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1.
Single crystals of L‐Arginine Fluoride (LAF) have been grown by the slow evaporation technique, and the crystalline perfection was studied by HRXRD. Optical absorption studies reveal the lower cut off wavelength (280 nm) and the band gap (5.1 eV). The dielectric constant and dielectric loss have been measured as a function of frequency (42 Hz–5 MHz) and temperature (307‐368K) and the activation energy is 77 μeV. The thermal transport properties such as thermal conductivity (0.88 ± 0.02 W/mK) and specific heat capacity (482±24 J/kg/K) have been estimated by the photopyroelectric technique. The nonlinear refractive index n2, is found to be of the order of 10−13 cm2/W by the Z‐scan technique.  相似文献   

2.
The optical properties of Tl2InGaSe4 layered single crystals have been studied through the transmission and reflection measurements in the wavelength range of 500‐1100 nm. The analysis of room temperature absorption data revealed the presence of both optical indirect and direct transitions with band gap energies of 1.86 and 2.05 eV, respectively. Transmission measurements carried out in the temperature range of 10‐300 K revealed that the rate of change of the indirect band gap with temperature is γ = – 4.4 × 10‐4 eV/K. The absolute zero value of the band gap energy was obtained as Egi(0) = 1.95 eV. The dispersion of the refractive index is discussed in terms of the single oscillator model. The refractive index dispersion parameters: oscillator wavelength and strength were found to be 2.53 × 10–7 m and 9.64 × 1013 m–2, respectively. (© 2009 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)  相似文献   

3.
采用基于密度泛函理论的第一性原理平面波超软贋势方法,分别计算了立方相Ca2Si及掺杂P、Al的电子结构和光学性质.结果表明:立方相Ca2Si是带隙为0.55483 eV的直接带隙半导体,价带主要由Si的3p和Ca的3d、4s态电子构成,导带主要由Ca 的3d、4s和Si的3p态电子共同构成,静态介电常数为11.92474,折射率为3.45322.Ca2Si掺P后,Ca2Si转变为n型半导体,其带隙值是0.42808 V,价带主要由Si、Al的3p和Ca的3d、4s态电子构成,导带主要由Ca的3d、Al的3p、3s和Si的3p态电子构成.静态介电常数为7.92698,折射率为2.81549.掺Al后, Ca2Si转变为n型半导体,带隙值是0.26317 eV,费米面附近的价带主要由Si、P的3p和Ca的3d态电子构成,导带主要由Ca的3d 4s、P的3p、3s和Si的3p态电子构成.静态介电常数为17.02409,折射率为4.12603.掺P和Al均降低Ca2Si的反射率,提高Ca2Si的吸收系数,提高Ca2Si的光利用率.说明掺杂能够有效地改变Ca2Si的电子结构和光学性质,为Ca2Si材料的研发和应用提供理论依据.  相似文献   

4.
WS2由于其优异的物理和光电性质引起了广泛关注。本研究基于第一性原理计算方法,探索了本征单层WS2及不同浓度W原子替位钇(Y)掺杂WS2的电子结构和光学特性。结果表明本征单层WS2为带隙1.814 eV的直接带隙半导体。进行4%浓度(原子数分数)的Y原子掺杂后,带隙减小为1.508 eV,依旧保持着直接带隙的特性,随着Y掺杂浓度的不断增大,掺杂WS2带隙进一步减小,当浓度达到25%时,能带结构转变为0.658 eV的间接带隙,WS2表现出磁性。适量浓度的掺杂可以提高材料的导电性能,且掺杂浓度增大时,体系依旧保持着透明性并且在红外光和可见光区对光子的吸收能力、材料的介电性能都有着显著提高。本文为WS2二维材料相关光电器件的研究提供了理论依据。  相似文献   

5.
邹江  李平  谢泉 《人工晶体学报》2021,50(11):2036-2044
采用基于密度泛函理论的平面波超软赝势方法对纯AlN、(La,Y)单掺杂以及La-Y共掺杂AlN 超胞进行几何结构优化,计算了稀土元素(La,Y)掺杂前后体系的能带结构、态密度和光学性质。结果表明:未掺杂的AlN是直接带隙半导体,带隙值为Eg=4.237 eV,在费米能级附近,态密度主要由Al-3p、N-2s电子轨道贡献电子,光吸收概率大,能量损失较大;掺杂后使得能带结构性质改变,带隙值降低,能带曲线变密集,总态密度整体下移;在光学性质中,稀土元素掺杂后均提高了静态介电常数、光吸收性能,增强了折射率和反射率,减小了电子吸收光子概率及能量损失;其中La-Y共掺体系变化得较为明显。  相似文献   

6.
Crystals of 2‐aminopyridinium nitrato silver have been synthesized by slow evaporation method. Grown crystals have been subjected to FTIR, Single crystal X‐Ray diffraction and UV‐Visible studies in order to investigate the structural and optical properties of the crystal. The FTIR spectrum reveals the presence of the functional group that corresponds to both 2‐aminopyridine and silver nitrate, suggesting the formation of the compound, 2‐aminopyridinium nitrato silver. From XRD it is observed that the crystal crystallizes in the structure of monoclinic with the space group of P21/c. The optical transmittance spectrum shows the maximum transparency of about 95% in the visible region is in consistent with the wide band gap, estimated as 4.738 eV. The optical constants n and k has also been determined from the transmittance data. The static dielectric constant is found to be 0.851. The wide band gap and the less dielectric constant suggest the suitability of this compound material for photoconductive applications. (© 2010 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)  相似文献   

7.
CdS thin films of varying thicknesses were deposited on cleaned glass substrates at room temperature by thermal evaporation technique in a vacuum of about 2 x 10‐5 torr. UV‐VIS spectra of the films were studied using the optical transmittance measurements which were taken in the spectral region from 300 nm to 1100 nm. The absorbance and reflectance spectra of the films in the UV‐VIS region were also studied. Optical constants such as optical band gap, extinction coefficient, refractive index, optical conductivity and complex dielectric constant were evaluated from these spectra. All the films were found to exhibit high transmittance (∼ 60 ‐ 93 %), low absorbance and low reflectance in the visible/near infrared region from ∼ 500 nm to 1100 nm. The optical band gap energy was found to be in the range 2.28 – 2.53 eV. All the films annealed at 300°C for 4 hours in vacuum (∼ 10‐2 torr) showed a decrease in the optical transmittance with its absorption edge shifted towards the longer wavelength, leading to the result that the optical band gap decreases on annealing the films. Also, on annealing crystallinity of the films improves, resulting in decrease in the optical transmittance. (© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)  相似文献   

8.
采用第一性原理计算方法,对本征Mn4Si7以及P和As掺杂的Mn4Si7的电子结构和光学性质进行计算解析。计算结果表明本征Mn4Si7是带隙值为0.810 eV的间接带隙半导体材料,P掺杂Mn4Si7的带隙值增大为0.839 eV,As掺杂Mn4Si7的带隙值减小为0.752 eV。掺杂使得Mn4Si7的能带结构和态密度向低能方向移动,同时使得介电函数的实数部分在低能区明显增大,虚数部分几乎全部区域增加且8 eV以后趋向于零。此外掺杂还增加了高能区的消光系数、吸收系数、反射系数以及光电导率,明显改善了Mn4Si7的光学性质。  相似文献   

9.
本文采用基于密度泛函理论的第一性原理计算了不同浓度Nb掺杂ZnO的能带结构及性能,并对本征ZnO、Al掺杂ZnO(AZO)和Nb掺杂ZnO(NZO)的模拟结果进行对比分析。结果表明:(1)NZO和AZO的带隙值均低于本征ZnO的带隙值,掺杂浓度(原子数分数)同为6.25%的NZO的带隙值低于AZO的带隙值。随着Nb掺杂浓度增高,NZO的导带底明显降低,态密度峰值降低,且Nb-4d态电子占据了费米能级的主要量子态。(2)随着掺杂浓度的增加,NZO和AZO吸收峰和介电函数峰均降低,且向低能区移动,其中,NZO吸收峰向低能区移动更明显,且介电函数虚部分别在0.42 eV和34.29 eV出现新的峰,主要是价带中Nb-4d和Nb-5p电子能级跃迁所致。掺杂浓度同为6.25%的NZO的静介电常数大于AZO的静介电常数,表明NZO极化能力更强,NZO可以更有效改善ZnO的光电性能。随着Nb掺杂浓度增加,NZO的吸收系数和介电函数虚部强度增加且向高能区移动。NZO的模拟结果为高价态元素Nb掺杂ZnO的实验研究工作及实际应用提供了理论参考。  相似文献   

10.
Single crystals of a novel organic material, 4‐Chloro‐3‐Nitrobenzophenone (4C3N) were grown from acetone solution employing the technique of controlled evaporation. 4C3N belongs to the Orthorhombic system, with a = 12.9665(11) Å, b = 7.4388(6) Å, c = 24.336(2) Å, α = β = γ = 90°. FT‐IR study has been performed to identify the functional groups. The transmittance of 4C3N has been used to calculate the refractive index n; the extinction coefficient K and both the real εr and imaginary εi components of the dielectric constant as functions of photon energy. The optical band gap of 4C3N is 2.7 eV. Thermo gravimetric analysis and differential thermal analysis have also been carried out, and the thermal behavior of 4C3N crystal has been studied. The mechanical properties have been investigated. (© 2009 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)  相似文献   

11.
本文基于密度泛函理论(DFT)的第一性原理平面波超软赝势方法计算了z-BC2N和z-B2CN的4种晶体结构的电子结构、硬度和光学性质。结果表明,z-BC2N(2)为直接带隙半导体,其禁带宽度2.449 eV,z-BC2N(1)为间接宽带隙半导体,其禁带宽度为3.381 eV,而z-B2CN(1)和z-B2CN(2)为导体;硬度结果显示z-BC2N(1)、z-BC2N(2)和z-B2CN(1)为超硬材料。最后通过计算z-BC2N基本光学函数与光子能量的关系表征了其光学性质。分析结果表明,z-BC2N结构可以用作良好的耐磨材料和窗口耐热材料。  相似文献   

12.
采用基于密度泛函理论的第一性原理赝势平面波法,计算未掺杂与P替换Si、C以及P间隙掺杂6H-SiC的电子结构与光学性质。结果显示未掺杂的6H-SiC是带隙为2.052 eV的间接带隙半导体,P替换Si、C掺杂以及P间隙掺杂6H-SiC带隙均减小,分别为1.787 eV、1.446 eV和0.075 eV,其中P间隙掺杂带隙减小幅度最大。P替换掺杂6H-SiC使得费米能级向导带移动并插入导带中,呈n型半导体。P间隙掺杂价带中的一条能级跨入费米能级,因此在禁带中出现一条P 3p杂质能级,P间隙掺杂6H-SiC转为p型半导体。替换与间隙掺杂使得6H-SiC的介电函数实部增大,介电函数虚部、吸收光谱、反射光谱与光电导率红移,其中P间隙掺杂效果最佳。通过P掺杂材料的电导率增强,对红外波段的利用率明显提高,为6H-SiC在红外光电性能方面的应用提供有效的理论依据。  相似文献   

13.
Cr掺杂锐钛矿相TiO2光学性质的第一性原理研究   总被引:1,自引:0,他引:1  
本文对Cr掺杂TiO2进行了基于密度泛函理论的第一性原理研究.模拟计算了完整及Cr掺杂TiO2的电子结构,介电函数及吸收光谱的偏振特性.计算结果表明完整的锐钛矿型TiO2晶体在可见光范围内无吸收;掺Cr后晶体的禁带宽度减小到2.25 eV,吸收边红移,并在可见光区域出现了2.51 eV(495 nn)的吸收峰,表明Cr掺杂有利于提高TiO2对太阳光的吸收.计算结果与实验结果基本相符.  相似文献   

14.
Al‐doped ZnO nanoparticle thin films were prepared on glass substrate at the optimum temperature of (410±10) °C by spray pyrolysis technique using zinc nitrate as a precursor solution and aluminium chloride as a dopant. The dopant concentration (Al/Zn at%) was varied from 0 to 2 at%. Structural analysis of the films shows that all the films are of polycrystalline zinc oxide in nature, possessing hexagonal wurtzite structure. The films exhibit variation in peak intensities corresponding to (100), (002) and (101) reflection planes on Al‐doping. The crystallite size calculated by Scherrer formula has been found to be in the range of 35‐65 nm. The optical absorption study shows that the optical band gap in the Al‐doped films varies in the range of 3.11 – 3.22 eV. The width of localized states in the band gap estimated by the Urbach tail analysis has been found to be minimum in case of the 1 at% Al‐doped zinc oxide thin film. (© 2011 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)  相似文献   

15.
GaSe thin films are obtained by evaporating GaSe crystals onto ultrasonically cleaned glass substrates kept at room temperature under a pressure of ∼10–5 Torr. The X‐ray analysis revealed that these films are of amorphous nature. The reflectance and transmittance of the films are measured in the incident photon energy range of 1.1–3.0 eV. The absorption coefficient spectral analysis revealed the existence of long and wide band tails of the localized states in the low absorption region. The band tails width is calculated to be 0.42 eV. The analysis of the absorption coefficient in the high absorption region revealed an indirect forbidden band gap of 1.93 eV. The transmittance analysis in the incidence photon wavelength range of 500–1100 nm allowed the determination of refractive index as function of wave length. The refractive index–wavelength variation leads to the determination of dispersion and oscillator energies as 31.23 and 3.90 eV, respectively. The static refractive index and static dielectric constant were also calculated as a result of the later data and found to be 9.0 and 3.0, respectively. (© 2005 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)  相似文献   

16.
采用基于密度泛函理论框架下的第一性原理平面波超软赝势(USP)方法,结合广义梯度近似(GGA)计算了岩盐结构(B1)和纤锌矿结构(B4)ZnO的相变、弹性性质,并分析了B1和B4相ZnO在相变点处的电子结构特征.计算结果表明:ZnO在12.72 GPa时发生了由B4相向B1相的转变.B1和B4相ZnO的体弹性模量分别为171.5 GPa和132.8 GPa.能带结构的结果表明B1相是间接带隙半导体,带隙值为1.404 eV,而B4相是直接带隙半导体,带隙值为1.107 eV.  相似文献   

17.
Organic optical material 4‐Aminopyridinium‐4‐nitro phenolate (4AP4NP) has been synthesized, and single crystals of size 20 x 14 x 6 mm3 have been grown from acetone solvent at room temperature by solvent evaporation technique. The grown crystals have been characterized by X‐ray diffraction to determine the cell parameters, and by FT‐IR technique to confirm the formation of the expected compound. The crystal belongs to monoclinic crystal system with space group P21/a.The structural perfection of the grown crystals has been analyzed by high‐resolution X‐ray diffraction (HRXRD) rocking curve measurements. The thermal stability of the compound has been determined by TG‐DTA curves. The transmittance of 4AP4NP has been used to determine the refractive index n; the extinction coefficient K and both the real εr and imaginary εi components of the dielectric constant as functions of photon energy. The optical band gap of 4AP4NP is 2.4 eV. The dielectric and mechanical behavior of the specimen was also studied. (© 2009 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)  相似文献   

18.
Optical absorption along the three crystallographic axes of (NH4)2ZnCl4 single crystals is reported over a temperature range from 276 K to 350 K. Our results clearly confirm the antiferroelectric to commensurate phase transition at 319 K. Analysis reveals that at the absorption edge the type of transition is the indirect allowed one. The indirect band gaps at various temperatures are determined and their temperature dependence is estimated in the antiferroelectric and commensurate phases. Optical parameters related to the temperature dependence of the energy gap are evaluated. The single‐effective oscillator model was used to describe the imaginary part of the dielectric constant, which facilitate calculation of the dipole moment parameters. The steepness parameter is given, its value is used to estimate the temperature dependence of the indirect energy gap and the result is compared with that calculated graphically. In the region of the absorption edge, the absorption coefficient obeys Urbach's rule. Urbach characteristic parameters are determined and their temperature dependence is investigated. Correlation between different parameters is considered. Most of the results confirm the optical isotropic nature of AZC crystals. (© 2003 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)  相似文献   

19.
Optical absorption of tris thiourea zinc sulphate (ZTS) single crystals has been measured and its direct band gap was found to be 3.6 eV. Theoretical calculations were carried out to determine the linear optical constants such as extinction coefficient and refractive index. Further the optical nonlinearties of ZTS have been investigated by Z‐scan technique with He‐Ne laser at 632.8 nm. The nonlinear refractive index, absorption coefficient and third order susceptibility is found to be in the order of –5.36 ± 0.26 × 10–12 cm2/W, 4.24 ± 0.21 × 10–4 cm/W, 3.5 ± 0.17 × 10–4 esu respectively. Thus optical characterization of ZTS reveals the various industrial application oriented properties of the material. (© 2009 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)  相似文献   

20.
2-amino-5-nitropyridinium hydrogen oxalate (2A5NPHO) was grown using slow evaporation and bulk crystal of 2A5NPHO was harvested from Assembled Temperature Reduction (ATR) method. Cut and polished crystal was irradiated using Au3+ ion with various fluences. Electronic loss, nuclear energy loss and penetration depth were calculated using SRIM software. It was observed in X- ray pattern that intensity of peak was reduced. Intensity of peak decreased with increase of ion fluencies from 1013 ions/cm2 to 1014 ions/cm2. Optical properties were measured using UV-Vis spectrometer. The increase of absorption was due to excited electrons which were formed by vacancies and formation of additional defects centres. Energy band gap of irradiated crystals increased with increase of ion fluence. Energy band gap of irradiated crystals were 3.39 eV, 3.42 eV, and 3.4 eV for 1013 ions/cm2, 5 × 1013 ions/cm2 and 1014 ions/cm2 respectively and increase of band gap was due to the increase of forbidden gap. Microhardness was calculated using Vicker's Hardness tester. Increase of microhardness in irradiation crystal was due to increase of high density lattice defects produced by Au3+ of 10.8 MeV. Electrical property was calculated using dielectric constant. Increase of dielectric constant was due to large polarization which caused by disorderness and rich defects in the crystalline surface. Decrease of intensity peak in fluorescence was due to transition of excited electron to intermediated energy levels from excited state which converted into vibrational energy of lattice atoms (phonon). Morphology of irradiated crystal was seen using scanning electron microscope (SEM). It was observed from the SEM image that surface of crystal was heavily damaged. It was also noticed that the thermal stability of the irradiated single crystal increased with increase of ion fluences. Impedance of irradiated crystal was measured. The bulk resistance and grain boundary resistance also were calculated.  相似文献   

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