Luminescence properties of ZnSe films grown by hot wall epitaxy

Received: 10 June 1996/Accepted: 20 October 1996     

Luminescence of CsBr:Eu films grown by liquid-phase epitaxy

By liquid-phase epitaxy from an aqueous alcoholic solution, we have obtained films of the well-known storage phospor CsBr:Eu, and we have studied their cathodoluminescence and photoluminescence (PL) spectra compared with the undoped CsBr films. We have established that the structure of the photoluminescence centers of the CsBr:Eu films when excited by laser radiation in the absorption band of the Eu²⁺ ions (λ = 337 nm) includes Eu²⁺-V_Cs isolated dipole centers and CsEuBr₃ aggregate centers, and also luminescence centers based on inclusions of hydroxyl group OH⁻ with the corresponding emission bands in the 440 nm, 520 nm, and 600 nm regions. We have studied the dependence of the spectra and the intensity of the photoluminescence for CsBr:Eu films on annealing temperature in air at 423–483 K, compared with analogous dependences for CsBr:Eu single crystals obtained from the melt. We have shown that annealing the films at T = 423–463 K leads to rapid formation of CsEuBr3 aggregate luminescence centers, while for T > 473 K thermal degradation of these centers occurs. We conclude that the observed differences between the photoluminescence spectra of CsBr:Eu films and CsBr:Eu single crystals may be due to additional doping of the films with OH⁻ ions. __________ Translated from Zhurnal Prikladnoi Spektroskopii, Vol. 73, No. 2, pp. 191–194, March–April, 2006.     

Raman scattering in mosaic silicon carbide films

The Raman spectra of mosaic silicon carbide films grown on silicon substrates by solid-state epitaxy have been studied. The main polytypes forming the film material have been determined. It has been experimentally revealed that the properties of the silicon carbide film are changed after an aluminum nitride film is deposited on the former film. This has been interpreted as a manifestation of good damping properties of the SiC film when layers of other semiconductors are grown on it.     

Photoluminescence of nanostructured cubic-lattice silicon carbide films grown on a silicon wafer

The light-emitting properties of cubic-lattice silicon carbide SiC films grown on Si(100) and Si(111) substrates with VPE at low temperatures (T _gr ∼ 700°C) are discussed. Investigations of the grown films reveal a homogeneous nanocrystalline structure involving only the 3C-SiC phase. When the electron subsystem of the structure is excited by a He-Cd laser emitting at λ_exit = 325 nm, the photoluminescence (PL) spectra contain a rather strong emission band shifted by about 3 eV toward a short-wave spectral region. At low temperatures, the PL integral curve is split into a set of Lorentz components. The relation between these components and the peculiarities of the energy spectrum of electrons in the nanocrystalline grains of the silicon carbide layers is discussed.     

Erbium-doped silicon epilayers grown by liquid-phase epitaxy

Liquid-phase epitaxy from an Si–In–Er solution at an average temperature of 950°C has been used to grow 2–4 μm thick epilayers of erbium-doped silicon onto CZ and FZ silicon substrates in an oxygen-free hydrogen atmosphere. Most of the samples grown on CZ substrates presented detectable, but feeble photoluminescence at 2 K in the spectral range of emission of the Er³⁺ manifold at 0.8 eV. However, some of the samples presented intense photoluminescence, characterized by two bands at 0.807 (at 10 K) and 0.873 eV, of which the first falls almost at the same energy of the Er³⁺ line, but whose intensity presents a quite remarkable persistence up to 250 K. From the energy position of the two bands, from their temperature dependence and from the levels found by deep level transient spectroscopy measurements, associated to TEM examinations, it was possible to attribute these bands, labelled D1 and D2, to dislocation luminescence. It will be shown in this paper that the presence of erbium enhances the D1 luminescence, possibly due to the fact that in these samples erbium is gettered at dislocations in an Er–O local configuration, as it results from EXAFS measurements. Apparently, also, a competition occurs with the Er-induced radiative recombination at dislocations, which is a fast process, and the indirect excitation of the Er manifold, which is the predominant process in dislocation-free materials.     

分子束外延PbTe单晶薄膜的反常拉曼光谱研究

采用分子束外延(MBE)方法在BaF₂(111)衬底上生长了高质量的PbTe单晶薄膜， 拉曼光谱测量观察到了表面氧化物的振动模、布里渊区中心(q≈0)纵光学(LO)声子振动模以 及声子-等离子激元耦合模振动.随着显微拉曼光谱仪激光光斑聚焦深度的改变，各拉曼散射 峰的峰位、积分强度、半高宽等都表现出不同的变化趋势. 随着激光光斑聚焦位置从样品表 面上方3μm处变化到表面下方3μm处，PbTe外延薄膜的LO声子频率从119cm^-1移 动到124cm^{-1关键词： PbTe外延薄膜 拉曼散射 纵光学声子}     

Synthesis of silicon carbide hexagonal nanoprisms

SiC hexagonal nanoprisms have been prepared by a reaction of multiwall carbon nanotubes and Si vapor in an Astro furnace at 1450 °C for 3 h. The polytype, morphology, crystal structure of the nanoprisms were studied by X-ray powder diffraction, scanning electron microscopy and high resolution transmission electron microscopy, showing their hexagonal nanoprism shapes with a 3C-SiC single crystal structure with a diameter of about 100 nm and 2 μm in length. The photoluminescence spectrum of the nanoprisms exhibits a significant blue-shift relative to bulk 3C-SiC and other nanostructured SiC. The possible growth mechanism that controls the nanostructure formation is also analysed. PACS 42.70.Nq; 68.37.-d; 78.55.-m; 78.67.Bf; 81.07.Vb     

Specific features and mechanisms of photoluminescence of nanostructured silicon carbide films grown on silicon in vacuum

The light-emitting properties of cubic silicon carbide films grown by vacuum vapor phase epitaxy on Si(100) and Si(111) substrates under conditions of decreased growth temperatures (T _gr ∼ 900–700°C) have been discussed. Structural investigations have revealed a nanocrystalline structure and, simultaneously, a homogeneity of the phase composition of the grown 3C-SiC films. Photoluminescence spectra of these structures under excitation of the electronic subsystem by a helium-cadmium laser (λ_excit = 325 nm) are characterized by a rather intense luminescence band with the maximum shifted toward the ultraviolet (∼3 eV) region of the spectral range. It has been found that the integral curve of photoluminescence at low temperatures of measurements is split into a set of Lorentzian components. The correlation between these components and the specific features of the crystal structure of the grown silicon carbide layers has been analyzed.     

Thermal stability of CdZnO thin films grown by molecular-beam epitaxy

CdZnO thin films with near-band-edge (NBE) photoluminescence (PL) emission from 2.39 eV to 2.74 eV were grown by plasma-assisted molecular-beam epitaxy on c-plane sapphire substrates with 800 °C in situ annealing. CdZnO thin films evolve from pure wurtzite (wz) structure, to mixture of wz and rock-salt (rs) structures confirmed by X-ray diffraction studies. Rapid-thermo-annealing (RTA) was performed on in situ annealed CdZnO samples. Pure wz CdZnO shows insignificant NBE PL peak shift after RTA, while mixture structure CdZnO shows evident blue shifts due to phase change after annealing, indicating the rs phase CdZnO changes to wz phase CdZnO during RTA process.     

Electrical and optical analyses of Er-doped silicon grown by liquid-phase epitaxy

We have studied the deep levels present in Er-doped silicon epilayers grown by the liquid-phase epitaxy method by deep level transient spectroscopy (DLTS) and optical DLTS, in order to identify the majority and minority carrier traps and a possible correlation between these traps and the observed photoluminescence (PL) and cathodoluminescence (CL) spectra. Capacitance–voltage analyses have been performed to analyze uniformity and depth distribution of the existing traps and marked differences have been observed between the luminescent and non-luminescent materials.The PL and depth resolved CL revealed the presence of dislocation-related emission lines which can possibly be correlated to the broadened peaks observed in DLTS analyses of luminescent material.     

低温分子束外延生长的GaMnAs反射光谱的低能振荡现象

通过傅里叶变换红外光谱和光调制反射光谱技术测量了不同Mn含量的低温分子束外延生长在GaAs衬底上的GaMnAs样品的反射光谱.在低于Ga(Mn)As带边的红外反射光谱和光调制反射光谱上观测到低能振荡现象.通过分析振荡产生的原因并使用双层界面反射模型拟合了红外反射光谱的低能振荡过程,拟合结果与实验相符.研究表明,反射光谱的低能振荡是由于GaMnAs中空穴浓度的变化导致GaMnAs中的折射率发生变化,GaMnAs与衬底GaAs之间的折射率差导致了不同Mn含量的GaMnAs材料的反射谱的低能振荡现象.测量了不同 关键词： GaMnAs 反射光谱 空穴浓度 折射率     

Specific features of morphology and the structure of nanocrystalline cubic silicon carbide films grown on a silicon surface

Physics of the Solid State - The composition, surface morphology, and crystal structure of nanocrystalline cubic silicon carbide films grown on a silicon surface through chemical conversion from...     

New method for growing silicon carbide on silicon by solid-phase epitaxy: Model and experiment

A new method of solid-state epitaxy of silicon carbide (SiC) on silicon (Si) is proposed theoretically and realized experimentally. Films of various polytypes of SiC on Si(111) grow through a chemical reaction (at T = 1100–1400°C) between single-crystal silicon and gaseous carbon oxide CO (at p = 10–300 Pa). Some silicon atoms transform into gaseous silicon oxide SiO and escape from the system, which brings about the formation of vacancies and pores in the silicon near the interface between the silicon and the silicon carbide. These pores provide significant relaxation of the elastic stresses caused by the lattice misfit between Si and SiC. X-ray diffraction, electron diffraction, and electron microscopy studies and luminescence analysis showed that the silicon carbide layers are epitaxial, homogeneous over the thickness, and can contain various polytypes and a mixture of them, depending on the growth conditions. The typical pore size is 1 to 5 μm at film thicknesses of ～20 to 100 nm. Thermodynamic nucleation theory is generalized to the case where a chemical reaction occurs. Kinetic and thermodynamic theories of this growth mechanism are constructed, and the time dependences of the number of new-phase nuclei, the concentrations of chemical components, and the film thickness are calculated. A model is proposed for relaxation of elastic stresses in a film favored by vacancies and pores in the substrate.     

The coalescence of silicon layers grown over SiO2 by liquid-phase epitaxy

We have investigated by liquid-phase epitaxy (LPE) the coalescence of defect-free silicon-on-insulator (SOI) layers. The SOI lamellae grow out laterally from neighbouring seeding windows and spread over the SiO₂. In our study, the seeding window edges are straight. The long window edges are parallel and extend in the (111) substrate plane in direction. Coalescence of SOI lamellae takes place without the formation of defects whenever it begins at one point and then proceeds in directions parallel to the longer edges of the windows in a zip-like mechanism. Defect-free coalescence seams reach lengths of up to 150 m.     

The coalescence of silicon layers grown over SiO2 by liquid-phase epitaxy

The coalescence of epitaxial silicon layers which are grown laterally over oxidized and patterned Si substrates is studied using various techniques of transmission electron microscopy (TEM). The epitaxial layers, the seam of coalescence and lattice defects formed by the coalescence are characterized. The epitaxial layer as a whole is found to be bent with respect to the substrate. Such misorientations, together with facetting of the growth fronts of the coalescing layers, may lead to the formation of solvent inclusions, dislocations and stacking faults at the seam of coalescence. However, under favourable conditions, the seam is found to be entirely defect-free.     

Nonlinear refraction in nanocrystalline silicon carbide films

Nonlinear refraction in nanocrystalline SiC films, which have been obtained using the method of direct deposition of carbon and silicon ions with an energy of 100 eV at substrate temperatures from 900 to 1150°C, has been investigated. It has been shown that the films exhibit a large third-order nonlinear susceptibility χ ⁽³⁾ ～ 10^?6 esu (at λ = 1064 nm and τ _p = 10 ns).     

X-ray photoelectron spectroscopy of Se films grown by hot wall epitaxy

The X-ray photoelectron spectroscopy (XPS) performed on Se films obtained by vacuum deposition and hot wall epitaxy (HWE) indicated shifts in the binding energies of the core-levels. The observed shift of 3.5 eV in the XPS spectrum of 3d level towards the higher binding energy in vacuum deposited film was associated with the Se₈ molecular state. On the other hand, the 3d-level XPS spectrum of Se films grown by HWE indicated an assymmetrical doublet. From the peak positions it was ascertained that the film was retained its bulk characteristic and a partial shift of 2.6 eV was interpretated for the presence of Se₆ molecules.     

Carrier transport characteristics in PbSrSe thin films grown by molecular beam epitaxy

The dark-current characteristics of PbSrSe thin films grown by molecular beam epitaxy on BaF₂ substrates with Sr composition from 0.066 to 0.276 have been measured systematically under different temperatures from 77 K to 300 K. The carrier-transport characteristics have been explained on the basis of a grain-boundary barrier model. The barrier height is found to be strongly related to the Sr composition. The different conductance behavior among the PbSrSe thin films is due to the variation of the grain-boundary barrier. Both the experimental barrier height, determined from the temperature-dependent conductance, and the theoretical results, deduced from the Poisson equation, reveal that the barrier height decreases with increasing applied bias. Furthermore, the success in explaining the observed negative-capacitance phenomenon gives further evidence that the accumulation of electrons at the grain boundaries plays a key role in the carrier transport of the PbSrSe thin films. PACS 72.80.Jc; 73.61.Le; 73.50.Bk     

High quality PdTe_2 thin films grown by molecular beam epitaxy

PdTe_2,a member of layered transition metal dichalcogenides(TMDs),has aroused significant research interest due to the coexistence of superconductivity and type-II Dirac fermions.It provides a promising platform to explore the interplay between superconducting quasiparticles and Dirac fermions.Moreover,PdTe_2 has also been used as a substrate for monolayer antimonene growth.Here in this paper,we report the epitaxial growth of high quality PdTe_2 films on bilayer graphene/SiC(0001)by molecular beam epitaxy(MBE).Atomically thin films are characterized by scanning tunneling microscopy(STM),X-ray photoemission spectroscopy(XPS),low-energy electron diffraction(LEED),and Raman spectroscopy.The band structure of 6-layer PdTe_2 film is measured by angle-resolved photoemission spectroscopy(ARPES).Moreover,our air exposure experiments show excellent chemical stability of epitaxial PdTe_2 film.High-quality PdTe_2 films provide opportunities to build antimonene/PdTe_2 heterostructure in ultrahigh vacuum for future applications in electronic and optoelectronic nanodevices.