Silicon LEDs emitting in the band-to-band transition region: Effect of temperature and current strength

The parameters of silicon light-emitting diodes (LEDs) prepared through boron implantation into n-Si, followed by annealing at 700–1200°C, were studied. The maximum room-temperature internal quantum efficiency of electroluminescence (EL) in the region of band-to-band transitions was estimated as 0.4% and reached at an annealing temperature of 1100°C. This value did not vary more than twofold within the operating temperature range 80–500 K. The EL growth and decay kinetics was studied at various currents. Following an initial current range of nonlinear dependence, the EL intensity scaled linearly with the current. It is shown that interpretation of this result will apparently require a revision of some present-day physical concepts concerning carrier recombination in silicon diodes.

     

Optimising dislocation-engineered silicon light-emitting diodes

This article presents a study of the possibilities of optimising the electroluminescence (EL) efficiency of dislocation-engineered silicon light-emitting diodes (DELEDs). The diodes were produced by implantation of boron in n-type (100)Si wafers, at a constant ion energy and fluence, of 30 keV and 1×10¹⁵ ions/cm², respectively. The density and the areal coverage by dislocation loops were varied by applying different annealing times in a rapid thermal processing, from 30 s to 60 min. It is shown that the EL efficiency is directly correlated to the number and areal coverage by the loops. The highest population of loops, ∼5×10⁹ /cm², and an areal coverage of around 50% were achieved for 1–5 min annealing. This loop distribution results in optimal DELEDs, having the highest EL response and the largest increase of EL intensity with operating temperature (80–300 K). The results of this work confirm a previously introduced model of charge-carrier spatial confinement by a local stress induced by the edge of the dislocation loops, preventing carrier diffusion to non-radiative recombination centres and enhancing radiative transitions at the silicon band edge. PACS 85.60.Jb; 78.60.Fi; 61.72.Tt     

Specific features of the effect of annealing on the transmission spectra of GaP:N light-emitting diodes

The effect of annealing in a hydrogen atmosphere on the transmission spectra of GaP:N light-emitting diodes at temperatures of 550, 570, and 590 °C has been investigated. Temperature-induced rearrangement of defects has been observed. The band gap of the material studied is determined. The dependence of the transmission and difference transmission spectra on the annealing temperature and the effect of annealing on the electroluminescence spectra are shown.     

Temperature and injection current dependent electroluminescence study of GaInP/AlGaInP quantum well laser diode grown using tertiarybutylarsine and tertiarybutylphosphine

GaInP/AlGaInP triple quantum well (TQW) lasers, grown by metalorganic chemical vapor deposition (MOCVD) using tertiarybutylarsine (TBAs) and tertiarybutylphosphine (TBP), were fabricated with a pulsed anodic oxidation (PAO) process. The devices worked at room temperature (RT) with the lowest threshold current density (J_th) of 1.5 kA/cm² ever reported for GaInP/AlGaInP lasers grown using TBAs and TBP. Temperature dependent (35–250 K) electroluminescence (EL) study of the GaInP/AlGaInP laser diode showed almost the same luminescence quenching behavior at a high temperature region (120–250 K), independent of the injection current (100–150 mA). A model involving a nonradiative recombination mechanism was presented to interpret the EL quenching behavior over the experimental temperature range. The nonradiative recombination centers in the Al-containing barrier or cladding layer are believed to contribute to the loss of carriers via nonradiative recombination. PACS 78.60.Fi; 71.20.Nr; 78.67.De; 81.15.Gh; 42.55.Px     

Temperature-dependent efficiency droop behaviors of GaN-based green light-emitting diodes

The efficiency droop behaviors of GaN-based green light-emitting diodes (LEDs) are studied as a function of temperature from 300 K to 480 K. The overall quantum efficiency of the green LEDs is found to degrade as temperature increases, which is mainly caused by activation of new non-radiative recombination centers within the LED active layer. Meanwhile, the external quantum efficiency of the green LEDs starts to decrease at low injection current level (<1 A/cm2 ) with a temperature-insensitive peak-efficiency-current. In contrast, the peak-efficiency-current of a control GaN-based blue LED shows continuous up-shift at higher temperatures. Around the onset point of efficiency droop, the electroluminescence spectra of the green LEDs also exhibit a monotonic blue-shift of peak energy and a reduction of full width at half maximum as injection current increases. Carrier delocalization is believed to play an important role in causing the efficiency droop in GaN-based green LEDs.     

High photo and electroluminescence efficiency oligothiophenes

We report photo and electroluminescence efficiency of a thiophene oligomer functionalized to enhance its solid-state efficiency. We find that the absolute PL quantum yield is up to 37% for spin-coated thin films of the compound. The material has been used as active material in organic light-emitting diodes (LEDs). EL efficiencies up to 0.9 cd/A are demonstrated in LEDs prepared with a blend indium tin oxide and Ca–Al electrodes.     

Enhancement of light-emission efficiency of ultraviolet InGaN/GaN multiple quantum well light emitting diode with InGaN underlying layer

Two ultraviolet InGaN/GaN light emitting diodes (LEDs) with and without InGaN underlying layer beneath the multiple quantum wells (MQWs) were grown by metal-organic vapor phase epitaxy. Based on the photoluminescence excitation measurements, it was found that the Stokes shift of the sample with a 10-nm-thick In_0.1Ga_0.9N underlying layer was about 64 meV, which was smaller than that of the reference sample without InGaN underlying layer, indicating a reduced quantum-confined Stark effect (QCSE) due to the decrease of the piezoelectric polarization field in the MQWs. In addition, by fitting the photon energy dependence of carrier lifetime values, the radiative recombination lifetime of the sample with and without InGaN underlying layer were obtained about 1.22 and 1.58 ns at 10?K, respectively. The shorter carrier lifetime also confirmed that the QCSE in the MQWs was weakened after inserting the InGaN underlying layer. In addition, although the depth of carrier localization in the sample with InGaN underlying layer became smaller, the nonradiative recombination centers (NRCs) inside it decreased, and thus suppressed the nonradiative recombination process significantly according to the electroluminescence measurement results. Compared to the reference sample, the efficiency droop behavior was delayed in the sample with InGaN underlying layer and the droop effect was also effectively alleviated. Therefore, the enhanced light-emission efficiency of ultraviolet InGaN/GaN MQW LEDs could be attributed to the decrease of QCSE and NRCs.     

Blue and green-blue-variable light-emitting diodes based on the blend of polymer and organic molecules

Organic light-emitting diodes based on the blend of poly (p-phenylene vinylene) (PPV) derivative and naphthyl-imine–gallium complex have been fabricated by spin-coating method. Blue emission and blue-green variation depending on the ratio of the PPV derivative to the complex and the applied voltage have been observed. The investigation on PL (photoluminescence) and EL (electroluminescence) properties demonstrates that the improvement of the luminescent efficiency is related to the injection balance between holes and electrons, and the color variation is attributed to the variation of the recombination zone. Received: 7 July 1999 / Accepted: 11 October 1999 / Published online: 8 March 2000     

High current density in light-emitting transistors of organic single crystals

We measured the external electroluminescence quantum efficiency (eta(ext)) in light-emitting field-effect transistors (LETs) made of organic single crystals and found that, in the ambipolar transport region, eta(ext) is not degraded up to several hundreds A/cm(2) current-density range, which is 2 orders of magnitude larger than that achieved in conventional organic light-emitting diodes. The present result indicates the single-crystal organic LET is a promising device structure that is free from various kinds of nonradiative losses such as exciton dissociation near electrodes and exciton annihilations.     

Effect of Mg-Preflow for p-AlGaN Electron Blocking Layer on the Electroluminescence of Green LEDs with V-Shaped Pits

In GaN-based green light-emitting diodes(LEDs) with and without Mg-preflow before the growth of p-Al GaN electron blocking layer(EBL) are investigated experimentally.A higher Mg doping concentration is achieved in the EBL after Mg-preflow treatment,effectively alleviating the commonly observed efficiency collapse and electrons overflowing at cryogenic temperatures.However,unexpected decline in quantum efficiency is observed after Mg-preflow treatment at room temperature.Our conclusions are drawn such that the efficiency decline is probably the result of different emission positions.Higher Mg doping concentration in the EBL after Mg-preflow treatment will make it easier for a hole to be injected into multiple quantum wells with emission closer to pGaN side through the(8-plane rather than the V-shape pits,which is not favorable to luminous efficiency due to the preferred occurrence of accumulated strain relaxation and structural defects in upper QWs closer to p-GaN.Within this framework,apparently disparate experimental observations regarding electroluminescence properties,in this work,are well reconciled.     

Thermal quenching of electroluminescence assisted by an electric field in thin films of tris-(8-hydroxyquinolinato) aluminum (III)

Temperature dependence of the electroluminescence (EL)-current efficiency of tris-(8-hydroxyquinolinato) aluminum (III) (Alq₃)-based organic light-emitting diodes (OLEDs) operated at a constant current density was investigated. The effects of temperature and electric field on photoluminescence (PL) efficiency of Alq₃ thin layers were also investigated. On the basis of these results, it was found that the EL efficiency decreases more markedly with increasing temperature than does PL efficiency. The temperature dependence of the EL efficiency can be interpreted in terms of the thermal dissociation of excitons that is assisted by the electric field.     

LiF修饰阴极的双层有机电致发光器件的延时效应

基于载流子的注入、传输和复合过程,建立了双层有机发光器件的电致发光延时理论模型;讨论了电致发光延时随电压、注入势垒、内界面势垒、阳极区厚度及LiF缓冲层(BL)厚度的变化关系。结果表明:(1)低电压下,EL延时由复合过程主导,而高电压下,输运过程起着更重要的作用;(2)当δe/δh2时,M/O界面属于欧姆接触,电流是空间电荷限制的,注入势垒的变化对复合时间trec影响较大,当δe/δh2时,M/O界面成为接触限制,注入势垒的变化对trec几乎没有影响;(3)当内界面势垒超过0.3eV,H′h对trec的影响明显变弱,复合延迟时间基本上由电压和其它因素控制;(4)当电压较小时,随Lh/L的增大,trec增大;当电压超过某一值后,trec几乎不随Lh/L的变化而变化;(5)对于LiF/Ag阴极,在不同的偏压下,LiF的厚度在3.1nm左右时的复合时间最短,对应的EL延迟时间也最短,这与实验中从电致发光效率的角度得出的LiF最佳厚度一致。     

Si-based materials and devices for light emission in silicon

We report on the fabrication and performances of extremely efficient Si-based light sources. The devices consist of MOS structures with erbium (Er) implanted in the thin gate oxide. The devices exhibit strong 1.54 μm electroluminescence (EL) at 300 K with a 10% external quantum efficiency, comparable to that of standard light-emitting diodes using III–V semiconductors. Er excitation is caused by hot electrons impact and oxide wearout limits the reliability of the devices. Much more stable light-emitting MOS devices have been fabricated using Er-doped silicon rich oxide (SRO) films as gate dielectric. These devices show a high stability, with an external quantum efficiency reduced to 1%. In these devices, Er pumping occurs by energy transfer from the Si nanostructures to the rare-earth ions. Finally, we have also fabricated MOS structures with Tb- and Yb-doped SiO₂ which show room temperature EL at 540 nm (Tb) and 980 nm (Yb) with an external quantum efficiency of a 10% and 0.1%, respectively.     

Characteristics of deep ultraviolet AlGaN-based light emitting diodes with p-hBN layer

The AlGaN-based deep ultraviolet (DUV) light-emitting diodes (LEDs) with p-hBN layer are investigated numerically. In comparison with the conventional AlGaN DUV LEDs, the proposed LED can significantly improve the carrier injection, radiative efficiency, as well as the electroluminescence (EL) intensity under the same applied forward bias. Simultaneously, the light extraction efficiency in the LED using p-hBN instead of p-AlGaN exhibits a more than 250% increase at the applied voltage of 7.5 V due to the smaller loss of reflection and absorption of the emitted light.     

Improvement in electroluminescence performance of n-ZnO/Ga_2O_3 /p-GaN heterojunction light-emitting diodes

n-ZnO/p-GaN heterojunction light-emitting diodes with and without a Ga2O3 interlayer are fabricated. The electroluminescence （EL） spectrum of the n-ZnO/p-GaN displays a single blue emission at 430 nm originating from GaN, while the n-ZnO/Ga2O3/p-GaN exhibits a broad emission peak from ultraviolet to visible. The broadened EL spectra of n-ZnO/Ga2O3/p-GaN are probably ascribed to the radiative recombination in both the p-GaN and n-ZnO, due to the larger electron barrier （ΔEC=1.85 eV） at n-ZnO/Ga2O3 interface and the much smaller hole barrier （ΔEV=0.20 eV） at Ga2O3/p-GaN interface.     

Electroluminescence of silicon nanocrystals in MOS structures

We have studied the structural, electrical and optical properties of MOS devices, where the dielectric layer consists of a substoichiometric SiO_x (x<2) thin film deposited by plasma-enhanced chemical vapor deposition. After deposition the samples were annealed at high temperature (>1000 °C) to induce the separation of the Si and the SiO₂ phases with the formation of Si nanocrystals embedded in the insulating matrix. We observed at room temperature a quite intense electroluminescence (EL) signal with a peak at ∼850 nm. The EL peak position is very similar to that observed in photoluminescence in the very same device, demonstrating that the observed EL is due to electron–hole recombination in the Si nanocrystals and not to defects. The effects of the Si concentration in the SiO_x layer and of the annealing temperature on the electrical and optical properties of these devices are also reported and discussed. In particular, it is shown that by increasing the Si content in the SiO_x layer the operating voltage of the device decreases and the total efficiency of emission increases. These data are reported and their implications discussed. Received: 31 August 2001 / Accepted: 3 September 2001 / Published online: 17 October 2001     

Electronic states at dislocations and metal silicide precipitates in?crystalline silicon and their role in?solar cell materials

Predominant dislocation types in solar silicon are dissociated into 30°- and 90°-partials with reconstructed cores. Besides shallow 1D-band localized in their strain field and a quasi-2D band at the stacking fault connecting the two partials, the existence of several intrinsic core defects with deep lying levels has been demonstrated by electron spin resonance. The majority of core defects occur in nonequilibrium situations and, with the exception of a small EPR-signal assigned to a reconstruction defect, vanish after careful annealing above 800°C. There is good evidence now that part of deep levels observed in dislocated silicon is associated with impurities, especially with transition metal impurities. Electron-hole-pair recombination at a dislocation mainly runs via its shallow bands and is strongly increased by impurities bound to its core or in the strain field. The concentration of these impurities can be reduced by gettering processes to such a low level that radiative recombination at dislocations yields a luminescence efficiency of 0.1% at room temperature. A quite coherent picture has emerged for metal impurity precipitation in silicon. Early stages of precipitation in defect-free silicon are characterised by kinetically selected metastable defects forming as a result of large chemical driving forces for precipitation. Such defects are associated with deep level spectra which show the properties of extended multielectron defects. The evolution of the system to energetically more favourable configurations proceeds via ordinary particle coarsening but also via internal ripening, a process reminiscent of the above-mentioned metastable defects. Electronically, the defects evolve into metal-like inclusions which in general seem to act as strong recombination centers for minority carriers. In the presence of dislocations metastable defects quickly transform into equilibrium structures in the course of precipitation or do not form at all. In the presence of several metal impurities silicide precipitates which can be described as solid solutions of the respective metal atoms are observed, which is at least qualitatively in accord with ternary phase diagrams. Like single-metal silicide precipitates, strong minority carrier recombination is also typical for those multi-metal silicide particles.     

Electroluminescence study on electron hole plasma in strained SiGe epitaxial layers

The electroluminescence (EL) of thick fully strained SiGe layers is investigated in order to clarify the recombination mechanisms. In the investigated temperature range of 20–80 K and for SiGe thickness of 70–450 nm an electron–hole plasma (EHP) is observed even at low current densities of 1 Acm⁻². In SiGe-based quantum devices the EHP condition is expected to be attained at even lower injection levels. We used the band filling model for EHP to extract the renormalized gap of SiGe in dependence on the plasma density by performing a line shape analysis of EL spectra. The results were compared with the theoretical prediction. Based on this analysis as well as on measurements and modelling of the spectral photocurrent and the external quantum efficiency, we were able to evaluate parameters of recombination transitions for EHP in SiGe. Above 200 K there is an important contribution to EL from the silicon regions. For a better evaluation of the SiGe contribution, we compared EL of SiGe diodes with EL of pure silicon diodes.     

Temperature‐dependent electroluminescence intensity in green and blue (In,Ga)N multiple‐quantum‐well diodes

The electroluminescence (EL) intensity has been investigated of green and blue (In,Ga)N multiple‐quantum‐well diodes grown on c ‐plane sapphire over a wide temperature range and as a function of current between 0.01 mA and 10 mA. The EL intensity of the green diode with p‐(Al,Ga)N electron blocking layer does not show low‐temperature quenching, especially at low injection levels, previously observed for the blue (In,Ga)N quantum‐well diodes. This finding rules out possi‐ bilities that the freeze‐out of holes at deep Mg acceptor levels and the failure of hole injections through the p‐(Al,Ga)N layer are directly responsible for the EL quenching at temperatures below 100 K. Variations of the EL efficiency with current level suggest that capture/escape efficiencies of injected carriers by the wells play an important role for the determination of EL external quantum efficiency. (© 2008 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

硅衬底InGaN/GaN基蓝光发光二极管droop效应的研究

InGaN/GaN基阱垒结构LED当注入的电流密度较大时, LED的量子效率随注入电流密度增大而下降, 即droop效应.本文在Si (111)衬底上生长了 InGaN/GaN 基蓝光多量子阱结构的LED,通过将实验测量的光电性能曲线与利用ABC模型模拟的结果进行对比, 探讨了droop效应的成因.结果显示:温度下降会阻碍电流扩展和降低空穴浓度, 电子在阱中分布会越来越不平衡,阱中局部区域中因填充了势能越来越高的电子而溢出阱外, 从而使droop效应随着温度的降低在更小的电流密度下出现且更为严重, 不同温度下实验值与俄歇复合模型模拟的结果在高注入时趋势相反.这此结果表明,引起 droop效应的主因不是俄歇非辐射复合而是电子溢出,电子溢出的本质原因是载流子在阱中分布不均衡.