铜线键合技术的发展与挑战

铜线键合技术近年来发展迅速,超细间距引线键合是目前铜线键合的主要发展趋势.介绍了铜线键合的防氧化措施以及键合参数的优化,并从IMC生长及焊盘铝挤出方面阐述了铜线键合的可靠性机理.针对铜线在超细间距引线键合中面临的问题,介绍了可解决这些问题的镀钯铜线的性能,并阐述了铜线的成弧能力及面临的挑战.     

IC键合铜线材料的显微力学性能研究

用于IC(集成电路)的键合铜线材料具有低成本、优良的导电和导热性等优点,但其高硬度容易对铝垫和芯片造成损伤,因此对其硬度的测量是一项关键技术。纳米压痕测量技术可以方便、准确地测量铜线材料的显微硬度值和其他力学性能参数。描述了纳米压痕测量技术的原理以及对铜线材料样品进行纳米压痕测量的参数选择,进行了测量试验。结果表明,原始铜线、FAB(金属熔球)、焊点的平均硬度分别为1.46,1.51和1.65GPa,为键合铜线材料的选择和键合工艺参数的优化提供了依据。     

Comparison of the copper and gold wire bonding processes for LED packaging

Wire bonding is one of the main processes of the LED packaging which provides electrical interconnection between the LED chip and lead frame. The gold wire bonding process has been widely used in LED packaging industry currently. However, due to the high cost of gold wire, copper wire bonding is a good substitute for the gold wire bonding which can lead to significant cost saving. In this paper, the copper and gold wire bonding processes on the high power LED chip are compared and analyzed with finite element simulation. This modeling work may provide guidelines for the parameter optimization of copper wire bonding process on the high power LED packaging.     

Comparison of the copper and gold wire bonding processes for LED packaging

Wire bonding is one of the main processes of the LED packaging which provides electrical interconnection between the LED chip and lead frame.The gold wire bonding process has been widely used in LED packaging industry currently.However,due to the high cost of gold wire,copper wire bonding is a good substitute for the gold wire bonding which can lead to significant cost saving.In this paper,the copper and gold wire bonding processes on the high power LED chip are compared and analyzed with finite element simulation.This modeling work may provide guidelines for the parameter optimization of copper wire bonding process on the high power LED packaging.     

Thermosonic bonding of gold wire onto a copper pad with titanium thin-film deposition

A novel thermosonic (TS) bonding process for gold wire bonded onto chips with copper interconnects was successfully developed by depositing a thin, titanium passivation layer on a copper pad. The copper pad oxidizes easily at elevated temperature during TS wire bonding. The bondability and bonding strength of the Au ball onto copper pads are significantly deteriorated if a copper-oxide film exists. To overcome this intrinsic drawback of the copper pad, a titanium thin film was deposited onto the copper pad to improve the bondability and bonding strength. The thickness of the titanium passivation layer is crucial to bondability and bonding strength. An appropriate, titanium film thickness of 3.7 nm is proposed in this work. One hundred percent bondability and high bonding strength was achieved. A thicker titanium film results in poor bond-ability and lower bonding strength, because the thicker titanium film cannot be removed by an appropriate range of ultrasonic power during TS bonding. The protective mechanism of the titanium passivation layer was interpreted by the results of field-emission Auger electron spectroscopy (FEAES) and electron spectroscopy for chemical analysis (ESCA). Titanium dioxide (TiO₂), formed during the die-saw and die-mount processes, plays an important role in preventing the copper pad from oxidizing. Reliability of the high-temperature storage (HTS) test for a gold ball bonded on the copper pad with a 3.7-nm titanium passivation layer was verified. The bonding strength did not degrade after prolonged storage at elevated temperature. This novel process could be applied to chips with copper interconnect packaging in the TS wire-bonding process.     

More uniform Pd distribution in free-air balls of Pd-coated Cu bonding wire using movable flame-off electrode

The currently high price of gold wire has led to the development of bonding wire made from palladium-coated-copper as a lower cost alternative. Increasing the uniformity of the Pd distribution in free-air balls, formed by melting the wire end with an electric spark, is of interest as it can influence the uniformity of process and reliability. To study this Pd distribution, free-air balls are made using four distinct electrical flame-off (spark) processes with short and long spark times from wire bonders with fixed and movable electrodes. Elemental analysis of the free-air ball surfaces reveal a higher Pd concentration on the movable electrode free-air balls than on the fixed electrode free-air balls. Elemental analysis of cross-sections show that the Pd distribution in free-air balls made with a fixed electrode has Pd trails flowing from the neck into the Cu ball center. Furthermore, micro- and nano-voids are observed to follow the Pd trails. In contrast, free-air balls made with a movable electrode exhibit less severe voiding and retain a uniform, thin Pd layer along the surface up to the tip of the free-air ball (shorter spark time). This can help to increase process consistency and reliability.     

Thermosonic bonding of gold wire onto silver bonding layer on the bond pads of chips with copper interconnects

A copper pad oxidizes easily at elevated temperatures during thermosonic wire bonding for chips with copper interconnects. The bondability and bonding strength of a gold wire onto a bare copper pad are seriously degraded by the formation of a copper oxide film. A new bonding approach is proposed to overcome this intrinsic drawback of the copper pad. A silver layer is deposited as a bonding layer on the surface of copper pads. Both the ball-shear force and the wire-pull force of a gold wire bonded onto copper pads with silver bonding layers far exceed the minimum values stated in the JEDEC standard and MIL specifications. The silver bonding layer improves bonding between the gold ball and copper pads. The reliability of gold ball bonds on a bond pad is verified in a high-temperature storage (HTS) test. The bonding strength increases with the storage time and far exceeds that required by the relevant industrial codes. The superior bondability and high strength after the HTS test were interpreted with reference to the results of electron probe x-ray microanalyzer (EPMA) analysis. This use of a silver bonding layer may make the fabrication of copper chips simpler than by other protective schemes.     

孔口铜丝问题的原因分析与改善

电镀工艺能够增加面铜厚度并实现不同层次的导电连接而被广泛的应用于PCB行业。然而,针对该工艺的品质保证绝非易事。电镀工艺受钻孔效果、沉铜前处理、电镀参数等因素的影响,在品质上容易出现铜丝铜粒等不良问题。本文从电镀基本原理出发,初步分析了电镀工艺铜丝的产生原因,并通过试验验证了铜丝产生的原因,得出了有效的改善措施。     

Development of a thermosonic wire-bonding process for gold wire bonding to copper pads using argon shielding

To improve the bondability and ensure the reliability of Au/Cu ball bonds of the thermosonic (TS) wire-bonding process, an argon-shielding atmosphere was applied to prevent the copper pad from oxidizing. With argon shielding in the TS wire-bonding process, 100% gold wire attached on a copper pad can be achieved at the bonding temperature of 180°C and above. The ball-shear and wire-pull forces far exceed the minimum requirements specified in the related industrial codes. In a suitable range of bonding parameters, increasing bonding parameters resulted in greater bonding strength. However, if bonding parameters exceed the suitable range, the bonding strength is deteriorated. The reliability of the high-temperature storage (HTS) test for Au/Cu ball bonds was verified in this study. The bonding strength of Au/Cu ball bonds increases slightly with prolonged storage duration because of diffusion between the gold ball and copper pad during the HTS test. As a whole, argon shielding is a successful way to ensure the Au/Cu ball bond in the TS wire-bonding process applied for packaging of chips with copper interconnects.     

Bonding parameters of blanket copper wafer bonding

A reliable copper wafer bonding process condition, which provides strong bonding at low bonding temperature with a short bonding duration and does not affect the device structure, is desirable for future three-dimensional (3-D) integration applications. In this review paper, the effects of different process parameters on the quality of blanket copper wafer bonding are reviewed and summarized. An overall view of copper wafer bonding for different bonding parameters, including pressure, temperature, duration, clean techniques, and anneal option, can be established. To achieve excellent copper wafer bonding results, 400°C bonding for 30 min. followed by 30 min. nitrogen anneal or 350°C bonding for 30 min. followed by 60 min. anneal bonding is necessary. In addition, by meeting the process requirements of future integrated circuit (IC) processes, the best bonding condition for 3-D integration can be determined.     

Microstructural study of copper free air balls in thermosonic wire bonding

Copper wires are increasingly used in place of gold wires for making bonded interconnections in microelectronics. In this paper, a microstructural study is reported of cross-sectioned free air balls (FABs) made with 23 μm diameter copper bonding wire. It was found that the FAB is comprised of a few columnar grains and a large number of fine subgrains formed within the columnar grains around the periphery of the FAB. It was determined that conduction through the wire was the dominant heat loss mechanism during cooling, and the solidification process started from the wire-ball interface and proceeded across the diameter then outward towards the ball periphery.The microstructure of the Cu ball bond after thermosonic bonding was investigated. The result showed that the subgrain orientations were changed in the bonding process. It is evident that metal flow along the bonding interface was from the central area to the bond periphery during thermosonic bonding.     

Effect of electronic flame off parameters on copper bonding wire: Free-air ball deformability, heat affected zone length, heat affected zone breaking force

Cu bonding wire is more and more used for interconnections to integrated circuits (ICs) to reduce cost and increase performance compared to Au wire. To eliminate underpad damage for Cu wire applications, it is worthwhile to reduce the hardness of the free-air ball (FAB). Short heat affected zone (HAZ) and high HAZ breaking load are often required for advanced microelectronics packaging in order to decrease the loop height and thereby the package thickness.Online measurements of deformability and HAZ breaking force at temperatures close to the bonding temperature of 220 °C are new tools used in this study to evaluate the effects of electronic flame off (EFO) current and firing time on the Cu FAB deformability and the HAZ length and tensile strength. FABs with 50 μm diameter formed from a 25 μm diameter Cu wire with a breaking load of 118.6 mN were used. EFO currents and firing times ranged from 40 to 250 mA and 0.11 to 0.90 ms, respectively. Average FAB deformability factors, HAZ breaking forces, and HAZ lengths were in the rounded ranges of 36.64–44.09% (with a deformation force of 0.60 N), 107.7–116.8 mN, and 167–215 μm, respectively. When produced with 250 mA current during 0.11 ms, the FABs are 7.01–7.89% more deformable than when produced with 45 mA during 0.9 ms, the HAZ breaking force is 7.53–9.37% higher, and the HAZ length is 7–90 μm shorter.     

Study of factors affecting the hardness of ball bonds in copper wire bonding

Copper wire bonding has gained popularity due to its economic advantage and superior electrical performance. However, copper is harder than gold, and replacing gold wire with copper wire introduces hardness related issues. This article reports investigations of the properties including microhardness of the copper balls bonded using ?25.4-μm copper wire and different combinations of electronic-flame-off (EFO) current and firing time settings with forming gas (5%H₂ and 95%N₂) as the inert cover gas. FABs with an identical diameter, obtained under different EFO firing conditions, were ball bonded with the same wire bonding parameters established using design of experiments. Microhardness tests were then performed on the cross-section of the bonded balls. The study revealed that ultrasonic generator current is the most significant factor to increase the bonded mashed ball diameter, ball shear and shear per unit area and to decrease the ball height. The microhardness of bonded copper balls is related to the EFO parameters, with FABs obtained by higher EFO current being softer. The lower hardness is attributed to the higher maximum temperature during the FAB melting state.     

High temperature degradation of palladium coated copper bond wires

High temperature storage lifetime tests of palladium coated copper bond wires (pcc-wires) beyond 1000 h@150 °C lead to an increased number of broken stitches during wire bond pull test. In this article we show that there is an intrinsic degradation of pcc-wires: defects in the Pd layer allow a temperature driven diffusion of Cu to the Pd surface reacting to CuO on the wire surface. Voids in the range of several microns in the Cu wire core weaken the bond wire strength to very low values.The degradation mechanism of pcc-wires is found in both cases, in molded packages and at non-molded wires from the spool. We present results after temperature storage at 150 °C, 175 °C, 200 °C, and 250 °C up to 3000 h.     

Footprint study of ultrasonic wedge-bonding with aluminum wire on copper substrate

The effects of the process parameters of ultrasonic power and normal bonding force on bond formation at ambient temperatures have been investigated with scanning electron microscopy (SEM) and energy-dispersive x-ray (EDX) analysis. A model was developed based on classical microslip theory¹ to explain the general phenomena observed in the evolution of bond footprints left on the substrate. Modifications to the model are made due to the inherent differences in geometry between ball-bonding and wedge-bonding. Classical microslip theory describes circular contacts undergoing elastic deformation. It is shown in this work that a similar microslip phenomenon occurs for elliptical wire-to-flat contacts with plastically deformed wire. It is shown that relative motion exists at the bonding interface as peripheral microslip at lower powers, transitioning into gross sliding at higher powers. With increased normal bonding forces, the transition point into gross sliding occurs at higher ultrasonic bonding powers. These results indicate that the bonding mechanisms in aluminum wire wedge-bonding are very similar to those of gold ball-bonding, both on copper substrate. In ultrasonic wedge-bonding onto copper substrates, the ultrasonic energy is essential in forming bonding by creating relative interfacial motion, which removes the surface oxides.     

Microstructure and mechanical properties of annealed Al-1%Si bonding wire

The microstructure and mechanical properties of 1.25-mil diameter Al-1%Si bonding wire annealed at various temperatures and times have been investigated. The results indicate that the strength shows normal decrease with increasing time and temperature, but the elongation exhibits an unusual U-shaped variation. Of interest is a special point in annealing at a given temperature, that is, same strength (σ_s = σ_b = 150–160 MPa), same elongation (δ<0.2%), and same fracture surface. Annealed at a lower temperature (>300°C), the recrystallized structure has a fine annealing texture that possesses less elongation. At intermediate temperature (300–480°C), some grains grow to intersecting grains and form a mixed structure in which the elongation is about 3–6%. At temperature greater than 480°C, the grains grow rapidly to ultra-long grains. Single slip occurs easily in these ultra-long grains, resulting in lower strength and greater elongation (10–16%). For wire testing, the geometric factors of the wire play a very important role, affecting the microstructure and mechanical properties.     

Reliability of thick Al wire: A study of the effects of wire bonding parameters on thermal cycling degradation rate using non-destructive methods

The effect of bonding parameters on the reliability of thick Al wire bond is investigated. Samples were prepared with 25 different designs with 5 different bonding parameters such as time, ultrasonic power, begin-force, end-force and touch-down steps (pre-compression) with 5 levels. The bond signals of ultrasonic generator were collected during bonding in order to obtain prior quality information of bonded wires. 3D X-ray tomography was then used to evaluate bond quality during passive thermal cycling between −55 °C and 125 °C. Tomography datasets were obtained from the as-bonded condition and during cycling. The results clearly show ultrasonic power, appropriate levels of begin-force and touch-down steps are all important for achieving a well attached and reliable bond. Analysis of the virtual cross-sections indicates a good correlation between the bond signal (i.e. the initial bond quality) and wire bond damage/degradation rate. An improved understanding of the wire bonding process was achieved by observing the effect of the complex interaction of bonding parameters on the ultrasonic generator signals and degradation rate under thermal cycling.     

a-SiNx:H薄膜的热丝化学气相沉积及微结构研究

为了研究热丝温度对a-SiNx:H薄膜性能的影响,采用热丝化学气相沉积法,以SiH4,NH3,H2为反应气源,改变热丝温度沉积薄膜。通过紫外-可见光吸收谱、傅里叶红外透射光谱、光致发光光谱等测试手段对薄膜发光特性、微观结构及键合情况进行表征与分析。从测试情况可知,当热丝温度为1645℃时,H含量最大,N含量最小,同时其折射率最高,薄膜材料的有序度增大;当热丝温度为1713℃时,H含量减少,N含量达到最大,且随着热丝温度增大,薄膜中N含量又开始下降,内部缺陷态密度增加。结果表明,热丝法制备a-SiNx:H薄膜的热丝温度最佳值在1596℃~1680℃之间,此时所制备的薄膜折射率为2.0,适合应用于硅基太阳能电池减反射膜层,且具有较充分的氮、氢含量,薄膜结构、性能稳定。