a substantial degree of orientational order in the styrene rings.     

Atomic layer deposition of the titanium dioxide thin film from tetraethoxytitanium and water

Using the methods of Rutherford backscattering spectrometry, X-ray photoelectron spectroscopy, X-ray diffraction in the geometry of the grazing beam, and Fourier transform infrared spectroscopy, we studied the chemical composition and structure of thin films of titanium dioxide formed by atomic layer deposition from tetraethoxytitanium and water. It is shown that the films obtained are characterized by a high stoichiometry of composition and by amorphous or polycrystalline structure of the anatase modification, depending on the number of reaction cycles. Using a model of the process of atomic layer deposition that takes into account the size and number of ligands of the reacting molecules, we calculated the amount of titanium dioxide deposited in a single reaction cycle.     

超电容器用电极材料氮化钼的改性研究(I)——钒酸氨添加物对电极性能的影响

应用XRD、SEM和循环伏安等方法对γ_氮化钼及其复合电极进行了表征和测量 ,研究了浸渍液中钒酸铵浓度对成膜物质的表面形貌、结晶形态和电容的影响 .结果表明 :添加钒酸铵导致成膜物质中生成四方晶系的VOMoO4 ,这对氮化钼电极的电容特性有重要影响 .其影响机理为VOMoO4 改变了成膜物质的结晶形态和结构 ,导致氮化钼的部分非晶化 ,循环伏安测试显示了氮化钼电极具有良好的电容特性 .掺钒之后 ,电极的工作电势范围拓宽 ,比电容加大 ;浸渍液中钒钼最佳摩尔比为 35∶6 5 .     

XRD-Studies of SiC/Si layers on carbon substrates

Structural investigations of thin films of SiC, SiC with free silicon and various titanium suicides (TiSi₂, TiSi and Ti₅Si₃) are described. The crystal phases have been identified using X-ray diffractometry. The growth of reaction products from surface reactions between silicon and deposited titanium can be observed.Dedicated to Professor Dr. rer.nat. Dr. h.c. Hubertus Nickel on the occasion of his 65th birthday     

Preparation and Characterization of TiO2 Thin Films by Sol-Gel Method

Titanium dioxide (TiO₂) thin films have been deposited on silicon and glass substrates by the sol-gel process using titanium iso-propoxide [Ti(O-i-C₃H₇)₄]. The bond configuration of the TiO₂ thin films was analyzed by using FTIR in the wavenumber range from 400 to 4000 cm^–1. The spectral transmittance of as-deposited TiO₂ films deposited on fused silica glass was measured in the wavelength range from 200 to 900 nm. X-ray diffraction measurements were performed to determine the crystallinity of the TiO₂ films. As-deposited films were amorphous. As the film was annealed at higher temperature, the structure was transformed from amorphous to the anatase crystalline state. The chemical composition of the deposited film was investigated using X-ray photoelectron spectroscopy (XPS). The films are essentially stoichiometric with carbon as the dominant impurity on the surface. Raman spectra show the characteristic of TiO₂ anatase phase. The electrical properties of the TiO₂ films were measured using capacitance-voltage (C-V) and current-voltage techniques. From C-V measurements, the dielectric constants were calculated to be approximately 26 for the as-deposited films and 75–82 for films annealed at 700°C in different atmosphere. For the as-deposited samples, the breakdown voltage was 2.7 MV/cm, and for an electric field of 1 MV/cm, the leakage current was 5 × 10^–5 A/cm² and the resistivity was 2.2 × 10¹⁰ -cm.     

Oxidation and carbidation of laser-ablated amorphized Ti particles in carbon monoxide

IR laser ablation of hexagonal titanium in vacuum leads to amorphization of ablated Ti particles and when carried out in gaseous carbon monoxide it proceeds as reactive ablation involving particles amorphization, oxidation and carbidation. The films deposited in vacuum and in the presence of CO were examined by Fourier transform infrared, Raman and X-ray photoelectron spectroscopy, X-ray and electron diffraction and electron microscopy. The Ti films become oxidized upon contact with air and the Ti/C/O films are composed of Ti–O, Ti–C and C–O bonds-containing structures with Ti in Ti²⁺–Ti⁴⁺ state and incorporating crystalline rutile and elemental carbon. The ablation in vacuum represents a new approach to amorphous titanium and it is judged that hot ablated Ti particles are modified by reactions with CO decomposition products into amorphous Ti oxycarbides which undergo rapid post-pulse amorphization.     

Composition,structure, and catalytic activity of Ni- and Cu-containing plasma-electrolytic coatings on titanium

Unmodified and modified nickel- and copper-containing oxide layers were formed on a titanium support and their composition, structure, and catalytic activity in a model reaction of CO oxidation were studied.     

Effect of Sulfate Anion Additions on the Phase Composition and Structure of Titanium Dioxide

Methods of X-ray diffraction analysis, electron microscopy, and microanalysis were used to examine the phase composition and structure of sulfate-anion-containing titanium dioxide samples into which a modifier was introduced by impregnation and by the sol-gel technique. It was demonstrated that the modification of titanium dioxide by the impregnation method results in that an ordered surface structure is formed, which is constituted by accreted crystallites 8–10 μm in size. In this structure, sulfate anions are stabilized at interblock boundaries. Titanium dioxide modified by the sol-gel method has the form of loosely packed coarse aggregates with sizes of about 30–32 μm. The appearance of the titanium tetrasulfide phase mostly situated on the surface was observed in its composition. The microstructural features and, in particular, enrichment of the surface of a sol-gel sample with sulfur and a decrease in dispersity are determined by the catalyst preparation conditions.     

Alteration of contact properties and chemical structure of polyethersulfone film surface by direct-current discharge treatment

Changes in the contact properties of the surface of polyethersulfone films modified at the cathode and the anode by dc discharge with varying the treatment time and discharge current have been studied. It has been shown that the treatment imparts hydrophilicity to the films, which persists for a long time. The chemical composition and structure of the surface of the modified films has been examined using X-ray photoelectron spectroscopy.     

超疏水多孔阵列碳纳米管薄膜

碳纳米管由于具有特异的力学[1] 、光学[2 ] 、电学[3,4 ] 和磁学性质[5] ,使其在锂离子电池[6 ] 和平板展示器[7] 等方面呈现出广泛的应用前景 .Ebbesen等[8] 对无序碳纳米管材料的浸润性进行了详细研究 ,发现其很容易被水润湿 .然而 ,阵列碳纳米管膜的浸润性研究尚未见报道 .固体表面的浸润性主要由表面化学组分和几何结构两方面控制 .通常 ,加大表面粗糙度可以增强其浸润性 [9～ 16 ] .近来 ,超疏水表面 (即与水的接触角大于 1 5 0°的表面 )的研究显示了广泛的应用背景[13～ 16 ] .这种表面通常可由增加表面粗糙度和降低表面能来制备[1…     

Titanium arsenide films from the atmospheric pressure chemical vapour deposition of tetrakisdimethylamidotitanium and tert-butylarsine

Thin films of titanium arsenide have been deposited from the atmospheric pressure chemical vapour deposition (APCVD) of [Ti(NMe(2))(4)] and (t)BuAsH(2) at substrate temperatures between 350-550 °C. Highly reflective, silver coloured films were obtained which showed borderline metallic-semiconductor resistivities. The titanium arsenide films were analyzed by scanning electron microscopy (SEM), Raman spectroscopy, wavelength dispersive analysis of X-rays (WDX), powder X-ray diffraction (XRD) and X-ray photoelectron spectroscopy (XPS). The films showed variable titanium to arsenic ratios but at substrate temperatures of 500 and 550 °C films with a 1 : 1 ratio of Ti : As, consistent with the composition TiAs, were deposited. Powder XRD showed that all of the films were crystalline and consistent with the formation of TiAs. Both nitrogen and carbon contamination of the films were negligible.     

X-ray diffraction measurements and depth profiling by secondary neutral mass spectrometry on epitaxially grown high-Tc superconducting thin films

YBa₂Cu₃O_7– thin films were deposited by pulsed laser deposition (PLD) on various substrates with different misfit. X-ray diffraction (XRD) measurements were performed in order to characterize the growth quality of the films and to study the orientation between the films and the substrates. On the used substrates all investigated films are relaxed independently, and epitaxially grown who show a long range ordered two domain structure. The elemental concentration depth profiles of these films detected by secondary neutral mass spectrometry (SNMS) show homogeneous stoichiometric element distributions with slight deviation of the Y content.Dedicated to Professor Dr. rer. nat. Dr. h.c. Hubertus Nickel on the occasion of his 65th birthday